LEADER 04502nam 2200517 450 001 9910677221603321 005 20230808205336.0 010 $a3-527-69647-4 010 $a3-527-69645-8 010 $a3-527-69640-7 035 $a(CKB)4330000000010686 035 $a(EBL)4661484 035 $a(MiAaPQ)EBC4661484 035 $a(OCoLC)957683058 035 $a(EXLCZ)994330000000010686 100 $a20160915h20162016 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 00$aAdvanced nano deposition methods /$fedited by Yuan Lin and Xin Chen 210 1$aWeinheim, Germany :$cWiley-Vch Verlag GmbH & Co. KGaA :$cChemical Industry Press,$d2016 210 4$dİ2016 215 $a1 online resource (329 p.) 300 $aDescription based upon print version of record 311 $a3-527-34025-4 320 $aIncludes bibliographical references at the end of each chapters and index 327 $aCover; Title Page; Copyright; Contents; List of Contributors; Chapter 1 Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure; 1.1 Introduction; 1.2 Pulsed Laser Deposition System Setup; 1.3 Advantages and Disadvantages of Pulsed Laser Deposition; 1.4 The Thermodynamics and Kinetics of Pulsed Laser Deposition; 1.4.1 Laser-Material Interactions; 1.4.2 Dynamics of the Plasma; 1.4.3 Nucleation and Growth of the Film on the Substrate Surface; 1.5 Monitoring of Growth Kinetics; 1.5.1 Introduction and RHEED Studies; 1.5.2 Growth Kinetics Studies by Surface X-ray Diffraction 327 $a1.6 Fundamental Parameters in Thin Film Growth1.6.1 Substrate Temperature; 1.6.2 Background Gas Pressure; 1.6.3 Laser Fluence and Ablation Area; 1.6.4 Target-Substrate Distance; 1.6.5 Post-Annealing; 1.6.6 Lattice Misfit; 1.7 Pulsed Laser Deposition for Complex Oxide Thin Film Growth; 1.7.1 Pulsed Laser Deposition for Superconductor Thin Film; 1.7.2 Pulsed Laser Deposition for Ferroelectric Thin Films; 1.7.3 Pulsed Laser Deposition for Ferromagnetic Thin Film; 1.7.4 Pulsed Laser Deposition for Multiferroics Thin Film; 1.7.5 Interface Strain Engineering the Complex Oxide Thin Film 327 $a1.7.5.1 Thickness Effect1.7.5.2 Substrate Effect; 1.7.5.3 Post-Annealing; 1.8 Pulsed Laser Deposition for Nanostructure Growth; 1.8.1 Self-Assembled Nanoscale Structures; 1.8.2 Geometrically Ordered Arrays; 1.9 Variation of Pulsed Laser Deposition; 1.10 Conclusion; References; Chapter 2 Electron Beam Evaporation Deposition; 2.1 Introduction; 2.2 Electron Beam Evaporation System; 2.2.1 Heating Principle and Characters of Electron Beams; 2.2.1.1 Heating Principle of Electron Beams; 2.2.1.2 Characters of Electron Beams; 2.2.2 Equipments of Electron Beam Source 327 $a2.2.2.1 Filament and Electron Emission2.2.2.2 Electron Beam Control; 2.2.2.3 Power Supply, Crucibles, and Feed Systems; 2.2.2.4 Source Materials; 2.2.3 Application of Electron Beam Evaporation; 2.2.3.1 Cooling of Electron Beam Gun; 2.2.3.2 Evaporation of Source Materials by Electron Beam; 2.2.3.3 Vacuum Deposition Process of Electron Beam Evaporation; 2.2.3.4 Attention and Warning for Electron Beam Evaporation; 2.3 Characterization of Thin Film; 2.3.1 Surface Morphology by AFM; 2.3.2 Thickness Measurement by Spectroscopic Ellipsometry; 2.4 Summary; Acknowledgments; References 327 $aChapter 3 Nanostructures and Thin Films Deposited with Sputtering3.1 Introduction; 3.2 Nanostructures with Sputtering; 3.2.1 Oxide Nanostructures; 3.2.1.1 Needle-Shaped MoO3 Nanowires; 3.2.1.2 Bi2O3 Nanowires; 3.2.2 Nitride Nanostructures; 3.2.2.1 Graphitic-C3N4 Nanocone Array; 3.2.2.2 InAlN Nanorods; 3.3 Thin Films Deposited with Sputtering; 3.3.1 Metal Alloy Thin Films; 3.3.1.1 LaNi5 Alloy Thin Films; 3.3.1.2 Ni-Mn-In Alloy Thin Films; 3.3.2 Composite Metal Oxide Thin Films; 3.3.2.1 BiFeO3/BaTiO3 Bilayer Thin Films; 3.4 Summary; Acknowledgments; References 327 $aChapter 4 Nanostructures and Quantum Dots Development with Molecular Beam Epitaxy 606 $aNanostructured materials 615 0$aNanostructured materials. 676 $a620.5 701 $aLin$b Yuan$c(Of Dian zi ke ji da xue (Chengdu, China)$01439478 701 $aChen$b Xin$c(Of Hua dong li gong da xue)$0768278 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910677221603321 996 $aAdvanced nano deposition methods$93601675 997 $aUNINA