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Nanoimprint Lithography Technology and Applications



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Autore: Mühlberger Michael Visualizza persona
Titolo: Nanoimprint Lithography Technology and Applications Visualizza cluster
Pubblicazione: Basel, : MDPI - Multidisciplinary Digital Publishing Institute, 2022
Descrizione fisica: 1 online resource (180 p.)
Soggetto topico: Technology: general issues
Soggetto non controllato: angle of incidence
anisotropy
biomimetic surface
biomimetics
Blu-Ray patterning
Bragg SPPs
click chemistry
contact angle
defect avoidance
durability
el-T-NIL
el-UV-NIL
formulation development
grating
guiding chart
high aspect ratio micro-structure
hydrodynamic instabilities
inorganic-organic hybrid polymer
large-area patterning
line and space
master
morpho butterfly
n/a
nanoimprint lithography
nanoimprint lithography (NIL)
negligible residual layer
neuronal cell assay
oleophobic
optical losses
optical planar waveguides
organic solar cell
partial cavity filling
plasmons
polymer
R2R UV-NIL
reactive ion etching
roll-to-plate nanoimprint lithography
roll-to-plate R2P nanoimprinting
SmartNIL
superhydrophobic
surface chemistry
T-NIL
ultraviolet nanoimprint lithography
undercut features
UV-curable polymers
UV-NIL
Persona (resp. second.): MühlbergerMichael
Sommario/riassunto: Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes around the world. One of the exciting things about nanoimprinting process is its remarkable versatility and the broad range of applications. This reprint includes ten articles, which represent a small glimpse of the challenges and possibilities of this technology. Six contributions deal with nanoimprint processes aiming at specific applications, while the other four papers focus on more general aspects of nanoimprint processes or present novel materials. Several different types of nanoimprint processes are used: plate-to-plate, roll-to-plate, and roll-to-roll. Plate-to-plate NIL here also includes the use of soft and flexible stamps. The application fields in this reprint are broad and can be identified as plasmonics, superhydrophibicity, biomimetics, optics/datacom, and life sciences, showing the broad applicability of nanoimprinting. The sections on the nanoimprint process discuss filling and wetting aspects during nanoimprinting as well as materials for stamps and imprinting.
Titolo autorizzato: Nanoimprint Lithography Technology and Applications  Visualizza cluster
Formato: Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione: Inglese
Record Nr.: 9910585936903321
Lo trovi qui: Univ. Federico II
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