LEADER 00998cam0-22003371i-450 001 990000241990403321 005 20200318115611.0 035 $a000024199 035 $aFED01000024199 035 $a(Aleph)000024199FED01 035 $a000024199 100 $a20020821d1989----km-y0itay50------ba 101 0 $aita 102 $aIT 105 $ay-------001yy 200 1 $aNorme & mercato$escenari e fattori innovativi delle costruzioni negli anni '90$fMichele Di Sivo$gintroduzione di Giovanni Ferracuti 210 $aFirenze$cALINEA$d1989 215 $a214 p.$d22 cm 225 1 $a<>processo edilizio$v14 700 1$aDi Sivo,$bMichele$f<1951- >$010828 702 1$aFerracuti,$bGiovanni 801 0$aIT$bUNINA$gRICA$2UNIMARC 901 $aBK 912 $a990000241990403321 952 $aB 611 CAN$bURB 3002/787$fDARPU 952 $a620017$b5702$fDCATA 952 $a620015$b5731$fDCATA 959 $aDARPU 959 $aDCATA 996 $aNorme & mercato$9116696 997 $aUNINA LEADER 03878nam 2200865z- 450 001 9910585936903321 005 20231214132922.0 035 $a(CKB)5600000000483113 035 $a(oapen)https://directory.doabooks.org/handle/20.500.12854/91170 035 $a(EXLCZ)995600000000483113 100 $a20202208d2022 |y 0 101 0 $aeng 135 $aurmn|---annan 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aNanoimprint Lithography Technology and Applications 210 $aBasel$cMDPI - Multidisciplinary Digital Publishing Institute$d2022 215 $a1 electronic resource (180 p.) 311 $a3-0365-4482-8 311 $a3-0365-4481-X 330 $aNanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes around the world. One of the exciting things about nanoimprinting process is its remarkable versatility and the broad range of applications. This reprint includes ten articles, which represent a small glimpse of the challenges and possibilities of this technology. Six contributions deal with nanoimprint processes aiming at specific applications, while the other four papers focus on more general aspects of nanoimprint processes or present novel materials. Several different types of nanoimprint processes are used: plate-to-plate, roll-to-plate, and roll-to-roll. Plate-to-plate NIL here also includes the use of soft and flexible stamps. The application fields in this reprint are broad and can be identified as plasmonics, superhydrophibicity, biomimetics, optics/datacom, and life sciences, showing the broad applicability of nanoimprinting. The sections on the nanoimprint process discuss filling and wetting aspects during nanoimprinting as well as materials for stamps and imprinting. 606 $aTechnology: general issues$2bicssc 610 $ananoimprint lithography 610 $apolymer 610 $aformulation development 610 $asurface chemistry 610 $aclick chemistry 610 $aplasmons 610 $aBragg SPPs 610 $aangle of incidence 610 $agrating 610 $aorganic solar cell 610 $aultraviolet nanoimprint lithography 610 $adurability 610 $aanisotropy 610 $acontact angle 610 $aline and space 610 $ahigh aspect ratio micro-structure 610 $aroll-to-plate nanoimprint lithography 610 $asuperhydrophobic 610 $aoleophobic 610 $abiomimetic surface 610 $alarge-area patterning 610 $anegligible residual layer 610 $apartial cavity filling 610 $aguiding chart 610 $adefect avoidance 610 $ahydrodynamic instabilities 610 $aT-NIL 610 $aUV-NIL 610 $ael-UV-NIL 610 $ael-T-NIL 610 $aoptical planar waveguides 610 $aroll-to-plate R2P nanoimprinting 610 $aUV-curable polymers 610 $ainorganic-organic hybrid polymer 610 $aoptical losses 610 $aSmartNIL 610 $aR2R UV-NIL 610 $aneuronal cell assay 610 $ananoimprint lithography (NIL) 610 $aundercut features 610 $amaster 610 $aBlu-Ray patterning 610 $areactive ion etching 610 $abiomimetics 610 $amorpho butterfly 615 7$aTechnology: general issues 700 $aMu?hlberger$b Michael$4edt$01328215 702 $aMu?hlberger$b Michael$4oth 906 $aBOOK 912 $a9910585936903321 996 $aNanoimprint Lithography Technology and Applications$93038435 997 $aUNINA