LEADER 03915nam 2200889z- 450 001 9910585936903321 005 20220812 035 $a(CKB)5600000000483113 035 $a(oapen)https://directory.doabooks.org/handle/20.500.12854/91170 035 $a(oapen)doab91170 035 $a(EXLCZ)995600000000483113 100 $a20202208d2022 |y 0 101 0 $aeng 135 $aurmn|---annan 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 00$aNanoimprint Lithography Technology and Applications 210 $aBasel$cMDPI - Multidisciplinary Digital Publishing Institute$d2022 215 $a1 online resource (180 p.) 311 08$a3-0365-4482-8 311 08$a3-0365-4481-X 330 $aNanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes around the world. One of the exciting things about nanoimprinting process is its remarkable versatility and the broad range of applications. This reprint includes ten articles, which represent a small glimpse of the challenges and possibilities of this technology. Six contributions deal with nanoimprint processes aiming at specific applications, while the other four papers focus on more general aspects of nanoimprint processes or present novel materials. Several different types of nanoimprint processes are used: plate-to-plate, roll-to-plate, and roll-to-roll. Plate-to-plate NIL here also includes the use of soft and flexible stamps. The application fields in this reprint are broad and can be identified as plasmonics, superhydrophibicity, biomimetics, optics/datacom, and life sciences, showing the broad applicability of nanoimprinting. The sections on the nanoimprint process discuss filling and wetting aspects during nanoimprinting as well as materials for stamps and imprinting. 606 $aTechnology: general issues$2bicssc 610 $aangle of incidence 610 $aanisotropy 610 $abiomimetic surface 610 $abiomimetics 610 $aBlu-Ray patterning 610 $aBragg SPPs 610 $aclick chemistry 610 $acontact angle 610 $adefect avoidance 610 $adurability 610 $ael-T-NIL 610 $ael-UV-NIL 610 $aformulation development 610 $agrating 610 $aguiding chart 610 $ahigh aspect ratio micro-structure 610 $ahydrodynamic instabilities 610 $ainorganic-organic hybrid polymer 610 $alarge-area patterning 610 $aline and space 610 $amaster 610 $amorpho butterfly 610 $an/a 610 $ananoimprint lithography 610 $ananoimprint lithography (NIL) 610 $anegligible residual layer 610 $aneuronal cell assay 610 $aoleophobic 610 $aoptical losses 610 $aoptical planar waveguides 610 $aorganic solar cell 610 $apartial cavity filling 610 $aplasmons 610 $apolymer 610 $aR2R UV-NIL 610 $areactive ion etching 610 $aroll-to-plate nanoimprint lithography 610 $aroll-to-plate R2P nanoimprinting 610 $aSmartNIL 610 $asuperhydrophobic 610 $asurface chemistry 610 $aT-NIL 610 $aultraviolet nanoimprint lithography 610 $aundercut features 610 $aUV-curable polymers 610 $aUV-NIL 615 7$aTechnology: general issues 700 $aMu?hlberger$b Michael$4edt$01328215 702 $aMu?hlberger$b Michael$4oth 906 $aBOOK 912 $a9910585936903321 996 $aNanoimprint Lithography Technology and Applications$93038435 997 $aUNINA