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Designing Topological Phase of Bismuth Halides and Controlling Rashba Effect in Films Studied by ARPES : Doctoral Thesis accepted by The University of Tokyo, Kashiwa, Japan / Ryo Noguchi



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Autore: Noguchi, Ryo Visualizza persona
Titolo: Designing Topological Phase of Bismuth Halides and Controlling Rashba Effect in Films Studied by ARPES : Doctoral Thesis accepted by The University of Tokyo, Kashiwa, Japan / Ryo Noguchi Visualizza cluster
Pubblicazione: Singapore, : Springer, 2022
Descrizione fisica: xv, 126 p. : ill. ; 24 cm
Soggetto topico: 74K35 - Thin films [MSC 2020]
81-XX - Quantum theory [MSC 2020]
81V35 - Nuclear physics [MSC 2020]
Soggetto non controllato: Angle-resolved photoemission spectroscopy
Higher-order Topological Insulator
Nano-ARPES
Quantum Well State
Rashba Spin-Orbit Coupling
Spin-resolved ARPES
Surface Alloy
Van der Waals Material
Weak Topological Insulator
Titolo autorizzato: Designing Topological Phase of Bismuth Halides and Controlling Rashba Effect in Films Studied by ARPES  Visualizza cluster
Formato: Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione: Inglese
Record Nr.: VAN00284054
Lo trovi qui: Univ. Vanvitelli
Localizzazioni e accesso elettronico https://doi.org/10.1007/978-981-19-1874-2
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Serie: Springer theses : recognizing outstanding Ph.D. research Berlin . -Springer , 2010-