2000 5th International Symposium on Plasma Process-Induced Damage : May 22-24, 2000, Santa Clara, California, USA
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| Titolo: |
2000 5th International Symposium on Plasma Process-Induced Damage : May 22-24, 2000, Santa Clara, California, USA
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| Pubblicazione: | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 2000 |
| Disciplina: | 621.3815/2 |
| Soggetto topico: | Semiconductor wafers - Effect of radiation on |
| Semiconductors | |
| Plasma radiation | |
| Electrical & Computer Engineering | |
| Engineering & Applied Sciences | |
| Electrical Engineering | |
| Persona (resp. second.): | GabrielCalvin T |
| EngelhardtManfred | |
| KoyanagiMitsumasa | |
| Note generali: | Bibliographic Level Mode of Issuance: Monograph |
| Titolo autorizzato: | 2000 5th International Symposium on Plasma Process-Induced Damage : May 22-24, 2000, Santa Clara, California, USA |
| Formato: | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 996206559703316 |
| Lo trovi qui: | Univ. di Salerno |
| Opac: | Controlla la disponibilità qui |