01944oam 2200529zu 450 99620655970331620210807003510.0(CKB)111055184271206(SSID)ssj0000395899(PQKBManifestationID)12189669(PQKBTitleCode)TC0000395899(PQKBWorkID)10457105(PQKB)10532172(EXLCZ)9911105518427120620160829d2000 uy engtxtccr2000 5th International Symposium on Plasma Process-Induced Damage : May 22-24, 2000, Santa Clara, California, USA[Place of publication not identified]Northern California Chapter of the American Vacuum Society2000Bibliographic Level Mode of Issuance: Monograph0-9651577-4-1 Semiconductor wafersEffect of radiation onCongressesSemiconductorsCongressesPlasma radiationCongressesElectrical & Computer EngineeringHILCCEngineering & Applied SciencesHILCCElectrical EngineeringHILCCSemiconductor wafersEffect of radiation onSemiconductorsPlasma radiationElectrical & Computer EngineeringEngineering & Applied SciencesElectrical Engineering621.3815/2Gabriel Calvin TEngelhardt ManfredKoyanagi MitsumasaIEEE Electron Devices SocietyAmerican Vacuum SocietyInternational Symposium on Plasma Process-Induced DamagePQKBPROCEEDING9962065597033162000 5th International Symposium on Plasma Process-Induced Damage : May 22-24, 2000, Santa Clara, California, USA2515723UNISA