Novel materials processing by advanced electromagnetic energy sources (MAPEES'04) : proceedings of the International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources : March 19-22, 2004, Osaka, Japan / / S. Miyake, editor-in-chief

• Pubblicazione: Amsterdam ; ; Boston, : Elsevier, 2005
• Edizione: 1st ed.
• Descrizione fisica: 1 online resource (477 p.)
• Disciplina: 539.7
• Soggetto topico: Electromagnetic waves; Materials science; Materials - Electric properties; Materials - Magnetic properties
• Altri autori: MiyakeS (Shoji)
• Note generali: Description based upon print version of record.
• Nota di bibliografia: Includes bibliographical references and author index.
• Nota di contenuto: Cover; CONTENTS; Preface; Organizing Committee; Plenary Papers; Smart Processing Development of Novel Materials for Electromagnetic Wave Control; A Review of Cluster Ion Beam Process Technology; Plasma Processing; Structural Control of Nanocarbon Materials by Novel Plasma Processing (Invited); Amorphous Carbon Film Deposition by Magnetically-Driven Shunting Arc Discharge (Invited); RF Sheet-Plasma Source Using Permanent Magnets; Deposition Uniformity of Pulsed Vacuum Arc Ion Source ; Thermal Properties of Gravity-Free Gas-Arc Discharge Measured in a Jet Plane and Its Application Nano-Tube ProductionNew Method for Measuring Ion Energy in Pulsed Vacuum Arc; Relationship between H-/D- Production and Plasma Parameter Control with Magnetic Filter in Volume Negative Ion Sources; Novel Method to Increase Energy Density of Arc Plasma Jet; Material Coating Using Electromagnetically Accelerated Plasma Jet; Process Control of Carbon Nanotube Formation Using RF Glow-Discharge Plasma in Strong Magnetic Field ; Development of Arc Discharge Method in Organic Solvents for the Formation of DNA Encapsulated Carbon NanotubesEffects of Sputtering Due to Ion Irradiation on Plasma Anisotropic CVD of Cu; Evaluation of Contribution of Higher-Order Silane Radicals in Silane Discharges to Si-H2 Bond Formation in A-Si:H Films; Nanometer-Ranged Metallic Coatings by Noble Pulsed Cathodic Arc Deposition; Preparation of Hard Carbon Films by MCECR Plasma Sputtering Method; Microwave/Millimeter-Wave Processing; Micro- and Millimeter-Wave Processing of Advanced Materials at Karlsruhe Research Center (Invited) ; Simultaneous Use of Different High Frequency Energy Sources for Material Processing (Invited)High Power Submillimeter Wave Radiation Sources, Gyrotron FU Series (Invited); What Type of Transport Phenomena can be Induced by Microwave Field in Solids and How These Phenomena Contribute to Materials Processing (Invited); Powerful Electron Beams for Cyclotron Resonance Devices; Quasi-Stationary Electro-Thermal Heating Model for Microwave/Hybrid-Processed Materials Using Greens Function Techniques; Aerospace CFRP Structure Fabrication with the 2.45 GHz Hephaistos System ; Optimization of Slotted Waveguides for 2.45 GHz Applicators Using Nobel Slot TypesThe Role of High Pressure Plasma in Microwave Sintering Processes; Heating Behavior of Slags in 2.45 GHz Microwave Applicator; Rapid Heating by Single-Mode Cavity Controlled at 6 GHz; Millimeter-Wave Dielectric Measurement of SiC Powders as a Basis of Millimeter-Wave Sintering of Ceramics; Boron Carbide Ceramics Sintering by Using 24 GHz Compact Gyrotron; Instrumented Millimeter Wave Sintering of Mechanically Alloyed Amorphous Ceramic Powders for Bulk Nanocrystalline Synthesis ; Millimeter-Wave Effect on Sintering of Silicon Nitrides by 28 GHz Millimeter-Wave Radiation
• Sommario/riassunto: Proceedings of the International Symposium in Novel Materials Processing by Advanced Electromagnetic Energy Sources (MAPEES'04)*Identifies and details recent progress achieved by advanced electromagnetic energy sources in materials processing.*Explores novel approaches to advanced electromagnetic energy processing of materials in an attempt to discover new and unique industrial fields.
• Altri titoli varianti: MAPEES '04
• Titolo autorizzato: Novel materials processing by advanced electromagnetic energy sources (MAPEES'04)
• ISBN: 1-280-63772-2; 9786610637720; 0-08-045612-X
• Formato: Materiale a stampa
• Livello bibliografico: Monografia
• Lingua di pubblicazione: Inglese
• Record Nr.: 9910968122803321
• Lo trovi qui: Univ. Federico II