LEADER 05503nam 2200733Ia 450 001 9910968122803321 005 20251029210320.0 010 $a1-280-63772-2 010 $a9786610637720 010 $a0-08-045612-X 024 3 $z9780080445045 024 3 $z978080445045 035 $a(CKB)1000000000384878 035 $a(EBL)269579 035 $a(SSID)ssj0000212521 035 $a(PQKBManifestationID)11178601 035 $a(PQKBTitleCode)TC0000212521 035 $a(PQKBWorkID)10137899 035 $a(PQKB)11275734 035 $a(Au-PeEL)EBL269579 035 $a(CaPaEBR)ebr10137950 035 $a(CaONFJC)MIL63772 035 $a(OCoLC)162130074 035 $a(MiAaPQ)EBC269579 035 $a(EXLCZ)991000000000384878 100 $a20051213d2005 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aNovel materials processing by advanced electromagnetic energy sources (MAPEES'04) $eproceedings of the International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources : March 19-22, 2004, Osaka, Japan /$fS. Miyake, editor-in-chief 205 $a1st ed. 210 $aAmsterdam ;$aBoston $cElsevier$d2005 215 $a1 online resource (477 p.) 300 $aDescription based upon print version of record. 311 08$a0-08-044504-7 320 $aIncludes bibliographical references and author index. 327 $aCover; CONTENTS; Preface; Organizing Committee; Plenary Papers; Smart Processing Development of Novel Materials for Electromagnetic Wave Control; A Review of Cluster Ion Beam Process Technology; Plasma Processing; Structural Control of Nanocarbon Materials by Novel Plasma Processing (Invited); Amorphous Carbon Film Deposition by Magnetically-Driven Shunting Arc Discharge (Invited); RF Sheet-Plasma Source Using Permanent Magnets; Deposition Uniformity of Pulsed Vacuum Arc Ion Source 327 $aThermal Properties of Gravity-Free Gas-Arc Discharge Measured in a Jet Plane and Its Application Nano-Tube ProductionNew Method for Measuring Ion Energy in Pulsed Vacuum Arc; Relationship between H-/D- Production and Plasma Parameter Control with Magnetic Filter in Volume Negative Ion Sources; Novel Method to Increase Energy Density of Arc Plasma Jet; Material Coating Using Electromagnetically Accelerated Plasma Jet; Process Control of Carbon Nanotube Formation Using RF Glow-Discharge Plasma in Strong Magnetic Field 327 $aDevelopment of Arc Discharge Method in Organic Solvents for the Formation of DNA Encapsulated Carbon NanotubesEffects of Sputtering Due to Ion Irradiation on Plasma Anisotropic CVD of Cu; Evaluation of Contribution of Higher-Order Silane Radicals in Silane Discharges to Si-H2 Bond Formation in A-Si:H Films; Nanometer-Ranged Metallic Coatings by Noble Pulsed Cathodic Arc Deposition; Preparation of Hard Carbon Films by MCECR Plasma Sputtering Method; Microwave/Millimeter-Wave Processing; Micro- and Millimeter-Wave Processing of Advanced Materials at Karlsruhe Research Center (Invited) 327 $aSimultaneous Use of Different High Frequency Energy Sources for Material Processing (Invited)High Power Submillimeter Wave Radiation Sources, Gyrotron FU Series (Invited); What Type of Transport Phenomena can be Induced by Microwave Field in Solids and How These Phenomena Contribute to Materials Processing (Invited); Powerful Electron Beams for Cyclotron Resonance Devices; Quasi-Stationary Electro-Thermal Heating Model for Microwave/Hybrid-Processed Materials Using Greens Function Techniques; Aerospace CFRP Structure Fabrication with the 2.45 GHz Hephaistos System 327 $aOptimization of Slotted Waveguides for 2.45 GHz Applicators Using Nobel Slot TypesThe Role of High Pressure Plasma in Microwave Sintering Processes; Heating Behavior of Slags in 2.45 GHz Microwave Applicator; Rapid Heating by Single-Mode Cavity Controlled at 6 GHz; Millimeter-Wave Dielectric Measurement of SiC Powders as a Basis of Millimeter-Wave Sintering of Ceramics; Boron Carbide Ceramics Sintering by Using 24 GHz Compact Gyrotron; Instrumented Millimeter Wave Sintering of Mechanically Alloyed Amorphous Ceramic Powders for Bulk Nanocrystalline Synthesis 327 $aMillimeter-Wave Effect on Sintering of Silicon Nitrides by 28 GHz Millimeter-Wave Radiation 330 $aProceedings of the International Symposium in Novel Materials Processing by Advanced Electromagnetic Energy Sources (MAPEES'04)*Identifies and details recent progress achieved by advanced electromagnetic energy sources in materials processing.*Explores novel approaches to advanced electromagnetic energy processing of materials in an attempt to discover new and unique industrial fields. 517 3 $aMAPEES '04 606 $aElectromagnetic waves$vCongresses 606 $aMaterials science$vCongresses 606 $aMaterials$xElectric properties$vCongresses 606 $aMaterials$xMagnetic properties$vCongresses 615 0$aElectromagnetic waves 615 0$aMaterials science 615 0$aMaterials$xElectric properties 615 0$aMaterials$xMagnetic properties 676 $a539.7 676 $a539.7 701 $aMiyake$b S$g(Shoji)$01853050 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910968122803321 996 $aNovel materials processing by advanced electromagnetic energy sources (MAPEES'04)$94449051 997 $aUNINA