Handbook of contamination control in microelectronics : principles, applications, and technology / / edited by Donald L. Tolliver
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| Titolo: |
Handbook of contamination control in microelectronics : principles, applications, and technology / / edited by Donald L. Tolliver
|
| Pubblicazione: | Park Ridge, N.J., U.S.A., : Noyes Publications, c1988 |
| Descrizione fisica: | 1 online resource (510 p.) |
| Disciplina: | 621.381/73 |
| Soggetto topico: | Integrated circuits - Design and construction |
| Contamination (Technology) | |
| Altri autori: |
TolliverDonald L
|
| Nota di bibliografia: | Includes bibliographies and index. |
| Sommario/riassunto: | This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications. |
| Titolo autorizzato: | Handbook of contamination control in microelectronics |
| ISBN: | 1-282-00261-9 |
| 9786612002618 | |
| 0-8155-1745-9 | |
| Formato: | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9911006668003321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |
Serie:
Materials science and process technology series.