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Titolo: |
Surface science and adhesion in cosmetics / / edited by K. L. Mittal and H.S. Bui
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Pubblicazione: | Hoboken, New Jersey : , : Scrivener Publishing, , [2021] |
©2021 | |
Descrizione fisica: | 1 online resource (720 pages) |
Disciplina: | 541.33 |
Soggetto topico: | Surface chemistry |
Adhesion | |
Cosmetics | |
Persona (resp. second.): | MittalK. L. <1945-> |
BuiH. S. | |
Sommario/riassunto: | "Activity in the arena of surface chemistry and adhesion aspects in cosmetics is substantial, but the information is scattered in many diverse publications media and no book exists which discusses surface chemistry and adhesion in cosmetics in unified manner. This book containing 15 chapters written by eminent researchers from academia and industry is divided into three parts: Part 1: General Topics; Part 2: Surface Chemistry Aspects; and Part 3: Wetting and Adhesion Aspects. The topics covered include: Lip biophysical properties and characterization; use of advanced silicone materials in long-lasting cosmetics; non-aqueous dispersions of acrylate copolymers in lipsticks; cosmetic oils in Lipstick structure; chemical structure of the hair surface, surface forces and interactions; AFM for hair surface characterization; application of AFM in characterizing hair, skin and cosmetic deposition; SIMS as a surface analysis method for hair, skin and cosmetics; surface tensiometry approach to characterize cosmetic products; spreading of hairsprays on hair; color transfer from long-wear face foundation products; interaction of polyelectrolytes and surfactants on hair surfaces; cosmetic adhesion to facial skin; and adhesion aspects in semi-permanent mascara; lipstick adhesion measurement."-- |
Titolo autorizzato: | Surface science and adhesion in cosmetics ![]() |
ISBN: | 1-119-65490-4 |
1-119-65492-0 | |
1-119-65484-X | |
Formato: | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione: | Inglese |
Record Nr.: | 9910830383203321 |
Lo trovi qui: | Univ. Federico II |
Opac: | Controlla la disponibilità qui |