Applications of Laser Ablation : Thin Film Deposition, Nanomaterial Synthesis and Surface Modification / / edited by Dongfang Yang

• Autore: Dongfang Yang
• Pubblicazione: IntechOpen, 2016; Rijeka, Croatia : , : IntechOpen, , 2016
• Descrizione fisica: 1 online resource (428 pages) : illustrations
• Disciplina: 621.3
• Soggetto topico: Laser ablation
• Soggetto non controllato: Physical Sciences; Engineering and Technology; Optoelectronics; Physics; Optics and Lasers
• Persona (resp. second.): YangDongfang
• Nota di bibliografia: Includes bibliographical references.
• Sommario/riassunto: Laser ablation refers to the phenomenon in which a low wavelength and short pulse (ns-fs) duration of laser beam irradiates the surface of a target to induce instant local vaporization of the target material generating a plasma plume consisting of photons, electrons, ions, atoms, molecules, clusters, and liquid or solid particles. This book covers various aspects of using laser ablation phenomenon for material processing including laser ablation applied for the deposition of thin films, for the synthesis of nanomaterials, and for the chemical compositional analysis and surface modification of materials. Through the 18 chapters written by experts from international scientific community, the reader will have access to the most recent research and development findings on laser ablation through original research studies and literature reviews.
• Altri titoli varianti: Applications of laser ablation; Applications of Laser Ablation - Thin Film Deposition, Nanomaterial Synthesis and Surface Modification
• Titolo autorizzato: Applications of Laser Ablation
• ISBN: 953-51-4129-5; 953-51-2812-4
• Formato: Materiale a stampa
• Livello bibliografico: Monografia
• Lingua di pubblicazione: Inglese
• Record Nr.: 9910169205903321
• Lo trovi qui: Univ. Federico II