02460nam 2200493 450 991016920590332120240131193931.0953-51-4129-5953-51-2812-4(CKB)3710000001157114(NjHacI)993710000001157114(oapen)https://directory.doabooks.org/handle/20.500.12854/41066(EXLCZ)99371000000115711420221018d2016 uy 0engur|||||||||||txtrdacontentcrdamediacrrdacarrierApplications of Laser Ablation Thin Film Deposition, Nanomaterial Synthesis and Surface Modification /edited by Dongfang YangIntechOpen2016Rijeka, Croatia :IntechOpen,2016.1 online resource (428 pages) illustrations953-51-2811-6 Includes bibliographical references.Laser ablation refers to the phenomenon in which a low wavelength and short pulse (ns-fs) duration of laser beam irradiates the surface of a target to induce instant local vaporization of the target material generating a plasma plume consisting of photons, electrons, ions, atoms, molecules, clusters, and liquid or solid particles. This book covers various aspects of using laser ablation phenomenon for material processing including laser ablation applied for the deposition of thin films, for the synthesis of nanomaterials, and for the chemical compositional analysis and surface modification of materials. Through the 18 chapters written by experts from international scientific community, the reader will have access to the most recent research and development findings on laser ablation through original research studies and literature reviews.Applications of laser ablationApplications of Laser Ablation - Thin Film Deposition, Nanomaterial Synthesis and Surface ModificationLaser ablationPhysical SciencesEngineering and TechnologyOptoelectronicsPhysicsOptics and LasersLaser ablation.621.3Dongfang Yangauth1365302Yang DongfangNjHacINjHaclBOOK9910169205903321Applications of Laser Ablation3874895UNINA