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Chemical Solution Deposition of Functional Oxide Thin Films / / edited by Theodor Schneller, Rainer Waser, Marija Kosec, David Payne



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Titolo: Chemical Solution Deposition of Functional Oxide Thin Films / / edited by Theodor Schneller, Rainer Waser, Marija Kosec, David Payne Visualizza cluster
Pubblicazione: Vienna : , : Springer Vienna : , : Imprint : Springer, , 2013
Edizione: 1st ed. 2013.
Descrizione fisica: 1 online resource (801 p.)
Disciplina: 660.6
Soggetto topico: Materials—Surfaces
Thin films
Physical chemistry
Industrial engineering
Production engineering
Tribology
Corrosion and anti-corrosives
Coatings
Surfaces and Interfaces, Thin Films
Physical Chemistry
Industrial and Production Engineering
Tribology, Corrosion and Coatings
Persona (resp. second.): SchnellerTheodor
WaserRainer
KosecMarija
PayneDavid
Note generali: Description based upon print version of record.
Nota di bibliografia: Includes bibliographical references at the end of each chapters and index.
Nota di contenuto: Introduction -- Solution Chemistry; Simple alskoxide based precursor systems; Carboxylate based precursor systems; Single-source precursors; Acqueos Precursor Systems; Solution Synthesis Strategies -- Analytical Methods; Introduction; Thermal Analysis; NMR Sepctroscopy; EXAFS; Other Methods (XRM, SEM,TEM;scattering methods at nanocrystalline films); Spin-Coating; Dip Coating; Inkjet Printing and Other Direct Writing Methods(dip point and imprint techniques); Chemical Bath Deposition; Polymer Assisted Deposition -- Processing and Crystallization; Thermodynamics and Heating Processes; Material Systems Dominated by Heterogeneous Nucleation; Material Systems Dominated by Homogeneous Nucleation; Low Temperature Processing; Epitaxial Films; Powder Assisted Film Fabrication; UV-and E-Beam Direct Patterning of Photosensitive CSD Films; Template Controlled Growth -- Functions and Applications; Introduction; Integrated Capacitors; Base Metal Electrodes; Polar Oxide Films for MEMS Applications;Conducting Films and Electrodes; Transparent conducting oxides; Superconducting Films; Porous Films for Gas Sensors; Luminescent Fims -- Appendix; Synthesis for Standard material Systems.
Sommario/riassunto: This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.
Titolo autorizzato: Chemical Solution Deposition of Functional Oxide Thin Films  Visualizza cluster
ISBN: 3-211-99311-8
Formato: Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione: Inglese
Record Nr.: 9910437801303321
Lo trovi qui: Univ. Federico II
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