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Titolo: | Chemical Solution Deposition of Functional Oxide Thin Films / / edited by Theodor Schneller, Rainer Waser, Marija Kosec, David Payne |
Pubblicazione: | Vienna : , : Springer Vienna : , : Imprint : Springer, , 2013 |
Edizione: | 1st ed. 2013. |
Descrizione fisica: | 1 online resource (801 p.) |
Disciplina: | 660.6 |
Soggetto topico: | Materials—Surfaces |
Thin films | |
Physical chemistry | |
Industrial engineering | |
Production engineering | |
Tribology | |
Corrosion and anti-corrosives | |
Coatings | |
Surfaces and Interfaces, Thin Films | |
Physical Chemistry | |
Industrial and Production Engineering | |
Tribology, Corrosion and Coatings | |
Persona (resp. second.): | SchnellerTheodor |
WaserRainer | |
KosecMarija | |
PayneDavid | |
Note generali: | Description based upon print version of record. |
Nota di bibliografia: | Includes bibliographical references at the end of each chapters and index. |
Nota di contenuto: | Introduction -- Solution Chemistry; Simple alskoxide based precursor systems; Carboxylate based precursor systems; Single-source precursors; Acqueos Precursor Systems; Solution Synthesis Strategies -- Analytical Methods; Introduction; Thermal Analysis; NMR Sepctroscopy; EXAFS; Other Methods (XRM, SEM,TEM;scattering methods at nanocrystalline films); Spin-Coating; Dip Coating; Inkjet Printing and Other Direct Writing Methods(dip point and imprint techniques); Chemical Bath Deposition; Polymer Assisted Deposition -- Processing and Crystallization; Thermodynamics and Heating Processes; Material Systems Dominated by Heterogeneous Nucleation; Material Systems Dominated by Homogeneous Nucleation; Low Temperature Processing; Epitaxial Films; Powder Assisted Film Fabrication; UV-and E-Beam Direct Patterning of Photosensitive CSD Films; Template Controlled Growth -- Functions and Applications; Introduction; Integrated Capacitors; Base Metal Electrodes; Polar Oxide Films for MEMS Applications;Conducting Films and Electrodes; Transparent conducting oxides; Superconducting Films; Porous Films for Gas Sensors; Luminescent Fims -- Appendix; Synthesis for Standard material Systems. |
Sommario/riassunto: | This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered. |
Titolo autorizzato: | Chemical Solution Deposition of Functional Oxide Thin Films |
ISBN: | 3-211-99311-8 |
Formato: | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione: | Inglese |
Record Nr.: | 9910437801303321 |
Lo trovi qui: | Univ. Federico II |
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