LEADER 05451nam 22007815 450 001 9910437801303321 005 20200704010507.0 010 $a3-211-99311-8 024 7 $a10.1007/978-3-211-99311-8 035 $a(CKB)2550000001199641 035 $a(EBL)971689 035 $a(SSID)ssj0001175094 035 $a(PQKBManifestationID)11761086 035 $a(PQKBTitleCode)TC0001175094 035 $a(PQKBWorkID)11116027 035 $a(PQKB)10396417 035 $a(DE-He213)978-3-211-99311-8 035 $a(MiAaPQ)EBC971689 035 $a(PPN)176103015 035 $a(EXLCZ)992550000001199641 100 $a20140124d2013 u| 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aChemical Solution Deposition of Functional Oxide Thin Films /$fedited by Theodor Schneller, Rainer Waser, Marija Kosec, David Payne 205 $a1st ed. 2013. 210 1$aVienna :$cSpringer Vienna :$cImprint: Springer,$d2013. 215 $a1 online resource (801 p.) 300 $aDescription based upon print version of record. 311 $a3-211-99310-X 320 $aIncludes bibliographical references at the end of each chapters and index. 327 $aIntroduction -- Solution Chemistry; Simple alskoxide based precursor systems; Carboxylate based precursor systems; Single-source precursors; Acqueos Precursor Systems; Solution Synthesis Strategies -- Analytical Methods; Introduction; Thermal Analysis; NMR Sepctroscopy; EXAFS; Other Methods (XRM, SEM,TEM;scattering methods at nanocrystalline films); Spin-Coating; Dip Coating; Inkjet Printing and Other Direct Writing Methods(dip point and imprint techniques); Chemical Bath Deposition; Polymer Assisted Deposition -- Processing and Crystallization; Thermodynamics and Heating Processes; Material Systems Dominated by Heterogeneous Nucleation; Material Systems Dominated by Homogeneous Nucleation; Low Temperature Processing; Epitaxial Films; Powder Assisted Film Fabrication; UV-and E-Beam Direct Patterning of Photosensitive CSD Films; Template Controlled Growth -- Functions and Applications; Introduction; Integrated Capacitors; Base Metal Electrodes; Polar Oxide Films for MEMS Applications;Conducting Films and Electrodes; Transparent conducting oxides; Superconducting Films; Porous Films for Gas Sensors; Luminescent Fims -- Appendix; Synthesis for Standard material Systems. 330 $aThis is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980?s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed ?cooking recipes? for selected material systems are offered. 606 $aMaterials?Surfaces 606 $aThin films 606 $aPhysical chemistry 606 $aIndustrial engineering 606 $aProduction engineering 606 $aTribology 606 $aCorrosion and anti-corrosives 606 $aCoatings 606 $aSurfaces and Interfaces, Thin Films$3https://scigraph.springernature.com/ontologies/product-market-codes/Z19000 606 $aPhysical Chemistry$3https://scigraph.springernature.com/ontologies/product-market-codes/C21001 606 $aIndustrial and Production Engineering$3https://scigraph.springernature.com/ontologies/product-market-codes/T22008 606 $aTribology, Corrosion and Coatings$3https://scigraph.springernature.com/ontologies/product-market-codes/Z15000 615 0$aMaterials?Surfaces. 615 0$aThin films. 615 0$aPhysical chemistry. 615 0$aIndustrial engineering. 615 0$aProduction engineering. 615 0$aTribology. 615 0$aCorrosion and anti-corrosives. 615 0$aCoatings. 615 14$aSurfaces and Interfaces, Thin Films. 615 24$aPhysical Chemistry. 615 24$aIndustrial and Production Engineering. 615 24$aTribology, Corrosion and Coatings. 676 $a660.6 702 $aSchneller$b Theodor$4edt$4http://id.loc.gov/vocabulary/relators/edt 702 $aWaser$b Rainer$4edt$4http://id.loc.gov/vocabulary/relators/edt 702 $aKosec$b Marija$4edt$4http://id.loc.gov/vocabulary/relators/edt 702 $aPayne$b David$4edt$4http://id.loc.gov/vocabulary/relators/edt 906 $aBOOK 912 $a9910437801303321 996 $aChemical Solution Deposition of Functional Oxide Thin Films$92506803 997 $aUNINA