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Design considerations for the cross-bridge sheet resistor
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Development of test structures for characterization of the fabrication and performance of radiation-hardened Charge-Coupled Device (CCD) imagers
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Development of test structures for characterization of the fabrication and performance of radiation-hardened charge-coupled device (CCD) imagers
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Double-level metallization
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Federal metric progress in 1993
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Microelectronic test patterns NBS-12 and NBS-24
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TERRY-2
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The development of test structures for characterization of the fabrication and performance of radiation-hardened CCD images
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Ultraclean semiconductor processing laboratory safe operating procedures manual
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