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2: Practical fundamentals / edited by P. H. Sydenham
2: Practical fundamentals / edited by P. H. Sydenham
Pubbl/distr/stampa Chichester [etc.], : John Wiley & Sons, ©1983
Descrizione fisica XXII, P. 655-1413 : ill. ; 24 cm
Disciplina 620.0044
Soggetto topico Strumenti per misure
ISBN 0471104930
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNISANNIO-MIL0153798
Chichester [etc.], : John Wiley & Sons, ©1983
Materiale a stampa
Lo trovi qui: Univ. del Sannio
Opac: Controlla la disponibilità qui
3 : XVII, 565 p.
3 : XVII, 565 p.
Pubbl/distr/stampa Chichester : John Wiley & Sons, 1981
Descrizione fisica 6 v. 25 cm
Disciplina 510 ; 519.4
Collana Handbook of Applicable Mathematics
ISBN 0-471-27947-1
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione ita
Record Nr. UNINA-990000870120403321
Chichester : John Wiley & Sons, 1981
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
3D IC and RF SiPs : advanced stacking and planar solutions for 5G mobility / / by Professor Lih-Tyng Hwang, Professor Tzyy-Sheng Jason Horng
3D IC and RF SiPs : advanced stacking and planar solutions for 5G mobility / / by Professor Lih-Tyng Hwang, Professor Tzyy-Sheng Jason Horng
Autore Hwang Lih-Tyng
Edizione [1st edition.]
Pubbl/distr/stampa Hoboken, New Jersey : , : John Wiley & Sons, , 2018
Descrizione fisica 1 online resource (464 pages)
Disciplina 621.39/5
Soggetto topico Mobile communication systems - Technological innovations
ISBN 1-119-28966-1
1-119-28967-X
1-119-28965-3
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto 1 MM and MTM for Mobility 1 -- 1.1 Convergence in Communications and the Future, 5G 3 -- 1.1.1 From 1980 (1G) to 2010 (4G) 3 -- 1.1.2 LTE-A and Rel 10 in 2010s 6 -- 1.1.3 The Future: 5G and IoT (Targeting 2020) 8 -- 1.2 Review of Key Products in Communication Networks 14 -- 1.2.1 Wired Communications 14 -- 1.2.2 Wireless Communications 21 -- 1.3 MM and MTM, an Intro to Hardware Technology 31 -- 1.3.1 Moore's Law 31 -- 1.3.2 More Than Moore 43 -- 1.3.3 MTM Packaging Map and MMiư MTM Business Model 53 -- 2 Interconnects 67 -- 2.1 Hierarchy of Interconnection 69 -- 2.1.1 Oniư Chip (Level 0) Interconnections 69 -- 2.1.2 Peripheral Pads on Semiconductor ICs (Level 0) 72 -- 2.1.3 Al pads (Wirebond and Flip Chip) 73 -- 2.1.4 Cu/Lowiư K Re-Distribution Using Damascene Techniques (Flip Chip) 74 -- 2.1.5 Au Pads (III-V) 77 -- 2.1.6 Level 1 Interconnections: WB and FC--Why FC Interconnections are Preferred? 78 -- 2.2 Level 1, Interconnection Gap in FC-PBGA, and Level 0.5 80 -- 2.2.1 Wirebonds 80 -- 2.2.2 Flip Chip Bumps with UBM 85 -- 2.2.3 TSV and Microbumps, Cu or Au Stud Bumps (Level 0.5) 91 -- 2.3 Changing Dynamics of Semiconductor Manufacturing 100 -- 2.3.1 Bumping Itself is a Business 100 -- 2.3.2 Cu/Low-K in BEOL 102 -- 2.3.3 Wafer Fab Foundry and OSAT are Competing for Their Business Shares 102 -- 3 Stateiư of iưtheiư Art IC Packages, Modules, and Substrates 111 -- 3.1 Single-Chip Packages (SCPs): Standardized Packages 113 -- 3.1.1 Lead Frame Based: SO, QFP/QFN, and TAB 114 -- 3.1.2 Organic Interposer Based: BGA/CSP and LGA 114 -- 3.1.3 Known Good Bare Die 120 -- 3.1.4 Single-Chip Packaging Processes 121 -- 3.1.5 IC Testing 123 -- 3.2 Advanced IC Substrates and Assembly 124 -- 3.2.1 MLO Substrates for ICs 126 -- 3.2.2 Multi-Layered Organic (MLO) for IC Packages 127 -- 3.3 Customized Assemblies: MCP/MCMs and Modules 130 -- 3.3.1 Multi-Chip Module (MCM) or Multi-Chip Package (MCP) 131 -- 3.3.2 Modules 132 -- 4 Passives Technology 139 -- 4.1 Thick-Film Ceramic Technology (TFC) for MLC 146.
4.1.1 Green Tapes 146 -- 4.1.2 Thick-Film Fabrication 149 -- 4.1.3 LTCC EPs, Thick-Film IPD, and LTCC-Based RF Modules 151 -- 4.1.4 SMT (or SMD) 155 -- 4.2 MLO Passives by Laminate Organic (LO) 156 -- 4.2.1 MLO-Based RF Modules 156 -- 4.2.2 Laminates 156 -- 4.2.3 MLO Fabrication 157 -- 4.2.4 MLO EPs and RF Modules 159 -- 4.3 On-Chip Passives 166 -- 4.3.1 RF Isolation (BCM4330) 166 -- 4.3.2 Monolithic FEOL On-Chip Passives 168 -- 4.3.3 Rs, Ls, and Cs in BEOL Layers 170 -- 4.3.4 Goals 172 -- 4.4 Thin-Film Multilayer (TFM) and IPD 173 -- 4.5 Summary on Passives Fabrication Technologies: Solutions for RF-Passives Systems 191 -- 5 Electrical Design for 5G Hardware--Digital Focus 199 -- 5.1 Introduction to PCB 201 -- 5.2 Signal Transmission Techniques: Singled-Ended and Differential Signals 202 -- 5.2.1 Single-Ended and Differential 202 -- 5.3 Co-Design Examples 216 -- 5.3.1 Interconnection RF Models and Library 216 -- 5.3.2 Chip-Package and Chip-Package-Board Co-Designs 219 -- 5.4 Wide I/O Memory Using TSVs 228 -- 5.4.1 JEDEC Memory Standards 230 -- 5.4.2 Data Structure Using TSV-Based Wide I/O 230 -- 6 Electrical Design for 5G Hardware--RF Focus 239 -- 6.1 PHY, Modulated RF Carriers; a PoP Possible? 240 -- 6.1.1 Frequency Bands and Wave Propagation Characteristics 240 -- 6.1.2 Narrow-Band Process and CW Carrier for Digital Signals 242 -- 6.2 Antennas 244 -- 6.2.1 Two Often Encountered RF Passive Structures in Modern Portable Electronics: Antenna and Its Feed 244 -- 6.2.2 Types of Antennas: Linear, Microstrip-Patch, and Multi-Element Antenna 245 -- 6.2.3 Active-Integrated Antennas and Measurement of Antenna Performance 251 -- 6.3 RF Functional Components 256 -- 6.3.1 Bandpass Filters 256 -- 6.3.2 Baluns 257 -- 6.3.3 Switches and Duplexers 262 -- 6.4 EMI/EMC 263 -- 6.4.1 Sources of Interference 264 -- 6.4.2 Diagnostic and Regulations Conformation Techniques 264 -- 6.4.3 Containment Techniques 267 -- 7 Product, Process Development, and Control 271.
7.1 Business Processes 272 -- 7.1.1 Strategic Management (Product and Process Development) 272 -- 7.1.2 Design and Manufacturing; Outsourced or Not 273 -- 7.2 History of Statistical Approach for Quality Management 273 -- 7.2.1 Quality Guidelines and Standards 274 -- 7.2.2 Semiconductor Process Development and Characterization 274 -- 7.3 APQP--An Iterative Process for Product and Process Development 275 -- 7.3.1 Translate Product Ideas Into Processes 275 -- 7.4 FMEA, Control Plan, and Initial Process Study 276 -- 7.4.1 RPN 276 -- 7.4.2 Locating the Root Causes 281 -- 7.4.3 Pre-Launch Control Plan 283 -- 7.4.4 Initial Process Study 284 -- 7.5 PPAP and SPC 287 -- 7.5.1 PPAP 287 -- 7.5.2 SPC 287 -- 8 Product Life and Reliability Assessment 291 -- 8.1 Product Life Prediction 292 -- 8.1.1 Calculate MTTF from Processes and Theoretical Distributions 293 -- 8.1.2 Practices to Obtain the Expected Product Life 296 -- 8.1.3 Activation Energy 300 -- 8.2 Reliability Assessment 301 -- 8.2.1 Assessment Variables for Reliability Tests 302 -- 8.2.2 Reliability Assessment Practices 303 -- 8.2.3 Discussions on Weibull Analysis and Weibull Plotting 309 -- 9 Hardware Solutions for 5G Mobility 317 -- 9.1 5G Mobility Products and Planar Solutions 318 -- 9.1.1 High-Density and Logic Products 319 -- 9.1.2 RF-Passives Systems 326 -- 9.1.3 A Summary: WLP and LPP Used for Both HD&L and RF-Passives Products 333 -- 9.2 Advanced Interconnection and Future Business Model 336 -- 9.2.1 Advanced Interconnection 336 -- 9.2.2 New Business Model 341 -- 9.3 Finale--What's Not 343 -- 9.3.1 New from Wafer Foundries 343 -- 9.3.2 System and Architectural Design of Mobile Handsets 345 -- 9.3.3 Thermo-Mechanical and Thermal Science 349 -- 9.3.4 Sensors and IoT 349 -- A Failure Mechanisms and Failure Analysis 357 -- A.1 Failure Mechanisms, or Macroscopic Models 358 -- A.1.1 Silicon Oxide Breakdown 359 -- A.1.2 Stress-Induced Migration (SM) 360 -- A.1.3 Electro-Migration (EM) and Hillocks 360.
A.1.4 Spiking 362 -- A.1.5 IMC, Purple plague (Gold-Al Intermetallics) 363 -- A.1.6 Fatigue and Creeping 364 -- A.1.7 Die Cracking 366 -- A.1.8 Delamination and Popcorning 366 -- A.1.9 Corrosion 367 -- A.2 Failure Analysis (FA) Techniques and FA Tools 368 -- A.2.1 De-Processing (or De-Capping) Techniques 368 -- A.2.2 Microscopic and Analytical Tools 369 -- B ANOVA 375 -- B.1 One-Way ANOVA 376 -- B.2 Two-Way ANOVA 377 -- C Gauge R&R and DOE 381 -- C.1 GR&R 381 -- C.1.1 AIAG's Xbar/Range Method for Gauge R&R Study 381 -- C.1.2 Minitab 383 -- C.1.3 GR&R Casted in the ANOVA Format 383 -- C.1.4 Criteria 384 -- C.2 DOE 384 -- C.2.1 DOE Guidelines 385 -- C.2.2 2k Runs, Unreplicated Case 386 -- C.2.3 Fractional Factorial Designs, 2k-p Run, p = 1, 2,.., < k 399 -- D Statistics Tables 409 -- D.1 F Distribution 409 D.2 Poisson Table of Expected # of Occurrences at a Confidence Level (C.L.) 409 -- D.3 MR Percentile Table 409.
Record Nr. UNINA-9910271018703321
Hwang Lih-Tyng  
Hoboken, New Jersey : , : John Wiley & Sons, , 2018
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
3D IC and RF SiPs : advanced stacking and planar solutions for 5G mobility / / by Professor Lih-Tyng Hwang, Professor Tzyy-Sheng Jason Horng
3D IC and RF SiPs : advanced stacking and planar solutions for 5G mobility / / by Professor Lih-Tyng Hwang, Professor Tzyy-Sheng Jason Horng
Autore Hwang Lih-Tyng
Edizione [1st edition.]
Pubbl/distr/stampa Hoboken, New Jersey : , : John Wiley & Sons, , 2018
Descrizione fisica 1 online resource (464 pages)
Disciplina 621.39/5
Soggetto topico Mobile communication systems - Technological innovations
ISBN 1-119-28966-1
1-119-28967-X
1-119-28965-3
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto 1 MM and MTM for Mobility 1 -- 1.1 Convergence in Communications and the Future, 5G 3 -- 1.1.1 From 1980 (1G) to 2010 (4G) 3 -- 1.1.2 LTE-A and Rel 10 in 2010s 6 -- 1.1.3 The Future: 5G and IoT (Targeting 2020) 8 -- 1.2 Review of Key Products in Communication Networks 14 -- 1.2.1 Wired Communications 14 -- 1.2.2 Wireless Communications 21 -- 1.3 MM and MTM, an Intro to Hardware Technology 31 -- 1.3.1 Moore's Law 31 -- 1.3.2 More Than Moore 43 -- 1.3.3 MTM Packaging Map and MMiư MTM Business Model 53 -- 2 Interconnects 67 -- 2.1 Hierarchy of Interconnection 69 -- 2.1.1 Oniư Chip (Level 0) Interconnections 69 -- 2.1.2 Peripheral Pads on Semiconductor ICs (Level 0) 72 -- 2.1.3 Al pads (Wirebond and Flip Chip) 73 -- 2.1.4 Cu/Lowiư K Re-Distribution Using Damascene Techniques (Flip Chip) 74 -- 2.1.5 Au Pads (III-V) 77 -- 2.1.6 Level 1 Interconnections: WB and FC--Why FC Interconnections are Preferred? 78 -- 2.2 Level 1, Interconnection Gap in FC-PBGA, and Level 0.5 80 -- 2.2.1 Wirebonds 80 -- 2.2.2 Flip Chip Bumps with UBM 85 -- 2.2.3 TSV and Microbumps, Cu or Au Stud Bumps (Level 0.5) 91 -- 2.3 Changing Dynamics of Semiconductor Manufacturing 100 -- 2.3.1 Bumping Itself is a Business 100 -- 2.3.2 Cu/Low-K in BEOL 102 -- 2.3.3 Wafer Fab Foundry and OSAT are Competing for Their Business Shares 102 -- 3 Stateiư of iưtheiư Art IC Packages, Modules, and Substrates 111 -- 3.1 Single-Chip Packages (SCPs): Standardized Packages 113 -- 3.1.1 Lead Frame Based: SO, QFP/QFN, and TAB 114 -- 3.1.2 Organic Interposer Based: BGA/CSP and LGA 114 -- 3.1.3 Known Good Bare Die 120 -- 3.1.4 Single-Chip Packaging Processes 121 -- 3.1.5 IC Testing 123 -- 3.2 Advanced IC Substrates and Assembly 124 -- 3.2.1 MLO Substrates for ICs 126 -- 3.2.2 Multi-Layered Organic (MLO) for IC Packages 127 -- 3.3 Customized Assemblies: MCP/MCMs and Modules 130 -- 3.3.1 Multi-Chip Module (MCM) or Multi-Chip Package (MCP) 131 -- 3.3.2 Modules 132 -- 4 Passives Technology 139 -- 4.1 Thick-Film Ceramic Technology (TFC) for MLC 146.
4.1.1 Green Tapes 146 -- 4.1.2 Thick-Film Fabrication 149 -- 4.1.3 LTCC EPs, Thick-Film IPD, and LTCC-Based RF Modules 151 -- 4.1.4 SMT (or SMD) 155 -- 4.2 MLO Passives by Laminate Organic (LO) 156 -- 4.2.1 MLO-Based RF Modules 156 -- 4.2.2 Laminates 156 -- 4.2.3 MLO Fabrication 157 -- 4.2.4 MLO EPs and RF Modules 159 -- 4.3 On-Chip Passives 166 -- 4.3.1 RF Isolation (BCM4330) 166 -- 4.3.2 Monolithic FEOL On-Chip Passives 168 -- 4.3.3 Rs, Ls, and Cs in BEOL Layers 170 -- 4.3.4 Goals 172 -- 4.4 Thin-Film Multilayer (TFM) and IPD 173 -- 4.5 Summary on Passives Fabrication Technologies: Solutions for RF-Passives Systems 191 -- 5 Electrical Design for 5G Hardware--Digital Focus 199 -- 5.1 Introduction to PCB 201 -- 5.2 Signal Transmission Techniques: Singled-Ended and Differential Signals 202 -- 5.2.1 Single-Ended and Differential 202 -- 5.3 Co-Design Examples 216 -- 5.3.1 Interconnection RF Models and Library 216 -- 5.3.2 Chip-Package and Chip-Package-Board Co-Designs 219 -- 5.4 Wide I/O Memory Using TSVs 228 -- 5.4.1 JEDEC Memory Standards 230 -- 5.4.2 Data Structure Using TSV-Based Wide I/O 230 -- 6 Electrical Design for 5G Hardware--RF Focus 239 -- 6.1 PHY, Modulated RF Carriers; a PoP Possible? 240 -- 6.1.1 Frequency Bands and Wave Propagation Characteristics 240 -- 6.1.2 Narrow-Band Process and CW Carrier for Digital Signals 242 -- 6.2 Antennas 244 -- 6.2.1 Two Often Encountered RF Passive Structures in Modern Portable Electronics: Antenna and Its Feed 244 -- 6.2.2 Types of Antennas: Linear, Microstrip-Patch, and Multi-Element Antenna 245 -- 6.2.3 Active-Integrated Antennas and Measurement of Antenna Performance 251 -- 6.3 RF Functional Components 256 -- 6.3.1 Bandpass Filters 256 -- 6.3.2 Baluns 257 -- 6.3.3 Switches and Duplexers 262 -- 6.4 EMI/EMC 263 -- 6.4.1 Sources of Interference 264 -- 6.4.2 Diagnostic and Regulations Conformation Techniques 264 -- 6.4.3 Containment Techniques 267 -- 7 Product, Process Development, and Control 271.
7.1 Business Processes 272 -- 7.1.1 Strategic Management (Product and Process Development) 272 -- 7.1.2 Design and Manufacturing; Outsourced or Not 273 -- 7.2 History of Statistical Approach for Quality Management 273 -- 7.2.1 Quality Guidelines and Standards 274 -- 7.2.2 Semiconductor Process Development and Characterization 274 -- 7.3 APQP--An Iterative Process for Product and Process Development 275 -- 7.3.1 Translate Product Ideas Into Processes 275 -- 7.4 FMEA, Control Plan, and Initial Process Study 276 -- 7.4.1 RPN 276 -- 7.4.2 Locating the Root Causes 281 -- 7.4.3 Pre-Launch Control Plan 283 -- 7.4.4 Initial Process Study 284 -- 7.5 PPAP and SPC 287 -- 7.5.1 PPAP 287 -- 7.5.2 SPC 287 -- 8 Product Life and Reliability Assessment 291 -- 8.1 Product Life Prediction 292 -- 8.1.1 Calculate MTTF from Processes and Theoretical Distributions 293 -- 8.1.2 Practices to Obtain the Expected Product Life 296 -- 8.1.3 Activation Energy 300 -- 8.2 Reliability Assessment 301 -- 8.2.1 Assessment Variables for Reliability Tests 302 -- 8.2.2 Reliability Assessment Practices 303 -- 8.2.3 Discussions on Weibull Analysis and Weibull Plotting 309 -- 9 Hardware Solutions for 5G Mobility 317 -- 9.1 5G Mobility Products and Planar Solutions 318 -- 9.1.1 High-Density and Logic Products 319 -- 9.1.2 RF-Passives Systems 326 -- 9.1.3 A Summary: WLP and LPP Used for Both HD&L and RF-Passives Products 333 -- 9.2 Advanced Interconnection and Future Business Model 336 -- 9.2.1 Advanced Interconnection 336 -- 9.2.2 New Business Model 341 -- 9.3 Finale--What's Not 343 -- 9.3.1 New from Wafer Foundries 343 -- 9.3.2 System and Architectural Design of Mobile Handsets 345 -- 9.3.3 Thermo-Mechanical and Thermal Science 349 -- 9.3.4 Sensors and IoT 349 -- A Failure Mechanisms and Failure Analysis 357 -- A.1 Failure Mechanisms, or Macroscopic Models 358 -- A.1.1 Silicon Oxide Breakdown 359 -- A.1.2 Stress-Induced Migration (SM) 360 -- A.1.3 Electro-Migration (EM) and Hillocks 360.
A.1.4 Spiking 362 -- A.1.5 IMC, Purple plague (Gold-Al Intermetallics) 363 -- A.1.6 Fatigue and Creeping 364 -- A.1.7 Die Cracking 366 -- A.1.8 Delamination and Popcorning 366 -- A.1.9 Corrosion 367 -- A.2 Failure Analysis (FA) Techniques and FA Tools 368 -- A.2.1 De-Processing (or De-Capping) Techniques 368 -- A.2.2 Microscopic and Analytical Tools 369 -- B ANOVA 375 -- B.1 One-Way ANOVA 376 -- B.2 Two-Way ANOVA 377 -- C Gauge R&R and DOE 381 -- C.1 GR&R 381 -- C.1.1 AIAG's Xbar/Range Method for Gauge R&R Study 381 -- C.1.2 Minitab 383 -- C.1.3 GR&R Casted in the ANOVA Format 383 -- C.1.4 Criteria 384 -- C.2 DOE 384 -- C.2.1 DOE Guidelines 385 -- C.2.2 2k Runs, Unreplicated Case 386 -- C.2.3 Fractional Factorial Designs, 2k-p Run, p = 1, 2,.., < k 399 -- D Statistics Tables 409 -- D.1 F Distribution 409 D.2 Poisson Table of Expected # of Occurrences at a Confidence Level (C.L.) 409 -- D.3 MR Percentile Table 409.
Record Nr. UNINA-9910830231303321
Hwang Lih-Tyng  
Hoboken, New Jersey : , : John Wiley & Sons, , 2018
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
4D hyperlocal : a cultural toolkit for theopen-source city / / guest-edited by Lucy Bullivant
4D hyperlocal : a cultural toolkit for theopen-source city / / guest-edited by Lucy Bullivant
Pubbl/distr/stampa Oxford, [England] : , : John Wiley & Sons, , 2017
Descrizione fisica 1 online resource (139 pages) : color illustrations, photographs, maps
Disciplina 307.1216
Collana Architectural Design
Soggetto topico City planning - Computer simulation
City planning - Data processing
Soggetto genere / forma Electronic books.
ISBN 1-119-09711-8
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910466459403321
Oxford, [England] : , : John Wiley & Sons, , 2017
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
4D hyperlocal : a cultural toolkit for the open-source city / / guest-edited by Lucy Bullivant
4D hyperlocal : a cultural toolkit for the open-source city / / guest-edited by Lucy Bullivant
Pubbl/distr/stampa Oxford, [England] : , : John Wiley & Sons, , 2017
Descrizione fisica 1 online resource (139 pages) : color illustrations, photographs, maps
Disciplina 307.1216
Collana Architectural Design
Soggetto topico City planning - Computer simulation
City planning - Data processing
ISBN 1-119-09711-8
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910792858003321
Oxford, [England] : , : John Wiley & Sons, , 2017
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
4D hyperlocal : a cultural toolkit for the open-source city / / guest-edited by Lucy Bullivant
4D hyperlocal : a cultural toolkit for the open-source city / / guest-edited by Lucy Bullivant
Pubbl/distr/stampa Oxford, [England] : , : John Wiley & Sons, , 2017
Descrizione fisica 1 online resource (139 pages) : color illustrations, photographs, maps
Disciplina 307.1216
Collana Architectural Design
Soggetto topico City planning - Computer simulation
City planning - Data processing
ISBN 1-119-09711-8
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910809215303321
Oxford, [England] : , : John Wiley & Sons, , 2017
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
66th Conference on Glass Problems [[electronic resource] ] : a collection of papers presented at the 66th Conference on Glass Problems, the University of Illinois at Urbana-Champaign / / editor, Waltraud M. Kriven
66th Conference on Glass Problems [[electronic resource] ] : a collection of papers presented at the 66th Conference on Glass Problems, the University of Illinois at Urbana-Champaign / / editor, Waltraud M. Kriven
Pubbl/distr/stampa Hoboken, NJ, : John Wiley & Sons
Descrizione fisica 1 online resource (227 p.)
Disciplina 666.1
666/.1
Altri autori (Persone) KrivenWaltraud M
Collana Ceramic engineering & science proceedings
Soggetto topico Glass
Glass manufacture
Soggetto genere / forma Electronic books.
ISBN 1-282-31400-9
9786612314001
0-470-29130-3
0-470-29171-0
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Contents; Foreword; Foreword; Preface; Acknowledgements; Furnaces; First Industrial Results of ALGLASS SUN Operation; On-Line Oxygen Sensor for the Tin Bath in Float Glass Production Lines; An Advanced Control System to Increase Glass Quality and Glass Production Yields Based on GS ESlll Technology; Breaking the Boundaries of PID; Refractories; Service Experience and Postmortem Analysis of High Alumina Crown Refractories from E-Glass Furnaces; Silica Loss in Crowns by Reactions with Glass Melt Vapours; Raw Materials; Techniques for Upgrading Dust Collection Systems
The Influence of Batch Segregation and Bulk Flow on Glass QualityMeasurements of Batch and Cullet Using Laser Induced Breakdown Spectroscopy; Glass Batch Raw Material Transportation: Expensive and Unreliable; Amber Glass40 Years of Lessons Learned; The Use of Borates in Glass Melting; Effect of Key Oxides, Including Li,O, on Reducing the Melt Viscosity and Energy Demand of E-Glass Compositions; Environmental Issues; Recycling of Cullet into Flat Glass Melting Furnaces; Recycling in Container Glass Production: Present Problems in European Glass Industry
Contribution to the Characterization of Dust Emissions of Glass Melting Furnaces
Record Nr. UNINA-9910144848103321
Hoboken, NJ, : John Wiley & Sons
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
66th Conference on Glass Problems [[electronic resource] ] : a collection of papers presented at the 66th Conference on Glass Problems, the University of Illinois at Urbana-Champaign / / editor, Waltraud M. Kriven
66th Conference on Glass Problems [[electronic resource] ] : a collection of papers presented at the 66th Conference on Glass Problems, the University of Illinois at Urbana-Champaign / / editor, Waltraud M. Kriven
Pubbl/distr/stampa Hoboken, NJ, : John Wiley & Sons
Descrizione fisica 1 online resource (227 p.)
Disciplina 666.1
666/.1
Altri autori (Persone) KrivenWaltraud M
Collana Ceramic engineering & science proceedings
Soggetto topico Glass
Glass manufacture
ISBN 1-282-31400-9
9786612314001
0-470-29130-3
0-470-29171-0
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Contents; Foreword; Foreword; Preface; Acknowledgements; Furnaces; First Industrial Results of ALGLASS SUN Operation; On-Line Oxygen Sensor for the Tin Bath in Float Glass Production Lines; An Advanced Control System to Increase Glass Quality and Glass Production Yields Based on GS ESlll Technology; Breaking the Boundaries of PID; Refractories; Service Experience and Postmortem Analysis of High Alumina Crown Refractories from E-Glass Furnaces; Silica Loss in Crowns by Reactions with Glass Melt Vapours; Raw Materials; Techniques for Upgrading Dust Collection Systems
The Influence of Batch Segregation and Bulk Flow on Glass QualityMeasurements of Batch and Cullet Using Laser Induced Breakdown Spectroscopy; Glass Batch Raw Material Transportation: Expensive and Unreliable; Amber Glass40 Years of Lessons Learned; The Use of Borates in Glass Melting; Effect of Key Oxides, Including Li,O, on Reducing the Melt Viscosity and Energy Demand of E-Glass Compositions; Environmental Issues; Recycling of Cullet into Flat Glass Melting Furnaces; Recycling in Container Glass Production: Present Problems in European Glass Industry
Contribution to the Characterization of Dust Emissions of Glass Melting Furnaces
Record Nr. UNINA-9910831198803321
Hoboken, NJ, : John Wiley & Sons
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
66th Conference on Glass Problems [[electronic resource] ] : a collection of papers presented at the 66th Conference on Glass Problems, the University of Illinois at Urbana-Champaign / / editor, Waltraud M. Kriven
66th Conference on Glass Problems [[electronic resource] ] : a collection of papers presented at the 66th Conference on Glass Problems, the University of Illinois at Urbana-Champaign / / editor, Waltraud M. Kriven
Pubbl/distr/stampa Hoboken, NJ, : John Wiley & Sons
Descrizione fisica 1 online resource (227 p.)
Disciplina 666.1
666/.1
Altri autori (Persone) KrivenWaltraud M
Collana Ceramic engineering & science proceedings
Soggetto topico Glass
Glass manufacture
ISBN 1-282-31400-9
9786612314001
0-470-29130-3
0-470-29171-0
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Contents; Foreword; Foreword; Preface; Acknowledgements; Furnaces; First Industrial Results of ALGLASS SUN Operation; On-Line Oxygen Sensor for the Tin Bath in Float Glass Production Lines; An Advanced Control System to Increase Glass Quality and Glass Production Yields Based on GS ESlll Technology; Breaking the Boundaries of PID; Refractories; Service Experience and Postmortem Analysis of High Alumina Crown Refractories from E-Glass Furnaces; Silica Loss in Crowns by Reactions with Glass Melt Vapours; Raw Materials; Techniques for Upgrading Dust Collection Systems
The Influence of Batch Segregation and Bulk Flow on Glass QualityMeasurements of Batch and Cullet Using Laser Induced Breakdown Spectroscopy; Glass Batch Raw Material Transportation: Expensive and Unreliable; Amber Glass40 Years of Lessons Learned; The Use of Borates in Glass Melting; Effect of Key Oxides, Including Li,O, on Reducing the Melt Viscosity and Energy Demand of E-Glass Compositions; Environmental Issues; Recycling of Cullet into Flat Glass Melting Furnaces; Recycling in Container Glass Production: Present Problems in European Glass Industry
Contribution to the Characterization of Dust Emissions of Glass Melting Furnaces
Record Nr. UNINA-9910841303603321
Hoboken, NJ, : John Wiley & Sons
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui

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