Industrial accelerators and their applications [[electronic resource] /] / edited by Robert W. Hamm, Marianne E. Hamm |
Pubbl/distr/stampa | Hackensack, NJ, : World Scientific Pub., 2012 |
Descrizione fisica | 1 online resource (436 p.) |
Disciplina | 539.73 |
Altri autori (Persone) |
HammRobert Wray
HammMarianne Elizabeth |
Soggetto topico |
Electron accelerators - Industrial applications
Ionizing radiation - Industrial applications Electron beams - Industrial applications |
Soggetto genere / forma | Electronic books. |
ISBN |
1-283-59361-0
9786613906069 981-4307-05-X |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
Dedication; CONTENTS; 1. Introduction; Introduction to the Beam Business Robert W. Hamm and Marianne E. Hamm; Chapter 1. Ion Implantation for Fabrication of Semiconductor Devices and Materials Michael I. Current; 1. Introduction; 2. Applications of Ion Implantation: Devices and Materials; 2.1 Pre-amorphization; 2.2 Cocktail implants; 2.3 Carbon implants for tensile strained nMOS; 2.4 Oxygen implants for direct formation of Silicon-on-Insulator (SOI) wafers; 2.5 Hydrogen implants for formation of SOI wafers by layer transfer; 3. Accelerator Designs; 3.1 Beamline system types
3.2 Accel-decel beamlines 3.3 MeV beamlines; 3.4 Plasma immersion and ion shower implanters; 3.5 SIMOX high-current, high-temperature implanters; 4. Ion Source Designs; 4.1 Special ion sources: SIMOX, molecular ions, non-volatile elements, and large-area beams; 5. Scanning Methods; 5.1 Beam deflection and wafer motion in orthogonal directions; 5.2 Spinning wheel and pendulum wafer scanning; 6. New Directions: Gas Cluster Ions, Photovoltaic Cell Doping, and MeV Protons for Si Membrane Cutting; 6.1 Gas cluster ions; 6.2 Doping of Si-based photovoltaic cells 6.2.1 Alternatives to implant doping for PV cells 6.2.2 Advanced PV cells; 6.3 High-current, multi-MeV proton beams for fabrication of thin Si PV membranes; 7. Implantation into Metals and Biomaterials; 7.1 Metals: hardness, friction, and corrosion; 7.2 Biomaterials treated by plasma immersion implantation and deposition; 8. Summary; Acknowledgements; References; Chapter 2. Electron Beam Materials Processing Donald E. Powers; 1. Introduction; 2. Electron Beam Equipment; 3. Electron Beam Welding; 3.1 Large steam turbines; 3.2 High efficiency impellers; 3.3 Speed gears; 3.4 Drive rings 4. EB Cutting and Drilling 5. EB Heat Treating; 6. EB Melting and Casting; 7. Summary and Future Trends; Acknowledgements; References; Chapter 3. Electron Beam Materials Irradiators Marshall R. Cleland; 1. Introduction; 2. Physical Properties of High-Energy Electrons and X-Rays; 2.1 High-energy electrons; 2.2 High-energy X-rays; 2.3 Radiation dosimetry; 2.4 Dose versus electron beam power; 2.5 Dose versus electron beam current; 3. Industrial Electron Accelerators; 3.1 Low-energy accelerators; 3.2 Medium-energy accelerators; 3.3 High-energy accelerators 4. Major Applications of Industrial EB Irradiators4.1 Cross-linking of materials; 4.1.1 Wire and cable insulation; 4.1.2 Heat-shrinkable plastic tubing and film; 4.1.3 Curing of inks, coatings, and adhesives; 4.1.4 Automobile tires; 4.1.5 Polyethylene foam; 4.2 Radiation sterilization of medical devices; 4.3 Irradiation of foods; 5. Other EB Irradiation Applications; 5.1 Treatment of waste materials; 5.2 Cleaning of stack gases; 5.3 Curing of composite materials; 5.4 Silicon-carbide fiber manufacturing; 5.5 Production of fuel cells; 5.6 Cross-linking of PTFE and rubber sheeting 5.7 Seed and soil disinfestation |
Record Nr. | UNINA-9910465497703321 |
Hackensack, NJ, : World Scientific Pub., 2012 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
Industrial accelerators and their applications [[electronic resource] /] / edited by Robert W. Hamm, Marianne E. Hamm |
Pubbl/distr/stampa | Hackensack, NJ, : World Scientific Pub., 2012 |
Descrizione fisica | 1 online resource (436 p.) |
Disciplina | 539.73 |
Altri autori (Persone) |
HammRobert Wray
HammMarianne Elizabeth |
Soggetto topico |
Electron accelerators - Industrial applications
Ionizing radiation - Industrial applications Electron beams - Industrial applications |
ISBN |
1-283-59361-0
9786613906069 981-4307-05-X |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
Dedication; CONTENTS; 1. Introduction; Introduction to the Beam Business Robert W. Hamm and Marianne E. Hamm; Chapter 1. Ion Implantation for Fabrication of Semiconductor Devices and Materials Michael I. Current; 1. Introduction; 2. Applications of Ion Implantation: Devices and Materials; 2.1 Pre-amorphization; 2.2 Cocktail implants; 2.3 Carbon implants for tensile strained nMOS; 2.4 Oxygen implants for direct formation of Silicon-on-Insulator (SOI) wafers; 2.5 Hydrogen implants for formation of SOI wafers by layer transfer; 3. Accelerator Designs; 3.1 Beamline system types
3.2 Accel-decel beamlines 3.3 MeV beamlines; 3.4 Plasma immersion and ion shower implanters; 3.5 SIMOX high-current, high-temperature implanters; 4. Ion Source Designs; 4.1 Special ion sources: SIMOX, molecular ions, non-volatile elements, and large-area beams; 5. Scanning Methods; 5.1 Beam deflection and wafer motion in orthogonal directions; 5.2 Spinning wheel and pendulum wafer scanning; 6. New Directions: Gas Cluster Ions, Photovoltaic Cell Doping, and MeV Protons for Si Membrane Cutting; 6.1 Gas cluster ions; 6.2 Doping of Si-based photovoltaic cells 6.2.1 Alternatives to implant doping for PV cells 6.2.2 Advanced PV cells; 6.3 High-current, multi-MeV proton beams for fabrication of thin Si PV membranes; 7. Implantation into Metals and Biomaterials; 7.1 Metals: hardness, friction, and corrosion; 7.2 Biomaterials treated by plasma immersion implantation and deposition; 8. Summary; Acknowledgements; References; Chapter 2. Electron Beam Materials Processing Donald E. Powers; 1. Introduction; 2. Electron Beam Equipment; 3. Electron Beam Welding; 3.1 Large steam turbines; 3.2 High efficiency impellers; 3.3 Speed gears; 3.4 Drive rings 4. EB Cutting and Drilling 5. EB Heat Treating; 6. EB Melting and Casting; 7. Summary and Future Trends; Acknowledgements; References; Chapter 3. Electron Beam Materials Irradiators Marshall R. Cleland; 1. Introduction; 2. Physical Properties of High-Energy Electrons and X-Rays; 2.1 High-energy electrons; 2.2 High-energy X-rays; 2.3 Radiation dosimetry; 2.4 Dose versus electron beam power; 2.5 Dose versus electron beam current; 3. Industrial Electron Accelerators; 3.1 Low-energy accelerators; 3.2 Medium-energy accelerators; 3.3 High-energy accelerators 4. Major Applications of Industrial EB Irradiators4.1 Cross-linking of materials; 4.1.1 Wire and cable insulation; 4.1.2 Heat-shrinkable plastic tubing and film; 4.1.3 Curing of inks, coatings, and adhesives; 4.1.4 Automobile tires; 4.1.5 Polyethylene foam; 4.2 Radiation sterilization of medical devices; 4.3 Irradiation of foods; 5. Other EB Irradiation Applications; 5.1 Treatment of waste materials; 5.2 Cleaning of stack gases; 5.3 Curing of composite materials; 5.4 Silicon-carbide fiber manufacturing; 5.5 Production of fuel cells; 5.6 Cross-linking of PTFE and rubber sheeting 5.7 Seed and soil disinfestation |
Record Nr. | UNINA-9910792082603321 |
Hackensack, NJ, : World Scientific Pub., 2012 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
Industrial accelerators and their applications [[electronic resource] /] / edited by Robert W. Hamm, Marianne E. Hamm |
Pubbl/distr/stampa | Hackensack, NJ, : World Scientific Pub., 2012 |
Descrizione fisica | 1 online resource (436 p.) |
Disciplina | 539.73 |
Altri autori (Persone) |
HammRobert Wray
HammMarianne Elizabeth |
Soggetto topico |
Electron accelerators - Industrial applications
Ionizing radiation - Industrial applications Electron beams - Industrial applications |
ISBN |
1-283-59361-0
9786613906069 981-4307-05-X |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
Dedication; CONTENTS; 1. Introduction; Introduction to the Beam Business Robert W. Hamm and Marianne E. Hamm; Chapter 1. Ion Implantation for Fabrication of Semiconductor Devices and Materials Michael I. Current; 1. Introduction; 2. Applications of Ion Implantation: Devices and Materials; 2.1 Pre-amorphization; 2.2 Cocktail implants; 2.3 Carbon implants for tensile strained nMOS; 2.4 Oxygen implants for direct formation of Silicon-on-Insulator (SOI) wafers; 2.5 Hydrogen implants for formation of SOI wafers by layer transfer; 3. Accelerator Designs; 3.1 Beamline system types
3.2 Accel-decel beamlines 3.3 MeV beamlines; 3.4 Plasma immersion and ion shower implanters; 3.5 SIMOX high-current, high-temperature implanters; 4. Ion Source Designs; 4.1 Special ion sources: SIMOX, molecular ions, non-volatile elements, and large-area beams; 5. Scanning Methods; 5.1 Beam deflection and wafer motion in orthogonal directions; 5.2 Spinning wheel and pendulum wafer scanning; 6. New Directions: Gas Cluster Ions, Photovoltaic Cell Doping, and MeV Protons for Si Membrane Cutting; 6.1 Gas cluster ions; 6.2 Doping of Si-based photovoltaic cells 6.2.1 Alternatives to implant doping for PV cells 6.2.2 Advanced PV cells; 6.3 High-current, multi-MeV proton beams for fabrication of thin Si PV membranes; 7. Implantation into Metals and Biomaterials; 7.1 Metals: hardness, friction, and corrosion; 7.2 Biomaterials treated by plasma immersion implantation and deposition; 8. Summary; Acknowledgements; References; Chapter 2. Electron Beam Materials Processing Donald E. Powers; 1. Introduction; 2. Electron Beam Equipment; 3. Electron Beam Welding; 3.1 Large steam turbines; 3.2 High efficiency impellers; 3.3 Speed gears; 3.4 Drive rings 4. EB Cutting and Drilling 5. EB Heat Treating; 6. EB Melting and Casting; 7. Summary and Future Trends; Acknowledgements; References; Chapter 3. Electron Beam Materials Irradiators Marshall R. Cleland; 1. Introduction; 2. Physical Properties of High-Energy Electrons and X-Rays; 2.1 High-energy electrons; 2.2 High-energy X-rays; 2.3 Radiation dosimetry; 2.4 Dose versus electron beam power; 2.5 Dose versus electron beam current; 3. Industrial Electron Accelerators; 3.1 Low-energy accelerators; 3.2 Medium-energy accelerators; 3.3 High-energy accelerators 4. Major Applications of Industrial EB Irradiators4.1 Cross-linking of materials; 4.1.1 Wire and cable insulation; 4.1.2 Heat-shrinkable plastic tubing and film; 4.1.3 Curing of inks, coatings, and adhesives; 4.1.4 Automobile tires; 4.1.5 Polyethylene foam; 4.2 Radiation sterilization of medical devices; 4.3 Irradiation of foods; 5. Other EB Irradiation Applications; 5.1 Treatment of waste materials; 5.2 Cleaning of stack gases; 5.3 Curing of composite materials; 5.4 Silicon-carbide fiber manufacturing; 5.5 Production of fuel cells; 5.6 Cross-linking of PTFE and rubber sheeting 5.7 Seed and soil disinfestation |
Record Nr. | UNINA-9910813686603321 |
Hackensack, NJ, : World Scientific Pub., 2012 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
International conference on mesons and recently discovered particles : 43. congresso nazionale di fisica : comunicazioni : Padova-Venezia, 22-28 settembre 1957 |
Autore | International conference on mesons and recently discovered particles : <1957 |
Pubbl/distr/stampa | Bologna : Società italiana di fisica, 1957 |
Disciplina |
539.72
539.73 |
Soggetto non controllato |
Particelle elementari
Raggi cosmici Acceleratori |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-990001061490403321 |
International conference on mesons and recently discovered particles : <1957 | ||
Bologna : Società italiana di fisica, 1957 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
An introduction to the physics of high energy accelerators [[electronic resource] /] / D.A. Edwards, M.J. Syphers |
Autore | Edwards D. A (Donald A.), <1927-> |
Pubbl/distr/stampa | New York, : Wiley, c1993 |
Descrizione fisica | 1 online resource (306 p.) |
Disciplina |
530.416
539.73 |
Altri autori (Persone) | SyphersM. J. <1957-> |
Collana | Wiley series in beam physics and accelerator technology |
Soggetto topico |
Particle accelerators
Particles (Nuclear physics) |
Soggetto genere / forma | Electronic books. |
ISBN |
1-282-01049-2
9786612010491 3-527-61727-2 3-527-61728-0 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
An Introduction to the Physics of High Energy Accelerators; Contents; Series Preface; Preface; 1 Introduction; 1.1 Prerequisites; 1.2 Uses of Accelerators; 1.2.1 Luminosity of a High Energy Collider; 1.2.2 Synchrotron Radiation Sources; Problems; 2 Acceleration and Phase Stability; 2.1 Acceleration Methods; 2.1.1 DC Accelerators; 2.1.2 Time Varying Electromagnetic Fields; 2.1.3 Resonant Cavities; 2.1.4 Accelerating Structures; 2.2 Phase Stability; 2.2.1 Synchrotron Oscillations; 2.2.2 Adiabatic Damping and Longitudinal Emmittance; 2.2.3 Transition Crossing
2.3 The Need for Transverse FocusingProblems; 3 Transverse Linear Motion; 3.1 Stability of Transverse Oscillations; 3.1.1 Weak Focusing; 3.1.2 Strong Focusing; 3.1.3 Stability Criterion; 3.2 Equation of Motion; 3.2.1 Piecewise Method of Solution; 3.2.2 Closed Form Solution; 3.2.3 Courant-Snyder Parameters; 3.2.4 Emittance and Admittance; 3.2.5 Adiabatic Damping of Betatron Oscillations; 3.3 Momentum Dispersion; 3.3.1 Equation of Motion for an Off-Momentum Particle; 3.3.2 Solution of Equation of Motion; 3.4 Linear Deviations from the Ideal Lattice; 3.4.1 Steering Errors and Corrections 3.4.2 Focusing Errors and Corrections3.4.3 Chromaticity; Problems; 4 Resonances and Transverse Nonlinear Motion; 4.1 Transverse Resonances; 4.1.1 Floquet Transformation; 4.1.2 Multipole Expansion; 4.1.3 The Driven Oscillator and Rational Numbers; 4.2 A Third-Integer Resonance; 4.2.1 Equation of Motion; 4.2.2 Recognition of the Sextupole Resonance; 4.2.3 First Integral and the Separatrix; 4.2.4 Application to Resonant Extraction; 4.2.5 Comments on Correction Systems; 4.3 The Hamiltonian Formalism; 4.3.1 Review of Hamiltonian Dynamics; 4.3.2 The Hamiltonian for Small Transverse Oscillations 4.3.3 Transformations of the Hamiltonian4.3.4 The Third-Integer Resonance Revisited; Problems; 5 Transverse Coupled Motion; 5.1 Linear Coupling; 5.1.1 Coupled Harmonic Oscillators; 5.1.2 Perturbation Treatment of a Single Skew Quadrupole; 5.1.3 Matrix Treatment of a Single Skew Quadrupole; 5.1.4 Matrix Formalism of Linear Coupling; 5.2 Nonlinear Coupling; 5.2.1 Two-Degree-of-Freedom Sum Resonance Due to Distribution of Sextupoles; 5.2.2 Multipoles and Resonance Lines; Problems; 6 Intensity Dependent Effects; 6.1 Space Charge; 6.1.1 The Transverse Space Charge Force 6.1.2 Equation of Motion in the Presence of Space Charge6.1.3 Incoherent Tune Shift; 6.1.4 The Beam-Beam Tune Shift; 6.1.5 Image Charge and Image Current Effects; 6.2 The Negative Mass Instability; 6.2.1 The Longitudinal Space Charge Field; 6.2.2 Perturbation of the Line Density; 6.3 Wake Fields and Impedance; 6.3.1 Field of a Relativistic Charge in Vacuum; 6.3.2 Wake Field for a Resistive Wall; 6.3.3 Wake Functions; 6.3.4 Impedance; 6.4 Macroparticle Models of Coherent Instabilities; 6.4.1 Beam Breakup in Linacs; 6.4.2 The Strong Head-Tail Instability; 6.4.3 The Head-Tail Instability 6.5 Evolution of the Distribution Function |
Record Nr. | UNINA-9910144742003321 |
Edwards D. A (Donald A.), <1927-> | ||
New York, : Wiley, c1993 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
An introduction to the physics of high energy accelerators [[electronic resource] /] / D.A. Edwards, M.J. Syphers |
Autore | Edwards D. A (Donald A.), <1927-> |
Pubbl/distr/stampa | New York, : Wiley, c1993 |
Descrizione fisica | 1 online resource (306 p.) |
Disciplina |
530.416
539.73 |
Altri autori (Persone) | SyphersM. J. <1957-> |
Collana | Wiley series in beam physics and accelerator technology |
Soggetto topico |
Particle accelerators
Particles (Nuclear physics) |
ISBN |
1-282-01049-2
9786612010491 3-527-61727-2 3-527-61728-0 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
An Introduction to the Physics of High Energy Accelerators; Contents; Series Preface; Preface; 1 Introduction; 1.1 Prerequisites; 1.2 Uses of Accelerators; 1.2.1 Luminosity of a High Energy Collider; 1.2.2 Synchrotron Radiation Sources; Problems; 2 Acceleration and Phase Stability; 2.1 Acceleration Methods; 2.1.1 DC Accelerators; 2.1.2 Time Varying Electromagnetic Fields; 2.1.3 Resonant Cavities; 2.1.4 Accelerating Structures; 2.2 Phase Stability; 2.2.1 Synchrotron Oscillations; 2.2.2 Adiabatic Damping and Longitudinal Emmittance; 2.2.3 Transition Crossing
2.3 The Need for Transverse FocusingProblems; 3 Transverse Linear Motion; 3.1 Stability of Transverse Oscillations; 3.1.1 Weak Focusing; 3.1.2 Strong Focusing; 3.1.3 Stability Criterion; 3.2 Equation of Motion; 3.2.1 Piecewise Method of Solution; 3.2.2 Closed Form Solution; 3.2.3 Courant-Snyder Parameters; 3.2.4 Emittance and Admittance; 3.2.5 Adiabatic Damping of Betatron Oscillations; 3.3 Momentum Dispersion; 3.3.1 Equation of Motion for an Off-Momentum Particle; 3.3.2 Solution of Equation of Motion; 3.4 Linear Deviations from the Ideal Lattice; 3.4.1 Steering Errors and Corrections 3.4.2 Focusing Errors and Corrections3.4.3 Chromaticity; Problems; 4 Resonances and Transverse Nonlinear Motion; 4.1 Transverse Resonances; 4.1.1 Floquet Transformation; 4.1.2 Multipole Expansion; 4.1.3 The Driven Oscillator and Rational Numbers; 4.2 A Third-Integer Resonance; 4.2.1 Equation of Motion; 4.2.2 Recognition of the Sextupole Resonance; 4.2.3 First Integral and the Separatrix; 4.2.4 Application to Resonant Extraction; 4.2.5 Comments on Correction Systems; 4.3 The Hamiltonian Formalism; 4.3.1 Review of Hamiltonian Dynamics; 4.3.2 The Hamiltonian for Small Transverse Oscillations 4.3.3 Transformations of the Hamiltonian4.3.4 The Third-Integer Resonance Revisited; Problems; 5 Transverse Coupled Motion; 5.1 Linear Coupling; 5.1.1 Coupled Harmonic Oscillators; 5.1.2 Perturbation Treatment of a Single Skew Quadrupole; 5.1.3 Matrix Treatment of a Single Skew Quadrupole; 5.1.4 Matrix Formalism of Linear Coupling; 5.2 Nonlinear Coupling; 5.2.1 Two-Degree-of-Freedom Sum Resonance Due to Distribution of Sextupoles; 5.2.2 Multipoles and Resonance Lines; Problems; 6 Intensity Dependent Effects; 6.1 Space Charge; 6.1.1 The Transverse Space Charge Force 6.1.2 Equation of Motion in the Presence of Space Charge6.1.3 Incoherent Tune Shift; 6.1.4 The Beam-Beam Tune Shift; 6.1.5 Image Charge and Image Current Effects; 6.2 The Negative Mass Instability; 6.2.1 The Longitudinal Space Charge Field; 6.2.2 Perturbation of the Line Density; 6.3 Wake Fields and Impedance; 6.3.1 Field of a Relativistic Charge in Vacuum; 6.3.2 Wake Field for a Resistive Wall; 6.3.3 Wake Functions; 6.3.4 Impedance; 6.4 Macroparticle Models of Coherent Instabilities; 6.4.1 Beam Breakup in Linacs; 6.4.2 The Strong Head-Tail Instability; 6.4.3 The Head-Tail Instability 6.5 Evolution of the Distribution Function |
Record Nr. | UNISA-996203218803316 |
Edwards D. A (Donald A.), <1927-> | ||
New York, : Wiley, c1993 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. di Salerno | ||
|
An introduction to the physics of high energy accelerators [[electronic resource] /] / D.A. Edwards, M.J. Syphers |
Autore | Edwards D. A (Donald A.), <1927-> |
Pubbl/distr/stampa | New York, : Wiley, c1993 |
Descrizione fisica | 1 online resource (306 p.) |
Disciplina |
530.416
539.73 |
Altri autori (Persone) | SyphersM. J. <1957-> |
Collana | Wiley series in beam physics and accelerator technology |
Soggetto topico |
Particle accelerators
Particles (Nuclear physics) |
ISBN |
1-282-01049-2
9786612010491 3-527-61727-2 3-527-61728-0 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
An Introduction to the Physics of High Energy Accelerators; Contents; Series Preface; Preface; 1 Introduction; 1.1 Prerequisites; 1.2 Uses of Accelerators; 1.2.1 Luminosity of a High Energy Collider; 1.2.2 Synchrotron Radiation Sources; Problems; 2 Acceleration and Phase Stability; 2.1 Acceleration Methods; 2.1.1 DC Accelerators; 2.1.2 Time Varying Electromagnetic Fields; 2.1.3 Resonant Cavities; 2.1.4 Accelerating Structures; 2.2 Phase Stability; 2.2.1 Synchrotron Oscillations; 2.2.2 Adiabatic Damping and Longitudinal Emmittance; 2.2.3 Transition Crossing
2.3 The Need for Transverse FocusingProblems; 3 Transverse Linear Motion; 3.1 Stability of Transverse Oscillations; 3.1.1 Weak Focusing; 3.1.2 Strong Focusing; 3.1.3 Stability Criterion; 3.2 Equation of Motion; 3.2.1 Piecewise Method of Solution; 3.2.2 Closed Form Solution; 3.2.3 Courant-Snyder Parameters; 3.2.4 Emittance and Admittance; 3.2.5 Adiabatic Damping of Betatron Oscillations; 3.3 Momentum Dispersion; 3.3.1 Equation of Motion for an Off-Momentum Particle; 3.3.2 Solution of Equation of Motion; 3.4 Linear Deviations from the Ideal Lattice; 3.4.1 Steering Errors and Corrections 3.4.2 Focusing Errors and Corrections3.4.3 Chromaticity; Problems; 4 Resonances and Transverse Nonlinear Motion; 4.1 Transverse Resonances; 4.1.1 Floquet Transformation; 4.1.2 Multipole Expansion; 4.1.3 The Driven Oscillator and Rational Numbers; 4.2 A Third-Integer Resonance; 4.2.1 Equation of Motion; 4.2.2 Recognition of the Sextupole Resonance; 4.2.3 First Integral and the Separatrix; 4.2.4 Application to Resonant Extraction; 4.2.5 Comments on Correction Systems; 4.3 The Hamiltonian Formalism; 4.3.1 Review of Hamiltonian Dynamics; 4.3.2 The Hamiltonian for Small Transverse Oscillations 4.3.3 Transformations of the Hamiltonian4.3.4 The Third-Integer Resonance Revisited; Problems; 5 Transverse Coupled Motion; 5.1 Linear Coupling; 5.1.1 Coupled Harmonic Oscillators; 5.1.2 Perturbation Treatment of a Single Skew Quadrupole; 5.1.3 Matrix Treatment of a Single Skew Quadrupole; 5.1.4 Matrix Formalism of Linear Coupling; 5.2 Nonlinear Coupling; 5.2.1 Two-Degree-of-Freedom Sum Resonance Due to Distribution of Sextupoles; 5.2.2 Multipoles and Resonance Lines; Problems; 6 Intensity Dependent Effects; 6.1 Space Charge; 6.1.1 The Transverse Space Charge Force 6.1.2 Equation of Motion in the Presence of Space Charge6.1.3 Incoherent Tune Shift; 6.1.4 The Beam-Beam Tune Shift; 6.1.5 Image Charge and Image Current Effects; 6.2 The Negative Mass Instability; 6.2.1 The Longitudinal Space Charge Field; 6.2.2 Perturbation of the Line Density; 6.3 Wake Fields and Impedance; 6.3.1 Field of a Relativistic Charge in Vacuum; 6.3.2 Wake Field for a Resistive Wall; 6.3.3 Wake Functions; 6.3.4 Impedance; 6.4 Macroparticle Models of Coherent Instabilities; 6.4.1 Beam Breakup in Linacs; 6.4.2 The Strong Head-Tail Instability; 6.4.3 The Head-Tail Instability 6.5 Evolution of the Distribution Function |
Record Nr. | UNINA-9910830068603321 |
Edwards D. A (Donald A.), <1927-> | ||
New York, : Wiley, c1993 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
An introduction to the physics of high energy accelerators [[electronic resource] /] / D.A. Edwards, M.J. Syphers |
Autore | Edwards D. A (Donald A.), <1927-> |
Pubbl/distr/stampa | New York, : Wiley, c1993 |
Descrizione fisica | 1 online resource (306 p.) |
Disciplina |
530.416
539.73 |
Altri autori (Persone) | SyphersM. J. <1957-> |
Collana | Wiley series in beam physics and accelerator technology |
Soggetto topico |
Particle accelerators
Particles (Nuclear physics) |
ISBN |
1-282-01049-2
9786612010491 3-527-61727-2 3-527-61728-0 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
An Introduction to the Physics of High Energy Accelerators; Contents; Series Preface; Preface; 1 Introduction; 1.1 Prerequisites; 1.2 Uses of Accelerators; 1.2.1 Luminosity of a High Energy Collider; 1.2.2 Synchrotron Radiation Sources; Problems; 2 Acceleration and Phase Stability; 2.1 Acceleration Methods; 2.1.1 DC Accelerators; 2.1.2 Time Varying Electromagnetic Fields; 2.1.3 Resonant Cavities; 2.1.4 Accelerating Structures; 2.2 Phase Stability; 2.2.1 Synchrotron Oscillations; 2.2.2 Adiabatic Damping and Longitudinal Emmittance; 2.2.3 Transition Crossing
2.3 The Need for Transverse FocusingProblems; 3 Transverse Linear Motion; 3.1 Stability of Transverse Oscillations; 3.1.1 Weak Focusing; 3.1.2 Strong Focusing; 3.1.3 Stability Criterion; 3.2 Equation of Motion; 3.2.1 Piecewise Method of Solution; 3.2.2 Closed Form Solution; 3.2.3 Courant-Snyder Parameters; 3.2.4 Emittance and Admittance; 3.2.5 Adiabatic Damping of Betatron Oscillations; 3.3 Momentum Dispersion; 3.3.1 Equation of Motion for an Off-Momentum Particle; 3.3.2 Solution of Equation of Motion; 3.4 Linear Deviations from the Ideal Lattice; 3.4.1 Steering Errors and Corrections 3.4.2 Focusing Errors and Corrections3.4.3 Chromaticity; Problems; 4 Resonances and Transverse Nonlinear Motion; 4.1 Transverse Resonances; 4.1.1 Floquet Transformation; 4.1.2 Multipole Expansion; 4.1.3 The Driven Oscillator and Rational Numbers; 4.2 A Third-Integer Resonance; 4.2.1 Equation of Motion; 4.2.2 Recognition of the Sextupole Resonance; 4.2.3 First Integral and the Separatrix; 4.2.4 Application to Resonant Extraction; 4.2.5 Comments on Correction Systems; 4.3 The Hamiltonian Formalism; 4.3.1 Review of Hamiltonian Dynamics; 4.3.2 The Hamiltonian for Small Transverse Oscillations 4.3.3 Transformations of the Hamiltonian4.3.4 The Third-Integer Resonance Revisited; Problems; 5 Transverse Coupled Motion; 5.1 Linear Coupling; 5.1.1 Coupled Harmonic Oscillators; 5.1.2 Perturbation Treatment of a Single Skew Quadrupole; 5.1.3 Matrix Treatment of a Single Skew Quadrupole; 5.1.4 Matrix Formalism of Linear Coupling; 5.2 Nonlinear Coupling; 5.2.1 Two-Degree-of-Freedom Sum Resonance Due to Distribution of Sextupoles; 5.2.2 Multipoles and Resonance Lines; Problems; 6 Intensity Dependent Effects; 6.1 Space Charge; 6.1.1 The Transverse Space Charge Force 6.1.2 Equation of Motion in the Presence of Space Charge6.1.3 Incoherent Tune Shift; 6.1.4 The Beam-Beam Tune Shift; 6.1.5 Image Charge and Image Current Effects; 6.2 The Negative Mass Instability; 6.2.1 The Longitudinal Space Charge Field; 6.2.2 Perturbation of the Line Density; 6.3 Wake Fields and Impedance; 6.3.1 Field of a Relativistic Charge in Vacuum; 6.3.2 Wake Field for a Resistive Wall; 6.3.3 Wake Functions; 6.3.4 Impedance; 6.4 Macroparticle Models of Coherent Instabilities; 6.4.1 Beam Breakup in Linacs; 6.4.2 The Strong Head-Tail Instability; 6.4.3 The Head-Tail Instability 6.5 Evolution of the Distribution Function |
Record Nr. | UNINA-9910840683603321 |
Edwards D. A (Donald A.), <1927-> | ||
New York, : Wiley, c1993 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
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An introduction to the physics of particle accelerators [e-book] / Mario Conte, William W. MacKay |
Autore | Conte, Mario |
Pubbl/distr/stampa | Singapore ; River Edge, NJ : World Scientific, c1994 |
Descrizione fisica | 1 online resource (xii, 250 p.) : ill. |
Disciplina | 539.73 |
Altri autori (Persone) | MacKay, William W. |
Altri autori (Enti) | EBSCOhost (Online service) |
Soggetto topico |
Particle accelerators
Nuclear physics - Instruments |
ISBN | 9789814439633 |
Classificazione |
LC QC787.P3
53.0.671 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISALENTO-991002641579707536 |
Conte, Mario | ||
Singapore ; River Edge, NJ : World Scientific, c1994 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. del Salento | ||
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Ion acceleration and extreme light field generation based on ultra-short and ultra–intense lasers [[electronic resource] /] / by Liangliang Ji |
Autore | Ji Liangliang |
Edizione | [1st ed. 2014.] |
Pubbl/distr/stampa | Berlin, Heidelberg : , : Springer Berlin Heidelberg : , : Imprint : Springer, , 2014 |
Descrizione fisica | 1 online resource (93 p.) |
Disciplina | 539.73 |
Collana | Springer Theses, Recognizing Outstanding Ph.D. Research |
Soggetto topico |
Atoms
Physics Particle acceleration Lasers Photonics Plasma (Ionized gases) Atoms and Molecules in Strong Fields, Laser Matter Interaction Particle Acceleration and Detection, Beam Physics Optics, Lasers, Photonics, Optical Devices Plasma Physics |
ISBN | 3-642-54007-4 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto | Introduction -- Ion acceleration I: Efficient heavy ion acceleration by ESA.- Ion acceleration II: The critical target thickness in light sail acceleration -- Extreme light field generation I: Quasi-single-cycle relativistic laser pulse -- Extreme light field generation II: Short-wavelength single-cycle ultra-intense laser pulse -- Extreme light field generation III: Ultra-intense isolated attosecond pulse -- Summary. |
Record Nr. | UNINA-9910300383503321 |
Ji Liangliang | ||
Berlin, Heidelberg : , : Springer Berlin Heidelberg : , : Imprint : Springer, , 2014 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
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