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| Autore: |
Kawai Yoshinobu
|
| Titolo: |
Industrial Plasma Technology: Applications from Environmental to Energy Technologies
|
| Pubblicazione: | [Place of publication not identified], : Wiley VCH Imprint, 2010 |
| Disciplina: | 660.044 |
| Soggetto topico: | Engineering & Applied Sciences |
| Applied Physics | |
| Persona (resp. second.): | IkegamiHideo |
| SatoNoriyoshi | |
| Note generali: | Bibliographic Level Mode of Issuance: Monograph |
| Nota di contenuto: | Introduction to Plasmas -- Environmental Application of Nonthermal Plasma -- Atmospheric Plasma Air Pollution Control, Solid Waste, and Water Treatment Technologies: Fundamental and Overview -- Optical Diagnostics for High-Pressure Nonthermal Plasma Analysis -- Laser Investigations of Flow Patterns in Electrostatic Precipitators and Nonthermal Plasma Reactors -- Water Plasmas for Environmental Application -- Chemistry of Organic Pollutants in Atmospheric Plasmas -- Generation and Application of Wide Area Plasma -- Nonthermal Plasma-Based System for Exhaust Treatment Under Reduced Atmosphere of Pyrolysis Gases -- Pharmaceutical and Biomedical Engineering By Plasma Techniques -- Targeting Dendritic Cells With Carbon Magnetic Nanoparticles Made By Dense-Medium Plasma Technology -- Applications of Pulsed Power and Plasmas To Biosystems and Living Organisms -- Applications of Plasma Polymerization in Biomaterials -- Plasma Sterilization At Normal Atmospheric Pressure -- Elimination of Pathogenic Biological Residuals By Means of Low-Pressure Inductively Coupled Plasma Discharge -- Sterilization and Protein Treatment Using Oxygen Radicals Produced By Rf Discharge -- Hydrophilicity and Bioactivity of A Polyethylene Terephthalate Surface Modified By Plasma-Initiated Graft Polymerization -- Strategies and Issues on the Plasma Processing of Thin-Film Silicon Solar Cells -- Characteristics of Vhf Plasma With Large Area -- Deposition of A-Si : H Films With High Stability Against Light Exposure By Reducing Deposition of Nanoparticles Formed in Sih4 Discharges -- Diagnostics and Modeling of Sih4 /H2 Plasmas for the Deposition of Microcrystalline Silicon: the Case of Dual-Frequency Sources -- Introduction To Diamond-Like Carbons -- Diamond-Like Carbon for Applications -- Applications of Dlcs To Bioprocessing -- Plasma Processing of Nanocrystalline Semiconductive Cubic Boron Nitride Thin Films -- Fundamentals on Tribology of Plasma-Deposited Diamond-Like Carbon Films -- Diamond-Like Carbon Thin Films Grown in Pulsed-Dc Plasmas -- Plasma Deposition of N-Tio2 Thin Films -- Investigation of Dlc and Multilayer Coatings Hydrophobic Character for Biomedical Applications -- Creation of Novel Electromagnetic and Reactive Media From Microplasmas -- Nanoblock Assembly Using Pulse Rf Discharges With Amplitude Modulation -- Thomson Scattering Diagnostics of Discharge Plasmas -- Crystallized Nanodust Particles Growth in Low-Pressure Cold Plasmas -- Collection and Removal of Fine Particles in Plasma Chambers. |
| Titolo autorizzato: | Industrial Plasma Technology: Applications from Environmental to Energy Technologies ![]() |
| ISBN: | 3-527-62974-2 |
| Formato: | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9911019967003321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |