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Metal Oxide Thin Films: Synthesis, Characterization and Applications
Metal Oxide Thin Films: Synthesis, Characterization and Applications
Autore Rauwel habil. Erwan
Pubbl/distr/stampa Basel, : MDPI - Multidisciplinary Digital Publishing Institute, 2022
Descrizione fisica 1 online resource (144 p.)
Soggetto topico History of engineering and technology
Materials science
Technology: general issues
Soggetto non controllato ALD
aluminum
aluminum-zinc oxide
anodizing
atmospheric pressure chemical vapour deposition transport properties
atomic layer deposition
bismuth ferrite
carrier gas
cellulose
charge carrier mobility
crystallography
device performance
dynamic hot-probe measurements
electrical characteristic
epitaxy
gadolinium cobaltites
high-aspect-ratio substrate
IGZO TFTs
impedance spectroscopy
indium-tin oxide
ions adsorption
La-doping
low-temperature fabrication
magnetoresistance
magnetron co-sputtering
MAO (micro-arc oxidation) coating
metal oxide thin films
mist chemical vapor deposition (mist-CVD)
n/a
NiTiO3
oxidation
ozone
piezoelectricity
plasma electrolytic oxidation
preferential crystal growth orientation
self-lubricating
SEM
sol-gel
stability
thin films
tin oxide
transparent semiconductor
tribological performance
wide-bandgap semiconductor
α-Ga2O3
β-diketonates
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Altri titoli varianti Metal Oxide Thin Films
Record Nr. UNINA-9910566457303321
Rauwel habil. Erwan  
Basel, : MDPI - Multidisciplinary Digital Publishing Institute, 2022
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Plasmas Processes Applied on Metals and Alloys
Plasmas Processes Applied on Metals and Alloys
Autore Chen Jian-Zhang
Pubbl/distr/stampa Basel, Switzerland, : MDPI - Multidisciplinary Digital Publishing Institute, 2021
Descrizione fisica 1 online resource (126 p.)
Soggetto topico Technology: general issues
Soggetto non controllato additive manufacturing
Ag-doped TiO2 anatase
air plasma
Al2O3 coating
aluminum
antibacterial and photoactivity applications
atmospheric pressure
atmospheric pressure plasma jet
atmospheric-pressure plasma
cathodic plasma electrolysis deposition
chloroplatinic acid
composite coating
cut heat affected zone
dye-sensitized solar cells
Ga droplet
GaN nanodot
hydrogen fraction
mini-tensile test
morphology
n/a
nitrogen
nitrogen dose amount
nitrogen plasma
optoelectronic properties
organic-inorganic halide perovskite
oxidation
plasma
plasma cutting
plasma electrolytic oxidation (PEO)
plasma nitriding
plasma treatment
platinum
polytetrafluoroethylene (PTFE)
postdischarge
residual stress
selective laser melting
self-lubricating
solution surface tension
spark plasma sintering
steel plate
surface
Ti6Al4V lattice structure
tin chloride
tin oxide
titanium
transmission electron microscopy
void
wettability
wurtzite
Zinc-blende
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910557434103321
Chen Jian-Zhang  
Basel, Switzerland, : MDPI - Multidisciplinary Digital Publishing Institute, 2021
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui