top

  Info

  • Utilizzare la checkbox di selezione a fianco di ciascun documento per attivare le funzionalità di stampa, invio email, download nei formati disponibili del (i) record.

  Info

  • Utilizzare questo link per rimuovere la selezione effettuata.
Feature Papers in Electronic Materials Section
Feature Papers in Electronic Materials Section
Autore Roccaforte Fabrizio
Pubbl/distr/stampa Basel, : MDPI - Multidisciplinary Digital Publishing Institute, 2022
Descrizione fisica 1 online resource (438 p.)
Soggetto topico Energy industries and utilities
History of engineering and technology
Technology: general issues
Soggetto non controllato 2D materials
3C-SiC
4H-SiC
aluminum oxide
arrhythmia detection
binary oxides
bulk growth
cardiovascular monitoring
charge removal rate
chemical vapour deposition
compensation
compliant substrates
cubic silicon carbide
CVD
CVD graphene
defects
degradation
diamond
diodes
doping
electrical characterization
electron microscopy
energy electronics
epitaxial lift-off
Fabry-Perot filter
flexible bioelectronics
flexible electronics
Ga2O3
GaAs
gallium oxide
GaN
GaN-on-diamond
gate dielectric
graphene absorption
HEMT
heteroepitaxy
high-throughput method
high-κ dielectrics
hybrid integration
InGaAs channel
instability
insulators
interface
iron-based superconductor
irradiation temperature
KOH etching
material printing
MOS
MoS2
MPCVD growth
nanomanufacturing
nanomembrane
ohmic contact
optical fibers
power electronics
proton and electron irradiation
pulsed laser deposition
quasi-vertical GaN
radiation effects
radiation hardness
radio frequency sputtering
reliability
Schottky barrier
Schottky diodes
silica point defects
silicon carbide
SIMS
simulation
soft biosensors
spinel
stacking faults
stress
thermal management
thin film
threshold voltage
Ti3SiC2
transistors
transmission electron microscopy
trapping
traps
trench MOS
ultra-wide bandgap
van der Waals
vertical GaN
wearable sensors
wide band gap semiconductors
ZnGa2O4
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910557620303321
Roccaforte Fabrizio  
Basel, : MDPI - Multidisciplinary Digital Publishing Institute, 2022
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Silicon-Based Nanomaterials : : Technology and Applications / / Robert W. Kelsall
Silicon-Based Nanomaterials : : Technology and Applications / / Robert W. Kelsall
Autore Kelsall Robert W
Pubbl/distr/stampa MDPI - Multidisciplinary Digital Publishing Institute, 2019
Descrizione fisica 1 electronic resource (94 p.)
Soggetto topico History of engineering and technology
Soggetto non controllato ohmic contact
graphene oxide
optical gain media
nano silica sol
in-situ growth
silicon quantum dots
gold nanoparticles
nanofabrication
thermal reduction
long-term mechanical tests
self-aligned nanowires
silicon carbide
micro-mechanism
telecom wavelengths
nanoparticles
single-crystal Si nanomembrane (Si NMs)
nanowires
localized surface plasmon resonances
C/C composites
thin film transistor
strain engineering
nanomembranes
light emitting devices
quantum photonics
ultrathin nanowires
electroluminescence enhancement
mechanical properties
group-IV semiconductors
self-assembly
silicon
SiC nanowires
fluctuating temperature-humidity conditions
TiO2 insertion layer
ISBN 9783039210435
3039210432
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910346667103321
Kelsall Robert W  
MDPI - Multidisciplinary Digital Publishing Institute, 2019
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Wide Bandgap Semiconductor Based Micro/Nano Devices / Jung-Hun Seo
Wide Bandgap Semiconductor Based Micro/Nano Devices / Jung-Hun Seo
Autore Seo Jung-Hun
Pubbl/distr/stampa MDPI - Multidisciplinary Digital Publishing Institute, 2019
Descrizione fisica 1 electronic resource (138 p.)
Soggetto topico History of engineering and technology
Soggetto non controllato ohmic contact
MESFET
optical band gap
wide-bandgap semiconductor
annealing temperature
junction termination extension (JTE)
channel length modulation
silicon carbide (SiC)
amorphous InGaZnO (a-IGZO)
light output power
GaN
electrochromism
large signal performance
passivation layer
4H-SiC
positive gate bias stress (PGBS)
asymmetric power combining
ultrahigh upper gate height
high electron mobility transistors
space application
gallium nitride (GaN)
phase balance
edge termination
distributed Bragg reflector
cathode field plate (CFP)
ammonothermal GaN
anode field plate (AFP)
W band
GaN high electron mobility transistor (HEMT)
1T DRAM
growth of GaN
tungsten trioxide film
thin-film transistor (TFT)
micron-sized patterned sapphire substrate
power added efficiency
T-anode
analytical model
AlGaN/GaN
harsh environment
high-temperature operation
amplitude balance
buffer layer
characteristic length
Ku-band
DIBL effect
I-V kink effect
flip-chip light-emitting diodes
high electron mobility transistors (HEMTs)
power amplifier
sidewall GaN
external quantum efficiency
breakdown voltage (BV)
threshold voltage (Vth) stability
regrown contact
AlGaN/GaN HEMT
TCAD
high electron mobility transistor (HEMT)
ISBN 9783038978435
3038978434
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910346846903321
Seo Jung-Hun  
MDPI - Multidisciplinary Digital Publishing Institute, 2019
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui