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Nanoelectronic Materials, Devices and Modeling
Nanoelectronic Materials, Devices and Modeling
Autore Li Qiliang
Pubbl/distr/stampa MDPI - Multidisciplinary Digital Publishing Institute, 2019
Descrizione fisica 1 electronic resource (242 p.)
Soggetto non controllato quantum mechanical
neuromorphic computation
off-current (Ioff)
double-gate tunnel field-effect-transistor
topological insulator
back current blocking layer (BCBL)
CMOS power amplifier IC
information integration
distributed Bragg
spike-timing-dependent plasticity
electron affinity
enhancement-mode
current collapse
gallium nitride (GaN)
band-to-band tunneling
vertical field-effect transistor (VFET)
ionic liquid
luminescent centres
thermal coupling
vision localization
PC1D
UAV
ZnO/Si
dual-switching transistor
memristor
field-effect transistor
higher order synchronization
shallow trench isolation (STI)
memristive device
on-current (Ion)
low voltage
reflection transmision method
dielectric layer
source/drain (S/D)
high efficiency
nanostructure synthesis
InAlN/GaN heterostructure
supercapacitor
high-electron mobility transistor (HEMTs)
heterojunction
p-GaN
recessed channel array transistor (RCAT)
gate field effect
charge injection
saddle FinFET (S-FinFET)
L-shaped tunnel field-effect-transistor
conductivity
energy storage
hierarchical
PECVD
sample grating
MISHEMT
bistability
threshold voltage (VTH)
bandgap tuning
oscillatory neural networks
UV irradiation
Mott transition
third harmonic tuning
topological magnetoelectric effect
cross-gain modulation
2D material
solar cells
silicon on insulator (SOI)
Green's function
optoelectronic devices
semiconductor optical amplifier
ZnO films
graphene
AlGaN/GaN
polarization effect
two-photon process
conductive atomic force microscopy (cAFM)
2DEG density
vanadium dioxide
interface traps
potential drop width (PDW)
pattern recognition
drain-induced barrier lowering (DIBL)
atomic layer deposition (ALD)
normally off power devices
gate-induced drain leakage (GIDL)
insulator-metal transition (IMT)
zinc oxide
synaptic device
subthreshold slope (SS)
landing
silicon
corner-effect
conditioned reflex
quantum dot
gallium nitride
bismuth ions
conduction band offset
variational form
ISBN 3-03921-226-5
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910346664303321
Li Qiliang  
MDPI - Multidisciplinary Digital Publishing Institute, 2019
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Wide Bandgap Based Devices: Design, Fabrication and Applications, Volume II
Wide Bandgap Based Devices: Design, Fabrication and Applications, Volume II
Autore Verzellesi Giovanni
Pubbl/distr/stampa Basel, : MDPI - Multidisciplinary Digital Publishing Institute, 2022
Descrizione fisica 1 electronic resource (320 p.)
Soggetto topico Technology: general issues
History of engineering & technology
Energy industries & utilities
Soggetto non controllato energy storage system
power conditioning system
silicon carbide
vanadium redox flow batteries
AlGaN/GaN
SiC
high electron mobility transistor
Schottky barrier diode
breakdown field
noise
charge traps
radio frequency
wide-bandgap (WBG)
gallium nitride (GaN)
silicon carbide (SiC)
high electron mobility transistor (HEMT)
metal-oxide-semiconductor field effect transistor (MOSFET)
driving technology
nickel oxide
annealing temperature
crystallite size
optical band gap
electrochromic device
indium oxide thin film
solution method
plasma surface treatment
bias stability
aluminum nitride
Schottky barrier diodes
radio frequency sputtering
X-ray diffraction
X-ray photoelectron spectroscopy
piezoelectric micromachined ultrasonic transducers
ranging
time of flight (TOF)
time to digital converter circuit (TDC)
AlGaN/GaN heterojunction
p-GaN gate
unidirectional operation
rectifying electrode
first-principles
density functional theory
pure β-Ga2O3
Sr-doped β-Ga2O3
p-type doping
band structure
density of states
optical absorption
AlN buffer layer
NH3 growth interruption
strain relaxation
GaN-based LED
low defect density
gate bias modulation
palladium catalyst
gallium nitride
nitrogen dioxide gas sensor
laser micromachining
sapphire
AlGaN/GaN heterostructures
high-electron mobility devices
p-GaN gate HEMT
normally off
low-resistance SiC substrate
temperature
high electron-mobility transistor (HEMT)
equivalent-circuit modeling
microwave frequency
scattering-parameter measurements
GaN
MIS-HEMTs
fabrication
threshold voltage stability
supercritical technology
GaN power HEMTs
breakdown voltage
current collapse
compensation ratio
auto-compensation
carbon doping
HVPE
AlN
high-temperature
buffer layer
nitridation
high-electron mobility transistor
heterogeneous integration
SOI
QST
crystal growth
cubic and hexagonal structure
blue and yellow luminescence
electron lifetime
wafer dicing
stealth dicing
laser thermal separation
dry processing
laser processing
wide bandgap semiconductor
photovoltaic module
digital signal processor
synchronous buck converter
polar
semi-polar
non-polar
magnetron sputtering
HTA
GaN-HEMT mesa structures
2DEG
X-ray sensor
X-ray imaging
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Altri titoli varianti Wide Bandgap Based Devices
Record Nr. UNINA-9910576886103321
Verzellesi Giovanni  
Basel, : MDPI - Multidisciplinary Digital Publishing Institute, 2022
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui