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Advances in Chemical Crystallography: A Themed Issue Honoring Professor Alexandra M. Z. Slawin on the Occasion of Her 60th Birthday
Advances in Chemical Crystallography: A Themed Issue Honoring Professor Alexandra M. Z. Slawin on the Occasion of Her 60th Birthday
Autore Harrison William T. A
Pubbl/distr/stampa Basel, : MDPI - Multidisciplinary Digital Publishing Institute, 2022
Descrizione fisica 1 electronic resource (214 p.)
Soggetto topico Research & information: general
Chemistry
Organic chemistry
Soggetto non controllato molecular magnetism
supramolecular chemistry
heterometallic clusters
magnetometry
EPR spectroscopy
N-Substituted Benzamides
Woollins’ reagent
selenation reagent
reduction reagent
single crystal X-ray structures
DFT
3d metal complex
benchmark
hydricity
2D Cu-MOF
square grid structure
Click reaction
Knoevenagel reaction
green chemistry
titanium(IV) oxo-clusters
band gap modification
multinuclear NMR
ESI-MS studies
photoluminescence
perophoramidine
natural product
Claisen rearrangement
indoloquinoline
intramolecular cyclization
X-ray structure
isothiourea
ammonium enolate
aryloxide
quinone methide
ester functionalization
1,6-conjugate addition
layered perovskite
bandgap tuning
azetidinium
Ruddlesden–Popper
structure-property relations
amide groups
isomers
late-transition metals
P-ligands
phenols
secondary interactions
single crystal X-ray crystallography
MOF
calcium MOF
electrochemistry
scXRD
VTXRD
bioMOF
bond activation
low oxidation state complexes
magnesium
metallacycles
ring system
X-ray crystallography
peri-substitution
arsenic
organophosphorus
pnictine
PDS
PELDOR
DEER
nitroxide spin label
Comparative DEER Analyzer
mtsslSuite
MMM
oxazoline
Wittig rearrangement
thiophene
thieno[2,3-c]pyrrolone
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Altri titoli varianti Advances in Chemical Crystallography
Record Nr. UNINA-9910576882403321
Harrison William T. A  
Basel, : MDPI - Multidisciplinary Digital Publishing Institute, 2022
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Nanoelectronic Materials, Devices and Modeling
Nanoelectronic Materials, Devices and Modeling
Autore Li Qiliang
Pubbl/distr/stampa MDPI - Multidisciplinary Digital Publishing Institute, 2019
Descrizione fisica 1 electronic resource (242 p.)
Soggetto non controllato quantum mechanical
neuromorphic computation
off-current (Ioff)
double-gate tunnel field-effect-transistor
topological insulator
back current blocking layer (BCBL)
CMOS power amplifier IC
information integration
distributed Bragg
spike-timing-dependent plasticity
electron affinity
enhancement-mode
current collapse
gallium nitride (GaN)
band-to-band tunneling
vertical field-effect transistor (VFET)
ionic liquid
luminescent centres
thermal coupling
vision localization
PC1D
UAV
ZnO/Si
dual-switching transistor
memristor
field-effect transistor
higher order synchronization
shallow trench isolation (STI)
memristive device
on-current (Ion)
low voltage
reflection transmision method
dielectric layer
source/drain (S/D)
high efficiency
nanostructure synthesis
InAlN/GaN heterostructure
supercapacitor
high-electron mobility transistor (HEMTs)
heterojunction
p-GaN
recessed channel array transistor (RCAT)
gate field effect
charge injection
saddle FinFET (S-FinFET)
L-shaped tunnel field-effect-transistor
conductivity
energy storage
hierarchical
PECVD
sample grating
MISHEMT
bistability
threshold voltage (VTH)
bandgap tuning
oscillatory neural networks
UV irradiation
Mott transition
third harmonic tuning
topological magnetoelectric effect
cross-gain modulation
2D material
solar cells
silicon on insulator (SOI)
Green's function
optoelectronic devices
semiconductor optical amplifier
ZnO films
graphene
AlGaN/GaN
polarization effect
two-photon process
conductive atomic force microscopy (cAFM)
2DEG density
vanadium dioxide
interface traps
potential drop width (PDW)
pattern recognition
drain-induced barrier lowering (DIBL)
atomic layer deposition (ALD)
normally off power devices
gate-induced drain leakage (GIDL)
insulator-metal transition (IMT)
zinc oxide
synaptic device
subthreshold slope (SS)
landing
silicon
corner-effect
conditioned reflex
quantum dot
gallium nitride
bismuth ions
conduction band offset
variational form
ISBN 3-03921-226-5
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910346664303321
Li Qiliang  
MDPI - Multidisciplinary Digital Publishing Institute, 2019
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui