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Miniaturized Transistors, Volume II
Miniaturized Transistors, Volume II
Autore Filipovic Lado
Pubbl/distr/stampa Basel, : MDPI - Multidisciplinary Digital Publishing Institute, 2022
Descrizione fisica 1 electronic resource (352 p.)
Soggetto topico Research & information: general
Mathematics & science
Soggetto non controllato FinFETs
CMOS
device processing
integrated circuits
silicon carbide (SiC) metal-oxide-semiconductor field-effect transistors (MOSFETs)
solid state circuit breaker (SSCB)
prototype
circuit design
GaN
HEMT
high gate
multi-recessed buffer
power density
power-added efficiency
4H-SiC
MESFET
IMRD structure
power added efficiency
1200 V SiC MOSFET
body diode
surge reliability
silvaco simulation
floating gate transistor
control gate
CMOS device
active noise control
vacuum channel
mean free path
vertical air-channel diode
vertical transistor
field emission
particle trajectory model
F-N plot
space-charge-limited currents
4H-SiC MESFET
simulation
power added efficiency (PAE)
new device
three-input transistor
T-channel
compact circuit style
CMOS compatible technology
avalanche photodiode
SPICE model
bandwidth
high responsivity
silicon photodiode
AlGaN/GaN HEMTs
thermal simulation
transient channel temperature
pulse width
gate structures
band-to-band tunnelling (BTBT)
tunnelling field-effect transistor (TFET)
germanium-around-source gate-all-around TFET (GAS GAA TFET)
average subthreshold swing
direct source-to-drain tunneling
transport effective mass
confinement effective mass
multi-subband ensemble Monte Carlo
non-equilibrium Green's function
DGSOI
FinFET
core-insulator
gate-all-around
field effect transistor
GAA
nanowire
one-transistor dynamic random-access memory (1T-DRAM)
polysilicon
grain boundary
electron trapping
flexible transistors
polymers
metal oxides
nanocomposites
dielectrics
active layers
nanotransistor
quantum transport
Landauer-Büttiker formalism
R-matrix method
nanoscale
mosfet
quantum current
surface transfer doping
2D hole gas (2DHG)
diamond
MoO3
V2O5
MOSFET
reliability
random telegraph noise
oxide defects
SiO2
split-gate trench power MOSFET
multiple epitaxial layers
specific on-resistance
device reliability
nanoscale transistor
bias temperature instabilities (BTI)
defects
single-defect spectroscopy
non-radiative multiphonon (NMP) model
time-dependent defect spectroscopy
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910580205803321
Filipovic Lado  
Basel, : MDPI - Multidisciplinary Digital Publishing Institute, 2022
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Silicon Nanodevices
Silicon Nanodevices
Autore Radamson Henry
Pubbl/distr/stampa Basel, : MDPI Books, 2022
Descrizione fisica 1 electronic resource (238 p.)
Soggetto topico Technology: general issues
Soggetto non controllato silicon
yolk−shell structure
anode
lithium-ion batteries
in-plane nanowire
site-controlled
epitaxial growth
germanium
nanowire-based quantum devices
HfO2/Si0.7Ge0.3 gate stack
ozone oxidation
Si-cap
interface state density
passivation
GOI
photodetectors
dark current
responsivity
prussian blue nanoparticles
organotrialkoxysilane
silica beads
arsenite
arsenate
water decontamination
vertical gate-all-around (vGAA)
digital etch
quasi-atomic-layer etching (q-ALE)
selective wet etching
HNO3 concentration
doping effect
vertical Gate-all-around (vGAA)
p+-Ge0.8Si0.2/Ge stack
dual-selective wet etching
atomic layer etching (ALE)
stacked SiGe/Si
epitaxial grown
Fin etching
FinFET
short-term potentiation (STP)
long-term potentiation (LTP)
charge-trap synaptic transistor
band-to-band tunneling
pattern recognition
neural network
neuromorphic system
Si-MOS
quantum dot
spin qubits
quantum computing
GeSn
CVD
lasers
detectors
transistors
III-V on Si
heteroepitaxy
threading dislocation densities (TDDs)
anti-phase boundaries (APBs)
selective epitaxial growth (SEG)
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910595076903321
Radamson Henry  
Basel, : MDPI Books, 2022
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui