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Biblioteca

MARC Lista (tabellare)
Chemical vapour deposition : precursors, processes and applications / / edited by Anthony C. Jones, Michael L. Hitchman
Chemical vapour deposition : precursors, processes and applications / / edited by Anthony C. Jones, Michael L. Hitchman
Edizione [1st ed.]
Pubbl/distr/stampa Cambridge, UK, : Royal Society of Chemistry, c2009
Descrizione fisica 1 online resource (599 p.)
Disciplina 671.735
Altri autori (Persone) JonesAnthony C
HitchmanMichael L
Soggetto topico Chemical vapor deposition
Vapor-plating
ISBN 9781621987031
1621987035
9781847558794
1847558798
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto 9780854044658; i_iv; v_vi; vii_xvi; 001_036; 037_092; 093_157; 158_206; 207_271; 272_319; 320_356; 357_412; 413_450; 451_476; 477_493; 494_534; 535_570; 571_582
Altri titoli varianti Chemical vapor deposition
Record Nr. UNINA-9911006780603321
Cambridge, UK, : Royal Society of Chemistry, c2009
Materiale a stampa
Lo trovi qui: Univ. Federico II
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The foundations of vacuum coating technology / / Donald M. Mattox
The foundations of vacuum coating technology / / Donald M. Mattox
Autore Mattox D. M
Pubbl/distr/stampa Norwich, N.Y., : Noyes Publications/William Andrew Pub., c2003
Descrizione fisica 1 online resource (161 p.)
Disciplina 669/.028/4
Soggetto topico Vapor-plating
ISBN 1-282-71175-X
1-282-02762-X
9786612711756
0-08-094705-0
0-8155-1927-3
0-8155-1993-1
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Front Cover; The Foundations of Vacuum Coating Technology; Copyright Page; Preface; Table of Contents; Chapter 1. Introduction; Chapter 2. Early Vacuum Science and Technology; Chapter 3. Early Electricity and Magnetism; Chapter 4. Early Plasma Physics and Chemistry; Chapter 5. Some Scientific and Engineering Societies and Publications; Chapter 6. Patents and the U.S. Patent Office; Deposition Processes; Sputter Deposition; Thermal Evaporation; Arc Vapor Deposition; Chemical Vapor Deposition; Ion Plating; Chapter 7. Surface Preparation; Summary; Endnotes; References
Acronyms Used in Vacuum CoatingGlossary of Terms for Vacuum Coating
Record Nr. UNINA-9911004783703321
Mattox D. M  
Norwich, N.Y., : Noyes Publications/William Andrew Pub., c2003
Materiale a stampa
Lo trovi qui: Univ. Federico II
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Handbook of chemical vapor deposition / / by Hugh O. Pierson
Handbook of chemical vapor deposition / / by Hugh O. Pierson
Autore Pierson Hugh O
Edizione [2nd ed.]
Pubbl/distr/stampa Norwich, NY, : Noyes Publications, 1999
Descrizione fisica 1 online resource (507 p.)
Disciplina 667.9
671.7/35 21
Altri autori (Persone) PiersonHugh O
Soggetto topico Chemical vapor deposition
Vapor-plating
ISBN 1-282-00259-7
9786612002595
0-8155-1743-2
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Front Cover; Handbook of Chemical Vapor Depostion (CVD): Principles, Technology, and Applications; Copyright Page; Contents; Chapter 1. Introduction and General Considerations; 1.0 INTRODUCTION; 2.0 HISTORICAL PERSPECTIVE; 3.0 THE APPLICATIONS OF CVD; 4.0 PROFILE OF THE CVD BUSINESS; 5.0 BOOK OBJECTIVES; 6.0 BACK GROUND REFERENCES; REFERENCES; Chapter 2. Fundamentals of Chemical Vapor Deposition; 1.0 INTRODUCTION; 2.0 THERMO DYNAMICS OF CVD; 3.0 KINETICS AND MASS-TRANSPORT MECHANISMS; 4.0 GROWTH MECHANISM AND STRUCTURE OF DEPOSIT; RFERENCES; Chapter 3. The Chemistry of CVD
1.0 CATEGORIES OF CVD REACTIONS2.0 CVD PRECURSORS; 3.0 HALIDE PRECURSORS; 4.0 METAL-CARBONYL PRECURSORS; 5.0 HYDRIDE PRECURSORS; REFERENCES; Chapter 4. Metallo-Organic CVD (MOCVD); 1.0 INTRODUCTION; 2.0 MOCVD PROCESS AND EQUIPMENT; 3.0 MOCVD PRECURSORS: ALKYL,ALICYCLIC, AND ARYL COMPOUNDS; 4.0 ACETYLACETO NATE COM POUNDS; 5.0 MOCVD REACTIONS FOR THE DEPOSITION OF METALS; 6.0 MOCVD REACTIONS FOR THE DEPOSITION OF CARBIDES AND NITRIDES; 7.0 MOCVD REACTIONS FOR THE DEPOSITION OF OXIDES; 8.0 MOCVD REACTIONS FOR THE DEPOSITION OFIII...V AND II...-VI COMPOUNDS; 9.0 GENERAL APPLICATIONS OF MOCVD
REFERENCESChapter 5. CVD Processes and Equipment; 1.0 INTRODUCTION; 2.0 CLOSED AND OPEN REACTOR; 3.0 REACTANT SUPPLY; 4.0 THERMAL CVD: DEPOSITION SYSTEM AND REACTOR DESIGN; 5.0 EXHAUST AND BY-PRODUCT DISPOSAL; 6.0 LASER AND PHOTO CVD; 7.0 CHEMICAL VAPOR INFILTRATION (CVI); 8.0 FLUIDIZED-BED CVD; 9.0 PLASMA CVD; REFERENCES; Chapter 6. The CVD of Metals; 1.0 INTRODUCTION; 2.0 ALUM INUM; 3.0 BERYLLIUM; 4.0 CHROMIUM; 5.0 COPPER; 6.0 GOLD; 7.0 MOLYBDENUM; 8.0 NICKEL; 9.0 NIOBIUM (COLUMBIUM); 10.0 PLATINUM AND PLATINUM GROUP METALS; 11.0 RHENIUM; 12.0 TANTALUM; 13.0 TITANIUM; 14.0 TUNGSTEN
15.0 OTHER METALS16.0 INTERM ETALLICS; REFERENCES; Chapter 7. The CVD of the Allotropes of Carbon; 1.0 THE ALL OTROPES OF CARBON; 2.0 THE CVD OF GRAPHITE; 3.0 THE CVD OF DIAMOND; 4.0 THE CVD OF DIAMOND-LIKE-CARBON (DLC); REFERENCES; Chapter 8. The CVD of Non-Metallic Elements; 1.0 INTRODUCTION; 2.0 THE CVD OF BORON; 3.0 THE CVD OF SILICON; 4.0 THE CVD OF GERMANIUM; REFERENCES; Chapter 9. The CVD of Ceramic Materials: Carbides; 1.0 INTRODUCTION; 2.0 THE CVD OF BORON CARBIDE; 3.0 THE CVD OF CHROMIUM CARBIDE; 4.0 THE CVD OF HAFNIUM CARBIDE; 5.0 THE CVD OF NIOBIUM CARBIDE
6.0 THE CVD OF SILICON CARBIDE7.0 THE CVD OF TANTALUM CARBIDE; 8.0 THE CVD OF TITANIUM CARBIDE; 9.0 THE CVD OF TUNGSTEN CARBIDE; 10.0 THE CVD OF ZIRCONIUM CARBIDE; 11.0 THE CVD OF MISCELLANEOUS CARBIDES; REFERENCES; Chapter 10. The CVD of Ceramic Materials: Nitrides; 1.0 GENERAL CHARACTERISTICS OF NITRIDES; 2.0 THE CVD OF ALUMINUM NITRIDE; 3.0 THE CVD OF HEXAGONAL BORON NITRIDE; 4.0 THE CVD OF CUBIC BORON NITRIDE; 5.0 THE CVD OF HAFNIUM NITRIDE; 6.0 THE CVD OF NIOBIUM NITRIDE; 7.0 THE CVD OF SILICON NITRIDE; 8.0 THE CVD OF TITANIUM NITRIDE; 9.0 THE CVD OF TITANIUM CARBONITRIDE
10.0 THE CVD OF OTHER NITRIDES
Record Nr. UNINA-9911006838203321
Pierson Hugh O  
Norwich, NY, : Noyes Publications, 1999
Materiale a stampa
Lo trovi qui: Univ. Federico II
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Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control / / by Donald M. Mattox
Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control / / by Donald M. Mattox
Autore Mattox D. M
Pubbl/distr/stampa Westwood, NJ, : Noyes Publications, c1998
Descrizione fisica 1 online resource (947 p.)
Disciplina 671.735
Soggetto topico Vapor-plating
Metals - Finishing
ISBN 9786612002755
1-282-00275-9
1-282-00276-7
0-8155-1763-7
1-59124-079-4
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Front Cover; Handbook of Physical Vapor Depositon (PVD) Processing: Film Formation, Adhesion, Surface Preparation and Contamination Control; Copyright Page; Dedication; Table of Contents; Chapter 1. Introduction; 1.1 SURFACE ENGINEERING; 1.2 THIN FILM PROCESSING; 1.3 PROCESS DOCUMENTATION; 1.4 SAFETY AND ENVIRONMENTAL CONCERNS; 1.5 UNITS; 1.6 SUMMARY; FURTHER READING; REFERENCES; Chapter 2. Substrate ("Real") Surfaces and Surface Modification; 2.1 INTRODUCTION; 2.2 MATERIALS AND FABRICATION; 2.3 ATOMIC STRUCTURE AND ATOM-PARTICLE INTERACTIONS
2.4 CHARACTERIZATION OF SURFACES AND NEAR-SURFACE REGIONS2.5 BULK PROPERTIES; 2.6 MODIFICATION OF SUBSTRATE SURFACES; 2.7 SUMMARY; FURTHER READING; REFERENCES; Chapter 3. The Low-Pressure Gas and Vacuum Processing Environment; 3.1 INTRODUCTION; 3.2 GASES AND VAPORS; 3.3 GAS-SURFACE INTERACTIONS; 3.4 VACUUM ENVIRONMENT; 3.5 VACUUM PROCESSING SYSTEMS; 3.6 VACUUM PUMPING; 3.7 VACUUM AND PLASMA COMPATIBLE MATERIALS; 3.8 ASSEMBLY; 3.9 EVALUATING VACUUM SYSTEM PERFORMANCE; 3.10 PURCHASING A VACUUM SYSTEM FOR PVD PROCESSING; 3.11 CLEANING OF VACUUM SURFACES; 3.12 SYSTEM-RELATED CONTAMINATION
3.13 PROCESS-RELATED CONTAMINATION3.14 TREATMENT OF SPECIFIC MATERIALS; 3.15 SAFETY ASPECTS OF VACUUM TECHNOLOGY; 3.16 SUMMARY; FURTHER READING; REFERENCES; Chapter 4. The Low-Pressure Plasma Processing Environment; 4.1 INTRODUCTION; 4.2 THE PLASMA; 4.3 PLASMA-SURFACE INTERACTIONS; 4.4 CONFIGURATIONS FOR GENERATING PLASMAS; 4.5 ION AND PLASMA SOURCES; 4.6 PLASMA PROCESSING SYSTEMS; 4.7 PLASMA-RELATED CONTAMINATION; 4.8 SOME SAFETY ASPECTS OF PLASMA PROCESSING; 4.9 SUMMARY; FURTHER READING; REFERENCES; Chapter 5. Vacuum Evaporation and Vacuum Deposition; 5.1 INTRODUCTION
5.2 THERMAL VAPORIZATION5.3 THERMAL VAPORIZATION SOURCES; 5.4 TRANSPORT OF VAPORIZED MATERIAL; 5.5 CONDENSATION OF VAPORIZED MATERIAL; 5.6 MATERIALS FOR EVAPORATION; 5.7 VACUUM DEPOSITION CONFIGURATIONS; 5.8 PROCESS MONITORING AND CONTROL; 5.9 CONTAMINATION FROM THE VAPORIZATION SOURCE; 5.10 ADVANTAGES AND DISADVANTAGES OF VACUUM DEPOSITION; 5.11 SOME APPLICATIONS OF VACUUM DEPOSITION; 5.12 GAS EVAPORATION AND ULTRAFINE PARTICLES; 5.13 OTHER PROCESSES; 5.14 SUMMARY; FURTHER READING; REFERENCES; Chapter 6. Physical Sputtering and Sputter Deposition (Sputtering; 6.1 INTRODUCTION
6.2 PHYSICAL SPUTTERING6.3 SPUTTERING CONFIGURATIONS; 6.4 TRANSPORT OF THE SPUTTER-VAPORIZED SPECIES; 6.5 CONDENSATION OF SPUTTERED SPECIES; 6.6 SPUTTER DEPOSITION GEOMETRIES; 6.7 TARGETS AND TARGET MATERIALS; 6.8 PROCESS MONITORING AND CONTROL; 6.9 CONTAMINATION DUE TO SPUTTERING; 6.10 ADVANTAGES AND DISADVANTAGES OF SPUTTER DEPOSITION; 6.11 SOME APPLICATIONS OF SPUTTER DEPOSITION; 6.12 SUMMARY; FURTHER READING; REFERENCES; Chapter 7. Arc Vapor Deposition; 7.1 INTRODUCTION; 7.2 ARCS; 7.3 ARC SOURCE CONFIGURATIONS; 7.4 REACTIVE ARC DEPOSITION; 7.5 ARC MATERIALS
7.6 ARC VAPOR DEPOSITION SYSTEM
Record Nr. UNINA-9911006867503321
Mattox D. M  
Westwood, NJ, : Noyes Publications, c1998
Materiale a stampa
Lo trovi qui: Univ. Federico II
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Physical vapor deposition of thin films / John E. Mahan
Physical vapor deposition of thin films / John E. Mahan
Autore Mahan, John E.
Pubbl/distr/stampa New York : John Wiley & Sons, c2000
Descrizione fisica xiii, 312 p. : ill. (some col.) ; 24 cm.
Disciplina 53.7.8
53.8.3
671.7'35
TS695.M32
Soggetto topico Thin films
Vapor-plating
ISBN 0471330019
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNISALENTO-991003078279707536
Mahan, John E.  
New York : John Wiley & Sons, c2000
Materiale a stampa
Lo trovi qui: Univ. del Salento
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Principles of physical vapor deposition of thin films / K.S. Sree Harsha
Principles of physical vapor deposition of thin films / K.S. Sree Harsha
Autore SreeHarsha, K. S.
Pubbl/distr/stampa Amsterdam ; Boston : Elsevier, 2006
Descrizione fisica xi, 1160 p. : ill. ; 25 cm
Disciplina 621.38152
Soggetto topico Thin films
Vapor-plating
ISBN 008044699X
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNISALENTO-991003821799707536
SreeHarsha, K. S.  
Amsterdam ; Boston : Elsevier, 2006
Materiale a stampa
Lo trovi qui: Univ. del Salento
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Principles of physical vapor deposition of thin films [e-book] / K.S. Sree Harsha
Principles of physical vapor deposition of thin films [e-book] / K.S. Sree Harsha
Autore SreeHarsha, K. S.
Pubbl/distr/stampa Amsterdam ; Boston ; London : Elsevier, 2006
Descrizione fisica xi, 1160 p. : ill. ; 25 cm
Disciplina 621.38152
Soggetto topico Thin films
Vapor-plating
Soggetto genere / forma Electronic books.
ISBN 9780080446998
008044699X
Formato Risorse elettroniche
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNISALENTO-991003233199707536
SreeHarsha, K. S.  
Amsterdam ; Boston ; London : Elsevier, 2006
Risorse elettroniche
Lo trovi qui: Univ. del Salento
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Roll-to-roll vacuum deposition of barrier coatings / / Charles A. Bishop
Roll-to-roll vacuum deposition of barrier coatings / / Charles A. Bishop
Autore Bishop Charles A.
Edizione [2nd ed.]
Pubbl/distr/stampa Salem, Massachusetts ; ; Hoboken, New Jersey : , : Scrivener Publishing : , : Wiley, , 2015
Descrizione fisica 1 online resource (317 p.)
Disciplina 671.53
Collana Advances in Roll-to-Roll Vacuum Coatings Technology
Soggetto topico Protective coatings
Vapor-plating
Soggetto genere / forma Electronic books.
ISBN 1-118-94615-4
1-118-94618-9
1-118-94616-2
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Cover; Title Page; Copyright Page; Contents; Biography; Acknowledgements; Preface; 1 Introduction; 1.1 Packaging; 1.1.1 Opaque Barrier; 1.1.2 Transparent Barrier; 1.2 Markets; References; 2 Terminology; 2.1 Hansen Solubility Parameter; 2.2 Permeability Models; 2.3 Barrier Improvement Factor; 2.4 Tortuous Path Model; 2.5 Terminology Summary; References; 3 Measurements; 3.1 Permeation Measurements; 3.2 Durability Testing; 3.3 Adhesion; 3.4 Pinholes; 3.5 Surface Energy; 3.6 Coefficient of Friction; 3.7 Coating Thickness; 3.8 Coating Conductivity or Resistivity
3.9 Transmittance, Reflectance and Ellipseometry3.10 Standard Test Methods; 3.10.1 Permeability Tests; 3.10.2 Other Mechanical or Optical Performance Tests; References; 4 Materials; References; 5 Packaging Materials Calculations; 5.1 Demonstration Calculations; References; 6 Substrates, Surfaces, Quality and Defects; 6.1 Substrates; 6.1.1 Oligomers; 6.1.2 Additives; 6.1.3 Contamination; 6.1.4 Surface Quality; 6.2 Substrate Cleaning; 6.3 Substrate Plasma Treatments; 6.4 Wetting and Adhesion; 6.5 Subbing or Planarisation Layers and Over-Coatings; References; 7 Vacuum Deposition Processing
7.1 Nucleation, Growth and Modification7.2 Managing the Substrate Heat Load; 7.3 Web Winding in Vacuum; 7.4 Troubleshooting; References; 8 Vacuum Deposition; 8.1 Resistance Heated Evaporation; 8.2 Plasma Enhanced Chemical Vapour Deposition (PECVD); 8.3 Electron Beam Evaporation Sources; 8.4 Induction Heated Evaporation Source; 8.5 Magnetron Sputter Deposition Sources; 8.6 Atomic Layer Deposition (ALD); 8.7 Other Deposition Processes; References; 9 Summary; 9.1 Cleanliness; 9.2 Substrates; 9.3 Coatings; 9.4 Over Coatings; 9.5 Multilayers; 9.6 Conclusion; Index; EULA
Record Nr. UNINA-9910131623803321
Bishop Charles A.  
Salem, Massachusetts ; ; Hoboken, New Jersey : , : Scrivener Publishing : , : Wiley, , 2015
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Roll-to-roll vacuum deposition of barrier coatings / / Charles A. Bishop
Roll-to-roll vacuum deposition of barrier coatings / / Charles A. Bishop
Autore Bishop Charles A.
Edizione [2nd ed.]
Pubbl/distr/stampa Salem, Massachusetts ; ; Hoboken, New Jersey : , : Scrivener Publishing : , : Wiley, , 2015
Descrizione fisica 1 online resource (317 p.)
Disciplina 671.53
Collana Advances in Roll-to-Roll Vacuum Coatings Technology
Soggetto topico Protective coatings
Vapor-plating
ISBN 1-118-94615-4
1-118-94618-9
1-118-94616-2
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Cover; Title Page; Copyright Page; Contents; Biography; Acknowledgements; Preface; 1 Introduction; 1.1 Packaging; 1.1.1 Opaque Barrier; 1.1.2 Transparent Barrier; 1.2 Markets; References; 2 Terminology; 2.1 Hansen Solubility Parameter; 2.2 Permeability Models; 2.3 Barrier Improvement Factor; 2.4 Tortuous Path Model; 2.5 Terminology Summary; References; 3 Measurements; 3.1 Permeation Measurements; 3.2 Durability Testing; 3.3 Adhesion; 3.4 Pinholes; 3.5 Surface Energy; 3.6 Coefficient of Friction; 3.7 Coating Thickness; 3.8 Coating Conductivity or Resistivity
3.9 Transmittance, Reflectance and Ellipseometry3.10 Standard Test Methods; 3.10.1 Permeability Tests; 3.10.2 Other Mechanical or Optical Performance Tests; References; 4 Materials; References; 5 Packaging Materials Calculations; 5.1 Demonstration Calculations; References; 6 Substrates, Surfaces, Quality and Defects; 6.1 Substrates; 6.1.1 Oligomers; 6.1.2 Additives; 6.1.3 Contamination; 6.1.4 Surface Quality; 6.2 Substrate Cleaning; 6.3 Substrate Plasma Treatments; 6.4 Wetting and Adhesion; 6.5 Subbing or Planarisation Layers and Over-Coatings; References; 7 Vacuum Deposition Processing
7.1 Nucleation, Growth and Modification7.2 Managing the Substrate Heat Load; 7.3 Web Winding in Vacuum; 7.4 Troubleshooting; References; 8 Vacuum Deposition; 8.1 Resistance Heated Evaporation; 8.2 Plasma Enhanced Chemical Vapour Deposition (PECVD); 8.3 Electron Beam Evaporation Sources; 8.4 Induction Heated Evaporation Source; 8.5 Magnetron Sputter Deposition Sources; 8.6 Atomic Layer Deposition (ALD); 8.7 Other Deposition Processes; References; 9 Summary; 9.1 Cleanliness; 9.2 Substrates; 9.3 Coatings; 9.4 Over Coatings; 9.5 Multilayers; 9.6 Conclusion; Index; EULA
Record Nr. UNINA-9910830225203321
Bishop Charles A.  
Salem, Massachusetts ; ; Hoboken, New Jersey : , : Scrivener Publishing : , : Wiley, , 2015
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Roll-to-roll vacuum deposition of barrier coatings [[electronic resource] /] / Charles A. Bishop
Roll-to-roll vacuum deposition of barrier coatings [[electronic resource] /] / Charles A. Bishop
Autore Bishop Charles A
Pubbl/distr/stampa Salem, Mass., : Scrivener, 2010
Descrizione fisica 1 online resource (279 p.)
Disciplina 667.9
667/.9
Collana Wiley-Scrivener
Soggetto topico Vapor-plating
Coatings
ISBN 1-118-03180-6
1-282-70802-3
9786612708022
1-61344-164-9
0-470-87651-4
0-470-87652-2
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Roll-to-Roll Vacuum Deposition of Barrier Coatings; Contents; Preface; Acknowledgements; 1 Introduction; 2 Terminology; 3 Measurements; 4 Materials; 5 Substrates, Surfaces, Quality and Defects; 6 Vacuum Deposition Processing; 7 Vacuum deposition; 8 Summary; Index; Author Biography
Record Nr. UNISA-996206212203316
Bishop Charles A  
Salem, Mass., : Scrivener, 2010
Materiale a stampa
Lo trovi qui: Univ. di Salerno
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