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An introduction to ultrathin organic films : from Langmuir-Blodgett to self-assembly / Abraham Ulman
| An introduction to ultrathin organic films : from Langmuir-Blodgett to self-assembly / Abraham Ulman |
| Autore | Ulman, Abraham |
| Pubbl/distr/stampa | Boston : Academic Press, c1991 |
| Descrizione fisica | xxiii, 442 p. : ill. ; 24 cm |
| Disciplina | 530.4175 |
| Soggetto topico |
Monomolecular films
Organic compounds Surface chemistry Thin films - Surfaces |
| ISBN | 0127082301 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISALENTO-991003497059707536 |
Ulman, Abraham
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| Boston : Academic Press, c1991 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. del Salento | ||
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Magnetism of surfaces, interfaces, and nanoscale materials . Volume 5 / / edited by Robert E. Camley, Zbigniew Celinski, Robert L. Stamps
| Magnetism of surfaces, interfaces, and nanoscale materials . Volume 5 / / edited by Robert E. Camley, Zbigniew Celinski, Robert L. Stamps |
| Pubbl/distr/stampa | Amsterdam, Netherlands : , : Elsevier, , 2016 |
| Descrizione fisica | 1 online resource (478 p.) |
| Disciplina | 621.340287 |
| Collana | Handbook of Surface Science |
| Soggetto topico |
Magnetic materials - Testing
Thin films - Surfaces Interfaces (Physical sciences) |
| ISBN | 0-444-62639-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
""Front Cover""; ""Magnetism of Surfaces, Interfaces, and Nanoscale Materials""; ""Copyright""; ""Contents""; ""Contributors""; ""Preface""; ""Chapter 1: Growth and Characterization of Magnetic Thin Film and Nanostructures""; ""1. Introduction""; ""2. Thin-Film Growth""; ""2.1. Thermal and Electron Beam Evaporation""; ""2.2. Sputter Deposition""; ""2.2.1. DC Sputter Deposition""; ""2.2.2. RF Sputter Deposition""; ""2.2.3. Magnetron Sputter Deposition""; ""3. Characterization Techniques""; ""3.1. Surface Characterization""; ""3.1.1. Atomic Force Microscopy""
""3.1.2. Magnetic Force Microscopy""""3.2. Static Magnetic Characterization""; ""3.2.1. MOKE Spectroscopy""; ""3.2.2. Vibrating Sample Magnetometry""; ""3.3. Dynamic Magnetic Characterization""; ""3.3.1. FMR Spectroscopy""; ""3.3.2. BLS Spectroscopy""; ""4. Magnetic Nanostructures""; ""4.1. Lithography""; ""4.2. Pattern Transfer""; ""4.3. Practical Examples""; ""4.3.1. Planar Magnetic Nanostructures""; ""4.3.2. Thickness-Modulated Magnetic Nanostructures""; ""4.3.3. Bicomponent Magnetic Nanostructures""; ""5. Conclusion""; ""Acknowledgments""; ""References"" ""Chapter 2: Element-Specific Probes of Magnetism""""1. Introduction""; ""2. Fundamental Aspects of Optical Excitation""; ""2.1. Electronic States in Solids""; ""2.2. Spectroscopy of Core States""; ""2.3. X-Ray Photoemission Spectroscopy""; ""2.4. X-Ray Absorption Spectroscopy""; ""2.5. X-Ray Reflection Spectroscopy""; ""3. Spin-Sensitive Photoemission""; ""3.1. Core-Level Photoemission from Ferromagnets""; ""3.1.1. Spin Polarimeter Schemes""; ""3.1.2. 3s XPS""; ""3.1.3. 2p XPS""; ""3.2. Magnetic Dichroism in Photoemission""; ""3.2.1. Magnetic Circular Dichroism in Photoemission"" ""3.2.2. Role of Angular Selection in Photoemission""""4. Magnetic Dichroism in X-Ray Absorption""; ""4.1. Magnetic X-Ray Circular Dichroism""; ""4.2. Magnetic X-Ray Linear Dichroism""; ""4.3. Hybrid Systems""; ""5. Magnetic Resonant X-Ray Scattering""; ""5.1. Basic Aspects""; ""5.2. Complex Layered Structures""; ""5.3. Antiferromagnets""; ""6. Addressing Picosecond Magnetization Dynamics""; ""7. Ultrafast Demagnetization Dynamics""; ""8. Summary and Conclusions""; ""Acknowledgments""; ""References""; ""Chapter 3: Magnetization Dynamics""; ""1. Introduction""; ""2. Analytic Results"" ""2.1. Infinitely Extended Flat Plate: In-Plane Field""""2.2. Spin Waves Propagating Perpendicular to the Surface, Conducting Films""; ""2.3. Surface Modes for Spin Waves Propagating Parallel to the Film Surface""; ""2.4. Infinitely Extended Flat Plate-Perpendicular-to-Plane Magnetization""; ""2.5. Nanostructures""; ""2.6. Antiferromagnets""; ""3. Examples of Experimental Characterization of Ferromagnetic Samples""; ""4. FMR Techniques""; ""4.1. Magnetic Damping""; ""4.2. Broadband FMR-Frequency Swept""; ""4.3. Broadband FMR-Field Swept""; ""4.3.1. Multimode Cavity Configuration"" ""4.3.2. Coplanar Waveguide Configuration"" |
| Record Nr. | UNINA-9910797869003321 |
| Amsterdam, Netherlands : , : Elsevier, , 2016 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Magnetism of surfaces, interfaces, and nanoscale materials . Volume 5 / / edited by Robert E. Camley, Zbigniew Celinski, Robert L. Stamps
| Magnetism of surfaces, interfaces, and nanoscale materials . Volume 5 / / edited by Robert E. Camley, Zbigniew Celinski, Robert L. Stamps |
| Pubbl/distr/stampa | Amsterdam, Netherlands : , : Elsevier, , 2016 |
| Descrizione fisica | 1 online resource (478 p.) |
| Disciplina | 621.340287 |
| Collana | Handbook of Surface Science |
| Soggetto topico |
Magnetic materials - Testing
Thin films - Surfaces Interfaces (Physical sciences) |
| ISBN | 0-444-62639-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
""Front Cover""; ""Magnetism of Surfaces, Interfaces, and Nanoscale Materials""; ""Copyright""; ""Contents""; ""Contributors""; ""Preface""; ""Chapter 1: Growth and Characterization of Magnetic Thin Film and Nanostructures""; ""1. Introduction""; ""2. Thin-Film Growth""; ""2.1. Thermal and Electron Beam Evaporation""; ""2.2. Sputter Deposition""; ""2.2.1. DC Sputter Deposition""; ""2.2.2. RF Sputter Deposition""; ""2.2.3. Magnetron Sputter Deposition""; ""3. Characterization Techniques""; ""3.1. Surface Characterization""; ""3.1.1. Atomic Force Microscopy""
""3.1.2. Magnetic Force Microscopy""""3.2. Static Magnetic Characterization""; ""3.2.1. MOKE Spectroscopy""; ""3.2.2. Vibrating Sample Magnetometry""; ""3.3. Dynamic Magnetic Characterization""; ""3.3.1. FMR Spectroscopy""; ""3.3.2. BLS Spectroscopy""; ""4. Magnetic Nanostructures""; ""4.1. Lithography""; ""4.2. Pattern Transfer""; ""4.3. Practical Examples""; ""4.3.1. Planar Magnetic Nanostructures""; ""4.3.2. Thickness-Modulated Magnetic Nanostructures""; ""4.3.3. Bicomponent Magnetic Nanostructures""; ""5. Conclusion""; ""Acknowledgments""; ""References"" ""Chapter 2: Element-Specific Probes of Magnetism""""1. Introduction""; ""2. Fundamental Aspects of Optical Excitation""; ""2.1. Electronic States in Solids""; ""2.2. Spectroscopy of Core States""; ""2.3. X-Ray Photoemission Spectroscopy""; ""2.4. X-Ray Absorption Spectroscopy""; ""2.5. X-Ray Reflection Spectroscopy""; ""3. Spin-Sensitive Photoemission""; ""3.1. Core-Level Photoemission from Ferromagnets""; ""3.1.1. Spin Polarimeter Schemes""; ""3.1.2. 3s XPS""; ""3.1.3. 2p XPS""; ""3.2. Magnetic Dichroism in Photoemission""; ""3.2.1. Magnetic Circular Dichroism in Photoemission"" ""3.2.2. Role of Angular Selection in Photoemission""""4. Magnetic Dichroism in X-Ray Absorption""; ""4.1. Magnetic X-Ray Circular Dichroism""; ""4.2. Magnetic X-Ray Linear Dichroism""; ""4.3. Hybrid Systems""; ""5. Magnetic Resonant X-Ray Scattering""; ""5.1. Basic Aspects""; ""5.2. Complex Layered Structures""; ""5.3. Antiferromagnets""; ""6. Addressing Picosecond Magnetization Dynamics""; ""7. Ultrafast Demagnetization Dynamics""; ""8. Summary and Conclusions""; ""Acknowledgments""; ""References""; ""Chapter 3: Magnetization Dynamics""; ""1. Introduction""; ""2. Analytic Results"" ""2.1. Infinitely Extended Flat Plate: In-Plane Field""""2.2. Spin Waves Propagating Perpendicular to the Surface, Conducting Films""; ""2.3. Surface Modes for Spin Waves Propagating Parallel to the Film Surface""; ""2.4. Infinitely Extended Flat Plate-Perpendicular-to-Plane Magnetization""; ""2.5. Nanostructures""; ""2.6. Antiferromagnets""; ""3. Examples of Experimental Characterization of Ferromagnetic Samples""; ""4. FMR Techniques""; ""4.1. Magnetic Damping""; ""4.2. Broadband FMR-Frequency Swept""; ""4.3. Broadband FMR-Field Swept""; ""4.3.1. Multimode Cavity Configuration"" ""4.3.2. Coplanar Waveguide Configuration"" |
| Record Nr. | UNINA-9910811264703321 |
| Amsterdam, Netherlands : , : Elsevier, , 2016 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Nanoscale measurements of the surface photovoltage in Cu(In,Ga)Se2, Cu2ZnSn4, and Cu2ZnSnSe4 thin films [[electronic resource]] : : the role of the surface electronics on the efficiency of solar cells : preprint / / H. Du ... [and others]
| Nanoscale measurements of the surface photovoltage in Cu(In,Ga)Se2, Cu2ZnSn4, and Cu2ZnSnSe4 thin films [[electronic resource]] : : the role of the surface electronics on the efficiency of solar cells : preprint / / H. Du ... [and others] |
| Pubbl/distr/stampa | Golden, CO : , : National Renewable Energy Laboratory, , [2011] |
| Descrizione fisica | 1 online resource (4 pages) : illustrations |
| Altri autori (Persone) | DuHui |
| Collana | NREL/CP |
| Soggetto topico |
Photovoltaic power generation - Research
Solar cells - Research Thin films - Surfaces Scanning tunneling microscopy |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Altri titoli varianti | Nanoscale measurements of the surface photovoltage in Cu |
| Record Nr. | UNINA-9910700831503321 |
| Golden, CO : , : National Renewable Energy Laboratory, , [2011] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Nanoscale processes on insulating surfaces [[electronic resource] /] / Enrico Gnecco, Marek Szymonski
| Nanoscale processes on insulating surfaces [[electronic resource] /] / Enrico Gnecco, Marek Szymonski |
| Autore | Gnecco Enrico |
| Pubbl/distr/stampa | Singapore ; ; Hackensack, N.J., : World Scientific, c2009 |
| Descrizione fisica | 1 online resource (201 p.) |
| Disciplina | 530.4/275 |
| Altri autori (Persone) | SzymońskiMarek |
| Soggetto topico |
Scanning probe microscopy
Nanoelectronics Ionic crystals Thin films - Surfaces |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-282-75749-0
9786612757495 981-283-763-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Contents; About the authors; Preface; 1. Crystal Structures of Insulating Surfaces; 1.1 Halide Surfaces; 1.1.1 Alkali halide surfaces; 1.1.2 Alkaline earth halide surfaces; 1.2 Oxide Surfaces; 1.2.1 True insulating oxide surfaces; 1.2.1.1 Aluminum oxide; 1.2.1.2 Magnesium oxide; 1.2.1.3 Silicon dioxide; 1.2.2 Mixed conducting oxide surfaces; 1.2.2.1 Titanium dioxide; 1.2.2.2 Zinc oxide; 1.2.2.3 Tin dioxide; 1.2.2.4 Cerium dioxide; 1.2.2.5 Strontium titanate; 2. Preparation Techniques of Insulating Surfaces; 2.1 Ultra High Vacuum.; 2.2 Preparation of Bulk Insulating Surfaces
2.2.1 Halide surfaces2.2.2 Oxide surfaces; 2.2.3 Nanostructuring of insulating surfaces; 2.2.3.1 Evaporation spirals on alkali halides; 2.2.3.2 Faceting of halide and oxide surfaces; 2.3 Deposition of Insulating Films, Metals and Organic Molecules; 2.3.1 Thin insulating films; 2.3.2 Metal adsorbates on insulators; 2.3.3 Organic molecules on insulators; 3. Scanning Probe Microscopy in Ultra High Vacuum; 3.1 Atomic Force Microscopy; 3.1.1 Relevant forces in AFM; 3.1.2 Contact AFM; 3.1.3 Non-contact AFM; 3.1.3.1 Tuning fork sensors; 3.1.4 Kelvin probe force microscopy 3.2 Scanning Tunneling Microscopy 3.2.1 Scanning tunneling microscopy; 3.2.2 Scanning tunneling spectroscopy; 3.3 Atomistic Modeling of SPM; 4. Scanning Probe Microscopy on Bulk Insulating Surfaces; 4.1 Halide Surfaces; 4.1.1 Alkali halide surfaces; 4.1.2 Alkaline earth halide surfaces; 4.2 Oxide Surfaces; 4.2.1 True insulating oxide surfaces; 4.2.1.1 Aluminum oxide; 4.2.1.2 Magnesium oxide; 4.2.1.3 Silicon dioxide; 4.2.2 Mixed conducting oxide surfaces; 4.2.2.1 Titanium dioxide; 4.2.2.2 Zinc oxide; 4.2.2.3 Tin dioxide; 4.2.2.4 Cerium dioxide; 4.2.2.5 Strontium titanate 4.3 Modeling AFM on Bulk Insulating Surfaces4.3.1 Halide surfaces; 4.3.2 Oxide surfaces; 5. Scanning Probe Microscopy on Thin Insulating Films; 5.1 Halide Films on Metals; 5.1.1 Carpet-like growth.; 5.1.2 Restructuring and patterning of vicinal surfaces; 5.1.3 Fractal growth at low temperatures; 5.2 Halide Films on Semiconductors; 5.3 Heteroepitaxial Growth of Alkali Halide Films; 5.4 Oxide Films; 5.5 Modeling AFM on Thin Insulating Films; 6. Interaction of Ions, Electrons and Photons with Halide Surfaces; 6.1 Ion Bombardment of Alkali Halides; 6.2 Electron and Photon Stimulated Desorption 6.2.1 Electron stimulated desorption 6.2.2 Photon stimulated desorption; 6.2.2.1 Desorption by excitation at threshold energies; 6.2.2.2 Desorption due to band-band excitation; 7. Surface Patterning with Electrons and Photons; 7.1 Surface Topography Modification by Electronic Excitations; 7.1.1 Layer-by-layer desorption; 7.1.2 Coexcitation with visible light; 7.2 Nanoscale Pits on Alkali Halide Surfaces; 7.2.1 Diffusion equation for F-centers; 8. Surface Patterning with Ions; 8.1 Ripple Formation by Ion Bombardment; 8.1.1 Linear continuum theory for ripple formation 8.1.2 Beyond the continuum theory |
| Record Nr. | UNINA-9910455864303321 |
|
Gnecco Enrico
|
||
| Singapore ; ; Hackensack, N.J., : World Scientific, c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Nanoscale processes on insulating surfaces [[electronic resource] /] / Enrico Gnecco, Marek Szymonski
| Nanoscale processes on insulating surfaces [[electronic resource] /] / Enrico Gnecco, Marek Szymonski |
| Autore | Gnecco Enrico |
| Pubbl/distr/stampa | Singapore ; ; Hackensack, N.J., : World Scientific, c2009 |
| Descrizione fisica | 1 online resource (201 p.) |
| Disciplina | 530.4/275 |
| Altri autori (Persone) | SzymońskiMarek |
| Soggetto topico |
Scanning probe microscopy
Nanoelectronics Ionic crystals Thin films - Surfaces |
| ISBN |
1-282-75749-0
9786612757495 981-283-763-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Contents; About the authors; Preface; 1. Crystal Structures of Insulating Surfaces; 1.1 Halide Surfaces; 1.1.1 Alkali halide surfaces; 1.1.2 Alkaline earth halide surfaces; 1.2 Oxide Surfaces; 1.2.1 True insulating oxide surfaces; 1.2.1.1 Aluminum oxide; 1.2.1.2 Magnesium oxide; 1.2.1.3 Silicon dioxide; 1.2.2 Mixed conducting oxide surfaces; 1.2.2.1 Titanium dioxide; 1.2.2.2 Zinc oxide; 1.2.2.3 Tin dioxide; 1.2.2.4 Cerium dioxide; 1.2.2.5 Strontium titanate; 2. Preparation Techniques of Insulating Surfaces; 2.1 Ultra High Vacuum.; 2.2 Preparation of Bulk Insulating Surfaces
2.2.1 Halide surfaces2.2.2 Oxide surfaces; 2.2.3 Nanostructuring of insulating surfaces; 2.2.3.1 Evaporation spirals on alkali halides; 2.2.3.2 Faceting of halide and oxide surfaces; 2.3 Deposition of Insulating Films, Metals and Organic Molecules; 2.3.1 Thin insulating films; 2.3.2 Metal adsorbates on insulators; 2.3.3 Organic molecules on insulators; 3. Scanning Probe Microscopy in Ultra High Vacuum; 3.1 Atomic Force Microscopy; 3.1.1 Relevant forces in AFM; 3.1.2 Contact AFM; 3.1.3 Non-contact AFM; 3.1.3.1 Tuning fork sensors; 3.1.4 Kelvin probe force microscopy 3.2 Scanning Tunneling Microscopy 3.2.1 Scanning tunneling microscopy; 3.2.2 Scanning tunneling spectroscopy; 3.3 Atomistic Modeling of SPM; 4. Scanning Probe Microscopy on Bulk Insulating Surfaces; 4.1 Halide Surfaces; 4.1.1 Alkali halide surfaces; 4.1.2 Alkaline earth halide surfaces; 4.2 Oxide Surfaces; 4.2.1 True insulating oxide surfaces; 4.2.1.1 Aluminum oxide; 4.2.1.2 Magnesium oxide; 4.2.1.3 Silicon dioxide; 4.2.2 Mixed conducting oxide surfaces; 4.2.2.1 Titanium dioxide; 4.2.2.2 Zinc oxide; 4.2.2.3 Tin dioxide; 4.2.2.4 Cerium dioxide; 4.2.2.5 Strontium titanate 4.3 Modeling AFM on Bulk Insulating Surfaces4.3.1 Halide surfaces; 4.3.2 Oxide surfaces; 5. Scanning Probe Microscopy on Thin Insulating Films; 5.1 Halide Films on Metals; 5.1.1 Carpet-like growth.; 5.1.2 Restructuring and patterning of vicinal surfaces; 5.1.3 Fractal growth at low temperatures; 5.2 Halide Films on Semiconductors; 5.3 Heteroepitaxial Growth of Alkali Halide Films; 5.4 Oxide Films; 5.5 Modeling AFM on Thin Insulating Films; 6. Interaction of Ions, Electrons and Photons with Halide Surfaces; 6.1 Ion Bombardment of Alkali Halides; 6.2 Electron and Photon Stimulated Desorption 6.2.1 Electron stimulated desorption 6.2.2 Photon stimulated desorption; 6.2.2.1 Desorption by excitation at threshold energies; 6.2.2.2 Desorption due to band-band excitation; 7. Surface Patterning with Electrons and Photons; 7.1 Surface Topography Modification by Electronic Excitations; 7.1.1 Layer-by-layer desorption; 7.1.2 Coexcitation with visible light; 7.2 Nanoscale Pits on Alkali Halide Surfaces; 7.2.1 Diffusion equation for F-centers; 8. Surface Patterning with Ions; 8.1 Ripple Formation by Ion Bombardment; 8.1.1 Linear continuum theory for ripple formation 8.1.2 Beyond the continuum theory |
| Record Nr. | UNINA-9910780727703321 |
|
Gnecco Enrico
|
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| Singapore ; ; Hackensack, N.J., : World Scientific, c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Open-space microfluidics : concepts, implementations, applications / / edited by Emmanuel Delamarche and Govind V. Kaigala
| Open-space microfluidics : concepts, implementations, applications / / edited by Emmanuel Delamarche and Govind V. Kaigala |
| Autore | Delamarche Emmanuel |
| Edizione | [1st edition] |
| Pubbl/distr/stampa | Weinheim, Germany : , : Wiley-VCH, , 2018 |
| Descrizione fisica | 1 online resource (198 pages) : illustrations, tables |
| Disciplina | 532.05 |
| Soggetto topico |
Microfluidics
Materials science Thin films - Surfaces |
| Soggetto genere / forma | Electronic books. |
| ISBN |
3-527-69680-6
3-527-69679-2 3-527-69678-4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910270911003321 |
|
Delamarche Emmanuel
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| Weinheim, Germany : , : Wiley-VCH, , 2018 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Open-space microfluidics : concepts, implementations, applications / / edited by Emmanuel Delamarche and Govind V. Kaigala
| Open-space microfluidics : concepts, implementations, applications / / edited by Emmanuel Delamarche and Govind V. Kaigala |
| Autore | Delamarche Emmanuel |
| Edizione | [1st edition] |
| Pubbl/distr/stampa | Weinheim, Germany : , : Wiley-VCH, , 2018 |
| Descrizione fisica | 1 online resource (198 pages) : illustrations, tables |
| Disciplina | 532.05 |
| Soggetto topico |
Microfluidics
Materials science Thin films - Surfaces |
| ISBN |
3-527-69680-6
3-527-69679-2 3-527-69678-4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910831096503321 |
|
Delamarche Emmanuel
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| Weinheim, Germany : , : Wiley-VCH, , 2018 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Principles of plasma discharges and materials processing [[electronic resource] /] / Michael A. Lieberman, Allan J. Lichtenberg
| Principles of plasma discharges and materials processing [[electronic resource] /] / Michael A. Lieberman, Allan J. Lichtenberg |
| Autore | Lieberman M. A (Michael A.) |
| Edizione | [2nd ed.] |
| Pubbl/distr/stampa | Hoboken, N.J., : Wiley-Interscience, c2005 |
| Descrizione fisica | 1 online resource (795 p.) |
| Disciplina |
530.4/4
530.44 |
| Altri autori (Persone) | LichtenbergAllan J |
| Soggetto topico |
Plasma dynamics
Thin films - Surfaces Plasma etching Plasma chemistry - Industrial applications |
| ISBN |
1-280-25507-2
9786610255078 0-470-36189-1 0-471-72425-4 0-471-72424-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING; CONTENTS; PREFACE; PREFACE TO THE FIRST EDITION; SYMBOLS AND ABBREVIATIONS; PHYSICAL CONSTANTS AND CONVERSION FACTORS; PRACTICAL FORMULAE; 1 INTRODUCTION; 1.1 Materials Processing; 1.2 Plasmas and Sheaths; Plasmas; Sheaths; 1.3 Discharges; Radio Frequency Diodes; High-Density Sources; 1.4 Symbols and Units; 2 BASIC PLASMA EQUATIONS AND EQUILIBRIUM; 2.1 Introduction; 2.2 Field Equations, Current, and Voltage; Maxwell's Equations; 2.3 The Conservation Equations; Boltzmann's Equation; Macroscopic Quantities; Particle Conservation
Momentum ConservationEnergy Conservation; Summary; 2.4 Equilibrium Properties; Boltzmann's Relation; Debye Length; Quasi-neutrality; Problems; 3 ATOMIC COLLISIONS; 3.1 Basic Concepts; Elastic and Inelastic Collisions; Collision Parameters; Differential Scattering Cross Section; 3.2 Collision Dynamics; Center-of-Mass Coordinates; Energy Transfer; Small Angle Scattering; 3.3 Elastic Scattering; Coulomb Collisions; Polarization Scattering; 3.4 Inelastic Collisions; Atomic Energy Levels; Electric Dipole Radiation and Metastable Atoms; Electron Ionization Cross Section Electron Excitation Cross SectionIon-Atom Charge Transfer; Ion-Atom Ionization; 3.5 Averaging Over Distributions and Surface Effects; Averaging Over a Maxwellian Distribution; Energy Loss per Electron-Ion Pair Created; Surface Effects; Problems; 4 PLASMA DYNAMICS; 4.1 Basic Motions; Motion in Constant Fields; E x B Drifts; Energy Conservation; 4.2 Nonmagnetized Plasma Dynamics; Plasma Oscillations; Dielectric Constant and Conductivity; Ohmic Heating; Electromagnetic Waves; Electrostatic Waves; 4.3 Guiding Center Motion; Parallel Force; Adiabatic Constancy of the Magnetic Moment Drift Due to Motion Along Field Lines (Curvature Drift)Drift Due to Gyration (Gradient Drift); Polarization Drift; 4.4 Dynamics of Magnetized Plasmas; Dielectric Tensor; The Wave Dispersion; 4.5 Waves in Magnetized Plasmas; Principal Electron Waves; Principal Waves Including Ion Dynamics; The CMA Diagram; 4.6 Wave Diagnostics; Interferometer; Cavity Perturbation; Wave Propagation; Problems; 5 DIFFUSION AND TRANSPORT; 5.1 Basic Relations; Diffusion and Mobility; Free Diffusion; Ambipolar Diffusion; 5.2 Diffusion Solutions; Boundary Conditions; Time-Dependent Solution Steady-State Plane-Parallel SolutionsSteady-State Cylindrical Solutions; 5.3 Low-Pressure Solutions; Variable Mobility Model; Langmuir Solution; Heuristic Solutions; 5.4 Diffusion Across a Magnetic Field; Ambipolar Diffusion; 5.5 Magnetic Multipole Confinement; Magnetic Fields; Plasma Confinement; Leak Width w; Problems; 6 DIRECT CURRENT (DC) SHEATHS; 6.1 Basic Concepts and Equations; The Collisionless Sheath; 6.2 The Bohm Sheath Criterion; Plasma Requirements; The Presheath; Sheath Potential at a Floating Wall; Collisional Sheaths; Simulation Results; 6.3 The High-Voltage Sheath Matrix Sheath |
| Record Nr. | UNINA-9910143579503321 |
|
Lieberman M. A (Michael A.)
|
||
| Hoboken, N.J., : Wiley-Interscience, c2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Principles of plasma discharges and materials processing [[electronic resource] /] / Michael A. Lieberman, Allan J. Lichtenberg
| Principles of plasma discharges and materials processing [[electronic resource] /] / Michael A. Lieberman, Allan J. Lichtenberg |
| Autore | Lieberman M. A (Michael A.) |
| Edizione | [2nd ed.] |
| Pubbl/distr/stampa | Hoboken, N.J., : Wiley-Interscience, c2005 |
| Descrizione fisica | 1 online resource (795 p.) |
| Disciplina |
530.4/4
530.44 |
| Altri autori (Persone) | LichtenbergAllan J |
| Soggetto topico |
Plasma dynamics
Thin films - Surfaces Plasma etching Plasma chemistry - Industrial applications |
| ISBN |
1-280-25507-2
9786610255078 0-470-36189-1 0-471-72425-4 0-471-72424-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING; CONTENTS; PREFACE; PREFACE TO THE FIRST EDITION; SYMBOLS AND ABBREVIATIONS; PHYSICAL CONSTANTS AND CONVERSION FACTORS; PRACTICAL FORMULAE; 1 INTRODUCTION; 1.1 Materials Processing; 1.2 Plasmas and Sheaths; Plasmas; Sheaths; 1.3 Discharges; Radio Frequency Diodes; High-Density Sources; 1.4 Symbols and Units; 2 BASIC PLASMA EQUATIONS AND EQUILIBRIUM; 2.1 Introduction; 2.2 Field Equations, Current, and Voltage; Maxwell's Equations; 2.3 The Conservation Equations; Boltzmann's Equation; Macroscopic Quantities; Particle Conservation
Momentum ConservationEnergy Conservation; Summary; 2.4 Equilibrium Properties; Boltzmann's Relation; Debye Length; Quasi-neutrality; Problems; 3 ATOMIC COLLISIONS; 3.1 Basic Concepts; Elastic and Inelastic Collisions; Collision Parameters; Differential Scattering Cross Section; 3.2 Collision Dynamics; Center-of-Mass Coordinates; Energy Transfer; Small Angle Scattering; 3.3 Elastic Scattering; Coulomb Collisions; Polarization Scattering; 3.4 Inelastic Collisions; Atomic Energy Levels; Electric Dipole Radiation and Metastable Atoms; Electron Ionization Cross Section Electron Excitation Cross SectionIon-Atom Charge Transfer; Ion-Atom Ionization; 3.5 Averaging Over Distributions and Surface Effects; Averaging Over a Maxwellian Distribution; Energy Loss per Electron-Ion Pair Created; Surface Effects; Problems; 4 PLASMA DYNAMICS; 4.1 Basic Motions; Motion in Constant Fields; E x B Drifts; Energy Conservation; 4.2 Nonmagnetized Plasma Dynamics; Plasma Oscillations; Dielectric Constant and Conductivity; Ohmic Heating; Electromagnetic Waves; Electrostatic Waves; 4.3 Guiding Center Motion; Parallel Force; Adiabatic Constancy of the Magnetic Moment Drift Due to Motion Along Field Lines (Curvature Drift)Drift Due to Gyration (Gradient Drift); Polarization Drift; 4.4 Dynamics of Magnetized Plasmas; Dielectric Tensor; The Wave Dispersion; 4.5 Waves in Magnetized Plasmas; Principal Electron Waves; Principal Waves Including Ion Dynamics; The CMA Diagram; 4.6 Wave Diagnostics; Interferometer; Cavity Perturbation; Wave Propagation; Problems; 5 DIFFUSION AND TRANSPORT; 5.1 Basic Relations; Diffusion and Mobility; Free Diffusion; Ambipolar Diffusion; 5.2 Diffusion Solutions; Boundary Conditions; Time-Dependent Solution Steady-State Plane-Parallel SolutionsSteady-State Cylindrical Solutions; 5.3 Low-Pressure Solutions; Variable Mobility Model; Langmuir Solution; Heuristic Solutions; 5.4 Diffusion Across a Magnetic Field; Ambipolar Diffusion; 5.5 Magnetic Multipole Confinement; Magnetic Fields; Plasma Confinement; Leak Width w; Problems; 6 DIRECT CURRENT (DC) SHEATHS; 6.1 Basic Concepts and Equations; The Collisionless Sheath; 6.2 The Bohm Sheath Criterion; Plasma Requirements; The Presheath; Sheath Potential at a Floating Wall; Collisional Sheaths; Simulation Results; 6.3 The High-Voltage Sheath Matrix Sheath |
| Record Nr. | UNINA-9910830941803321 |
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Lieberman M. A (Michael A.)
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| Hoboken, N.J., : Wiley-Interscience, c2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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