Info
- Utilizzare la checkbox di selezione a fianco di ciascun documento per attivare le funzionalità di stampa, invio email, download nei formati disponibili del (i) record.
Developments in surface contamination and cleaning : methods for surface cleaning / / edited by Rajiv Kohli and K. L. Mittal
| Developments in surface contamination and cleaning : methods for surface cleaning / / edited by Rajiv Kohli and K. L. Mittal |
| Autore | Kohli Rajiv |
| Edizione | [1st edition] |
| Pubbl/distr/stampa | Amsterdam, [Netherlands] : , : William Andrew, , 2017 |
| Descrizione fisica | 1 online resource (214 pages) : illustrations (some color), graphs |
| Disciplina | 620.44 |
| Collana | Developments in Surface Contamination and Cleaning Series |
| Soggetto topico |
Surfaces (Technology) - Inspection
Surface contamination - Prevention Particles - Measurement |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910583329203321 |
Kohli Rajiv
|
||
| Amsterdam, [Netherlands] : , : William Andrew, , 2017 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Developments in surface contamination and cleaning . Volume five Contaminant removal and monitoring / / edited by Rajiv Kohli and K.L. Mittal
| Developments in surface contamination and cleaning . Volume five Contaminant removal and monitoring / / edited by Rajiv Kohli and K.L. Mittal |
| Pubbl/distr/stampa | Amsterdam, : Elsevier, 2013 |
| Descrizione fisica | 1 online resource (241 p.) |
| Disciplina |
620.44
660.6 |
| Altri autori (Persone) |
KohliRajiv
MittalK. L |
| Soggetto topico |
Surfaces (Technology) - Inspection
Surface contamination - Prevention Particles - Measurement |
| ISBN |
1-283-61976-8
9786613932211 1-4377-7882-8 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Developments in Surface Contamination and Cleaning: Contaminant Removal and Monitoring; Copyright; Contents; Preface; About the Editors; Contributors; Chapter 1 - Surface Contamination Removal Using Dense-Phase Fluids: Liquid and Supercritical Carbon Dioxide; 1. INTRODUCTION; 2. SURFACE CLEANLINESS LEVELS; 4. PRINCIPLES OF DENSE-PHASE CO2 CLEANING; 5. ADVANTAGES AND DISADVANTAGES OF DENSE-PHASE CO2 CLEANING; 6. APPLICATIONS; 7. SUMMARY AND CONCLUSIONS; ACKNOWLEDGMENT; DISCLAIMER; REFERENCES
Chapter 2 - Plasma Cleaning for Electronic, Photonic, Biological, and Archeological Applications1. INTRODUCTION; 2. PLASMA REACTOR CONFIGURATIONS; 3. SEMICONDUCTOR MANUFACTURING; 4. PHOTOVOLTAIC CELL PROCESSING; 5. PLASMA STERILIZATION; 6. PLASMA CLEANING IN THE RESTORATION INDUSTRY; 7. PLASMA CLEANING APPLICATIONS IN ELECTRON MICROSCOPY; 8. ADDITIONAL PLASMA APPLICATIONS; 9. SUMMARY AND FUTURE NEEDS; REFERENCES; Chapter 3 - Clean Room Wipers for Removal of Surface Contamination; 1. PRINCIPLES OF WIPING FOR REMOVAL OF CONTAMINANTS; 2. TYPES OF WIPERS; 3. WIPER TESTING 4. METHODS TO ASSESS WIPER QUALITY5. THE IMPORTANCE OF AUTOMATION; 6. APPLICATIONS; 7. CURRENT TRENDS IN WIPER TECHNOLOGY; 8. FUTURE DEVELOPMENTS IN CLEAN ROOM WIPERS; REFERENCES; Chapter 4 - Impact of Microbial Surface Contamination and Effective Environment Monitoring System in Pharmaceutical Manufacturing; 1. INTRODUCTION; 2. IMPACT OF MICROORGANISMS IN THE ENVIRONMENT; 3. SANITIZATION; 4. ENVIRONMENTAL MONITORING; 5. ENVIRONMENTAL CONTAMINATION CONTROL; 6. FUTURE DEVELOPMENTAL REQUIREMENTS; REFERENCES Chapter 5 - Neutron Holography as a Technique for Probing Local Atomic Structures on the Nanoscale1. INTRODUCTION; 2. BASIC CONCEPTS; 3. EXPERIMENTAL REQUIREMENTS; 4. EXAMPLES; 5. OUTLOOK; REFERENCES; Index |
| Record Nr. | UNINA-9911006548403321 |
| Amsterdam, : Elsevier, 2013 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Developments in surface contamination and cleaning . Volume four Detection, characterization, and analysis of contaminants / / edited by Rajiv Kohli and K.L. Mittal
| Developments in surface contamination and cleaning . Volume four Detection, characterization, and analysis of contaminants / / edited by Rajiv Kohli and K.L. Mittal |
| Edizione | [1st ed.] |
| Pubbl/distr/stampa | Amsterdam, : William Andrew, 2012 |
| Descrizione fisica | 1 online resource (361 p.) |
| Disciplina | 620.44 |
| Altri autori (Persone) |
KohliRajiv
MittalK. L |
| Soggetto topico |
Surfaces (Technology) - Inspection
Surface contamination - Prevention Cleaning Coatings Dust control |
| ISBN |
1-283-29379-X
9786613293794 1-4377-7884-4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Developments in Surface Contamination and Cleaning; Copyright; Contents; Preface; About the Editors; Contributors; Chapter 1 - Basics and Sampling of Particles for Size Analysis and Identification; 1.Introduction and basics; 2.Sampling; 3.Solvents and solubility parameters; 4.Cleanroom airflows and their consideration in contamination sampling; 5.Summary; References; Chapter 2 - Computational Fluid Dynamics of Particle Transport and Deposition; 1 Introduction; 2 Formulation; 3 Applications; 4 Conclusions; Acknowledgments; References
Chapter 3 - Methods for Monitoring and Measuring Cleanliness of Surfaces1 Introduction; 2 Types of Contaminants; 3 Product Cleanliness Levels; 4 Methods for Monitoring Surface Cleanliness; 5 Summary; Disclaimer; Acknowledgment; References; Chapter 4 - Size Analysis and Identification of Particles; 1 Introduction; 2 Particle Identification; 3 Summary; References; Chapter 5 - Developments in Imaging and Analysis Techniques for Micro- and Nanosize Particles and Surface Features; 1 Introduction; 2 Impact of Contaminants; 3 Nature and Size of Particles 4 Recent Developments in Characterization Techniques5 Miscellaneous Innovative Applications of Characterization Methods; 6 Summary; Disclaimer; References; Chapter 6 - Atomic Force Microscopy for Characterization of Surfaces, Particles, and Their Interactions; 1 Introduction; 2 AFM - Modes of Operation; 3 Adhesion Forces; 4 Application of AFM; 5 Summary; References; Index |
| Record Nr. | UNINA-9911004850103321 |
| Amsterdam, : William Andrew, 2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Developments in surface contamination and cleaning [[electronic resource] ] : fundamentals and applied aspects . Volume 2 Particle deposition, control and removal / / edited by Rajiv Kohli and Kashmiri L. Mittal
| Developments in surface contamination and cleaning [[electronic resource] ] : fundamentals and applied aspects . Volume 2 Particle deposition, control and removal / / edited by Rajiv Kohli and Kashmiri L. Mittal |
| Pubbl/distr/stampa | Amsterdam, : Elsevier, c2010 |
| Descrizione fisica | 1 online resource (311 p.) |
| Disciplina | 620.44 |
| Altri autori (Persone) |
KohliRajiv <1947->
MittalK. L. <1945-> |
| Soggetto topico |
Cleaning
Coatings Dust control Particles - Measurement Surface contamination - Prevention Surfaces (Technology) |
| ISBN |
1-282-73820-8
9786612738203 1-4377-7831-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Developments in Surface Contaminationand Cleaning; Copyright; Contents; Preface; About the Editors; Contributors; Chapter 1Particle Deposition onto Enclosure Surfaces; 1. INTRODUCTION; 2. BACKGROUND; 3. MECHANISMS OF PARTICLE TRANSPORT; 4. PARAMETERS FOR PARTICLE DEPOSITIONCHARACTERIZATION; 5. METHODS FOR MEASUREMENT OF PARTICLE DEPOSITION; 6. REVIEW OF EXPERIMENTAL STUDIES; 7. MODELING PARTICLE DEPOSITION AND THEEXPERIMENTAL VALIDATIONS; 8. SUMMARY; ACKNOWLEDGEMENTS; REFERENCES; Chapter 2Contamination Control: A Systems Approach; 1. INTRODUCTION; 2. A SYSTEMS APPROACH
3. EFFECT OF CONTAMINATION CONTROL MEASURES ONRPN SCORES4. PITFALLS; 5. CONCLUSIONS; ACKNOWLEDGEMENTS; REFERENCES; Chapter 3Particles in Semiconductor Processing; 1. INTRODUCTION; 2. THEORY; 3. PARTICLE REMOVAL STUDY; 4. CONCLUSIONS; ACKNOWLEDGEMENTS; REFERENCES; Chapter 4Continuous Contamination Monitoring Systems; 1. INTRODUCTION; 2. CASE STUDIES OF TRADITIONAL VERSUS CRITICAL ANDBUSY SAMPLING FOR AIRBORNE PARTICLE COUNTS; 3. IN SITU PARTICLE MONITORING OF CLEANINGEQUIPMENT; 4. WHAT TO CONTINUOUSLY MONITOR IN HIGHTECHNOLOGYMANUFACTURING; REFERENCES Chapter 5Strippable Coatings for Removal of Surface Contaminants1. INTRODUCTION; 2. COATING DESCRIPTION; 3. TYPES OF STRIPPABLE COATINGS; 4. ISSUES WITH STRIPPABLE COATINGS; 5. PRECISION CLEANING APPLICATIONS; 6. SUMMARY; ACKNOWLEDGEMENTS; DISCLAIMER; REFERENCES; Chapter 6Ultrasonic Cleaning; 1. INTRODUCTION; 2. ULTRASONIC CLEANING; 3. PRINCIPLES OF ULTRASONIC CLEANING; 4. SURFACE CLEANLINESS MEASUREMENT; 5. THEORY OF ULTRASONIC CLEANING; 6. EXPERIMENTS IN SONIC CLEANING; 7. CLEANING OPTIMIZATION; ACKNOWLEDGEMENTS; REFERENCES; Index; ColorPlates |
| Altri titoli varianti | Particle deposition, control and removal |
| Record Nr. | UNINA-9911004777503321 |
| Amsterdam, : Elsevier, c2010 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Developments in surface contamination and cleaning : fundamentals and applied aspects / / edited by Rajiv Kohli and K.L. Mittal
| Developments in surface contamination and cleaning : fundamentals and applied aspects / / edited by Rajiv Kohli and K.L. Mittal |
| Pubbl/distr/stampa | Norwich, NY, U.S.A., : W. Andrew Pub., c2008 |
| Descrizione fisica | 1 online resource (1209 p.) |
| Disciplina | 620/.44 |
| Altri autori (Persone) |
KohliRajiv <1947->
MittalK. L. <1945-> |
| Soggetto topico |
Surfaces (Technology) - Inspection
Surface contamination - Prevention Particles - Measurement Cleaning Coatings Dust control |
| ISBN |
9786612737787
1-282-73778-3 1-282-01380-7 9786612013805 0-8155-1685-1 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Developments in Surface Contamination and Cleaning: Fundamentals and Applied Aspects; Copyright Page; Contents; Introduction; PART I: FUNDAMENTALS; Chapter 1. The Physical Nature of Very, Very Small Particles and its Impact on Their Behavior; 1.1 Introduction; 1.2 The Spectrum of Aerosol Particle Sizes; 1.3 Atoms and Molecules-Concepts and Dimensions; 1.4 The Model of a Gas; 1.5 Particles and Gas Molecules; 1.6 Particle Interactions; 1.7 Nanoparticles as Molecular Clusters; 1.8 An Interaction Model for Nanometer-Sized Particles; 1.9 Concluding Remarks; Acknowledgements
ReferencesChapter 2. Elucidating the Fundamental Interactions of Very Small Particles: Ultrafast Science; 2.1 Introduction; 2.2 Techniques for the Generation of Ultrashort Pulses; 2.3 Dynamics of Atoms and Molecules in Strong Fields; 2.4 Bond-breaking in Single Molecules; 2.5 Controlling Molecular Populations and Chemical Reactions by Ultrafast Pulses; 2.6 Polyatomic Molecules and Nonadiabatic Processes; 2.7 Recent Results in Ultrafast Crystallography: UED and Time-resolved X-rays; 2.8 New Nonlinear Optical Techniques for Probing Surfaces: Surface Second-harmonic and Sum-frequency Generation 2.9 SummaryReferences; Chapter 3. Transport and Deposition of Aerosol Particles; 3.1 Introduction; 3.2 Noncontinuum Considerations; 3.3 Lagrangian Particle Equation of Motion; 3.4 Inertial Effects; 3.5 Drift Velocity; 3.6 Eulerian Formulation; 3.7 Particle Transport and Deposition in a Parallel Plate Reactor; 3.8 Inertia-Enhanced Deposition; 3.9 Chapter Summary and Practical Guidelines; References; Chapter 4. Relevance of Particle Transport in Surface Deposition and Cleaning; 4.1 Introduction; 4.2 Particle-solid Surface Interactions; 4.3 Dry Deposition 4.4 Thermophoresis and Its Relevance in Surface Cleaning4.5 Electrostatic Force and Its Relevance in Surface Cleaning; 4.6 Dielectrophoresis and Its Relevance in Surface Cleaning; 4.7 Abrasive Erosion and Its Relevance in Surface Cleaning; 4.8 Summary; References; Chapter 5. Tribological Implication of Particles; 5.1 Introduction; 5.2 The Micro-Site for Generation of Wear Particles; 5.3 Wear Modes and Particles; 5.4 Wear Rate and Number of Generated Wear Particles; 5.5 The Size Distribution of Wear Particles; 5.6 Concluding Remarks; Acknowledgement; References Chapter 6. Airborne Molecular Contamination: Contamination on Substrates and the Environment in Semiconductors and Other Industries6.1 Introduction; 6.2 Definitions, Types and Sources of AMCs; 6.3 Analysis Methods; 6.4 Nature of Airborne Molecular Contamination and Its Effects; 6.5 Examples of Application of Knowledge and Technology; 6.6 Future Directions; 6.7 Summary of the Chapter; Acknowledgements; References; Chapter 7. Aspects of Particle Adhesion and Removal; 7.1 Introduction; 7.2 Interactions Giving Rise to Particle Adhesion; 7.3 Mechanics of Particle Adhesion 7.4 Factors Affecting Particle Adhesion |
| Record Nr. | UNINA-9911006819203321 |
| Norwich, NY, U.S.A., : W. Andrew Pub., c2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Methods for removal of particle contaminants / / edited by Rajiv Kohli and K.L. Mittal
| Methods for removal of particle contaminants / / edited by Rajiv Kohli and K.L. Mittal |
| Edizione | [1st ed.] |
| Pubbl/distr/stampa | Oxford [U.K.] ; ; Burlington, Mass., : William Andrew, an imprint of Elsevier, 2011 |
| Descrizione fisica | 1 online resource (259 p.) |
| Disciplina | 620/.44 |
| Altri autori (Persone) |
KohliRajiv
MittalK. L |
| Collana | Developments in surface contamination and cleaning |
| Soggetto topico |
Surfaces (Technology) - Inspection
Surface contamination - Prevention Particles - Measurement |
| ISBN | 1-4377-7886-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Developments in Surface Contamination and Cleaning; Copyright; Contents; Preface; About the Editors; Contributors; Chapter 1 - Supersonic Nano-Particle Beam Technique for Removing Nano-Sized Contaminant Particles from Surfaces; 1.Introduction; 2.Theoretical Background; 3.Supersonic Nozzle Beam Technique; 4.Electrospray Technique; 5.Summary; Acknowledgment; References; Chapter 2 -Megasonic Cleaning; 1.Introduction; 2.Cleaning Mechanism; 3.Theory of Megasonic Cleaning; 4.Surface Cleanliness Measurement; 5.Megasonic System Evaluation in the Laboratory and in Industry
6.Industry Case Studies7.Concluding Remarks; References; Chapter 3 - Laser Cleaning for Removal of Nano/Micro-Scale Particles and Film Contamination; 1.Introduction; 2.Dry Particle Removal Technique Requirements; 3.Laser Cleaning Techniques; 4.Future Directions in Laser Particle Removal Research; 5.Conclusions and Remarks; Acknowledgments; References; Chapter 4 -Non-Aqueous Interior Surface Cleaning Using Projectiles; 1.Introduction; 2.Types of Contamination; 3.Effects of Contamination; 4.Fluid Cleanliness Levels; 5.Tube Cleaning Methods; 6.Non-Aqueous Projectile Cleaning Method; 7.Summary AcknowkledgmentDisclaimer; References; Chapter 5 -Electrostatic Removal of Particles and its Applications to Self-Cleaning Solar Panels and Solar Concentrators; 1.Introduction; 2.Solar Power Potential and the Global Energy Needs; 3.Atmospheric Dust and Its Deposition on Solar Panel; 4.Loss of PV Output Power Caused by Dust Deposition; 5.Electrostatic Charging of Dust Particles; 6.Dust Deposition Process: Effects of Size and Charge Distributions; 7.Transmission Loss Due to Atmospheric Dust; 8.Experimental Studies on Solar Panel Obscuration by Dust Deposition 9.Effect of Microstructural Deposition Pattern: Particle Size, Shape, and Electrostatic Charge Distributions10.Removal of Dust From Solar Panels Using Low-Power Electrodynamic Screens; 11.Trajectories of Charged Particles on the Electrodynamic Screen; 12.Dielectrophoretic Force; 13.Tribocharging of Particles; 14.Removal of Uncharged Conducting Particles; 15.High-Voltage Three-Phase Power Supply for the Electrodynamic Screen; 16.Testing of the Electrodynamic Screen; 17.Measurement of Maximum Power Point Operation of the PV System With EDS 18.Testing the Solar Panels Integrated With EDS for Maximum Power Point Operation19.Results; 20.Summary and Conclusions; Acknowledgments; References; Chapter 6 -Alternate Semi-Aqueous Precision Cleaning Techniques: Steam Cleaning and Supersonic Gas/Liquid Cleaning Systems; 1.Introduction; 2.Precision Steam Cleaning; 3.Supersonic Gas-Liquid Cleaning; 4.Summary; Acknowledgments; Disclaimer; References; Index |
| Record Nr. | UNINA-9911006820903321 |
| Oxford [U.K.] ; ; Burlington, Mass., : William Andrew, an imprint of Elsevier, 2011 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
