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ANSI N323B-2003 : American National Standard for Radiation Protection Instrumentation Test and Calibration, Portable Survey Instrumentation for Near Background Operation / / Institute of Electrical and Electronics Engineers (IEEE)
| ANSI N323B-2003 : American National Standard for Radiation Protection Instrumentation Test and Calibration, Portable Survey Instrumentation for Near Background Operation / / Institute of Electrical and Electronics Engineers (IEEE) |
| Pubbl/distr/stampa | New York : , : Institute of Electrical and Electronics Engineers (IEEE), , 2004 |
| Descrizione fisica | 1 online resource (vii, 29 pages) : illustrations |
| Disciplina | 539.77 |
| Soggetto topico |
Radioactivity - Measurement
Radiation - Safety measures Surface contamination Radioactivity - Instruments - Standards |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Altri titoli varianti | ANSI N323B-2003 |
| Record Nr. | UNISA-996279884603316 |
| New York : , : Institute of Electrical and Electronics Engineers (IEEE), , 2004 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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ANSI N323B-2003 : American National Standard for Radiation Protection Instrumentation Test and Calibration, Portable Survey Instrumentation for Near Background Operation / / Institute of Electrical and Electronics Engineers (IEEE)
| ANSI N323B-2003 : American National Standard for Radiation Protection Instrumentation Test and Calibration, Portable Survey Instrumentation for Near Background Operation / / Institute of Electrical and Electronics Engineers (IEEE) |
| Pubbl/distr/stampa | New York : , : Institute of Electrical and Electronics Engineers (IEEE), , 2004 |
| Descrizione fisica | 1 online resource (vii, 29 pages) : illustrations |
| Disciplina | 539.77 |
| Soggetto topico |
Radioactivity - Measurement
Radiation - Safety measures Surface contamination Radioactivity - Instruments - Standards |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Altri titoli varianti | ANSI N323B-2003 |
| Record Nr. | UNINA-9910147245103321 |
| New York : , : Institute of Electrical and Electronics Engineers (IEEE), , 2004 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Evaluation of sporicidal wipes and liquid agents for decontamination of anthrax-contaminated surfaces by robotic cleaners
| Evaluation of sporicidal wipes and liquid agents for decontamination of anthrax-contaminated surfaces by robotic cleaners |
| Pubbl/distr/stampa | Research Triangle Park, NC : , : National Homeland Security Research Center, Office of Research and Development, U.S. Environmental Protection Agency, , July 2016 |
| Descrizione fisica | 1 online resource (49 unnumbered pages) : color illustrations |
| Soggetto topico |
Bacillus anthracis - Decontamination
Surface contamination Cleaning compounds - Evaluation Cleaning machinery and appliances - Evaluation Robots, Industrial - Evaluation |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910707306003321 |
| Research Triangle Park, NC : , : National Homeland Security Research Center, Office of Research and Development, U.S. Environmental Protection Agency, , July 2016 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Measured degree of infrared polarization for a variety of thermal emitting surfaces [[electronic resource] /] / by Kristan P. Gurton, Rachid Dahmani, and Gordon Videen
| Measured degree of infrared polarization for a variety of thermal emitting surfaces [[electronic resource] /] / by Kristan P. Gurton, Rachid Dahmani, and Gordon Videen |
| Autore | Gurton Kristan P |
| Pubbl/distr/stampa | Adelphi, MD : , : Army Research Laboratory, , [2004] |
| Descrizione fisica | 1 online resource (vi, 26 pages) : color illustrations |
| Altri autori (Persone) |
DahmaniRachid
VideenGordon |
| Collana | ARL-TR |
| Soggetto topico |
Surface roughness
Surface contamination |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910697173103321 |
Gurton Kristan P
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| Adelphi, MD : , : Army Research Laboratory, , [2004] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Surface contamination and cleaning . Volume 1 / / edited by Kash L. Mittal
| Surface contamination and cleaning . Volume 1 / / edited by Kash L. Mittal |
| Edizione | [First edition.] |
| Pubbl/distr/stampa | Boca Raton, FL : , : CRC Press, an imprint of Taylor and Francis, , 2003 |
| Descrizione fisica | 1 online resource (373 p.) |
| Disciplina | 620/.44 |
| Soggetto topico | Surface contamination |
| Soggetto genere / forma | Electronic books. |
| ISBN |
0-429-08796-9
1-280-46543-3 9786610465439 1-4175-7784-3 90-474-0328-2 1-60119-232-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Contents; Preface; Mapping of surface contaminants by tunable infrared-laser imaging; Monitoring cleanliness and defining acceptable cleanliness levels; Tracking surface ionic contamination by ion chromatography; A new method using MESERAN technique for measuring surface contamination after solvent extraction; Methods for pharmaceutical cleaning validations; Influence of cleaning on the surface of model glasses and their sensitivity to organic contamination; Decontamination of sensitive equipment; The fundamentals of no-chemistry process cleaning
Development of a technology for generation of ice particlesCleaning with solid carbon dioxide pellet blasting; Development of a generic procedure for modeling of waterjet cleaning; Experimental and numerical investigation of waterjet derusting technology; Practical applications of icejet technology in surface processing; Correlating cleanliness to electrical performance; Qualifying a cleaning system for space flight printed wiring assemblies; Investigation of modified SC-1 solutions for silicon wafer cleaning Performance qualification of post-CMP cleaning equipment in a semiconductor fabrication environmentSpatial and temporal scales in wet processing of deep submicrometer features; Microdenier fabrics for cleanroom wipers; Fine particle detachment studied by reflectometry and atomic force microscopy; Dust removal from solar panels and spacecraft on Mars; Laser cleaning of silicon wafers: Prospects and problems; Particle removal using resonant laser detachment; The future of industrial cleaning and related public policy-making |
| Record Nr. | UNINA-9910450116103321 |
| Boca Raton, FL : , : CRC Press, an imprint of Taylor and Francis, , 2003 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Surface contamination and cleaning . Volume 1 / / edited by Kash L. Mittal
| Surface contamination and cleaning . Volume 1 / / edited by Kash L. Mittal |
| Edizione | [First edition.] |
| Pubbl/distr/stampa | Boca Raton, FL : , : CRC Press, an imprint of Taylor and Francis, , 2003 |
| Descrizione fisica | 1 online resource (373 p.) |
| Disciplina | 620/.44 |
| Soggetto topico | Surface contamination |
| ISBN |
0-429-08796-9
1-280-46543-3 9786610465439 1-4175-7784-3 90-474-0328-2 1-60119-232-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Contents; Preface; Mapping of surface contaminants by tunable infrared-laser imaging; Monitoring cleanliness and defining acceptable cleanliness levels; Tracking surface ionic contamination by ion chromatography; A new method using MESERAN technique for measuring surface contamination after solvent extraction; Methods for pharmaceutical cleaning validations; Influence of cleaning on the surface of model glasses and their sensitivity to organic contamination; Decontamination of sensitive equipment; The fundamentals of no-chemistry process cleaning
Development of a technology for generation of ice particlesCleaning with solid carbon dioxide pellet blasting; Development of a generic procedure for modeling of waterjet cleaning; Experimental and numerical investigation of waterjet derusting technology; Practical applications of icejet technology in surface processing; Correlating cleanliness to electrical performance; Qualifying a cleaning system for space flight printed wiring assemblies; Investigation of modified SC-1 solutions for silicon wafer cleaning Performance qualification of post-CMP cleaning equipment in a semiconductor fabrication environmentSpatial and temporal scales in wet processing of deep submicrometer features; Microdenier fabrics for cleanroom wipers; Fine particle detachment studied by reflectometry and atomic force microscopy; Dust removal from solar panels and spacecraft on Mars; Laser cleaning of silicon wafers: Prospects and problems; Particle removal using resonant laser detachment; The future of industrial cleaning and related public policy-making |
| Record Nr. | UNINA-9910783227903321 |
| Boca Raton, FL : , : CRC Press, an imprint of Taylor and Francis, , 2003 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Surface contamination and cleaning / / editor, K.L. Mittal
| Surface contamination and cleaning / / editor, K.L. Mittal |
| Edizione | [First edition.] |
| Pubbl/distr/stampa | Utrecht ; ; Boston, : VSP, 2003- |
| Descrizione fisica | 1 online resource (373 p.) |
| Disciplina | 620/.44 |
| Altri autori (Persone) | MittalK. L. <1945-> |
| Soggetto topico | Surface contamination |
| ISBN |
9786610465439
9781040192245 1040192246 9780429087967 0429087969 9781280465437 1280465433 9781417577842 1417577843 9789047403289 9047403282 9781601192325 1601192320 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Contents; Preface; Mapping of surface contaminants by tunable infrared-laser imaging; Monitoring cleanliness and defining acceptable cleanliness levels; Tracking surface ionic contamination by ion chromatography; A new method using MESERAN technique for measuring surface contamination after solvent extraction; Methods for pharmaceutical cleaning validations; Influence of cleaning on the surface of model glasses and their sensitivity to organic contamination; Decontamination of sensitive equipment; The fundamentals of no-chemistry process cleaning
Development of a technology for generation of ice particlesCleaning with solid carbon dioxide pellet blasting; Development of a generic procedure for modeling of waterjet cleaning; Experimental and numerical investigation of waterjet derusting technology; Practical applications of icejet technology in surface processing; Correlating cleanliness to electrical performance; Qualifying a cleaning system for space flight printed wiring assemblies; Investigation of modified SC-1 solutions for silicon wafer cleaning Performance qualification of post-CMP cleaning equipment in a semiconductor fabrication environmentSpatial and temporal scales in wet processing of deep submicrometer features; Microdenier fabrics for cleanroom wipers; Fine particle detachment studied by reflectometry and atomic force microscopy; Dust removal from solar panels and spacecraft on Mars; Laser cleaning of silicon wafers: Prospects and problems; Particle removal using resonant laser detachment; The future of industrial cleaning and related public policy-making |
| Record Nr. | UNINA-9910961520903321 |
| Utrecht ; ; Boston, : VSP, 2003- | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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