Ion implantation technology--96 : proceedings of the Eleventh International Conference on Ion Implantation Technology, Austin, Texas, USA, June 16-21, 1996 |
Pubbl/distr/stampa | [Place of publication not identified], : Institute of Electrical and Electronics Engineers, 1996 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductors - Congresses
Ion implantation - Congresses Semiconductor doping - Congresses Electrical & Computer Engineering Electrical Engineering Engineering & Applied Sciences |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996203711803316 |
[Place of publication not identified], : Institute of Electrical and Electronics Engineers, 1996 | ||
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Lo trovi qui: Univ. di Salerno | ||
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Rapid thermal annealing-chemical vapor deposition and integrated processing : Symposium held April 25-28, 1989, San Diego CA / edited by David Hodul...[et al.] |
Autore | MRS |
Pubbl/distr/stampa | Pittsburgh : Materials Research Society, 1989 |
Descrizione fisica | xi, 494 p. : ill. ; 24 cm. |
Altri autori (Persone) | Hodul, David |
Collana | MRS Symposium Proceedings ; 146 |
Soggetto topico |
Semiconductor doping - Congresses
Semiconductors-Heat treatment - Congresses Vapor-plating - Congresses |
ISBN | 1558990194 |
Classificazione |
53.8
53.9.1 TK7871.85 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISALENTO-991001210109707536 |
MRS
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Pittsburgh : Materials Research Society, 1989 | ||
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Lo trovi qui: Univ. del Salento | ||
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