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Device performance [[electronic resource] ] : measurements & characterization
| Device performance [[electronic resource] ] : measurements & characterization |
| Pubbl/distr/stampa | Golden, CO : , : National Renewable Energy Laboratory, , [2006] |
| Descrizione fisica | 4 unnumbered pages : digital, PDF file |
| Collana | NREL/BR |
| Soggetto topico |
Materials testing laboratories
Semiconductors - Characterization Scientific apparatus and instruments - Calibration |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Altri titoli varianti | Device performance |
| Record Nr. | UNINA-9910696416903321 |
| Golden, CO : , : National Renewable Energy Laboratory, , [2006] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Nanoscale calibration standards and methods [[electronic resource] ] : dimensional and related measurements in the micro- and nanometer range / / edited by Günter Wilkening, Ludger Koenders
| Nanoscale calibration standards and methods [[electronic resource] ] : dimensional and related measurements in the micro- and nanometer range / / edited by Günter Wilkening, Ludger Koenders |
| Pubbl/distr/stampa | Weinheim ; ; [Chichester?], : Wiley-VCH, c2005 |
| Descrizione fisica | 1 online resource (543 p.) |
| Disciplina | 620.50287 |
| Altri autori (Persone) |
KoendersLudger
WilkeningGünter |
| Soggetto topico |
Microstructure - Measurement
Nanostructured materials - Measurement Scientific apparatus and instruments - Calibration Stereology |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-280-85401-4
9786610854011 3-527-60666-1 3-527-60687-4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Nanoscale Calibration Standards and Methods; Contents; List of Contributors; Part I Instrumentation - Overview; 1 Metrological Scanning Probe Microscopes - Instruments for Dimensional Nanometrology; 1.1 Introduction; 1.2 High-Resolution Probing Systems; 1.2.1 Sensor Objective with Beam Deflection Detection; 1.2.2 Sensor Objective with Piezolever Module; 1.2.3 Sensor Objective with Tuning Fork Module; 1.2.4 Sensor Head for Combined Scanning Probe and Interference Microscopy; 1.3 Metrology Systems Based on Scanning Probe Microscopes; 1.3.1 Scanning Force Microscopes of Type Veritekt
1.3.2 Metrological Large Range Scanning Force Microscope1.4 Summary; Acknowledgments; References; 2 Nanometrology at the IMGC; 2.1 Introduction; 2.2 Surface Metrology; 2.2.1 Scanning Probe Microscopy; 2.2.2 Optical Diffractometry; 2.2.3 Stylus Profilometry; 2.3 Atomic Scale Metrology; 2.3.1 Lattice Parameter of Silicon; 2.3.2 Combined Optical and X-Ray Interferometry (COXI); 2.4 Phase-Contrast Topograpy; 2.4.1 Detection of Small Lattice Strain; 2.4.2 Phase-Contrast Imaging; 2.5 Nanobalance; 2.6 Conclusions; References; 3 Metrological Applications of X-ray Interferometry; 3.1 Introduction 3.2 Measurement of Non-linearity in Optical Interferometers3.3 Combined Optical and X-ray Interferometry; 3.4 Measurement of Small Angles; 3.5 X-ray Interferometry and Scanning Probe Microscopy; 3.6 Conclusions; References; Part II Instrumentation - Long-range Scanning Probe Microscopes; 4 Advances in Traceable Nanometrology with the Nanopositioning and Nanomeasuring Machine; 4.1 Introduction; 4.2 Design and Operation; 4.3 Uncertainty Budget; 4.4 Focus Sensor; 4.5 Measuring Opportunities and Performance with Focus Sensor; 4.6 Focus Probe with SFM Cantilever; 4.7 Conclusion; Acknowledgements References5 Coordinate Measurements in Microsystems by Using AFM-Probing: Problems and Solutions; 5.1 Introduction; 5.2 Realizing CMMs for Microsystems; 5.3 Problems and Solutions; 5.3.1 Dynamics of Positioning System; 5.3.2 CMM: One-Millimeter Scan; 5.3.3 Measuring Strategies; 5.4 Conclusion and Outlook; References; 6 Metrological Large Range Scanning Force Microscope Applicable for Traceable Calibration of Surface Textures; 6.1 Introduction; 6.2 Instrumentation; 6.2.1 Principle; 6.2.2 Metrological Properties; 6.2.3 Traceability; 6.2.4 Specially Designed Features 6.3 Measurement Result of a 2D-Grating Standard6.3.1 Measurement Strategy; 6.3.2 Data Evaluation; 6.3.3 Measurement Result of the Mean Pitch Value; 6.3.4 Measurement of the Local Pitch Variation; 6.4 A Selected Measurement Result of a Microroughness Standard; 6.4.1 Measurement Result of a Glass Flatness Standard; 6.4.2 Measurement of a PTB Microroughness Standard; 6.4.3 Comparison of the Roughness Measurement Results Derived from SFM and Stylus Instruments Using Gaussian Filter; 6.4.4 Comparison Using Morphological Filters; 6.4.5 Evaluation Results Using PTB Reference Software 6.5 Outlook and Conclusion |
| Record Nr. | UNINA-9910144578403321 |
| Weinheim ; ; [Chichester?], : Wiley-VCH, c2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Nanoscale calibration standards and methods [[electronic resource] ] : dimensional and related measurements in the micro- and nanometer range / / edited by Günter Wilkening, Ludger Koenders
| Nanoscale calibration standards and methods [[electronic resource] ] : dimensional and related measurements in the micro- and nanometer range / / edited by Günter Wilkening, Ludger Koenders |
| Pubbl/distr/stampa | Weinheim ; ; [Chichester?], : Wiley-VCH, c2005 |
| Descrizione fisica | 1 online resource (543 p.) |
| Disciplina | 620.50287 |
| Altri autori (Persone) |
KoendersLudger
WilkeningGünter |
| Soggetto topico |
Microstructure - Measurement
Nanostructured materials - Measurement Scientific apparatus and instruments - Calibration Stereology |
| ISBN |
1-280-85401-4
9786610854011 3-527-60666-1 3-527-60687-4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Nanoscale Calibration Standards and Methods; Contents; List of Contributors; Part I Instrumentation - Overview; 1 Metrological Scanning Probe Microscopes - Instruments for Dimensional Nanometrology; 1.1 Introduction; 1.2 High-Resolution Probing Systems; 1.2.1 Sensor Objective with Beam Deflection Detection; 1.2.2 Sensor Objective with Piezolever Module; 1.2.3 Sensor Objective with Tuning Fork Module; 1.2.4 Sensor Head for Combined Scanning Probe and Interference Microscopy; 1.3 Metrology Systems Based on Scanning Probe Microscopes; 1.3.1 Scanning Force Microscopes of Type Veritekt
1.3.2 Metrological Large Range Scanning Force Microscope1.4 Summary; Acknowledgments; References; 2 Nanometrology at the IMGC; 2.1 Introduction; 2.2 Surface Metrology; 2.2.1 Scanning Probe Microscopy; 2.2.2 Optical Diffractometry; 2.2.3 Stylus Profilometry; 2.3 Atomic Scale Metrology; 2.3.1 Lattice Parameter of Silicon; 2.3.2 Combined Optical and X-Ray Interferometry (COXI); 2.4 Phase-Contrast Topograpy; 2.4.1 Detection of Small Lattice Strain; 2.4.2 Phase-Contrast Imaging; 2.5 Nanobalance; 2.6 Conclusions; References; 3 Metrological Applications of X-ray Interferometry; 3.1 Introduction 3.2 Measurement of Non-linearity in Optical Interferometers3.3 Combined Optical and X-ray Interferometry; 3.4 Measurement of Small Angles; 3.5 X-ray Interferometry and Scanning Probe Microscopy; 3.6 Conclusions; References; Part II Instrumentation - Long-range Scanning Probe Microscopes; 4 Advances in Traceable Nanometrology with the Nanopositioning and Nanomeasuring Machine; 4.1 Introduction; 4.2 Design and Operation; 4.3 Uncertainty Budget; 4.4 Focus Sensor; 4.5 Measuring Opportunities and Performance with Focus Sensor; 4.6 Focus Probe with SFM Cantilever; 4.7 Conclusion; Acknowledgements References5 Coordinate Measurements in Microsystems by Using AFM-Probing: Problems and Solutions; 5.1 Introduction; 5.2 Realizing CMMs for Microsystems; 5.3 Problems and Solutions; 5.3.1 Dynamics of Positioning System; 5.3.2 CMM: One-Millimeter Scan; 5.3.3 Measuring Strategies; 5.4 Conclusion and Outlook; References; 6 Metrological Large Range Scanning Force Microscope Applicable for Traceable Calibration of Surface Textures; 6.1 Introduction; 6.2 Instrumentation; 6.2.1 Principle; 6.2.2 Metrological Properties; 6.2.3 Traceability; 6.2.4 Specially Designed Features 6.3 Measurement Result of a 2D-Grating Standard6.3.1 Measurement Strategy; 6.3.2 Data Evaluation; 6.3.3 Measurement Result of the Mean Pitch Value; 6.3.4 Measurement of the Local Pitch Variation; 6.4 A Selected Measurement Result of a Microroughness Standard; 6.4.1 Measurement Result of a Glass Flatness Standard; 6.4.2 Measurement of a PTB Microroughness Standard; 6.4.3 Comparison of the Roughness Measurement Results Derived from SFM and Stylus Instruments Using Gaussian Filter; 6.4.4 Comparison Using Morphological Filters; 6.4.5 Evaluation Results Using PTB Reference Software 6.5 Outlook and Conclusion |
| Record Nr. | UNINA-9910830318003321 |
| Weinheim ; ; [Chichester?], : Wiley-VCH, c2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Nanoscale calibration standards and methods : dimensional and related measurements in the micro- and nanometer range / / edited by Gunter Wilkening, Ludger Koenders
| Nanoscale calibration standards and methods : dimensional and related measurements in the micro- and nanometer range / / edited by Gunter Wilkening, Ludger Koenders |
| Pubbl/distr/stampa | Weinheim ; ; [Chichester?], : Wiley-VCH, c2005 |
| Descrizione fisica | 1 online resource (543 p.) |
| Disciplina | 620.50287 |
| Altri autori (Persone) |
KoendersLudger
WilkeningGunter |
| Soggetto topico |
Microstructure - Measurement
Nanostructured materials - Measurement Scientific apparatus and instruments - Calibration Stereology |
| ISBN |
1-280-85401-4
9786610854011 3-527-60666-1 3-527-60687-4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Nanoscale Calibration Standards and Methods; Contents; List of Contributors; Part I Instrumentation - Overview; 1 Metrological Scanning Probe Microscopes - Instruments for Dimensional Nanometrology; 1.1 Introduction; 1.2 High-Resolution Probing Systems; 1.2.1 Sensor Objective with Beam Deflection Detection; 1.2.2 Sensor Objective with Piezolever Module; 1.2.3 Sensor Objective with Tuning Fork Module; 1.2.4 Sensor Head for Combined Scanning Probe and Interference Microscopy; 1.3 Metrology Systems Based on Scanning Probe Microscopes; 1.3.1 Scanning Force Microscopes of Type Veritekt
1.3.2 Metrological Large Range Scanning Force Microscope1.4 Summary; Acknowledgments; References; 2 Nanometrology at the IMGC; 2.1 Introduction; 2.2 Surface Metrology; 2.2.1 Scanning Probe Microscopy; 2.2.2 Optical Diffractometry; 2.2.3 Stylus Profilometry; 2.3 Atomic Scale Metrology; 2.3.1 Lattice Parameter of Silicon; 2.3.2 Combined Optical and X-Ray Interferometry (COXI); 2.4 Phase-Contrast Topograpy; 2.4.1 Detection of Small Lattice Strain; 2.4.2 Phase-Contrast Imaging; 2.5 Nanobalance; 2.6 Conclusions; References; 3 Metrological Applications of X-ray Interferometry; 3.1 Introduction 3.2 Measurement of Non-linearity in Optical Interferometers3.3 Combined Optical and X-ray Interferometry; 3.4 Measurement of Small Angles; 3.5 X-ray Interferometry and Scanning Probe Microscopy; 3.6 Conclusions; References; Part II Instrumentation - Long-range Scanning Probe Microscopes; 4 Advances in Traceable Nanometrology with the Nanopositioning and Nanomeasuring Machine; 4.1 Introduction; 4.2 Design and Operation; 4.3 Uncertainty Budget; 4.4 Focus Sensor; 4.5 Measuring Opportunities and Performance with Focus Sensor; 4.6 Focus Probe with SFM Cantilever; 4.7 Conclusion; Acknowledgements References5 Coordinate Measurements in Microsystems by Using AFM-Probing: Problems and Solutions; 5.1 Introduction; 5.2 Realizing CMMs for Microsystems; 5.3 Problems and Solutions; 5.3.1 Dynamics of Positioning System; 5.3.2 CMM: One-Millimeter Scan; 5.3.3 Measuring Strategies; 5.4 Conclusion and Outlook; References; 6 Metrological Large Range Scanning Force Microscope Applicable for Traceable Calibration of Surface Textures; 6.1 Introduction; 6.2 Instrumentation; 6.2.1 Principle; 6.2.2 Metrological Properties; 6.2.3 Traceability; 6.2.4 Specially Designed Features 6.3 Measurement Result of a 2D-Grating Standard6.3.1 Measurement Strategy; 6.3.2 Data Evaluation; 6.3.3 Measurement Result of the Mean Pitch Value; 6.3.4 Measurement of the Local Pitch Variation; 6.4 A Selected Measurement Result of a Microroughness Standard; 6.4.1 Measurement Result of a Glass Flatness Standard; 6.4.2 Measurement of a PTB Microroughness Standard; 6.4.3 Comparison of the Roughness Measurement Results Derived from SFM and Stylus Instruments Using Gaussian Filter; 6.4.4 Comparison Using Morphological Filters; 6.4.5 Evaluation Results Using PTB Reference Software 6.5 Outlook and Conclusion |
| Record Nr. | UNINA-9910877100303321 |
| Weinheim ; ; [Chichester?], : Wiley-VCH, c2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Selected laboratory and measurement practices, and procedures, to support basic mass calibrations [[electronic resource] /] / Georgia L. Harris
| Selected laboratory and measurement practices, and procedures, to support basic mass calibrations [[electronic resource] /] / Georgia L. Harris |
| Autore | Harris Georgia L |
| Edizione | [2012 ed.] |
| Pubbl/distr/stampa | [Gaithersburg, Md.] : , : U.S. Dept. of Commerce, National Institute of Standards and Technology, , 2012 |
| Descrizione fisica | 1 online resource (206 unnumbered pages) : illustrations |
| Altri autori (Persone) | HarrisGeorgia L |
| Collana | NISTIR |
| Soggetto topico |
Scientific apparatus and instruments - Calibration
Weights and measures - Quality control Measurement - Quality control |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910700550403321 |
Harris Georgia L
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| [Gaithersburg, Md.] : , : U.S. Dept. of Commerce, National Institute of Standards and Technology, , 2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
