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Theory of reflectance and emittance spectroscopy / / Bruce Hapke [[electronic resource]]
| Theory of reflectance and emittance spectroscopy / / Bruce Hapke [[electronic resource]] |
| Autore | Hapke Bruce |
| Edizione | [Second edition.] |
| Pubbl/distr/stampa | Cambridge : , : Cambridge University Press, , 2012 |
| Descrizione fisica | 1 online resource (xiii, 513 pages) : digital, PDF file(s) |
| Disciplina | 522/.67 |
| Soggetto topico |
Reflectance spectroscopy
Emission spectroscopy |
| ISBN |
1-139-20947-7
1-316-08917-7 1-280-48500-0 1-139-22231-7 9786613579980 1-139-21750-X 1-139-21442-X 1-139-22402-6 1-139-22059-4 1-139-02568-6 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Machine generated contents note: Acknowledgements; 1. Introduction; 2. Electromagnetic wave propagation; 3. The absorption of light; 4. Specular reflection; 5. Single particle scattering: perfect spheres; 6. Single particle scattering: irregular particles; 7. Propagation in a nonuniform medium: the equation of radiative transfer; 8. The bidirectional reflectance of a semi-infinite medium; 9. The opposition effect; 10. A miscellany of bidirectional reflectances and related quantities; 11. Integrated reflectances and planetary photometry; 12. Photometric effects of large scale roughness; 13. Polarization; 14. Reflectance spectroscopy; 15. Thermal emission and emittance spectroscopy; 16. Simultaneous transport of energy by radiation and conduction; Appendix A. A brief review of vector calculus; Appendix B. Functions of a complex variable; Appendix C. The wave equation in spherical coordinates; Appendix D. Fraunhoffer diffraction by a circular hole; Appendix E. Table of symbols; Bibliography; Index. |
| Altri titoli varianti | Theory of Reflectance & Emittance Spectroscopy |
| Record Nr. | UNINA-9910461502103321 |
Hapke Bruce
|
||
| Cambridge : , : Cambridge University Press, , 2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Theory of reflectance and emittance spectroscopy / / Bruce Hapke [[electronic resource]]
| Theory of reflectance and emittance spectroscopy / / Bruce Hapke [[electronic resource]] |
| Autore | Hapke Bruce |
| Edizione | [Second edition.] |
| Pubbl/distr/stampa | Cambridge : , : Cambridge University Press, , 2012 |
| Descrizione fisica | 1 online resource (xiii, 513 pages) : digital, PDF file(s) |
| Disciplina | 522/.67 |
| Soggetto topico |
Reflectance spectroscopy
Emission spectroscopy |
| ISBN |
1-139-20947-7
1-316-08917-7 1-280-48500-0 1-139-22231-7 9786613579980 1-139-21750-X 1-139-21442-X 1-139-22402-6 1-139-22059-4 1-139-02568-6 |
| Classificazione | TEC036000 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Machine generated contents note: Acknowledgements; 1. Introduction; 2. Electromagnetic wave propagation; 3. The absorption of light; 4. Specular reflection; 5. Single particle scattering: perfect spheres; 6. Single particle scattering: irregular particles; 7. Propagation in a nonuniform medium: the equation of radiative transfer; 8. The bidirectional reflectance of a semi-infinite medium; 9. The opposition effect; 10. A miscellany of bidirectional reflectances and related quantities; 11. Integrated reflectances and planetary photometry; 12. Photometric effects of large scale roughness; 13. Polarization; 14. Reflectance spectroscopy; 15. Thermal emission and emittance spectroscopy; 16. Simultaneous transport of energy by radiation and conduction; Appendix A. A brief review of vector calculus; Appendix B. Functions of a complex variable; Appendix C. The wave equation in spherical coordinates; Appendix D. Fraunhoffer diffraction by a circular hole; Appendix E. Table of symbols; Bibliography; Index. |
| Altri titoli varianti | Theory of Reflectance & Emittance Spectroscopy |
| Record Nr. | UNINA-9910790463403321 |
|
Hapke Bruce
|
||
| Cambridge : , : Cambridge University Press, , 2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Total-reflection x-ray fluorescence analysis and related methods / / Reinhold Klockenkämper, Alex von Bohlen
| Total-reflection x-ray fluorescence analysis and related methods / / Reinhold Klockenkämper, Alex von Bohlen |
| Autore | Reinhold Klockenkämper |
| Edizione | [2nd ed.] |
| Pubbl/distr/stampa | Hoboken, New Jersey : , : Wiley, , 2015 |
| Descrizione fisica | 1 online resource (555 p.) |
| Disciplina | 543.56 |
| Collana | Chemical Analysis |
| Soggetto topico |
Fluorescence spectroscopy
X-ray spectroscopy Reflectance spectroscopy |
| ISBN |
1-118-98595-8
1-118-98587-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Total-Reflection X-ray Fluorescence Analysis and Related Methods; Contents; Foreword; Acknowledgments; List of Acronyms; List of Physical Units and Subunits; List of Symbols; Chapter 1: Fundamentals of X-Ray Fluorescence; 1.1 A Short History of XRF; 1.2 The New Variant TXRF; 1.2.1 Retrospect on its Development; 1.2.2 Relationship of XRF and TXRF; 1.3 Nature and Production of X-Rays; 1.3.1 The Nature of X-Rays; 1.3.2 X-Ray Tubes as X-Ray Sources; 1.3.2.1 The Line Spectrum; 1.3.2.2 The Continuous Spectrum; 1.3.3 Polarization of X-Rays; 1.3.4 Synchrotron Radiation as X-Ray Source
1.3.4.1 Electrons in Fields of Bending Magnets 1.3.4.2 Radiation Power of a Single Electron; 1.3.4.3 Angular and Spectral Distribution of SR; 1.3.4.4 Comparison with Black-Body Radiation; 1.4 Attenuation of X-Rays; 1.4.1 Photoelectric Absorption; 1.4.2 X-Ray Scatter; 1.4.3 Total Attenuation; 1.5 Deflection of X-Rays; 1.5.1 Reflection and Refraction; 1.5.2 Diffraction and Bragg's Law; 1.5.3 Total External Reflection; 1.5.3.1 Reflectivity; 1.5.3.2 Penetration Depth; 1.5.4 Refraction and Dispersion; References; Chapter 2: Principles of Total Reflection XRF; 2.1 Interference of X-Rays 2.1.1 Double-Beam Interference 2.1.2 Multiple-Beam Interference; 2.2 X-Ray Standing Wave Fields; 2.2.1 Standing Waves in Front of a Thick Substrate; 2.2.2 Standing Wave Fields Within a Thin Layer; 2.2.3 Standing Waves Within a Multilayer or Crystal; 2.3 Intensity of Fluorescence Signals; 2.3.1 Infinitely Thick and Flat Substrates; 2.3.2 Granular Residues on a Substrate; 2.3.3 Buried Layers in a Substrate; 2.3.4 Reflecting Layers on Substrates; 2.3.5 Periodic Multilayers and Crystals; 2.4 Formalism for Intensity Calculations; 2.4.1 A Thick and Flat Substrate 2.4.2 A Thin Homogeneous Layer on a Substrate 2.4.3 A Stratified Medium of Several Layers; References; Chapter 3: Instrumentation for TXRF and GI-XRF; 3.1 Basic Instrumental Setup; 3.2 High and Low-Power X-Ray Sources; 3.2.1 Fine-Focus X-Ray Tubes; 3.2.2 Rotating Anode Tubes; 3.2.3 Air-Cooled X-Ray Tubes; 3.3 Synchrotron Facilities; 3.3.1 Basic Setup with Bending Magnets; 3.3.2 Undulators, Wigglers, and FELs; 3.3.3 Facilities Worldwide; 3.4 The Beam Adapting Unit; 3.4.1 Low-Pass Filters; 3.4.2 Simple Monochromators; 3.4.3 Double-Crystal Monochromators; 3.5 Sample Positioning 3.5.1 Sample Carriers 3.5.2 Fixed Angle Adjustment for TXRF ("Angle Cut"); 3.5.3 Stepwise-Angle Variation for GI-XRF ("Angle Scan"); 3.6 Energy-Dispersive Detection of X-Rays; 3.6.1 The Semiconductor Detector; 3.6.2 The Silicon Drift Detector; 3.6.3 Position Sensitive Detectors; 3.7 Wavelength-Dispersive Detection of X-Rays; 3.7.1 Dispersing Crystals with Soller Collimators; 3.7.2 Gas-Filled Detectors; 3.7.3 Scintillation Detectors; 3.8 Spectra Registration and Evaluation; 3.8.1 The Registration Unit; 3.8.2 Performance Characteristics; 3.8.2.1 Detector Efficiency; 3.8.2.2 Spectral Resolution 3.8.2.3 Input-Output Yield |
| Record Nr. | UNINA-9910132307903321 |
|
Reinhold Klockenkämper
|
||
| Hoboken, New Jersey : , : Wiley, , 2015 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Total-reflection x-ray fluorescence analysis and related methods / / Reinhold Klockenkämper, Alex von Bohlen
| Total-reflection x-ray fluorescence analysis and related methods / / Reinhold Klockenkämper, Alex von Bohlen |
| Autore | Reinhold Klockenkämper |
| Edizione | [2nd ed.] |
| Pubbl/distr/stampa | Hoboken, New Jersey : , : Wiley, , 2015 |
| Descrizione fisica | 1 online resource (555 p.) |
| Disciplina | 543.56 |
| Collana | Chemical Analysis |
| Soggetto topico |
Fluorescence spectroscopy
X-ray spectroscopy Reflectance spectroscopy |
| ISBN |
1-118-98595-8
1-118-98587-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Total-Reflection X-ray Fluorescence Analysis and Related Methods; Contents; Foreword; Acknowledgments; List of Acronyms; List of Physical Units and Subunits; List of Symbols; Chapter 1: Fundamentals of X-Ray Fluorescence; 1.1 A Short History of XRF; 1.2 The New Variant TXRF; 1.2.1 Retrospect on its Development; 1.2.2 Relationship of XRF and TXRF; 1.3 Nature and Production of X-Rays; 1.3.1 The Nature of X-Rays; 1.3.2 X-Ray Tubes as X-Ray Sources; 1.3.2.1 The Line Spectrum; 1.3.2.2 The Continuous Spectrum; 1.3.3 Polarization of X-Rays; 1.3.4 Synchrotron Radiation as X-Ray Source
1.3.4.1 Electrons in Fields of Bending Magnets 1.3.4.2 Radiation Power of a Single Electron; 1.3.4.3 Angular and Spectral Distribution of SR; 1.3.4.4 Comparison with Black-Body Radiation; 1.4 Attenuation of X-Rays; 1.4.1 Photoelectric Absorption; 1.4.2 X-Ray Scatter; 1.4.3 Total Attenuation; 1.5 Deflection of X-Rays; 1.5.1 Reflection and Refraction; 1.5.2 Diffraction and Bragg's Law; 1.5.3 Total External Reflection; 1.5.3.1 Reflectivity; 1.5.3.2 Penetration Depth; 1.5.4 Refraction and Dispersion; References; Chapter 2: Principles of Total Reflection XRF; 2.1 Interference of X-Rays 2.1.1 Double-Beam Interference 2.1.2 Multiple-Beam Interference; 2.2 X-Ray Standing Wave Fields; 2.2.1 Standing Waves in Front of a Thick Substrate; 2.2.2 Standing Wave Fields Within a Thin Layer; 2.2.3 Standing Waves Within a Multilayer or Crystal; 2.3 Intensity of Fluorescence Signals; 2.3.1 Infinitely Thick and Flat Substrates; 2.3.2 Granular Residues on a Substrate; 2.3.3 Buried Layers in a Substrate; 2.3.4 Reflecting Layers on Substrates; 2.3.5 Periodic Multilayers and Crystals; 2.4 Formalism for Intensity Calculations; 2.4.1 A Thick and Flat Substrate 2.4.2 A Thin Homogeneous Layer on a Substrate 2.4.3 A Stratified Medium of Several Layers; References; Chapter 3: Instrumentation for TXRF and GI-XRF; 3.1 Basic Instrumental Setup; 3.2 High and Low-Power X-Ray Sources; 3.2.1 Fine-Focus X-Ray Tubes; 3.2.2 Rotating Anode Tubes; 3.2.3 Air-Cooled X-Ray Tubes; 3.3 Synchrotron Facilities; 3.3.1 Basic Setup with Bending Magnets; 3.3.2 Undulators, Wigglers, and FELs; 3.3.3 Facilities Worldwide; 3.4 The Beam Adapting Unit; 3.4.1 Low-Pass Filters; 3.4.2 Simple Monochromators; 3.4.3 Double-Crystal Monochromators; 3.5 Sample Positioning 3.5.1 Sample Carriers 3.5.2 Fixed Angle Adjustment for TXRF ("Angle Cut"); 3.5.3 Stepwise-Angle Variation for GI-XRF ("Angle Scan"); 3.6 Energy-Dispersive Detection of X-Rays; 3.6.1 The Semiconductor Detector; 3.6.2 The Silicon Drift Detector; 3.6.3 Position Sensitive Detectors; 3.7 Wavelength-Dispersive Detection of X-Rays; 3.7.1 Dispersing Crystals with Soller Collimators; 3.7.2 Gas-Filled Detectors; 3.7.3 Scintillation Detectors; 3.8 Spectra Registration and Evaluation; 3.8.1 The Registration Unit; 3.8.2 Performance Characteristics; 3.8.2.1 Detector Efficiency; 3.8.2.2 Spectral Resolution 3.8.2.3 Input-Output Yield |
| Record Nr. | UNINA-9910822150203321 |
|
Reinhold Klockenkämper
|
||
| Hoboken, New Jersey : , : Wiley, , 2015 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
