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Database needs for modeling and simulation of plasma processing [[electronic resource] /] / Panel on Database Needs in Plasma Processing, Committee on Atomic, Molecular, and Optical Sciences and Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council
| Database needs for modeling and simulation of plasma processing [[electronic resource] /] / Panel on Database Needs in Plasma Processing, Committee on Atomic, Molecular, and Optical Sciences and Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1996 |
| Descrizione fisica | 1 online resource (74 p.) |
| Collana | The compass series |
| Soggetto topico |
Semiconductors - Design and construction
Plasma engineering - Databases Plasma engineering - Computer simulation |
| Soggetto genere / forma | Electronic books. |
| ISBN |
0-309-57353-X
0-585-08454-8 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
""Database Needs for Modeling and Simulation of Plasma Processing""; ""Copyright""; ""Preface""; ""Contents""; ""Executive Summary""; ""FINDINGS""; ""CONCLUSIONS""; ""RECOMMENDATIONS""; ""REFERENCES""; ""1 Industrial Perspectives ""; ""INTRODUCTION""; ""PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING""; ""PLASMA EQUIPMENT SUPPLIER PERSPECTIVES""; ""CHIP MANUFACTURER PERSPECTIVES""; ""RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""2 Tool Scale and Feature Scale Models ""; ""INTRODUCTION""; ""TOOL SCALE MODELS""
""Capabilities Needed for Tool Scale Models""""Barriers to Using Tool Scale Models""; ""FEATURE SCALE MODELS""; ""GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""3 Radiative Processes and Diagnostics ""; ""INTRODUCTION""; ""TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES""; ""Information Resources""; ""Roles of the Database In Motivating Diagnostic Experiments""; ""SURFACE REACTION DATABASE AND DIAGNOSTICS""; ""Information Resources""; ""New Diagnostic Techniques""; ""FINDINGS"" ""REFERENCES""""4 Heterogeneous Processes ""; ""INTRODUCTION""; ""STATE OF THE DATABASE""; ""TECHNIQUES FOR IMPROVING THE DATABASE""; ""Approach""; ""Measurements On Realistic Plasma Reactors""; ""Incident Flux and Desorbing Flux Analysis""; ""Condition of the Surface""; ""Technology""; ""Ultrahigh-Vacuum Approach Using Mass and Energy Selected Reactive Beams""; ""Particle Beams""; ""Sticking Coefficients""; ""Synergistic Effects""; ""Substrate Temperature Dependence""; ""Angle Dependence""; ""Computer Simulations""; ""FINDINGS""; ""REFERENCES""; ""5 Electron Collision Processes "" ""INTRODUCTION""""IONIZATION""; ""Atoms""; ""Molecules""; ""Theoretical Methods and Advances""; ""Neutral Dissociation""; ""ELECTRON-IMPACT EXCITATION""; ""ATTACHMENT""; ""MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS""; ""GENERAL COMMENTS""; ""FINDINGS""; ""REFERENCES""; ""6 Ion Processes, Neutral Chemistry, And Thermochemical Data ""; ""INTRODUCTION""; ""CROSS SECTIONS AND RATE COEFFICIENTS""; ""Ion Processes""; ""Momentum Transfer""; ""Ion-Molecule and Charge Exchange Reactions""; ""Ion-Ion Neutralization""; ""Electron-Ion Recombination"" ""Ion-Neutral and Neutral-Neutral Excitation""""Neutral Chemistry""; ""Status of the Database""; ""Excited State Chemistry and Penning Ionization""; ""Summary""; ""Ion Processes""; ""Neutral Chemistry""; ""THERMOCHEMICAL DATA""; ""FINDINGS""; ""REFERENCES""; ""Appendix A: Acronyms and Abbreviations""; ""Appendix B: Workshop Agenda""; ""Appendix C: Workshop Participants"" |
| Record Nr. | UNINA-9910456054403321 |
| Washington, D.C., : National Academy Press, 1996 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Database needs for modeling and simulation of plasma processing [[electronic resource] /] / Panel on Database Needs in Plasma Processing, Committee on Atomic, Molecular, and Optical Sciences and Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council
| Database needs for modeling and simulation of plasma processing [[electronic resource] /] / Panel on Database Needs in Plasma Processing, Committee on Atomic, Molecular, and Optical Sciences and Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1996 |
| Descrizione fisica | 1 online resource (74 p.) |
| Collana | The compass series |
| Soggetto topico |
Semiconductors - Design and construction
Plasma engineering - Databases Plasma engineering - Computer simulation |
| ISBN |
0-309-17513-5
0-309-57353-X 0-585-08454-8 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
""Database Needs for Modeling and Simulation of Plasma Processing""; ""Copyright""; ""Preface""; ""Contents""; ""Executive Summary""; ""FINDINGS""; ""CONCLUSIONS""; ""RECOMMENDATIONS""; ""REFERENCES""; ""1 Industrial Perspectives ""; ""INTRODUCTION""; ""PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING""; ""PLASMA EQUIPMENT SUPPLIER PERSPECTIVES""; ""CHIP MANUFACTURER PERSPECTIVES""; ""RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""2 Tool Scale and Feature Scale Models ""; ""INTRODUCTION""; ""TOOL SCALE MODELS""
""Capabilities Needed for Tool Scale Models""""Barriers to Using Tool Scale Models""; ""FEATURE SCALE MODELS""; ""GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""3 Radiative Processes and Diagnostics ""; ""INTRODUCTION""; ""TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES""; ""Information Resources""; ""Roles of the Database In Motivating Diagnostic Experiments""; ""SURFACE REACTION DATABASE AND DIAGNOSTICS""; ""Information Resources""; ""New Diagnostic Techniques""; ""FINDINGS"" ""REFERENCES""""4 Heterogeneous Processes ""; ""INTRODUCTION""; ""STATE OF THE DATABASE""; ""TECHNIQUES FOR IMPROVING THE DATABASE""; ""Approach""; ""Measurements On Realistic Plasma Reactors""; ""Incident Flux and Desorbing Flux Analysis""; ""Condition of the Surface""; ""Technology""; ""Ultrahigh-Vacuum Approach Using Mass and Energy Selected Reactive Beams""; ""Particle Beams""; ""Sticking Coefficients""; ""Synergistic Effects""; ""Substrate Temperature Dependence""; ""Angle Dependence""; ""Computer Simulations""; ""FINDINGS""; ""REFERENCES""; ""5 Electron Collision Processes "" ""INTRODUCTION""""IONIZATION""; ""Atoms""; ""Molecules""; ""Theoretical Methods and Advances""; ""Neutral Dissociation""; ""ELECTRON-IMPACT EXCITATION""; ""ATTACHMENT""; ""MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS""; ""GENERAL COMMENTS""; ""FINDINGS""; ""REFERENCES""; ""6 Ion Processes, Neutral Chemistry, And Thermochemical Data ""; ""INTRODUCTION""; ""CROSS SECTIONS AND RATE COEFFICIENTS""; ""Ion Processes""; ""Momentum Transfer""; ""Ion-Molecule and Charge Exchange Reactions""; ""Ion-Ion Neutralization""; ""Electron-Ion Recombination"" ""Ion-Neutral and Neutral-Neutral Excitation""""Neutral Chemistry""; ""Status of the Database""; ""Excited State Chemistry and Penning Ionization""; ""Summary""; ""Ion Processes""; ""Neutral Chemistry""; ""THERMOCHEMICAL DATA""; ""FINDINGS""; ""REFERENCES""; ""Appendix A: Acronyms and Abbreviations""; ""Appendix B: Workshop Agenda""; ""Appendix C: Workshop Participants"" |
| Record Nr. | UNINA-9910778672203321 |
| Washington, D.C., : National Academy Press, 1996 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Database needs for modeling and simulation of plasma processing / / Panel on Database Needs in Plasma Processing, Committee on Atomic, Molecular, and Optical Sciences and Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council
| Database needs for modeling and simulation of plasma processing / / Panel on Database Needs in Plasma Processing, Committee on Atomic, Molecular, and Optical Sciences and Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| Edizione | [1st ed.] |
| Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1996 |
| Descrizione fisica | 1 online resource (74 p.) |
| Collana | The compass series |
| Soggetto topico |
Semiconductors - Design and construction
Plasma engineering - Databases Plasma engineering - Computer simulation |
| ISBN |
0-309-17513-5
0-309-57353-X 0-585-08454-8 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
""Database Needs for Modeling and Simulation of Plasma Processing""; ""Copyright""; ""Preface""; ""Contents""; ""Executive Summary""; ""FINDINGS""; ""CONCLUSIONS""; ""RECOMMENDATIONS""; ""REFERENCES""; ""1 Industrial Perspectives ""; ""INTRODUCTION""; ""PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING""; ""PLASMA EQUIPMENT SUPPLIER PERSPECTIVES""; ""CHIP MANUFACTURER PERSPECTIVES""; ""RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""2 Tool Scale and Feature Scale Models ""; ""INTRODUCTION""; ""TOOL SCALE MODELS""
""Capabilities Needed for Tool Scale Models""""Barriers to Using Tool Scale Models""; ""FEATURE SCALE MODELS""; ""GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""3 Radiative Processes and Diagnostics ""; ""INTRODUCTION""; ""TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES""; ""Information Resources""; ""Roles of the Database In Motivating Diagnostic Experiments""; ""SURFACE REACTION DATABASE AND DIAGNOSTICS""; ""Information Resources""; ""New Diagnostic Techniques""; ""FINDINGS"" ""REFERENCES""""4 Heterogeneous Processes ""; ""INTRODUCTION""; ""STATE OF THE DATABASE""; ""TECHNIQUES FOR IMPROVING THE DATABASE""; ""Approach""; ""Measurements On Realistic Plasma Reactors""; ""Incident Flux and Desorbing Flux Analysis""; ""Condition of the Surface""; ""Technology""; ""Ultrahigh-Vacuum Approach Using Mass and Energy Selected Reactive Beams""; ""Particle Beams""; ""Sticking Coefficients""; ""Synergistic Effects""; ""Substrate Temperature Dependence""; ""Angle Dependence""; ""Computer Simulations""; ""FINDINGS""; ""REFERENCES""; ""5 Electron Collision Processes "" ""INTRODUCTION""""IONIZATION""; ""Atoms""; ""Molecules""; ""Theoretical Methods and Advances""; ""Neutral Dissociation""; ""ELECTRON-IMPACT EXCITATION""; ""ATTACHMENT""; ""MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS""; ""GENERAL COMMENTS""; ""FINDINGS""; ""REFERENCES""; ""6 Ion Processes, Neutral Chemistry, And Thermochemical Data ""; ""INTRODUCTION""; ""CROSS SECTIONS AND RATE COEFFICIENTS""; ""Ion Processes""; ""Momentum Transfer""; ""Ion-Molecule and Charge Exchange Reactions""; ""Ion-Ion Neutralization""; ""Electron-Ion Recombination"" ""Ion-Neutral and Neutral-Neutral Excitation""""Neutral Chemistry""; ""Status of the Database""; ""Excited State Chemistry and Penning Ionization""; ""Summary""; ""Ion Processes""; ""Neutral Chemistry""; ""THERMOCHEMICAL DATA""; ""FINDINGS""; ""REFERENCES""; ""Appendix A: Acronyms and Abbreviations""; ""Appendix B: Workshop Agenda""; ""Appendix C: Workshop Participants"" |
| Record Nr. | UNINA-9910825813503321 |
| Washington, D.C., : National Academy Press, 1996 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
