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2005 IEEE 32nd International Conference on Plasma Sciences
| 2005 IEEE 32nd International Conference on Plasma Sciences |
| Pubbl/distr/stampa | [Place of publication not identified], : I E E E, 2005 |
| Descrizione fisica | 1 online resource (377 pages) : illustrations |
| Disciplina | 621.044 |
| Soggetto topico | Plasma engineering |
| ISBN | 1-5090-9713-9 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910146818403321 |
| [Place of publication not identified], : I E E E, 2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
2005 IEEE 32nd International Conference on Plasma Sciences
| 2005 IEEE 32nd International Conference on Plasma Sciences |
| Pubbl/distr/stampa | [Place of publication not identified], : I E E E, 2005 |
| Descrizione fisica | 1 online resource (377 pages) : illustrations |
| Disciplina | 621.044 |
| Soggetto topico | Plasma engineering |
| ISBN | 1-5090-9713-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996203241603316 |
| [Place of publication not identified], : I E E E, 2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
2008 IEEE 35th International Conference on Plasma Science : 15-19 June 2008
| 2008 IEEE 35th International Conference on Plasma Science : 15-19 June 2008 |
| Pubbl/distr/stampa | New York : , : IEEE, , 2008 |
| Descrizione fisica | 1 online resource (619 pages) |
| Soggetto topico | Plasma engineering |
| ISBN |
1-5090-7846-0
1-4244-1930-1 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996206291603316 |
| New York : , : IEEE, , 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
2008 IEEE 35th International Conference on Plasma Science : 15-19 June 2008
| 2008 IEEE 35th International Conference on Plasma Science : 15-19 June 2008 |
| Pubbl/distr/stampa | New York : , : IEEE, , 2008 |
| Descrizione fisica | 1 online resource (619 pages) |
| Soggetto topico | Plasma engineering |
| ISBN |
1-5090-7846-0
1-4244-1930-1 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910145724603321 |
| New York : , : IEEE, , 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
2012 IEEE 39th International Conference on Plasma Sciences
| 2012 IEEE 39th International Conference on Plasma Sciences |
| Pubbl/distr/stampa | [Place of publication not identified], : IEEE, 2012 |
| Descrizione fisica | 1 online resource (1 volume (734 pages)) : illustrations (black and white) |
| Disciplina | 621.044 |
| Soggetto topico | Plasma engineering |
| ISBN |
1-4577-2129-5
1-4577-2128-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996217918403316 |
| [Place of publication not identified], : IEEE, 2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
2012 IEEE 39th International Conference on Plasma Sciences
| 2012 IEEE 39th International Conference on Plasma Sciences |
| Pubbl/distr/stampa | [Place of publication not identified], : IEEE, 2012 |
| Descrizione fisica | 1 online resource (1 volume (734 pages)) : illustrations (black and white) |
| Disciplina | 621.044 |
| Soggetto topico | Plasma engineering |
| ISBN |
1-4577-2129-5
1-4577-2128-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910141366503321 |
| [Place of publication not identified], : IEEE, 2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Advanced plasma technology / / edited by Riccardo d'Agostino [and five others]
| Advanced plasma technology / / edited by Riccardo d'Agostino [and five others] |
| Pubbl/distr/stampa | Weinheim, Germany : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 |
| Descrizione fisica | 1 online resource (481 p.) |
| Disciplina |
621.044
660.004 |
| Soggetto topico | Plasma engineering |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-281-94675-3
9786611946753 3-527-62218-7 3-527-62219-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Advanced Plasma Technology; Contents; Preface; List of Contributors; 1 Basic Approaches to Plasma Production and Control; 1.1 Plasma Production; 1.1.1 Under Low Gas Pressure (10 torr); 1.2 Energy Control; 1.2.1 Electron-Temperature Control; 1.2.2 Ion-Energy Control; 1.3 Dust Collection and Removal; References; 2 Plasma Sources and Reactor Configurations; 2.1 Introduction; 2.2 Characteristics of ICP; 2.2.1 Principle; 2.2.2 Transformer Model; 2.2.3 Technological Aspects; 2.2.3.1 Matching
2.2.3.2 Capacitive Coupling2.2.3.3 Standing Wave Effects; 2.3 Sources and Reactor Configuration; 2.3.1 Substrate Shape; 2.3.1.1 Flat Substrates; 2.3.1.2 Complex Three-Dimensional Shapes; 2.3.1.3 Large Area Treatment; 2.4 Conclusions; References; 3 Advanced Simulations for Industrial Plasma Applications; 3.1 Introduction; 3.2 PIC Simulations; 3.2.1 Capacitively Coupled O(2)/Ar Plasmas; 3.2.1.1 Gas Composition; 3.2.1.2 Pressure Effect in Ar/O(2) Plasmas; 3.2.2 Three-Dimensional (3D) Charge-up Simulation; 3.2.2.1 Description of 3D Charge-up Simulations 3.2.2.2 Effects of Secondary Electron Emission3.2.2.3 Negative Ion Extraction; 3.3 Fluid Simulations; 3.3.1 Capacitively Coupled Discharges; 3.3.2 Large Area Plasma Source; 3.4 Summary; References; 4 Modeling and Diagnostics of He Discharges for Treatment of Polymers; 4.1 Introduction; 4.2 Experimental; 4.3 Model Description; 4.4 Results and Discussion; 4.4.1 Electrical Properties; 4.4.2 Gas-Phase Chemistry; 4.4.3 Plasma-Surface Interactions; 4.5 Conclusions; References; 5 Three-Dimensional Modeling of Thermal Plasmas (RF and Transferred Arc) for the Design of Sources and Industrial Processes 5.1 Introduction5.2 Inductively Coupled Plasma Torches; 5.2.1 Modeling Approach; 5.2.1.1 Modeling Assumptions; 5.2.1.2 Governing Equations of the Continuum Phase; 5.2.1.3 Governing Equations of the Discrete Phase; 5.2.1.4 Computational Domain and Boundary Conditions; 5.2.2 Selected Simulation Results; 5.2.2.1 High-Definition Numerical Simulation of Industrial ICPTs; 5.2.2.2 Numerical Simulation of the Trajectories and Thermal Histories of Powders Injected in Industrial ICPTs; 5.3 DC Transferred Arc Plasma Torches; 5.3.1 Modeling Approach; 5.3.1.1 Modeling Assumptions 5.3.1.2 Governing Equations5.3.1.3 Computational Domain and Boundary Conditions; 5.3.2 Selected Simulation Results; 5.3.2.1 Magnetically Deflected Transferred Arc; 5.3.2.2 The Twin Torch; 5.3.2.3 The Cutting Torch; References; 6 Radiofrequency Plasma Sources for Semiconductor Processing; 6.1 Introduction; 6.2 Capacitively Coupled Plasmas; 6.2.1 Dual-Frequency CCPs; 6.3 Inductively Coupled Plasmas; 6.3.1 General Description; 6.3.2 Anomalous Skin Depth; 6.3.3 Magnetized ICPs; 6.4 Helicon Wave Sources; 6.4.1 General Description; 6.4.2 Unusual Features; 6.4.3 Extended Helicon Sources; References 7 Advanced Plasma Diagnostics for Thin-Film Deposition |
| Record Nr. | UNINA-9910144100803321 |
| Weinheim, Germany : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Advanced plasma technology / / edited by Riccardo d'Agostino [and five others]
| Advanced plasma technology / / edited by Riccardo d'Agostino [and five others] |
| Pubbl/distr/stampa | Weinheim, Germany : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 |
| Descrizione fisica | 1 online resource (481 p.) |
| Disciplina |
621.044
660.004 |
| Soggetto topico | Plasma engineering |
| ISBN |
1-281-94675-3
9786611946753 3-527-62218-7 3-527-62219-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Advanced Plasma Technology; Contents; Preface; List of Contributors; 1 Basic Approaches to Plasma Production and Control; 1.1 Plasma Production; 1.1.1 Under Low Gas Pressure (10 torr); 1.2 Energy Control; 1.2.1 Electron-Temperature Control; 1.2.2 Ion-Energy Control; 1.3 Dust Collection and Removal; References; 2 Plasma Sources and Reactor Configurations; 2.1 Introduction; 2.2 Characteristics of ICP; 2.2.1 Principle; 2.2.2 Transformer Model; 2.2.3 Technological Aspects; 2.2.3.1 Matching
2.2.3.2 Capacitive Coupling2.2.3.3 Standing Wave Effects; 2.3 Sources and Reactor Configuration; 2.3.1 Substrate Shape; 2.3.1.1 Flat Substrates; 2.3.1.2 Complex Three-Dimensional Shapes; 2.3.1.3 Large Area Treatment; 2.4 Conclusions; References; 3 Advanced Simulations for Industrial Plasma Applications; 3.1 Introduction; 3.2 PIC Simulations; 3.2.1 Capacitively Coupled O(2)/Ar Plasmas; 3.2.1.1 Gas Composition; 3.2.1.2 Pressure Effect in Ar/O(2) Plasmas; 3.2.2 Three-Dimensional (3D) Charge-up Simulation; 3.2.2.1 Description of 3D Charge-up Simulations 3.2.2.2 Effects of Secondary Electron Emission3.2.2.3 Negative Ion Extraction; 3.3 Fluid Simulations; 3.3.1 Capacitively Coupled Discharges; 3.3.2 Large Area Plasma Source; 3.4 Summary; References; 4 Modeling and Diagnostics of He Discharges for Treatment of Polymers; 4.1 Introduction; 4.2 Experimental; 4.3 Model Description; 4.4 Results and Discussion; 4.4.1 Electrical Properties; 4.4.2 Gas-Phase Chemistry; 4.4.3 Plasma-Surface Interactions; 4.5 Conclusions; References; 5 Three-Dimensional Modeling of Thermal Plasmas (RF and Transferred Arc) for the Design of Sources and Industrial Processes 5.1 Introduction5.2 Inductively Coupled Plasma Torches; 5.2.1 Modeling Approach; 5.2.1.1 Modeling Assumptions; 5.2.1.2 Governing Equations of the Continuum Phase; 5.2.1.3 Governing Equations of the Discrete Phase; 5.2.1.4 Computational Domain and Boundary Conditions; 5.2.2 Selected Simulation Results; 5.2.2.1 High-Definition Numerical Simulation of Industrial ICPTs; 5.2.2.2 Numerical Simulation of the Trajectories and Thermal Histories of Powders Injected in Industrial ICPTs; 5.3 DC Transferred Arc Plasma Torches; 5.3.1 Modeling Approach; 5.3.1.1 Modeling Assumptions 5.3.1.2 Governing Equations5.3.1.3 Computational Domain and Boundary Conditions; 5.3.2 Selected Simulation Results; 5.3.2.1 Magnetically Deflected Transferred Arc; 5.3.2.2 The Twin Torch; 5.3.2.3 The Cutting Torch; References; 6 Radiofrequency Plasma Sources for Semiconductor Processing; 6.1 Introduction; 6.2 Capacitively Coupled Plasmas; 6.2.1 Dual-Frequency CCPs; 6.3 Inductively Coupled Plasmas; 6.3.1 General Description; 6.3.2 Anomalous Skin Depth; 6.3.3 Magnetized ICPs; 6.4 Helicon Wave Sources; 6.4.1 General Description; 6.4.2 Unusual Features; 6.4.3 Extended Helicon Sources; References 7 Advanced Plasma Diagnostics for Thin-Film Deposition |
| Record Nr. | UNINA-9910830298803321 |
| Weinheim, Germany : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Biomimetic architectures by plasma processing : fabrication and applications / / edited by Surojit Chattopadhyay
| Biomimetic architectures by plasma processing : fabrication and applications / / edited by Surojit Chattopadhyay |
| Pubbl/distr/stampa | Boca Raton, FL : , : CRC Press |
| Descrizione fisica | 1 online resource (246 p.) |
| Disciplina | 621.044 |
| Soggetto topico |
Plasma engineering
Biomimetics Nanostructured materials |
| ISBN |
0-429-08591-5
981-4463-95-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Front Cover; About the Cover; Contents; Preface; Introduction; Chapter 1: Photonic Structures in the Animal Kingdom: Valuable Inspirations for Biomimetic Applications; Chapter 2: Anti-Reflecting Nanostructures; Chapter 3: Plasma-Processed Biomimetic Nano- and Micro-Structures; Chapter 4: Wetting Properties of Natural and Plasma-Processed Biomimetic Surfaces; Chapter 5: Biomimetic Superhydrophobic Surface Fabrication by Plasma Processing; Chapter 6: Biomimetic Interfaces of Plasma-Modified Titanium Alloy |
| Record Nr. | UNINA-9910787961703321 |
| Boca Raton, FL : , : CRC Press | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Biomimetic architectures by plasma processing : fabrication and applications / / edited by Surojit Chattopadhyay
| Biomimetic architectures by plasma processing : fabrication and applications / / edited by Surojit Chattopadhyay |
| Edizione | [1st ed.] |
| Pubbl/distr/stampa | Boca Raton, FL : , : CRC Press |
| Descrizione fisica | 1 online resource (246 p.) |
| Disciplina | 621.044 |
| Soggetto topico |
Plasma engineering
Biomimetics Nanostructured materials |
| ISBN |
0-429-08591-5
981-4463-95-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Front Cover; About the Cover; Contents; Preface; Introduction; Chapter 1: Photonic Structures in the Animal Kingdom: Valuable Inspirations for Biomimetic Applications; Chapter 2: Anti-Reflecting Nanostructures; Chapter 3: Plasma-Processed Biomimetic Nano- and Micro-Structures; Chapter 4: Wetting Properties of Natural and Plasma-Processed Biomimetic Surfaces; Chapter 5: Biomimetic Superhydrophobic Surface Fabrication by Plasma Processing; Chapter 6: Biomimetic Interfaces of Plasma-Modified Titanium Alloy |
| Record Nr. | UNINA-9910812689303321 |
| Boca Raton, FL : , : CRC Press | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
