2001 IEEE International Conference on Plasma Science |
Pubbl/distr/stampa | [Place of publication not identified], : I E E E, 2001 |
Descrizione fisica | 1 online resource : illustrations |
Disciplina | 541.0 |
Soggetto topico | Plasma chemistry |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996217700903316 |
[Place of publication not identified], : I E E E, 2001 | ||
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Lo trovi qui: Univ. di Salerno | ||
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2001 IEEE International Conference on Plasma Science |
Pubbl/distr/stampa | [Place of publication not identified], : I E E E, 2001 |
Descrizione fisica | 1 online resource : illustrations |
Disciplina | 541.0 |
Soggetto topico | Plasma chemistry |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910872734203321 |
[Place of publication not identified], : I E E E, 2001 | ||
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Lo trovi qui: Univ. Federico II | ||
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Dusty plasmas : physics, chemistry, and technological impacts in plasma processing / edited by André Bouchoule |
Autore | Bouchoule, André |
Pubbl/distr/stampa | Chichester, England ; New York : John Wiley & Sons, c1999 |
Descrizione fisica | viii, 408 p. : ill. ; 24 cm. |
Disciplina |
53.6.5
660.044 TA2020 |
Soggetto topico |
Dusty plasmas
Plasma chemistry Plasma engineering Plasma enhanced chemical vapor deposition Plasma (Ionized gases)-Industrial applications |
ISBN | 0471973866 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISALENTO-991003071579707536 |
Bouchoule, André
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Chichester, England ; New York : John Wiley & Sons, c1999 | ||
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Lo trovi qui: Univ. del Salento | ||
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Introduction to plasma technology [[electronic resource] ] : science, engineering and applications / / John Harry |
Autore | Harry John |
Pubbl/distr/stampa | Weinheim, Germany, : Wiley-VCH, 2010 |
Descrizione fisica | 1 online resource (234 p.) |
Disciplina |
530.44
660.044 |
Soggetto topico |
Plasma engineering
Plasma chemistry |
Soggetto genere / forma | Electronic books. |
ISBN |
3-527-64370-2
1-283-30238-1 9786613302380 3-527-63217-4 3-527-63216-6 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
Introduction to Plasma Technology: Science, Engineering and Applications; Contents; Preface; Symbols, Constants and Electronic Symbols; 1 Plasma, an Overview; 1.1 Introduction; 1.2 Plasma; 1.2.1 Space Plasmas; 1.2.2 Kinetic Plasmas; 1.2.3 Technological Plasmas; 1.3 Classical Models; 1.3.1 Simple Ballistic and Statistical Models; 1.3.2 Statistical Behaviour; 1.3.3 Collisions Between Particles; 1.3.4 Coulomb Forces; 1.3.5 Boundaries and Sheaths; 1.3.6 Degree of Ionization; 1.4 Plasma Resonance; 1.5 The Defining Characteristics of a Plasma; References; Further Reading
2 Elastic and Inelastic Collision Processes in Weakly Ionized Gases2.1 Introduction; 2.2 The Drift Velocity; 2.2.1 Electrical Conductivity; 2.2.2 Mobility; 2.2.3 Thermal Velocity; 2.2.4 Collision Frequency; 2.2.5 Collision Cross-section; 2.3 Inelastic Collision Processes; 2.3.1 Excitation; 2.3.1.1 Metastable Processes; 2.3.2 Ionization and Recombination Processes; 2.3.2.1 Charge Transfer; 2.3.2.2 Dissociation; 2.3.2.3 Negative Ionization; 2.3.2.4 Recombination; 2.3.2.5 Metastable Ionization; References; 3 The Interaction of Electromagnetic Fields with Plasmas; 3.1 Introduction 3.2 The Behaviour of Plasmas at DC and Low Frequencies in the Near Field3.2.1 Charged Particles in Electromagnetic Fields; 3.2.1.1 Behaviour of a Charged Particle in an Oscillating Electric Field; 3.2.1.2 Plasma Frequency; 3.2.1.3 The Debye Radius; 3.3 Behaviour of Charged Particles in Magnetic Fields (Magnetized Plasmas); 3.4 Initiation of an Electrical Discharge or Plasma; 3.5 Similarity Conditions; References; Further Reading; 4 Coupling Processes; 4.1 Introduction; 4.2 Direct Coupling; 4.2.1 The Cathode; 4.2.1.1 Emission Processes; 4.2.2 The Cathode Fall Region; 4.2.3 The Anode 4.2.4 The Discharge Column4.2.5 Interaction of Magnetic Fields with a Discharge or Plasma; 4.3 Indirect Coupling; 4.3.1 Induction Coupling; 4.3.2 Capacitive Coupling; 4.3.3 Propagation of an Electromagnetic Wave; 4.3.4 The Helical Resonator; 4.3.5 Microwave Waveguides; 4.3.6 Electron Cyclotron Resonance; 4.3.7 The Helicon Plasma Source; References; Further Reading; 5 Applications of Nonequilibrium Cold Low-pressure Discharges and Plasmas; 5.1 Introduction; 5.2 Plasma Processes Used in Electronics Fabrication; 5.2.1 The Glow Discharge Diode; 5.2.2 The Magnetron 5.2.3 Inductively Coupled Plasmas5.2.4 Electron Cyclotron Resonance Reactor; 5.2.5 The Helical Reactor; 5.2.6 The Helicon Reactor; 5.3 Low-pressure Electric Discharge and Plasma Lamps; 5.3.1 The Low-pressure Mercury Vapour Lamp; 5.3.2 Cold Cathode Low-pressure Lamps; 5.3.3 Electrodeless Low-pressure Discharge Lamps; 5.4 Gas Lasers; 5.5 Free Electron and Ion Beams; 5.5.1 Electron and Ion Beam Evaporation; 5.5.2 Ion Beam Processes; 5.5.3 High-power Electron Beams; 5.6 Glow Discharge Surface Treatment; 5.7 Propulsion in Space; References; Further Reading 6 Nonequilibrium Atmospheric Pressure Discharges and Plasmas |
Record Nr. | UNINA-9910139422103321 |
Harry John
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Weinheim, Germany, : Wiley-VCH, 2010 | ||
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Lo trovi qui: Univ. Federico II | ||
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Introduction to plasma technology : science, engineering and applications / / John Harry |
Autore | Harry John |
Pubbl/distr/stampa | Weinheim, Germany, : Wiley-VCH, 2010 |
Descrizione fisica | 1 online resource (234 p.) |
Disciplina |
530.44
660.044 |
Soggetto topico |
Plasma engineering
Plasma chemistry |
ISBN |
3-527-64370-2
1-283-30238-1 9786613302380 3-527-63217-4 3-527-63216-6 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
Introduction to Plasma Technology: Science, Engineering and Applications; Contents; Preface; Symbols, Constants and Electronic Symbols; 1 Plasma, an Overview; 1.1 Introduction; 1.2 Plasma; 1.2.1 Space Plasmas; 1.2.2 Kinetic Plasmas; 1.2.3 Technological Plasmas; 1.3 Classical Models; 1.3.1 Simple Ballistic and Statistical Models; 1.3.2 Statistical Behaviour; 1.3.3 Collisions Between Particles; 1.3.4 Coulomb Forces; 1.3.5 Boundaries and Sheaths; 1.3.6 Degree of Ionization; 1.4 Plasma Resonance; 1.5 The Defining Characteristics of a Plasma; References; Further Reading
2 Elastic and Inelastic Collision Processes in Weakly Ionized Gases2.1 Introduction; 2.2 The Drift Velocity; 2.2.1 Electrical Conductivity; 2.2.2 Mobility; 2.2.3 Thermal Velocity; 2.2.4 Collision Frequency; 2.2.5 Collision Cross-section; 2.3 Inelastic Collision Processes; 2.3.1 Excitation; 2.3.1.1 Metastable Processes; 2.3.2 Ionization and Recombination Processes; 2.3.2.1 Charge Transfer; 2.3.2.2 Dissociation; 2.3.2.3 Negative Ionization; 2.3.2.4 Recombination; 2.3.2.5 Metastable Ionization; References; 3 The Interaction of Electromagnetic Fields with Plasmas; 3.1 Introduction 3.2 The Behaviour of Plasmas at DC and Low Frequencies in the Near Field3.2.1 Charged Particles in Electromagnetic Fields; 3.2.1.1 Behaviour of a Charged Particle in an Oscillating Electric Field; 3.2.1.2 Plasma Frequency; 3.2.1.3 The Debye Radius; 3.3 Behaviour of Charged Particles in Magnetic Fields (Magnetized Plasmas); 3.4 Initiation of an Electrical Discharge or Plasma; 3.5 Similarity Conditions; References; Further Reading; 4 Coupling Processes; 4.1 Introduction; 4.2 Direct Coupling; 4.2.1 The Cathode; 4.2.1.1 Emission Processes; 4.2.2 The Cathode Fall Region; 4.2.3 The Anode 4.2.4 The Discharge Column4.2.5 Interaction of Magnetic Fields with a Discharge or Plasma; 4.3 Indirect Coupling; 4.3.1 Induction Coupling; 4.3.2 Capacitive Coupling; 4.3.3 Propagation of an Electromagnetic Wave; 4.3.4 The Helical Resonator; 4.3.5 Microwave Waveguides; 4.3.6 Electron Cyclotron Resonance; 4.3.7 The Helicon Plasma Source; References; Further Reading; 5 Applications of Nonequilibrium Cold Low-pressure Discharges and Plasmas; 5.1 Introduction; 5.2 Plasma Processes Used in Electronics Fabrication; 5.2.1 The Glow Discharge Diode; 5.2.2 The Magnetron 5.2.3 Inductively Coupled Plasmas5.2.4 Electron Cyclotron Resonance Reactor; 5.2.5 The Helical Reactor; 5.2.6 The Helicon Reactor; 5.3 Low-pressure Electric Discharge and Plasma Lamps; 5.3.1 The Low-pressure Mercury Vapour Lamp; 5.3.2 Cold Cathode Low-pressure Lamps; 5.3.3 Electrodeless Low-pressure Discharge Lamps; 5.4 Gas Lasers; 5.5 Free Electron and Ion Beams; 5.5.1 Electron and Ion Beam Evaporation; 5.5.2 Ion Beam Processes; 5.5.3 High-power Electron Beams; 5.6 Glow Discharge Surface Treatment; 5.7 Propulsion in Space; References; Further Reading 6 Nonequilibrium Atmospheric Pressure Discharges and Plasmas |
Record Nr. | UNINA-9910876879003321 |
Harry John
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Weinheim, Germany, : Wiley-VCH, 2010 | ||
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Lo trovi qui: Univ. Federico II | ||
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Plasma |
Pubbl/distr/stampa | Basel, Switzerland : , : MDPI, AG, , 2018- |
Descrizione fisica | 1 online resource |
Soggetto topico |
Plasma chemistry
Plasma astrophysics Plasma dynamics |
Soggetto genere / forma |
Periodicals.
Zeitschrift |
ISSN | 2571-6182 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Periodico |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996320857603316 |
Basel, Switzerland : , : MDPI, AG, , 2018- | ||
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Lo trovi qui: Univ. di Salerno | ||
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Plasma |
Pubbl/distr/stampa | Basel, Switzerland : , : MDPI, AG, , 2018- |
Descrizione fisica | 1 online resource |
Soggetto topico |
Plasma chemistry
Plasma astrophysics Plasma dynamics |
Soggetto genere / forma |
Periodicals.
Zeitschrift |
ISSN | 2571-6182 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Periodico |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910332060103321 |
Basel, Switzerland : , : MDPI, AG, , 2018- | ||
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Lo trovi qui: Univ. Federico II | ||
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Plasma chemistry and catalysis in gases and liquids [[electronic resource] /] / edited by Vasile I. Parvulescu, Monica Magureanu, and Petr Lukes |
Edizione | [2nd ed.] |
Pubbl/distr/stampa | Weinheim, : Wiley-VCH Verlag GmbH & Co. KGaA, c2012 |
Descrizione fisica | 1 online resource (421 p.) |
Disciplina | 541.0424 |
Altri autori (Persone) |
PârvulescuV. I (Vasile I.)
MagureanuMonica LukesPetr |
Soggetto topico |
Plasma chemistry
Catalysis Gases Liquids |
ISBN |
3-527-64954-9
1-280-67927-1 9786613656209 3-527-64952-2 3-527-64955-7 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
Plasma Chemistry and Catalysis in Gases and Liquids; Contents; Preface; List of Contributors; 1 An Introduction to Nonequilibrium Plasmas at Atmospheric Pressure; 1.1 Introduction; 1.1.1 Nonthermal Plasmas and Electron Energy Distributions; 1.1.2 Barrier and Corona Streamer Discharges - Discharges at Atmospheric Pressure; 1.1.3 Other Nonthermal Discharge Types; 1.1.3.1 Transition to Sparks, Arcs, or Leaders; 1.1.4 Microscopic Discharge Mechanisms; 1.1.4.1 Bulk Ionization Mechanisms; 1.1.4.2 Surface Ionization Mechanisms; 1.1.5 Chemical Activity; 1.1.6 Diagnostics; 1.2 Coronas and Streamers
1.2.1 Occurrence and Applications1.2.2 Main Properties of Streamers; 1.2.3 Streamer Initiation or Homogeneous Breakdown; 1.2.4 Streamer Propagation; 1.2.4.1 Electron Sources for Positive Streamers; 1.2.5 Initiation Cloud, Primary, Secondary, and Late Streamers; 1.2.6 Streamer Branching and Interaction; 1.3 Glow Discharges at Higher Pressures; 1.3.1 Introduction; 1.3.2 Properties; 1.3.3 Studies; 1.3.4 Instabilities; 1.4 Dielectric Barrier and Surface Discharges; 1.4.1 Basic Geometries; 1.4.2 Main Properties; 1.4.3 Surface Discharges and Packed Beds; 1.4.4 Applications of Barrier Discharges 1.5 Gliding Arcs1.6 Concluding Remarks; References; 2 Catalysts Used in Plasma-Assisted Catalytic Processes: Preparation, Activation, and Regeneration; 2.1 Introduction; 2.2 Specific Features Generated by Plasma-Assisted Catalytic Applications; 2.3 Chemical Composition and Texture; 2.4 Methodologies Used for the Preparation of Catalysts for Plasma-Assisted Catalytic Reactions; 2.4.1 Oxides and Oxide Supports; 2.4.1.1 Al2O3; 2.4.1.2 SiO2; 2.4.1.3 TiO2; 2.4.1.4 ZrO2; 2.4.2 Zeolites; 2.4.2.1 Metal-Containing Molecular Sieves; 2.4.3 Active Oxides; 2.4.4 Mixed Oxides; 2.4.4.1 Intimate Mixed Oxides 2.4.4.2 Perovskites2.4.5 Supported Oxides; 2.4.5.1 Metal Oxides on Metal Foams and Metal Textiles; 2.4.6 Metal Catalysts; 2.4.6.1 Embedded Nanoparticles; 2.4.6.2 Catalysts Prepared via Electroplating; 2.4.6.3 Catalysts Prepared via Chemical Vapor Infiltration; 2.4.6.4 Metal Wires; 2.4.6.5 Supported Metals; 2.4.6.6 Supported Noble Metals; 2.5 Catalysts Forming; 2.5.1 Tableting; 2.5.2 Spherudizing; 2.5.3 Pelletization; 2.5.4 Extrusion; 2.5.5 Foams; 2.5.6 Metal Textile Catalysts; 2.6 Regeneration of the Catalysts Used in Plasma Assisted Reactions; 2.7 Plasma Produced Catalysts and Supports 2.7.1 Sputtering2.8 Conclusions; References; 3 NOx Abatement by Plasma Catalysis; 3.1 Introduction; 3.1.1 Why Nonthermal Plasma-Assisted Catalytic NOx Remediation?; 3.2 General deNOx Model over Supported Metal Cations and Role of NTP Reactor: ''Plasma-Assisted Catalytic deNOx Reaction''; 3.3 About the Nonthermal Plasma for NOx Remediation; 3.3.1 The Nanosecond Pulsed DBD Reactor Coupled with a Catalytic deNOx Reactor: a Laboratory Scale Device Easily Scaled Up at Pilot Level; 3.3.2 Nonthermal Plasma Chemistry and Kinetics; 3.3.3 Plasma Energy Deposition and Energy Cost 3.4 Special Application of NTP to Catalytic Oxidation of Methane on Alumina-Supported Noble Metal Catalysts |
Record Nr. | UNINA-9910139747103321 |
Weinheim, : Wiley-VCH Verlag GmbH & Co. KGaA, c2012 | ||
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Lo trovi qui: Univ. Federico II | ||
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Plasma chemistry and catalysis in gases and liquids / / edited by Vasile I. Parvulescu, Monica Magureanu, and Petr Lukes |
Edizione | [2nd ed.] |
Pubbl/distr/stampa | Weinheim, : Wiley-VCH Verlag GmbH & Co. KGaA, c2012 |
Descrizione fisica | 1 online resource (421 p.) |
Disciplina | 541.0424 |
Altri autori (Persone) |
PârvulescuV. I (Vasile I.)
MagureanuMonica LukesPetr |
Soggetto topico |
Plasma chemistry
Catalysis Gases Liquids |
ISBN |
3-527-64954-9
1-280-67927-1 9786613656209 3-527-64952-2 3-527-64955-7 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
Plasma Chemistry and Catalysis in Gases and Liquids; Contents; Preface; List of Contributors; 1 An Introduction to Nonequilibrium Plasmas at Atmospheric Pressure; 1.1 Introduction; 1.1.1 Nonthermal Plasmas and Electron Energy Distributions; 1.1.2 Barrier and Corona Streamer Discharges - Discharges at Atmospheric Pressure; 1.1.3 Other Nonthermal Discharge Types; 1.1.3.1 Transition to Sparks, Arcs, or Leaders; 1.1.4 Microscopic Discharge Mechanisms; 1.1.4.1 Bulk Ionization Mechanisms; 1.1.4.2 Surface Ionization Mechanisms; 1.1.5 Chemical Activity; 1.1.6 Diagnostics; 1.2 Coronas and Streamers
1.2.1 Occurrence and Applications1.2.2 Main Properties of Streamers; 1.2.3 Streamer Initiation or Homogeneous Breakdown; 1.2.4 Streamer Propagation; 1.2.4.1 Electron Sources for Positive Streamers; 1.2.5 Initiation Cloud, Primary, Secondary, and Late Streamers; 1.2.6 Streamer Branching and Interaction; 1.3 Glow Discharges at Higher Pressures; 1.3.1 Introduction; 1.3.2 Properties; 1.3.3 Studies; 1.3.4 Instabilities; 1.4 Dielectric Barrier and Surface Discharges; 1.4.1 Basic Geometries; 1.4.2 Main Properties; 1.4.3 Surface Discharges and Packed Beds; 1.4.4 Applications of Barrier Discharges 1.5 Gliding Arcs1.6 Concluding Remarks; References; 2 Catalysts Used in Plasma-Assisted Catalytic Processes: Preparation, Activation, and Regeneration; 2.1 Introduction; 2.2 Specific Features Generated by Plasma-Assisted Catalytic Applications; 2.3 Chemical Composition and Texture; 2.4 Methodologies Used for the Preparation of Catalysts for Plasma-Assisted Catalytic Reactions; 2.4.1 Oxides and Oxide Supports; 2.4.1.1 Al2O3; 2.4.1.2 SiO2; 2.4.1.3 TiO2; 2.4.1.4 ZrO2; 2.4.2 Zeolites; 2.4.2.1 Metal-Containing Molecular Sieves; 2.4.3 Active Oxides; 2.4.4 Mixed Oxides; 2.4.4.1 Intimate Mixed Oxides 2.4.4.2 Perovskites2.4.5 Supported Oxides; 2.4.5.1 Metal Oxides on Metal Foams and Metal Textiles; 2.4.6 Metal Catalysts; 2.4.6.1 Embedded Nanoparticles; 2.4.6.2 Catalysts Prepared via Electroplating; 2.4.6.3 Catalysts Prepared via Chemical Vapor Infiltration; 2.4.6.4 Metal Wires; 2.4.6.5 Supported Metals; 2.4.6.6 Supported Noble Metals; 2.5 Catalysts Forming; 2.5.1 Tableting; 2.5.2 Spherudizing; 2.5.3 Pelletization; 2.5.4 Extrusion; 2.5.5 Foams; 2.5.6 Metal Textile Catalysts; 2.6 Regeneration of the Catalysts Used in Plasma Assisted Reactions; 2.7 Plasma Produced Catalysts and Supports 2.7.1 Sputtering2.8 Conclusions; References; 3 NOx Abatement by Plasma Catalysis; 3.1 Introduction; 3.1.1 Why Nonthermal Plasma-Assisted Catalytic NOx Remediation?; 3.2 General deNOx Model over Supported Metal Cations and Role of NTP Reactor: ''Plasma-Assisted Catalytic deNOx Reaction''; 3.3 About the Nonthermal Plasma for NOx Remediation; 3.3.1 The Nanosecond Pulsed DBD Reactor Coupled with a Catalytic deNOx Reactor: a Laboratory Scale Device Easily Scaled Up at Pilot Level; 3.3.2 Nonthermal Plasma Chemistry and Kinetics; 3.3.3 Plasma Energy Deposition and Energy Cost 3.4 Special Application of NTP to Catalytic Oxidation of Methane on Alumina-Supported Noble Metal Catalysts |
Record Nr. | UNINA-9910822158903321 |
Weinheim, : Wiley-VCH Verlag GmbH & Co. KGaA, c2012 | ||
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Lo trovi qui: Univ. Federico II | ||
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Plasma Chemistry and Gas Conversion / / edited by Nikolay Britun and Tiago Silva |
Pubbl/distr/stampa | London, United Kingdom : , : IntechOpen, , 2018 |
Descrizione fisica | 1 online resource (86 pages) : illustrations some color |
Disciplina | 541.0424 |
Soggetto topico |
Plasma chemistry
Plasma (Ionized gases) |
ISBN |
1-83881-832-4
1-78984-841-5 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910317771803321 |
London, United Kingdom : , : IntechOpen, , 2018 | ||
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Lo trovi qui: Univ. Federico II | ||
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