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2001 IEEE International Conference on Plasma Science
2001 IEEE International Conference on Plasma Science
Pubbl/distr/stampa [Place of publication not identified], : I E E E, 2001
Descrizione fisica 1 online resource : illustrations
Disciplina 541.0
Soggetto topico Plasma chemistry
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNISA-996217700903316
[Place of publication not identified], : I E E E, 2001
Materiale a stampa
Lo trovi qui: Univ. di Salerno
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2001 IEEE International Conference on Plasma Science
2001 IEEE International Conference on Plasma Science
Pubbl/distr/stampa [Place of publication not identified], : I E E E, 2001
Descrizione fisica 1 online resource : illustrations
Disciplina 541.0
Soggetto topico Plasma chemistry
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910872734203321
[Place of publication not identified], : I E E E, 2001
Materiale a stampa
Lo trovi qui: Univ. Federico II
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Dusty plasmas : physics, chemistry, and technological impacts in plasma processing / edited by André Bouchoule
Dusty plasmas : physics, chemistry, and technological impacts in plasma processing / edited by André Bouchoule
Autore Bouchoule, André
Pubbl/distr/stampa Chichester, England ; New York : John Wiley & Sons, c1999
Descrizione fisica viii, 408 p. : ill. ; 24 cm.
Disciplina 53.6.5
660.044
TA2020
Soggetto topico Dusty plasmas
Plasma chemistry
Plasma engineering
Plasma enhanced chemical vapor deposition
Plasma (Ionized gases)-Industrial applications
ISBN 0471973866
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNISALENTO-991003071579707536
Bouchoule, André  
Chichester, England ; New York : John Wiley & Sons, c1999
Materiale a stampa
Lo trovi qui: Univ. del Salento
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Introduction to plasma technology [[electronic resource] ] : science, engineering and applications / / John Harry
Introduction to plasma technology [[electronic resource] ] : science, engineering and applications / / John Harry
Autore Harry John
Pubbl/distr/stampa Weinheim, Germany, : Wiley-VCH, 2010
Descrizione fisica 1 online resource (234 p.)
Disciplina 530.44
660.044
Soggetto topico Plasma engineering
Plasma chemistry
Soggetto genere / forma Electronic books.
ISBN 3-527-64370-2
1-283-30238-1
9786613302380
3-527-63217-4
3-527-63216-6
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Introduction to Plasma Technology: Science, Engineering and Applications; Contents; Preface; Symbols, Constants and Electronic Symbols; 1 Plasma, an Overview; 1.1 Introduction; 1.2 Plasma; 1.2.1 Space Plasmas; 1.2.2 Kinetic Plasmas; 1.2.3 Technological Plasmas; 1.3 Classical Models; 1.3.1 Simple Ballistic and Statistical Models; 1.3.2 Statistical Behaviour; 1.3.3 Collisions Between Particles; 1.3.4 Coulomb Forces; 1.3.5 Boundaries and Sheaths; 1.3.6 Degree of Ionization; 1.4 Plasma Resonance; 1.5 The Defining Characteristics of a Plasma; References; Further Reading
2 Elastic and Inelastic Collision Processes in Weakly Ionized Gases2.1 Introduction; 2.2 The Drift Velocity; 2.2.1 Electrical Conductivity; 2.2.2 Mobility; 2.2.3 Thermal Velocity; 2.2.4 Collision Frequency; 2.2.5 Collision Cross-section; 2.3 Inelastic Collision Processes; 2.3.1 Excitation; 2.3.1.1 Metastable Processes; 2.3.2 Ionization and Recombination Processes; 2.3.2.1 Charge Transfer; 2.3.2.2 Dissociation; 2.3.2.3 Negative Ionization; 2.3.2.4 Recombination; 2.3.2.5 Metastable Ionization; References; 3 The Interaction of Electromagnetic Fields with Plasmas; 3.1 Introduction
3.2 The Behaviour of Plasmas at DC and Low Frequencies in the Near Field3.2.1 Charged Particles in Electromagnetic Fields; 3.2.1.1 Behaviour of a Charged Particle in an Oscillating Electric Field; 3.2.1.2 Plasma Frequency; 3.2.1.3 The Debye Radius; 3.3 Behaviour of Charged Particles in Magnetic Fields (Magnetized Plasmas); 3.4 Initiation of an Electrical Discharge or Plasma; 3.5 Similarity Conditions; References; Further Reading; 4 Coupling Processes; 4.1 Introduction; 4.2 Direct Coupling; 4.2.1 The Cathode; 4.2.1.1 Emission Processes; 4.2.2 The Cathode Fall Region; 4.2.3 The Anode
4.2.4 The Discharge Column4.2.5 Interaction of Magnetic Fields with a Discharge or Plasma; 4.3 Indirect Coupling; 4.3.1 Induction Coupling; 4.3.2 Capacitive Coupling; 4.3.3 Propagation of an Electromagnetic Wave; 4.3.4 The Helical Resonator; 4.3.5 Microwave Waveguides; 4.3.6 Electron Cyclotron Resonance; 4.3.7 The Helicon Plasma Source; References; Further Reading; 5 Applications of Nonequilibrium Cold Low-pressure Discharges and Plasmas; 5.1 Introduction; 5.2 Plasma Processes Used in Electronics Fabrication; 5.2.1 The Glow Discharge Diode; 5.2.2 The Magnetron
5.2.3 Inductively Coupled Plasmas5.2.4 Electron Cyclotron Resonance Reactor; 5.2.5 The Helical Reactor; 5.2.6 The Helicon Reactor; 5.3 Low-pressure Electric Discharge and Plasma Lamps; 5.3.1 The Low-pressure Mercury Vapour Lamp; 5.3.2 Cold Cathode Low-pressure Lamps; 5.3.3 Electrodeless Low-pressure Discharge Lamps; 5.4 Gas Lasers; 5.5 Free Electron and Ion Beams; 5.5.1 Electron and Ion Beam Evaporation; 5.5.2 Ion Beam Processes; 5.5.3 High-power Electron Beams; 5.6 Glow Discharge Surface Treatment; 5.7 Propulsion in Space; References; Further Reading
6 Nonequilibrium Atmospheric Pressure Discharges and Plasmas
Record Nr. UNINA-9910139422103321
Harry John  
Weinheim, Germany, : Wiley-VCH, 2010
Materiale a stampa
Lo trovi qui: Univ. Federico II
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Introduction to plasma technology : science, engineering and applications / / John Harry
Introduction to plasma technology : science, engineering and applications / / John Harry
Autore Harry John
Pubbl/distr/stampa Weinheim, Germany, : Wiley-VCH, 2010
Descrizione fisica 1 online resource (234 p.)
Disciplina 530.44
660.044
Soggetto topico Plasma engineering
Plasma chemistry
ISBN 3-527-64370-2
1-283-30238-1
9786613302380
3-527-63217-4
3-527-63216-6
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Introduction to Plasma Technology: Science, Engineering and Applications; Contents; Preface; Symbols, Constants and Electronic Symbols; 1 Plasma, an Overview; 1.1 Introduction; 1.2 Plasma; 1.2.1 Space Plasmas; 1.2.2 Kinetic Plasmas; 1.2.3 Technological Plasmas; 1.3 Classical Models; 1.3.1 Simple Ballistic and Statistical Models; 1.3.2 Statistical Behaviour; 1.3.3 Collisions Between Particles; 1.3.4 Coulomb Forces; 1.3.5 Boundaries and Sheaths; 1.3.6 Degree of Ionization; 1.4 Plasma Resonance; 1.5 The Defining Characteristics of a Plasma; References; Further Reading
2 Elastic and Inelastic Collision Processes in Weakly Ionized Gases2.1 Introduction; 2.2 The Drift Velocity; 2.2.1 Electrical Conductivity; 2.2.2 Mobility; 2.2.3 Thermal Velocity; 2.2.4 Collision Frequency; 2.2.5 Collision Cross-section; 2.3 Inelastic Collision Processes; 2.3.1 Excitation; 2.3.1.1 Metastable Processes; 2.3.2 Ionization and Recombination Processes; 2.3.2.1 Charge Transfer; 2.3.2.2 Dissociation; 2.3.2.3 Negative Ionization; 2.3.2.4 Recombination; 2.3.2.5 Metastable Ionization; References; 3 The Interaction of Electromagnetic Fields with Plasmas; 3.1 Introduction
3.2 The Behaviour of Plasmas at DC and Low Frequencies in the Near Field3.2.1 Charged Particles in Electromagnetic Fields; 3.2.1.1 Behaviour of a Charged Particle in an Oscillating Electric Field; 3.2.1.2 Plasma Frequency; 3.2.1.3 The Debye Radius; 3.3 Behaviour of Charged Particles in Magnetic Fields (Magnetized Plasmas); 3.4 Initiation of an Electrical Discharge or Plasma; 3.5 Similarity Conditions; References; Further Reading; 4 Coupling Processes; 4.1 Introduction; 4.2 Direct Coupling; 4.2.1 The Cathode; 4.2.1.1 Emission Processes; 4.2.2 The Cathode Fall Region; 4.2.3 The Anode
4.2.4 The Discharge Column4.2.5 Interaction of Magnetic Fields with a Discharge or Plasma; 4.3 Indirect Coupling; 4.3.1 Induction Coupling; 4.3.2 Capacitive Coupling; 4.3.3 Propagation of an Electromagnetic Wave; 4.3.4 The Helical Resonator; 4.3.5 Microwave Waveguides; 4.3.6 Electron Cyclotron Resonance; 4.3.7 The Helicon Plasma Source; References; Further Reading; 5 Applications of Nonequilibrium Cold Low-pressure Discharges and Plasmas; 5.1 Introduction; 5.2 Plasma Processes Used in Electronics Fabrication; 5.2.1 The Glow Discharge Diode; 5.2.2 The Magnetron
5.2.3 Inductively Coupled Plasmas5.2.4 Electron Cyclotron Resonance Reactor; 5.2.5 The Helical Reactor; 5.2.6 The Helicon Reactor; 5.3 Low-pressure Electric Discharge and Plasma Lamps; 5.3.1 The Low-pressure Mercury Vapour Lamp; 5.3.2 Cold Cathode Low-pressure Lamps; 5.3.3 Electrodeless Low-pressure Discharge Lamps; 5.4 Gas Lasers; 5.5 Free Electron and Ion Beams; 5.5.1 Electron and Ion Beam Evaporation; 5.5.2 Ion Beam Processes; 5.5.3 High-power Electron Beams; 5.6 Glow Discharge Surface Treatment; 5.7 Propulsion in Space; References; Further Reading
6 Nonequilibrium Atmospheric Pressure Discharges and Plasmas
Record Nr. UNINA-9910876879003321
Harry John  
Weinheim, Germany, : Wiley-VCH, 2010
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Plasma
Plasma
Pubbl/distr/stampa Basel, Switzerland : , : MDPI, AG, , 2018-
Descrizione fisica 1 online resource
Soggetto topico Plasma chemistry
Plasma astrophysics
Plasma dynamics
Soggetto genere / forma Periodicals.
Zeitschrift
ISSN 2571-6182
Formato Materiale a stampa
Livello bibliografico Periodico
Lingua di pubblicazione eng
Record Nr. UNISA-996320857603316
Basel, Switzerland : , : MDPI, AG, , 2018-
Materiale a stampa
Lo trovi qui: Univ. di Salerno
Opac: Controlla la disponibilità qui
Plasma
Plasma
Pubbl/distr/stampa Basel, Switzerland : , : MDPI, AG, , 2018-
Descrizione fisica 1 online resource
Soggetto topico Plasma chemistry
Plasma astrophysics
Plasma dynamics
Soggetto genere / forma Periodicals.
Zeitschrift
ISSN 2571-6182
Formato Materiale a stampa
Livello bibliografico Periodico
Lingua di pubblicazione eng
Record Nr. UNINA-9910332060103321
Basel, Switzerland : , : MDPI, AG, , 2018-
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Plasma chemistry and catalysis in gases and liquids [[electronic resource] /] / edited by Vasile I. Parvulescu, Monica Magureanu, and Petr Lukes
Plasma chemistry and catalysis in gases and liquids [[electronic resource] /] / edited by Vasile I. Parvulescu, Monica Magureanu, and Petr Lukes
Edizione [2nd ed.]
Pubbl/distr/stampa Weinheim, : Wiley-VCH Verlag GmbH & Co. KGaA, c2012
Descrizione fisica 1 online resource (421 p.)
Disciplina 541.0424
Altri autori (Persone) PârvulescuV. I (Vasile I.)
MagureanuMonica
LukesPetr
Soggetto topico Plasma chemistry
Catalysis
Gases
Liquids
ISBN 3-527-64954-9
1-280-67927-1
9786613656209
3-527-64952-2
3-527-64955-7
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Plasma Chemistry and Catalysis in Gases and Liquids; Contents; Preface; List of Contributors; 1 An Introduction to Nonequilibrium Plasmas at Atmospheric Pressure; 1.1 Introduction; 1.1.1 Nonthermal Plasmas and Electron Energy Distributions; 1.1.2 Barrier and Corona Streamer Discharges - Discharges at Atmospheric Pressure; 1.1.3 Other Nonthermal Discharge Types; 1.1.3.1 Transition to Sparks, Arcs, or Leaders; 1.1.4 Microscopic Discharge Mechanisms; 1.1.4.1 Bulk Ionization Mechanisms; 1.1.4.2 Surface Ionization Mechanisms; 1.1.5 Chemical Activity; 1.1.6 Diagnostics; 1.2 Coronas and Streamers
1.2.1 Occurrence and Applications1.2.2 Main Properties of Streamers; 1.2.3 Streamer Initiation or Homogeneous Breakdown; 1.2.4 Streamer Propagation; 1.2.4.1 Electron Sources for Positive Streamers; 1.2.5 Initiation Cloud, Primary, Secondary, and Late Streamers; 1.2.6 Streamer Branching and Interaction; 1.3 Glow Discharges at Higher Pressures; 1.3.1 Introduction; 1.3.2 Properties; 1.3.3 Studies; 1.3.4 Instabilities; 1.4 Dielectric Barrier and Surface Discharges; 1.4.1 Basic Geometries; 1.4.2 Main Properties; 1.4.3 Surface Discharges and Packed Beds; 1.4.4 Applications of Barrier Discharges
1.5 Gliding Arcs1.6 Concluding Remarks; References; 2 Catalysts Used in Plasma-Assisted Catalytic Processes: Preparation, Activation, and Regeneration; 2.1 Introduction; 2.2 Specific Features Generated by Plasma-Assisted Catalytic Applications; 2.3 Chemical Composition and Texture; 2.4 Methodologies Used for the Preparation of Catalysts for Plasma-Assisted Catalytic Reactions; 2.4.1 Oxides and Oxide Supports; 2.4.1.1 Al2O3; 2.4.1.2 SiO2; 2.4.1.3 TiO2; 2.4.1.4 ZrO2; 2.4.2 Zeolites; 2.4.2.1 Metal-Containing Molecular Sieves; 2.4.3 Active Oxides; 2.4.4 Mixed Oxides; 2.4.4.1 Intimate Mixed Oxides
2.4.4.2 Perovskites2.4.5 Supported Oxides; 2.4.5.1 Metal Oxides on Metal Foams and Metal Textiles; 2.4.6 Metal Catalysts; 2.4.6.1 Embedded Nanoparticles; 2.4.6.2 Catalysts Prepared via Electroplating; 2.4.6.3 Catalysts Prepared via Chemical Vapor Infiltration; 2.4.6.4 Metal Wires; 2.4.6.5 Supported Metals; 2.4.6.6 Supported Noble Metals; 2.5 Catalysts Forming; 2.5.1 Tableting; 2.5.2 Spherudizing; 2.5.3 Pelletization; 2.5.4 Extrusion; 2.5.5 Foams; 2.5.6 Metal Textile Catalysts; 2.6 Regeneration of the Catalysts Used in Plasma Assisted Reactions; 2.7 Plasma Produced Catalysts and Supports
2.7.1 Sputtering2.8 Conclusions; References; 3 NOx Abatement by Plasma Catalysis; 3.1 Introduction; 3.1.1 Why Nonthermal Plasma-Assisted Catalytic NOx Remediation?; 3.2 General deNOx Model over Supported Metal Cations and Role of NTP Reactor: ''Plasma-Assisted Catalytic deNOx Reaction''; 3.3 About the Nonthermal Plasma for NOx Remediation; 3.3.1 The Nanosecond Pulsed DBD Reactor Coupled with a Catalytic deNOx Reactor: a Laboratory Scale Device Easily Scaled Up at Pilot Level; 3.3.2 Nonthermal Plasma Chemistry and Kinetics; 3.3.3 Plasma Energy Deposition and Energy Cost
3.4 Special Application of NTP to Catalytic Oxidation of Methane on Alumina-Supported Noble Metal Catalysts
Record Nr. UNINA-9910139747103321
Weinheim, : Wiley-VCH Verlag GmbH & Co. KGaA, c2012
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Plasma chemistry and catalysis in gases and liquids / / edited by Vasile I. Parvulescu, Monica Magureanu, and Petr Lukes
Plasma chemistry and catalysis in gases and liquids / / edited by Vasile I. Parvulescu, Monica Magureanu, and Petr Lukes
Edizione [2nd ed.]
Pubbl/distr/stampa Weinheim, : Wiley-VCH Verlag GmbH & Co. KGaA, c2012
Descrizione fisica 1 online resource (421 p.)
Disciplina 541.0424
Altri autori (Persone) PârvulescuV. I (Vasile I.)
MagureanuMonica
LukesPetr
Soggetto topico Plasma chemistry
Catalysis
Gases
Liquids
ISBN 3-527-64954-9
1-280-67927-1
9786613656209
3-527-64952-2
3-527-64955-7
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Plasma Chemistry and Catalysis in Gases and Liquids; Contents; Preface; List of Contributors; 1 An Introduction to Nonequilibrium Plasmas at Atmospheric Pressure; 1.1 Introduction; 1.1.1 Nonthermal Plasmas and Electron Energy Distributions; 1.1.2 Barrier and Corona Streamer Discharges - Discharges at Atmospheric Pressure; 1.1.3 Other Nonthermal Discharge Types; 1.1.3.1 Transition to Sparks, Arcs, or Leaders; 1.1.4 Microscopic Discharge Mechanisms; 1.1.4.1 Bulk Ionization Mechanisms; 1.1.4.2 Surface Ionization Mechanisms; 1.1.5 Chemical Activity; 1.1.6 Diagnostics; 1.2 Coronas and Streamers
1.2.1 Occurrence and Applications1.2.2 Main Properties of Streamers; 1.2.3 Streamer Initiation or Homogeneous Breakdown; 1.2.4 Streamer Propagation; 1.2.4.1 Electron Sources for Positive Streamers; 1.2.5 Initiation Cloud, Primary, Secondary, and Late Streamers; 1.2.6 Streamer Branching and Interaction; 1.3 Glow Discharges at Higher Pressures; 1.3.1 Introduction; 1.3.2 Properties; 1.3.3 Studies; 1.3.4 Instabilities; 1.4 Dielectric Barrier and Surface Discharges; 1.4.1 Basic Geometries; 1.4.2 Main Properties; 1.4.3 Surface Discharges and Packed Beds; 1.4.4 Applications of Barrier Discharges
1.5 Gliding Arcs1.6 Concluding Remarks; References; 2 Catalysts Used in Plasma-Assisted Catalytic Processes: Preparation, Activation, and Regeneration; 2.1 Introduction; 2.2 Specific Features Generated by Plasma-Assisted Catalytic Applications; 2.3 Chemical Composition and Texture; 2.4 Methodologies Used for the Preparation of Catalysts for Plasma-Assisted Catalytic Reactions; 2.4.1 Oxides and Oxide Supports; 2.4.1.1 Al2O3; 2.4.1.2 SiO2; 2.4.1.3 TiO2; 2.4.1.4 ZrO2; 2.4.2 Zeolites; 2.4.2.1 Metal-Containing Molecular Sieves; 2.4.3 Active Oxides; 2.4.4 Mixed Oxides; 2.4.4.1 Intimate Mixed Oxides
2.4.4.2 Perovskites2.4.5 Supported Oxides; 2.4.5.1 Metal Oxides on Metal Foams and Metal Textiles; 2.4.6 Metal Catalysts; 2.4.6.1 Embedded Nanoparticles; 2.4.6.2 Catalysts Prepared via Electroplating; 2.4.6.3 Catalysts Prepared via Chemical Vapor Infiltration; 2.4.6.4 Metal Wires; 2.4.6.5 Supported Metals; 2.4.6.6 Supported Noble Metals; 2.5 Catalysts Forming; 2.5.1 Tableting; 2.5.2 Spherudizing; 2.5.3 Pelletization; 2.5.4 Extrusion; 2.5.5 Foams; 2.5.6 Metal Textile Catalysts; 2.6 Regeneration of the Catalysts Used in Plasma Assisted Reactions; 2.7 Plasma Produced Catalysts and Supports
2.7.1 Sputtering2.8 Conclusions; References; 3 NOx Abatement by Plasma Catalysis; 3.1 Introduction; 3.1.1 Why Nonthermal Plasma-Assisted Catalytic NOx Remediation?; 3.2 General deNOx Model over Supported Metal Cations and Role of NTP Reactor: ''Plasma-Assisted Catalytic deNOx Reaction''; 3.3 About the Nonthermal Plasma for NOx Remediation; 3.3.1 The Nanosecond Pulsed DBD Reactor Coupled with a Catalytic deNOx Reactor: a Laboratory Scale Device Easily Scaled Up at Pilot Level; 3.3.2 Nonthermal Plasma Chemistry and Kinetics; 3.3.3 Plasma Energy Deposition and Energy Cost
3.4 Special Application of NTP to Catalytic Oxidation of Methane on Alumina-Supported Noble Metal Catalysts
Record Nr. UNINA-9910822158903321
Weinheim, : Wiley-VCH Verlag GmbH & Co. KGaA, c2012
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Plasma Chemistry and Gas Conversion / / edited by Nikolay Britun and Tiago Silva
Plasma Chemistry and Gas Conversion / / edited by Nikolay Britun and Tiago Silva
Pubbl/distr/stampa London, United Kingdom : , : IntechOpen, , 2018
Descrizione fisica 1 online resource (86 pages) : illustrations some color
Disciplina 541.0424
Soggetto topico Plasma chemistry
Plasma (Ionized gases)
ISBN 1-83881-832-4
1-78984-841-5
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910317771803321
London, United Kingdom : , : IntechOpen, , 2018
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui