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EUV lithography [[electronic resource] /] / Vivek Bakshi, editor
| EUV lithography [[electronic resource] /] / Vivek Bakshi, editor |
| Pubbl/distr/stampa | Bellingham, Wash., : SPIE Press, : John Wiley & Sons, c2009 |
| Descrizione fisica | 1 online resource (702 p.) |
| Disciplina | 621.3815 |
| Altri autori (Persone) | BakshiVivek |
| Collana | SPIE Press monograph |
| Soggetto topico |
Ultraviolet radiation - Industrial applications
Photolithography Optical coatings |
| ISBN |
1-61583-717-5
0-8194-8070-3 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
1. EUV Lithography: A Historical Perspective / Hiroo Kinoshita and Obert Wood -- Introduction -- The Early Stage of Development: 1981 to 1992 -- The Second Stage of Development: 1993 to 1996 -- Other Developments in Japan and Europe -- The Development of Individual Technologies -- EUVL Conferences -- Summary.
2. EUV LLC: An Historical Perspective / Chuck Gwyn and Stefan Wurm -- Introduction -- Formation of the LLC -- Program Structure -- Program Results -- Retrospective Observations -- Status of EUV Development at the End of LLC -- Summary. 3. EUV Source Technology / Vivek Bakshi-- Introduction -- EUV Source Requirements -- DPP and LPP Source Technologies -- EUV Source Performance -- Summary and Future Outlook. 4A. Optics and Multilayer Coatings for EUVL Systems / Regina Soufli, Saša Bajt, Russell M. Hudyma and John S. Taylor -- Introduction -- Properties of EUVL Systems. 4B. Projection Systems for Extreme Ultraviolet Lithography / Russell M. Hudyma and Regina Soufli -- General EUVL Optical Design Considerations -- EUV Microsteppers -- Engineering Test Stand (ETS) -- Six-Mirror EUVL Projection Systems. 4C. Specification, Fabrication, Testing, and Mounting of EUVL Optical Substrates / John S. Taylor and Regina Soufli -- Introduction -- Specification -- Projection Optics -- Effect of Substrate Errors on Imaging Performance -- Low-Frequency (Figure) Errors -- Mid-Spatial-Frequency Errors -- High-Spatial-Frequency Errors -- Influence of Coatings on Roughness Specification -- Calculation of Surface Errors -- Uniformity -- Substrate Materials -- Fabrication -- Metrology -- Mounting and Assembly -- Alignment -- Condenser Optics. 4D. Multilayer Coatings for EUVL / Regina Soufli and Saša Bajt -- Overview and History of EUV Multilayer Coatings -- Choice of ML Materials and Wavelength Considerations -- Multilayer Deposition Technologies -- Theoretical design -- High Reflectivity, Low Stress, and Thermal Stability Considerations -- Optical Constants -- Multilayer Thickness Specifications for Imaging and Condenser EUVL Mirrors. 5. EUV Optical Testing / Kenneth A. Goldberg -- Introduction -- Target Accuracy -- Techniques for Angstrom-scale EUV Wavefront Measurement Accuracy -- Intercomparison -- Future Directions. 6A. Optics Contamination / Saša Bajt -- Introduction -- Fundamentals of Optics Contamination -- Optics Contamination Control -- Summary and Future Outlook. 6B. Grazing Angle Collector Contamination / Valentino Rigato -- Introduction -- Collector Lifetime Status and Challenges -- Summary. 6C. Normal Incidence (Multilayer) Collector Contamination / David N. Ruzic and Shailendra N. Srivastava -- Introduction -- Overview of Normal-Incidence Collector Mirrors -- Collector Performance -- Summary. 7. EUV Mask and Mask Metrology / Han-Ku Cho and Jinho Ahn -- Introduction -- EUV Mask Structure and Process Flow -- Mask Substrate -- Mask Blank Fabrication -- Absorber Stack and Backside Conductive Coating -- Mask Patterning -- Mask Cleaning -- Advanced Mask Structure -- Summary and Future Outlook. 8. Photoresists for Extreme Ultraviolet Lithography / Robert L. Brainard -- Introduction -- Earliest EUV Resist Imaging -- Absorption Coefficients of EUV Photoresists -- Multilayer Resists and Pattern Transfer -- Resist Types -- PAGs and Acids -- Line Edge Roughness -- Summary and Future Outlook. 9. High-Resolution EUV Imaging Tools for Resist Exposure and Aerial Image Monitoring / Malcolm Gower -- Introduction -- EUV Tool Design Considerations -- EUV Microstepper -- Reticle Imaging Microscope -- Summary and Future Outlook. 10. Fundamentals of the EUVL Scanner / Kazuya Ota -- Introduction -- Illumination Optics -- Projection Optics -- Stages -- Sensors -- Handling Systems -- Vacuum and Environment System -- Budgets -- Summary. 11. EUVL System Patterning Performance / Patrick Naulleau, John E. Bjorkholm, and Manish Chandhok -- Introduction: The Benefits of EUV Imaging -- Imaging with the 0.1-NA ETS Optic -- Imaging with the 0.3-NA MET Optic -- System Contributors to Line Edge Roughness -- Flare in EUVL Systems -- Summary. 12. Lithography Cost of Ownership / Phil Seidel -- Cost of Ownership Overview -- Lithography: Historical Cost and Price Trends -- Major Lithography CoO Parameter and Productivity Drivers -- General Observations on Lithography Cell and CoO Improvements (Past Decade) -- CoO Considerations for Future Lithography Technologies -- Summary -- Appendix: Example Case Studies of Lithography CoO Calculations. |
| Altri titoli varianti | Extreme ultraviolet lithography |
| Record Nr. | UNINA-9911004833203321 |
| Bellingham, Wash., : SPIE Press, : John Wiley & Sons, c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Periodic materials and interference lithography for photonics, phononics and mechanics [[electronic resource] /] / by Martin Maldovan, Edwin L. Thomas
| Periodic materials and interference lithography for photonics, phononics and mechanics [[electronic resource] /] / by Martin Maldovan, Edwin L. Thomas |
| Autore | Maldovan Martin |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, c2009 |
| Descrizione fisica | 1 online resource (333 p.) |
| Disciplina |
620.11
621.36 |
| Altri autori (Persone) | ThomasEdwin L |
| Soggetto topico |
Materials science
Structural analysis (Engineering) Photolithography |
| ISBN |
1-282-27931-9
9786612279317 3-527-62539-9 3-527-62540-2 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Periodic Materials and Interference Lithography; Contents; Preface; Introduction; Theory; 1 Structural Periodicity; 1.1 Nonperiodic versus Periodic Structures; 1.2 Two-dimensional Point Lattices; 1.3 Three-dimensional Point Lattices; 1.3.1 Primitive and Nonprimitive Unit Cells; 1.4 Mathematical Description of Periodic Structures; 1.5 Fourier Series; 1.5.1 Fourier Series for Two-dimensional Periodic Functions; 1.5.2 Fourier Series for Three-dimensional Periodic Functions; 1.5.3 Arbitrary Unit Cells; Further Reading; Problems; 2 Periodic Functions and Structures; 2.1 Introduction
2.2 Creating Simple Periodic Functions in Two Dimensions2.2.1 The Square Lattice; 2.2.2 The Triangular Lattice; 2.3 Creating Simple Periodic Functions in Three Dimensions; 2.3.1 The Simple Cubic Lattice; 2.3.2 The Face-centered-cubic Lattice; 2.3.3 The Body-centered-cubic Lattice; 2.4 Combination of Simple Periodic Functions; Problems; 3 Interference of Waves and Interference Lithography; 3.1 Electromagnetic Waves; 3.2 The Wave Equation; 3.3 Electromagnetic Plane Waves; 3.4 The Transverse Character of Electromagnetic Plane Waves; 3.5 Polarization 3.5.1 Linearly Polarized Electromagnetic Plane Waves3.5.2 Circularly Polarized Electromagnetic Plane Waves; 3.5.3 Elliptically Polarized Electromagnetic Plane Waves; 3.6 Electromagnetic Energy; 3.6.1 Energy Density and Energy Flux for Electromagnetic Plane Waves; 3.6.2 Time-averaged Values; 3.6.3 Intensity; 3.7 Interference of Electromagnetic Plane Waves; 3.7.1 Three-dimensional Interference Patterns; 3.8 Interference Lithography; 3.8.1 Photoresist Materials; 3.8.2 The Interference Lithography Technique; 3.8.3 Designing Periodic Structures; Further Reading; Problems 4 Periodic Structures and Interference Lithography4.1 The Connection between the Interference of Plane Waves and Fourier Series; 4.2 Simple Periodic Structures in Two Dimensions Via Interference Lithography; 4.3 Simple Periodic Structures in Three Dimensions Via Interference Lithography; Further Reading; Problems; Experimental; 5 Fabrication of Periodic Structures; 5.1 Introduction; 5.2 Light Beams; 5.3 Multiple Gratings and the Registration Challenge; 5.4 Beam Configuration; 5.4.1 Using Four Beams; 5.4.2 Using a Single Beam (Phase Mask Lithography) 5.5 Pattern Transfer: Material Platforms and Photoresists5.5.1 Negative Photoresists; 5.5.2 Positive Photoresists; 5.5.3 Organic-Inorganic Hybrids Resists; 5.6 Practical Considerations for Interference Lithography; 5.6.1 Preserving Polarizations and Directions; 5.6.2 Contrast; 5.6.3 Drying; 5.6.4 Shrinkage; 5.6.5 Backfilling - Creating Inverse Periodic Structures; 5.6.6 Volume Fraction Control; 5.7 Closing Remarks; Further Reading; Applications; 6 Photonic Crystals; 6.1 Introduction; 6.2 One-dimensional Photonic Crystals; 6.2.1 Finite Periodic Structures; 6.2.2 Infinite Periodic Structures 6.2.3 Finite versus Infinite Periodic Structures |
| Record Nr. | UNINA-9910139944903321 |
Maldovan Martin
|
||
| Weinheim, : Wiley-VCH, c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Periodic materials and interference lithography for photonics, phononics and mechanics [[electronic resource] /] / by Martin Maldovan, Edwin L. Thomas
| Periodic materials and interference lithography for photonics, phononics and mechanics [[electronic resource] /] / by Martin Maldovan, Edwin L. Thomas |
| Autore | Maldovan Martin |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, c2009 |
| Descrizione fisica | 1 online resource (333 p.) |
| Disciplina |
620.11
621.36 |
| Altri autori (Persone) | ThomasEdwin L |
| Soggetto topico |
Materials science
Structural analysis (Engineering) Photolithography |
| ISBN |
1-282-27931-9
9786612279317 3-527-62539-9 3-527-62540-2 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Periodic Materials and Interference Lithography; Contents; Preface; Introduction; Theory; 1 Structural Periodicity; 1.1 Nonperiodic versus Periodic Structures; 1.2 Two-dimensional Point Lattices; 1.3 Three-dimensional Point Lattices; 1.3.1 Primitive and Nonprimitive Unit Cells; 1.4 Mathematical Description of Periodic Structures; 1.5 Fourier Series; 1.5.1 Fourier Series for Two-dimensional Periodic Functions; 1.5.2 Fourier Series for Three-dimensional Periodic Functions; 1.5.3 Arbitrary Unit Cells; Further Reading; Problems; 2 Periodic Functions and Structures; 2.1 Introduction
2.2 Creating Simple Periodic Functions in Two Dimensions2.2.1 The Square Lattice; 2.2.2 The Triangular Lattice; 2.3 Creating Simple Periodic Functions in Three Dimensions; 2.3.1 The Simple Cubic Lattice; 2.3.2 The Face-centered-cubic Lattice; 2.3.3 The Body-centered-cubic Lattice; 2.4 Combination of Simple Periodic Functions; Problems; 3 Interference of Waves and Interference Lithography; 3.1 Electromagnetic Waves; 3.2 The Wave Equation; 3.3 Electromagnetic Plane Waves; 3.4 The Transverse Character of Electromagnetic Plane Waves; 3.5 Polarization 3.5.1 Linearly Polarized Electromagnetic Plane Waves3.5.2 Circularly Polarized Electromagnetic Plane Waves; 3.5.3 Elliptically Polarized Electromagnetic Plane Waves; 3.6 Electromagnetic Energy; 3.6.1 Energy Density and Energy Flux for Electromagnetic Plane Waves; 3.6.2 Time-averaged Values; 3.6.3 Intensity; 3.7 Interference of Electromagnetic Plane Waves; 3.7.1 Three-dimensional Interference Patterns; 3.8 Interference Lithography; 3.8.1 Photoresist Materials; 3.8.2 The Interference Lithography Technique; 3.8.3 Designing Periodic Structures; Further Reading; Problems 4 Periodic Structures and Interference Lithography4.1 The Connection between the Interference of Plane Waves and Fourier Series; 4.2 Simple Periodic Structures in Two Dimensions Via Interference Lithography; 4.3 Simple Periodic Structures in Three Dimensions Via Interference Lithography; Further Reading; Problems; Experimental; 5 Fabrication of Periodic Structures; 5.1 Introduction; 5.2 Light Beams; 5.3 Multiple Gratings and the Registration Challenge; 5.4 Beam Configuration; 5.4.1 Using Four Beams; 5.4.2 Using a Single Beam (Phase Mask Lithography) 5.5 Pattern Transfer: Material Platforms and Photoresists5.5.1 Negative Photoresists; 5.5.2 Positive Photoresists; 5.5.3 Organic-Inorganic Hybrids Resists; 5.6 Practical Considerations for Interference Lithography; 5.6.1 Preserving Polarizations and Directions; 5.6.2 Contrast; 5.6.3 Drying; 5.6.4 Shrinkage; 5.6.5 Backfilling - Creating Inverse Periodic Structures; 5.6.6 Volume Fraction Control; 5.7 Closing Remarks; Further Reading; Applications; 6 Photonic Crystals; 6.1 Introduction; 6.2 One-dimensional Photonic Crystals; 6.2.1 Finite Periodic Structures; 6.2.2 Infinite Periodic Structures 6.2.3 Finite versus Infinite Periodic Structures |
| Record Nr. | UNINA-9910830311403321 |
|
Maldovan Martin
|
||
| Weinheim, : Wiley-VCH, c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Periodic materials and interference lithography for photonics, phononics and mechanics / / by Martin Maldovan, Edwin L. Thomas
| Periodic materials and interference lithography for photonics, phononics and mechanics / / by Martin Maldovan, Edwin L. Thomas |
| Autore | Maldovan Martin |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, c2009 |
| Descrizione fisica | 1 online resource (333 p.) |
| Disciplina |
620.11
621.36 |
| Altri autori (Persone) | ThomasEdwin L |
| Soggetto topico |
Materials science
Structural analysis (Engineering) Photolithography |
| ISBN |
9786612279317
9781282279315 1282279319 9783527625390 3527625399 9783527625406 3527625402 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Periodic Materials and Interference Lithography; Contents; Preface; Introduction; Theory; 1 Structural Periodicity; 1.1 Nonperiodic versus Periodic Structures; 1.2 Two-dimensional Point Lattices; 1.3 Three-dimensional Point Lattices; 1.3.1 Primitive and Nonprimitive Unit Cells; 1.4 Mathematical Description of Periodic Structures; 1.5 Fourier Series; 1.5.1 Fourier Series for Two-dimensional Periodic Functions; 1.5.2 Fourier Series for Three-dimensional Periodic Functions; 1.5.3 Arbitrary Unit Cells; Further Reading; Problems; 2 Periodic Functions and Structures; 2.1 Introduction
2.2 Creating Simple Periodic Functions in Two Dimensions2.2.1 The Square Lattice; 2.2.2 The Triangular Lattice; 2.3 Creating Simple Periodic Functions in Three Dimensions; 2.3.1 The Simple Cubic Lattice; 2.3.2 The Face-centered-cubic Lattice; 2.3.3 The Body-centered-cubic Lattice; 2.4 Combination of Simple Periodic Functions; Problems; 3 Interference of Waves and Interference Lithography; 3.1 Electromagnetic Waves; 3.2 The Wave Equation; 3.3 Electromagnetic Plane Waves; 3.4 The Transverse Character of Electromagnetic Plane Waves; 3.5 Polarization 3.5.1 Linearly Polarized Electromagnetic Plane Waves3.5.2 Circularly Polarized Electromagnetic Plane Waves; 3.5.3 Elliptically Polarized Electromagnetic Plane Waves; 3.6 Electromagnetic Energy; 3.6.1 Energy Density and Energy Flux for Electromagnetic Plane Waves; 3.6.2 Time-averaged Values; 3.6.3 Intensity; 3.7 Interference of Electromagnetic Plane Waves; 3.7.1 Three-dimensional Interference Patterns; 3.8 Interference Lithography; 3.8.1 Photoresist Materials; 3.8.2 The Interference Lithography Technique; 3.8.3 Designing Periodic Structures; Further Reading; Problems 4 Periodic Structures and Interference Lithography4.1 The Connection between the Interference of Plane Waves and Fourier Series; 4.2 Simple Periodic Structures in Two Dimensions Via Interference Lithography; 4.3 Simple Periodic Structures in Three Dimensions Via Interference Lithography; Further Reading; Problems; Experimental; 5 Fabrication of Periodic Structures; 5.1 Introduction; 5.2 Light Beams; 5.3 Multiple Gratings and the Registration Challenge; 5.4 Beam Configuration; 5.4.1 Using Four Beams; 5.4.2 Using a Single Beam (Phase Mask Lithography) 5.5 Pattern Transfer: Material Platforms and Photoresists5.5.1 Negative Photoresists; 5.5.2 Positive Photoresists; 5.5.3 Organic-Inorganic Hybrids Resists; 5.6 Practical Considerations for Interference Lithography; 5.6.1 Preserving Polarizations and Directions; 5.6.2 Contrast; 5.6.3 Drying; 5.6.4 Shrinkage; 5.6.5 Backfilling - Creating Inverse Periodic Structures; 5.6.6 Volume Fraction Control; 5.7 Closing Remarks; Further Reading; Applications; 6 Photonic Crystals; 6.1 Introduction; 6.2 One-dimensional Photonic Crystals; 6.2.1 Finite Periodic Structures; 6.2.2 Infinite Periodic Structures 6.2.3 Finite versus Infinite Periodic Structures |
| Record Nr. | UNINA-9911019642703321 |
|
Maldovan Martin
|
||
| Weinheim, : Wiley-VCH, c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Proposed code of fair competition for the photo-lithographing industry as submitted on September 6, 1933
| Proposed code of fair competition for the photo-lithographing industry as submitted on September 6, 1933 |
| Pubbl/distr/stampa | Washington : , : United States Government Printing Office, , 1933 |
| Descrizione fisica | 1 online resource (7 pages) |
| Soggetto topico |
Photolithography
Lithography - United States |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Altri titoli varianti | Photo-lithographing industry |
| Record Nr. | UNINA-9910705336103321 |
| Washington : , : United States Government Printing Office, , 1933 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
