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Laser micro-nano-manufacturing and 3D microprinting / / Anming Hu, editor
| Laser micro-nano-manufacturing and 3D microprinting / / Anming Hu, editor |
| Edizione | [1st ed. 2020.] |
| Pubbl/distr/stampa | Cham, Switzerland : , : Springer, , [2020] |
| Descrizione fisica | 1 online resource (XIX, 360 p. 227 illus., 166 illus. in color.) |
| Disciplina | 620.5 |
| Collana | Springer Series in Materials Science |
| Soggetto topico |
Nanomanufacturing
Nanostructured materials - Design and construction Lasers - Industrial applications |
| ISBN | 3-030-59313-4 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Fundamental: Laser-micro-nano-material interaction -- Laser direct writing of micro-nanodevices and nanoscale additive manufacturing -- Laser induced nanoparticles in liquid phase -- Laser-induced synthesis of diamond//Laser direct writing of graphene -- Laser surface engineering -- Laser peening with femtosecond laser -- High power fiber picosecond laser processing of wide band semiconductors -- Femtosecond laser nanojoining -- Laser nanobrazing -- Laser sintering of nanoparticles for devices -- Laser direct writing of optical waveguides -- Laser 3D printing for energy devices -- Laser manufacturing for medical devices. Laser interference lithography for optical crystals and biosensors -- STED-inspired super-resolution manufacturing -- Laser induced front transfer for nanodevices -- Laser processing for batteries. |
| Record Nr. | UNISA-996418435603316 |
| Cham, Switzerland : , : Springer, , [2020] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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Laser micro-nano-manufacturing and 3D microprinting / / Anming Hu, editor
| Laser micro-nano-manufacturing and 3D microprinting / / Anming Hu, editor |
| Edizione | [1st ed. 2020.] |
| Pubbl/distr/stampa | Cham, Switzerland : , : Springer, , [2020] |
| Descrizione fisica | 1 online resource (XIX, 360 p. 227 illus., 166 illus. in color.) |
| Disciplina | 620.5 |
| Collana | Springer Series in Materials Science |
| Soggetto topico |
Nanomanufacturing
Nanostructured materials - Design and construction Lasers - Industrial applications |
| ISBN | 3-030-59313-4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Fundamental: Laser-micro-nano-material interaction -- Laser direct writing of micro-nanodevices and nanoscale additive manufacturing -- Laser induced nanoparticles in liquid phase -- Laser-induced synthesis of diamond//Laser direct writing of graphene -- Laser surface engineering -- Laser peening with femtosecond laser -- High power fiber picosecond laser processing of wide band semiconductors -- Femtosecond laser nanojoining -- Laser nanobrazing -- Laser sintering of nanoparticles for devices -- Laser direct writing of optical waveguides -- Laser 3D printing for energy devices -- Laser manufacturing for medical devices. Laser interference lithography for optical crystals and biosensors -- STED-inspired super-resolution manufacturing -- Laser induced front transfer for nanodevices -- Laser processing for batteries. |
| Record Nr. | UNINA-9910427666803321 |
| Cham, Switzerland : , : Springer, , [2020] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Modelling and design of nanostructured optoelectronic devices : solar cells and photodetectors / / Jagdish A. Krishnaswamy [and three others]
| Modelling and design of nanostructured optoelectronic devices : solar cells and photodetectors / / Jagdish A. Krishnaswamy [and three others] |
| Autore | Krishnaswamy Jagdish |
| Pubbl/distr/stampa | Singapore : , : Springer, , [2022] |
| Descrizione fisica | 1 online resource (293 pages) |
| Disciplina | 681.25 |
| Collana | Energy systems in electrical engineering |
| Soggetto topico |
Optical detectors
Nanostructured materials - Design and construction Optoelectronic devices - Design and construction |
| ISBN | 981-19-0607-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910558489703321 |
Krishnaswamy Jagdish
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| Singapore : , : Springer, , [2022] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Nanocasting : a versatile strategy for creating nanostructured porous materials / / [edited by] An-Hui Lu, Dongyuan Zhao, Ying Wan
| Nanocasting : a versatile strategy for creating nanostructured porous materials / / [edited by] An-Hui Lu, Dongyuan Zhao, Ying Wan |
| Autore | Lu An-Hui |
| Edizione | [1st ed.] |
| Pubbl/distr/stampa | Cambridge, : RSC Pub., c2010 |
| Descrizione fisica | 1 online resource (279 p.) |
| Disciplina | 620.5 |
| Altri autori (Persone) |
ZhaoDongyuan
WanYing |
| Collana | RSC nanoscience & nanotechnology |
| Soggetto topico |
Nanostructured materials - Design and construction
Nanotechnology |
| ISBN |
9781628701494
1628701498 9781847559869 1847559867 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | 9780854041886_publicity; i_iv; v_vi; vii_x; xi_xii; 001_044; 045_094; 095_128; 129_176; 177_207; 208-245; 246_253; 254_266 |
| Record Nr. | UNINA-9911004803803321 |
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Lu An-Hui
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| Cambridge, : RSC Pub., c2010 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Nanolithography : the art of fabricating nanoelectronic and nanophotonic devices and systems / / edited by Martin Feldman
| Nanolithography : the art of fabricating nanoelectronic and nanophotonic devices and systems / / edited by Martin Feldman |
| Pubbl/distr/stampa | Philadelphia, PA : , : Woodhead Pub., , 2014 |
| Descrizione fisica | 1 online resource (599 p.) |
| Disciplina | 621.381531 |
| Altri autori (Persone) | FeldmanMartin |
| Collana | Woodhead Publishing series in electronic and optical materials |
| Soggetto topico |
Nanolithography
Nanophotonics Nanotechnology Nanostructured materials - Design and construction |
| Soggetto genere / forma | Electronic books. |
| ISBN | 0-85709-875-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover ; Nanolithography: The art of fabricating nanoelectronic and nanophotonic devices and systems ; Copyright ; Contents; Contributor contact details; Woodhead Publishing Series in Electronic and Optical Materials; Preface; 1: Optical projection lithography; 1.1 Introduction; 1.2 Lithography technology and trends; 1.3 Fundamentals of optical lithography; 1.4 Image evaluation; 1.5 Projection lithography systems; 1.6 Wavelengths for optical lithography; 1.7 Lithography in the deep ultraviolet (UV); 1.8 Resolution enhancement technology; 1.9 Immersion lithography
1.10 Multiple patterning optical lithography1.11 Conclusion; 1.12 References; 2: Extreme ultraviolet (EUV) lithography; 2.1 Introduction; 2.2 EUV sources; 2.3 EUV optics; 2.4 EUV masks; 2.5 EUV resists; 2.6 EUV integration and implementation challenges; 2.7 Conclusion and future trends; 2.8 Acknowledgments; 2.9 References; 3: Electron beam lithography; 3.1 Introduction; 3.2 Using pixel parallelism to address the throughput bottleneck; 3.3 The tradeoff between resolution and throughput; 3.4 Distributed systems; 3.5 Ultimate lithographic resolution 3.6 Electron-beam patterning of photomasks for optical lithography3.7 Conclusion; 3.8 Acknowledgements; 3.9 References; 4: Focused ion beams for nano-machining and imaging; 4.1 Introduction; 4.2 An adumbrated history of focused ion beams (FIBs); 4.3 Sources of ions: a quartet of types; 4.4 Charged particle optics; 4.5 Ion-matter interactions; 4.6 Milling; 4.7 Deposition; 4.8 Imaging; 4.9 Spectroscopy; 4.10 Conclusion and future trends; 4.11 References; 5: Masks for microand nanolithography; 5.1 Introduction; 5.2 Mask materials; 5.3 Mask process; 5.4 Mask metrology; 5.5 Defects and masks 5.6 Conclusion5.7 References; 6: Maskless photolithography; 6.1 Introduction; 6.2 The use of photons as opposed to charged particles; 6.3 Forms of maskless photolithography; 6.4 Zone-plate-array lithography (ZPAL); 6.5 Proximity-effect correction; 6.6 Extending the resolution of ZPAL; 6.7 Commercialization of ZPAL by LumArray, Inc.; 6.8 Conclusion; 6.9 References; 7: Chemistry and processing of resists for nanolithography; 7.1 Introduction; 7.2 Resists for optical lithography: synthesis and radiation induced chemistry of resists as a function of exposure technology 7.3 Chemically amplified resist process considerations7.4 Chemically amplified resists for 193 nm lithography; 7.5 Resists for extreme ultraviolet lithography (EUVL); 7.6 Resists for electron beam lithography; 7.7 Resists for selected forward looking lithographic technologies; 7.8 Resist resolution limitations; 7.9 Conclusion; 7.10 References; 8: Directed assembly nanolithography; 8.1 Introduction; 8.2 Block copolymers in lithography; 8.3 Directed self-assembly of block copolymers; 8.4 Programmable three-dimensional lithography; 8.5 Conclusion; 8.6 References; 9: Nanoimprint lithography 9.1 Introduction |
| Record Nr. | UNISA-996426332403316 |
| Philadelphia, PA : , : Woodhead Pub., , 2014 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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Nanolithography : the art of fabricating nanoelectronic and nanophotonic devices and systems / / edited by Martin Feldman
| Nanolithography : the art of fabricating nanoelectronic and nanophotonic devices and systems / / edited by Martin Feldman |
| Pubbl/distr/stampa | Philadelphia, PA : , : Woodhead Pub., , 2014 |
| Descrizione fisica | 1 online resource (599 p.) |
| Disciplina | 621.381531 |
| Altri autori (Persone) | FeldmanMartin |
| Collana | Woodhead Publishing series in electronic and optical materials |
| Soggetto topico |
Nanolithography
Nanophotonics Nanotechnology Nanostructured materials - Design and construction |
| Soggetto genere / forma | Electronic books. |
| ISBN | 0-85709-875-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover ; Nanolithography: The art of fabricating nanoelectronic and nanophotonic devices and systems ; Copyright ; Contents; Contributor contact details; Woodhead Publishing Series in Electronic and Optical Materials; Preface; 1: Optical projection lithography; 1.1 Introduction; 1.2 Lithography technology and trends; 1.3 Fundamentals of optical lithography; 1.4 Image evaluation; 1.5 Projection lithography systems; 1.6 Wavelengths for optical lithography; 1.7 Lithography in the deep ultraviolet (UV); 1.8 Resolution enhancement technology; 1.9 Immersion lithography
1.10 Multiple patterning optical lithography1.11 Conclusion; 1.12 References; 2: Extreme ultraviolet (EUV) lithography; 2.1 Introduction; 2.2 EUV sources; 2.3 EUV optics; 2.4 EUV masks; 2.5 EUV resists; 2.6 EUV integration and implementation challenges; 2.7 Conclusion and future trends; 2.8 Acknowledgments; 2.9 References; 3: Electron beam lithography; 3.1 Introduction; 3.2 Using pixel parallelism to address the throughput bottleneck; 3.3 The tradeoff between resolution and throughput; 3.4 Distributed systems; 3.5 Ultimate lithographic resolution 3.6 Electron-beam patterning of photomasks for optical lithography3.7 Conclusion; 3.8 Acknowledgements; 3.9 References; 4: Focused ion beams for nano-machining and imaging; 4.1 Introduction; 4.2 An adumbrated history of focused ion beams (FIBs); 4.3 Sources of ions: a quartet of types; 4.4 Charged particle optics; 4.5 Ion-matter interactions; 4.6 Milling; 4.7 Deposition; 4.8 Imaging; 4.9 Spectroscopy; 4.10 Conclusion and future trends; 4.11 References; 5: Masks for microand nanolithography; 5.1 Introduction; 5.2 Mask materials; 5.3 Mask process; 5.4 Mask metrology; 5.5 Defects and masks 5.6 Conclusion5.7 References; 6: Maskless photolithography; 6.1 Introduction; 6.2 The use of photons as opposed to charged particles; 6.3 Forms of maskless photolithography; 6.4 Zone-plate-array lithography (ZPAL); 6.5 Proximity-effect correction; 6.6 Extending the resolution of ZPAL; 6.7 Commercialization of ZPAL by LumArray, Inc.; 6.8 Conclusion; 6.9 References; 7: Chemistry and processing of resists for nanolithography; 7.1 Introduction; 7.2 Resists for optical lithography: synthesis and radiation induced chemistry of resists as a function of exposure technology 7.3 Chemically amplified resist process considerations7.4 Chemically amplified resists for 193 nm lithography; 7.5 Resists for extreme ultraviolet lithography (EUVL); 7.6 Resists for electron beam lithography; 7.7 Resists for selected forward looking lithographic technologies; 7.8 Resist resolution limitations; 7.9 Conclusion; 7.10 References; 8: Directed assembly nanolithography; 8.1 Introduction; 8.2 Block copolymers in lithography; 8.3 Directed self-assembly of block copolymers; 8.4 Programmable three-dimensional lithography; 8.5 Conclusion; 8.6 References; 9: Nanoimprint lithography 9.1 Introduction |
| Record Nr. | UNISA-996461151603316 |
| Philadelphia, PA : , : Woodhead Pub., , 2014 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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The new frontiers of organic and composite nanotechnology [[electronic resource] /] / Victor Erokhin, Manoj Ram, Ozlem Yavuz, editors
| The new frontiers of organic and composite nanotechnology [[electronic resource] /] / Victor Erokhin, Manoj Ram, Ozlem Yavuz, editors |
| Pubbl/distr/stampa | London, : Elsevier Science, 2008 |
| Descrizione fisica | 1 online resource (505 p.) |
| Disciplina | 620.5 |
| Altri autori (Persone) |
ErokhinVictor
RamManoj Kumar YavuzOzlem |
| Soggetto topico |
Nanotechnology
Nanostructured materials - Design and construction |
| ISBN |
1-281-07050-5
9786611070502 0-08-055407-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; The New Frontiers of Organic and Composite Nanotechnology; Copyright Page; Table of Contents; Preface; List of contributors; Chapter 1 Layer-by-layer assembly; 1.1. Introduction; 1.2. Layer-by-layer Self-assembly; 1.2.1. Basic Principles; 1.2.2. Building Blocks for Layer-by-layer Self-assembly; 1.2.3. Kinetics of Multilayer Adsorption; 1.2.4. Tuning of Layer-by-layer Self-assembly; 1.3. Fabrication of Nanocomposite Thin Films; 1.3.1. Silica/Polyion Multilayer; 1.3.2. Semiconductor Nanoparticle/Polyion Multilayers; 1.3.3. Au Nanoparticle/Polycation Multilayer
1.3.4. Layered Ceramic Plates1.3.5. Conductive Polymers/Polyion Multilayer; 1.3.6. Carbon Nanotube/Polyion Multilayer; 1.3.7. Protein/Polyion Multilayer; 1.3.8. DNA Multilayer; 1.4. Modified Procedures; 1.4.1. Spin Layer-by-layer Self-assembly; 1.4.2. Spray Layer-by-layer Self-assembly; 1.4.3. Covalent Layer-by-layer Self-assembly; 1.5. Surface Patterning; 1.6. Current and Potential Applications; 1.6.1. Current Applications; 1.6.2. Potential Applications; 1.6.3. Difficulties and Solutions; 1.7. Conclusions; References Chapter 2 Multifunctional microcontainers with tuned permeability for delivery and (bio)chemical reactions2.1. Introduction; 2.2. Novel Polymer Materials for Low Permeable Capsule Walls and Encapsulation; 2.3. Release of Encapsulated Materials from Polyelectrolyte Capsules; 2.3.1. Enzyme-mediated Release of Encapsulated Materials; 2.3.2. Release by Laser; 2.4. Applications and Perspectives; References; Chapter 3 Advanced optical spectroscopies in nanotechnology; 3.1. Introduction: Spectroscopy on the Nanoscale; 3.2. The Nanoworld; 3.2.1. Small Objects; 3.2.2. Small Structures 3.3. Advanced Optical Spectroscopies3.3.1. Single-molecule Fluorescence Spectroscopies; 3.3.2. The SERS Effect and Enhanced Spectroscopies; 3.3.3. Tip-enhanced Spectroscopies; 3.4. Some Applications; 3.4.1. Blinking, Statistics and PCS; 3.4.2. Surface Plasmon Engineering and Sensors; 3.4.3. Quantum Dots and Nanoparticles; 3.4.4. Polarization and Anisotropy Effects; 3.4.5. Innovative Methods and Results; 3.4.6. 'Normal' Spectroscopy on Nanostructured Systems; 3.5. Conclusions and Perspectives; Bibliographical Appendix; Bibliography; Chapter 4 Conducting nanocomposite systems; 4.1. Introduction 4.2. Classification4.3. Host and Guest Materials for Conducting Nanocomposite Systems; 4.3.1. Host Materials; 4.3.2. Guest Materials; References; Chapter 5 Electrochemically assisted scanning probe microscopy: A powerful tool in nano(bio)science; 5.1. Introduction; 5.2. Electrochemical Scanning Tunnelling Microscope (EC-STM); 5.2.1. Bipotentiostatic Approach; 5.2.2. Tip Preparation; 5.2.3. Tip Characterization; 5.2.4. Substrate Electrode Preparation; 5.2.5. Tunnelling in Water; 5.3. EC-STM for Studying Underpotential Deposition 5.4. Visualization of Potential-Induced Molecular Assembling and Phase Transitions |
| Record Nr. | UNINA-9910777019603321 |
| London, : Elsevier Science, 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Synthesis and engineering of nanostructures by energetic ions [[electronic resource] /] / Devesh Kumar Avasthi and Jean Claude Pivin, editors
| Synthesis and engineering of nanostructures by energetic ions [[electronic resource] /] / Devesh Kumar Avasthi and Jean Claude Pivin, editors |
| Pubbl/distr/stampa | New York, : Nova Science Publishers, Inc., c2012 |
| Descrizione fisica | 1 online resource (390 p.) |
| Disciplina | 620/.5 |
| Altri autori (Persone) |
AvasthiDevesh Kumar
PivinJean Claude |
| Collana |
Nanotechnology science and technology
Novinka |
| Soggetto topico |
Nanostructured materials - Design and construction
Nanostructures - Design and construction Ion bombardment - Industrial applications |
| Soggetto genere / forma | Electronic books. |
| ISBN | 1-62100-237-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910457362603321 |
| New York, : Nova Science Publishers, Inc., c2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Synthesis and engineering of nanostructures by energetic ions [[electronic resource] /] / Devesh Kumar Avasthi and Jean Claude Pivin, editors
| Synthesis and engineering of nanostructures by energetic ions [[electronic resource] /] / Devesh Kumar Avasthi and Jean Claude Pivin, editors |
| Pubbl/distr/stampa | New York, : Nova Science Publishers, Inc., c2012 |
| Descrizione fisica | 1 online resource (390 p.) |
| Disciplina | 620/.5 |
| Altri autori (Persone) |
AvasthiDevesh Kumar
PivinJean Claude |
| Collana |
Nanotechnology science and technology
Novinka |
| Soggetto topico |
Nanostructured materials - Design and construction
Nanostructures - Design and construction Ion bombardment - Industrial applications |
| ISBN | 1-62100-237-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910781951603321 |
| New York, : Nova Science Publishers, Inc., c2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Synthesis and processing of nanostructured materials [[electronic resource] ] : a collection of papers presented at the 29th and 30th International Conference on Advanced Ceramics and Composites, January 2005 and 2006, Cocoa Beach, Florida / / editor, William M. Mullins; general editors, Andrew Wereszczak, Edgar Lara-Curzio
| Synthesis and processing of nanostructured materials [[electronic resource] ] : a collection of papers presented at the 29th and 30th International Conference on Advanced Ceramics and Composites, January 2005 and 2006, Cocoa Beach, Florida / / editor, William M. Mullins; general editors, Andrew Wereszczak, Edgar Lara-Curzio |
| Pubbl/distr/stampa | Hoboken, NJ, : Wiley, c2007 |
| Descrizione fisica | 1 online resource (150 p.) |
| Disciplina |
620.14
620.5 |
| Altri autori (Persone) |
MullinsWilliam M
WereszczakAndrew Lara-CurzioEdgar <1963-> |
| Collana | Ceramic engineering and science proceedings |
| Soggetto topico |
Nanostructured materials
Nanostructured materials - Design and construction |
| ISBN |
1-282-31439-4
9786612314391 0-470-29137-0 0-470-29179-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Synthesis and Processing of Nanostructured Materials; Contents; Preface; Introduction; Nanoparticle Colloidal Suspension Optimization and Freeze-Cast Forming; Synthesis, Characterization and Measurements of Electrical Properties; Synthesis and Characterization of Nanocrystalline Barium Strontium Titanate Ceramics; Nanoparticle Hydroxyapatite Crystallization Control by using Palyelectrolytes; Synthesis of Carbon Nanotubes and Silicon Carbide Nanofibers as Composite Reinforcing Materials
3-D Microparticles of BaTiO3 and Zn2SiO4 via the Chemical (Soi-Gel, Acetate, or Hydrothermal) Conversion of Biological (Diatom) TemplatesPolymer Fiber Assisted Processing of Ceramic Oxide Nano and Submicron Fibers; Phase Development in the Catalytic System V205/Ti02 under Oxidizing Conditions; Synthesis and Characterization of Cubic Silicon Carbide (β-Sic) and Trigonal Silicon Nitride (α-Si3N4) Nanowires; High Energy Milling Behavior of Alpha Silicon Carbide; Synthesis of Boron Nitride Nanotubes for Engineering Applications; Comparison of Electromagnetic Shielding in GFR-Nano Composites Densification Behavior of Zirconia Ceramics Sintered UsingManufacturing of Doped Glasses Using Reactive ElectrophoreticDeposition (REPD); Shaping of Bulk Glasses and Ceramics with Nanosized Particles; Author Index |
| Record Nr. | UNINA-9910144845703321 |
| Hoboken, NJ, : Wiley, c2007 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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