Info
- Utilizzare la checkbox di selezione a fianco di ciascun documento per attivare le funzionalità di stampa, invio email, download nei formati disponibili del (i) record.
2018 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale : 13-17 August 2018, Hangzhou, China / / Institute of Electrical and Electronics Engineers
| 2018 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale : 13-17 August 2018, Hangzhou, China / / Institute of Electrical and Electronics Engineers |
| Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2018 |
| Descrizione fisica | 1 online resource (344 pages) |
| Disciplina | 620.5 |
| Soggetto topico |
Nanotechnology
Nanomanufacturing Nanostructured materials - Measurement |
| ISBN | 1-5386-6214-0 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996280353903316 |
| Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2018 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
2018 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale : 13-17 August 2018, Hangzhou, China / / Institute of Electrical and Electronics Engineers
| 2018 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale : 13-17 August 2018, Hangzhou, China / / Institute of Electrical and Electronics Engineers |
| Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2018 |
| Descrizione fisica | 1 online resource (344 pages) |
| Disciplina | 620.5 |
| Soggetto topico |
Nanotechnology
Nanomanufacturing Nanostructured materials - Measurement |
| ISBN | 1-5386-6214-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910295657503321 |
| Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2018 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
3M-NANO : 2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale : 7-11 August 2017
| 3M-NANO : 2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale : 7-11 August 2017 |
| Pubbl/distr/stampa | New York : , : IEEE, , 2018 |
| Descrizione fisica | 1 online resource (289 pages) |
| Soggetto topico |
Nanotechnology
Nanomanufacturing Nanostructured materials - Measurement |
| ISBN | 1-5386-1081-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996280257803316 |
| New York : , : IEEE, , 2018 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
3M-NANO : 2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale : 7-11 August 2017
| 3M-NANO : 2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale : 7-11 August 2017 |
| Pubbl/distr/stampa | New York : , : IEEE, , 2018 |
| Descrizione fisica | 1 online resource (289 pages) |
| Soggetto topico |
Nanotechnology
Nanomanufacturing Nanostructured materials - Measurement |
| ISBN | 1-5386-1081-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910258256403321 |
| New York : , : IEEE, , 2018 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
3M-NANO : 2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale : 27-31 October 2014
| 3M-NANO : 2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale : 27-31 October 2014 |
| Pubbl/distr/stampa | New York : , : IEEE, , 2015 |
| Descrizione fisica | 1 online resource (304 pages) |
| Soggetto topico |
Nanomanufacturing
Nanotechnology Nanostructured materials - Measurement |
| ISBN | 1-4799-7923-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996280307103316 |
| New York : , : IEEE, , 2015 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
3M-NANO : 2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale : 27-31 October 2014
| 3M-NANO : 2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale : 27-31 October 2014 |
| Pubbl/distr/stampa | New York : , : IEEE, , 2015 |
| Descrizione fisica | 1 online resource (304 pages) |
| Soggetto topico |
Nanomanufacturing
Nanotechnology Nanostructured materials - Measurement |
| ISBN | 1-4799-7923-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910135186903321 |
| New York : , : IEEE, , 2015 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Advanced micro- and nano-manufacturing technologies : applications in biochemical and biomedical engineering / / Shrikrishna Nandkishor Joshi, Pranjal Chandra, editors
| Advanced micro- and nano-manufacturing technologies : applications in biochemical and biomedical engineering / / Shrikrishna Nandkishor Joshi, Pranjal Chandra, editors |
| Pubbl/distr/stampa | Singapore : , : Springer, , [2022] |
| Descrizione fisica | 1 online resource (404 pages) |
| Disciplina | 610.28 |
| Collana | Materials Horizons |
| Soggetto topico |
Biomedical engineering - Technological innovations
Nanomanufacturing Biochemical engineering - Technological innovations |
| ISBN |
981-16-3644-3
981-16-3645-1 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910743368903321 |
| Singapore : , : Springer, , [2022] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Conference proceedings : International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)
| Conference proceedings : International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) |
| Pubbl/distr/stampa | [Piscataway, NJ] : , : [IEEE] |
| Descrizione fisica | online version |
| Disciplina | 620 |
| Soggetto topico |
Nanotechnology
Nanomanufacturing |
| Soggetto genere / forma | Conference papers and proceedings. |
| ISSN | 2694-510X |
| Formato | Materiale a stampa |
| Livello bibliografico | Periodico |
| Lingua di pubblicazione | eng |
| Altri titoli varianti |
Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), ... International Conference on
3M-NANO International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale IEEE NANO |
| Record Nr. | UNINA-9910626188803321 |
| [Piscataway, NJ] : , : [IEEE] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Directed self-assembly of block co-polymers for nano-manufacturing / / edited by Roel Gronheid and Paul Nealey
| Directed self-assembly of block co-polymers for nano-manufacturing / / edited by Roel Gronheid and Paul Nealey |
| Pubbl/distr/stampa | Amsterdam, Netherlands : , : Woodhead Publishing, , 2015 |
| Descrizione fisica | 1 online resource (328 p.) |
| Disciplina | 547.84 |
| Collana | Woodhead Publishing series in electronic and optical materials |
| Soggetto topico |
Block copolymers
Self-assembly (Chemistry) Nanomanufacturing |
| ISBN |
0-08-100261-0
0-08-100250-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Directed Self-assembly of Block Copolymers for Nano-manufacturing; Copyright; Contents; List of contributors; Woodhead Publishing Series in Electronic and Optical Materials; Part One: Physics and chemistry of block copolymer (BCP) materials ; Chapter 1: Physics of block copolymers from bulk to thin films; 1.1 . Introduction; 1.2 . Order-disorder transition of block copolymers; 1.2.1 . Disordered state; 1.2.2 . Weak segregation limit in ordered state; 1.2.3 . Strong segregation limit in ordered state; 1.2.4 . Phase diagram obtained by using self-consistent field theory
1.3 . Morphologies of diblock copolymer/homopolymer mixtures1.4 . Dynamics of phase transition in block copolymers; 1.5 . Structures of block copolymer in thin films; 1.5.1 . Free energy of block copolymer thin film; 1.5.2 . Effect of surface energy term; F surface ; 1.5.3 . Effect of bulk energy term F bulk ; 1.6 . Conclusion; References; Chapter 2: RAFT synthesis of block copolymers and their self-assembly properties; 2.1 . RAFT process description; 2.2 . Polymerization process details; 2.2.1 . In situ process analysis; 2.3 . RAFT end-group catalytic radical reduction 2.4 . Block Copolymer In situ Topcoat Applications2.5 . DSA Applications; 2.6 . High chi block copolymers; 2.7 . Conclusions; Acknowledgments; References; Chapter 3: Thermal and solvent annealing of block copolymer films; 3.1 . Introduction; 3.2 . Thermal annealing of BCPs films; 3.2.1 . Fundamental consideration; 3.2.2 . Film thickness effect and temperature gradient; 3.2.3 . Crystallization behavior induced by thermal annealing; 3.3 . Solvent annealing of BCPs films; 3.3.1 . Fundamental consideration; 3.3.2 . Factors affecting the annealing process 3.3.3 . Combination of solvent annealing and thermal annealing3.4 . Summary and outlook; References; Chapter 4: Field-theoretic simulations and self-consistent field theory for studying block copolymer directed self-assembly; 4.1 Introduction; 4.2 Overview of field-theory-based simulations of block copolymer DSA; 4.3 Chemoepitaxy modeling; 4.4 Graphoepitaxy modeling; 4.4.1 Cylinders in a rectangular trench; 4.4.2 Contact hole shrink; 4.5 Summary and outlook; References; Part Two: Templates and patterning for directed self-assembly Chapter 5: Directed self-oriented self-assembly of block copolymers using topographical surfaces5.1 . Introduction; 5.2 . Control of interfacial interactions; 5.3 . Graphoepitaxy; 5.3.1 . Fabrication of topographical surfaces; 5.3.2 . Geometry with deep patterning; 5.3.2.1 . Deep trench surfaces; 5.3.2.2 . Post surfaces; 5.3.2.3 . Other surfaces; 5.3.3 . Geometry with minimal patterning; 5.3.3.1 . Faceted surfaces; 5.3.3.2 . Shallow trench surfaces; 5.4 . Application of BCPs guided by topographical surfaces; 5.5 . Summary and outlook; References Chapter 6: Directed self-oriented self-assembly of block copolymers using chemically modified surfaces |
| Record Nr. | UNINA-9910797363803321 |
| Amsterdam, Netherlands : , : Woodhead Publishing, , 2015 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Directed self-assembly of block co-polymers for nano-manufacturing / / edited by Roel Gronheid and Paul Nealey
| Directed self-assembly of block co-polymers for nano-manufacturing / / edited by Roel Gronheid and Paul Nealey |
| Pubbl/distr/stampa | Amsterdam, Netherlands : , : Woodhead Publishing, , 2015 |
| Descrizione fisica | 1 online resource (328 p.) |
| Disciplina | 547.84 |
| Collana | Woodhead Publishing series in electronic and optical materials |
| Soggetto topico |
Block copolymers
Self-assembly (Chemistry) Nanomanufacturing |
| ISBN |
0-08-100261-0
0-08-100250-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Directed Self-assembly of Block Copolymers for Nano-manufacturing; Copyright; Contents; List of contributors; Woodhead Publishing Series in Electronic and Optical Materials; Part One: Physics and chemistry of block copolymer (BCP) materials ; Chapter 1: Physics of block copolymers from bulk to thin films; 1.1 . Introduction; 1.2 . Order-disorder transition of block copolymers; 1.2.1 . Disordered state; 1.2.2 . Weak segregation limit in ordered state; 1.2.3 . Strong segregation limit in ordered state; 1.2.4 . Phase diagram obtained by using self-consistent field theory
1.3 . Morphologies of diblock copolymer/homopolymer mixtures1.4 . Dynamics of phase transition in block copolymers; 1.5 . Structures of block copolymer in thin films; 1.5.1 . Free energy of block copolymer thin film; 1.5.2 . Effect of surface energy term; F surface ; 1.5.3 . Effect of bulk energy term F bulk ; 1.6 . Conclusion; References; Chapter 2: RAFT synthesis of block copolymers and their self-assembly properties; 2.1 . RAFT process description; 2.2 . Polymerization process details; 2.2.1 . In situ process analysis; 2.3 . RAFT end-group catalytic radical reduction 2.4 . Block Copolymer In situ Topcoat Applications2.5 . DSA Applications; 2.6 . High chi block copolymers; 2.7 . Conclusions; Acknowledgments; References; Chapter 3: Thermal and solvent annealing of block copolymer films; 3.1 . Introduction; 3.2 . Thermal annealing of BCPs films; 3.2.1 . Fundamental consideration; 3.2.2 . Film thickness effect and temperature gradient; 3.2.3 . Crystallization behavior induced by thermal annealing; 3.3 . Solvent annealing of BCPs films; 3.3.1 . Fundamental consideration; 3.3.2 . Factors affecting the annealing process 3.3.3 . Combination of solvent annealing and thermal annealing3.4 . Summary and outlook; References; Chapter 4: Field-theoretic simulations and self-consistent field theory for studying block copolymer directed self-assembly; 4.1 Introduction; 4.2 Overview of field-theory-based simulations of block copolymer DSA; 4.3 Chemoepitaxy modeling; 4.4 Graphoepitaxy modeling; 4.4.1 Cylinders in a rectangular trench; 4.4.2 Contact hole shrink; 4.5 Summary and outlook; References; Part Two: Templates and patterning for directed self-assembly Chapter 5: Directed self-oriented self-assembly of block copolymers using topographical surfaces5.1 . Introduction; 5.2 . Control of interfacial interactions; 5.3 . Graphoepitaxy; 5.3.1 . Fabrication of topographical surfaces; 5.3.2 . Geometry with deep patterning; 5.3.2.1 . Deep trench surfaces; 5.3.2.2 . Post surfaces; 5.3.2.3 . Other surfaces; 5.3.3 . Geometry with minimal patterning; 5.3.3.1 . Faceted surfaces; 5.3.3.2 . Shallow trench surfaces; 5.4 . Application of BCPs guided by topographical surfaces; 5.5 . Summary and outlook; References Chapter 6: Directed self-oriented self-assembly of block copolymers using chemically modified surfaces |
| Record Nr. | UNINA-9910826847403321 |
| Amsterdam, Netherlands : , : Woodhead Publishing, , 2015 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
