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ASML and Dutch Physics : A History of the Advanced Research Center for Nanolithography (ARCNL), 2014-2024
| ASML and Dutch Physics : A History of the Advanced Research Center for Nanolithography (ARCNL), 2014-2024 |
| Autore | Brookhuis Hein |
| Edizione | [1st ed.] |
| Pubbl/distr/stampa | Amsterdam : , : Amsterdam University Press, , 2025 |
| Descrizione fisica | 1 online resource (153 pages) |
| Disciplina | 621.381531 |
| Soggetto topico |
Nanolithography
Science and industry |
| ISBN | 90-485-7164-2 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9911020826703321 |
Brookhuis Hein
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| Amsterdam : , : Amsterdam University Press, , 2025 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Journal of micro/nanolithography, MEMS, and MOEMS : JM³
| Journal of micro/nanolithography, MEMS, and MOEMS : JM³ |
| Pubbl/distr/stampa | [Bellingham, WA], : SPIE-The International Society of Optical Engineering, ©2007- |
| Disciplina | 620 |
| Soggetto topico |
Nanolithography
Microelectronics Microlithography Microfabrication |
| Soggetto genere / forma | Periodicals. |
| ISSN | 1932-5134 |
| Formato | Materiale a stampa |
| Livello bibliografico | Periodico |
| Lingua di pubblicazione | eng |
| Altri titoli varianti |
JM³
J. Micro/Nanolith. MEMS MOEMS |
| Record Nr. | UNISA-996334349903316 |
| [Bellingham, WA], : SPIE-The International Society of Optical Engineering, ©2007- | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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Nano-lithography [[electronic resource] /] / edited by Stefan Landis
| Nano-lithography [[electronic resource] /] / edited by Stefan Landis |
| Autore | Landis Stefan |
| Edizione | [1st edition] |
| Pubbl/distr/stampa | London, : ISTE |
| Descrizione fisica | 1 online resource (353 p.) |
| Disciplina | 621.381531 |
| Altri autori (Persone) | LandisStefan |
| Collana | ISTE |
| Soggetto topico | Nanolithography |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-118-62170-0
1-118-62258-8 1-299-31558-5 1-118-62162-X |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Ch. 1. X-ray lithography : fundamentals and applications -- ch. 2. NanoImprint lithography -- ch. 3. Lithography techniques using scanning probe microscopy -- ch. 4. Lithography and manipulation based on the optical properties of metal nanostructures -- ch. 5. Patterning with self-assembling block copolymers -- ch. 6. Metrology for lithography. |
| Record Nr. | UNINA-9910139242703321 |
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Landis Stefan
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| London, : ISTE | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Nano-lithography [[electronic resource] /] / edited by Stefan Landis
| Nano-lithography [[electronic resource] /] / edited by Stefan Landis |
| Autore | Landis Stefan |
| Edizione | [1st edition] |
| Pubbl/distr/stampa | London, : ISTE |
| Descrizione fisica | 1 online resource (353 p.) |
| Disciplina | 621.381531 |
| Altri autori (Persone) | LandisStefan |
| Collana | ISTE |
| Soggetto topico | Nanolithography |
| ISBN |
1-118-62170-0
1-118-62258-8 1-299-31558-5 1-118-62162-X |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Ch. 1. X-ray lithography : fundamentals and applications -- ch. 2. NanoImprint lithography -- ch. 3. Lithography techniques using scanning probe microscopy -- ch. 4. Lithography and manipulation based on the optical properties of metal nanostructures -- ch. 5. Patterning with self-assembling block copolymers -- ch. 6. Metrology for lithography. |
| Record Nr. | UNINA-9910830314403321 |
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Landis Stefan
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||
| London, : ISTE | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Nano-lithography / / edited by Stefan Landis
| Nano-lithography / / edited by Stefan Landis |
| Edizione | [1st edition] |
| Pubbl/distr/stampa | London, : ISTE |
| Descrizione fisica | 1 online resource (353 p.) |
| Disciplina | 621.3815/31 |
| Altri autori (Persone) | LandisStefan |
| Collana | ISTE |
| Soggetto topico | Nanolithography |
| ISBN |
9781118621707
1118621700 9781118622582 1118622588 9781299315587 1299315585 9781118621622 111862162X |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Ch. 1. X-ray lithography : fundamentals and applications -- ch. 2. NanoImprint lithography -- ch. 3. Lithography techniques using scanning probe microscopy -- ch. 4. Lithography and manipulation based on the optical properties of metal nanostructures -- ch. 5. Patterning with self-assembling block copolymers -- ch. 6. Metrology for lithography. |
| Record Nr. | UNINA-9911019632803321 |
| London, : ISTE | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Nanoimprinting and its applications / / edited by Akihiro Miyauchi
| Nanoimprinting and its applications / / edited by Akihiro Miyauchi |
| Pubbl/distr/stampa | Singapore : , : Jenny Stanford Publishing, , [2019] |
| Descrizione fisica | 1 online resource (210 pages) |
| Disciplina | 621.381531 |
| Soggetto topico | Nanolithography |
| ISBN |
0-429-03192-0
0-429-62687-8 0-429-62851-X |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910793625703321 |
| Singapore : , : Jenny Stanford Publishing, , [2019] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Nanolithography : the art of fabricating nanoelectronic and nanophotonic devices and systems / / edited by Martin Feldman
| Nanolithography : the art of fabricating nanoelectronic and nanophotonic devices and systems / / edited by Martin Feldman |
| Pubbl/distr/stampa | Philadelphia, PA : , : Woodhead Pub., , 2014 |
| Descrizione fisica | 1 online resource (599 p.) |
| Disciplina | 621.381531 |
| Altri autori (Persone) | FeldmanMartin |
| Collana | Woodhead Publishing series in electronic and optical materials |
| Soggetto topico |
Nanolithography
Nanophotonics Nanotechnology Nanostructured materials - Design and construction |
| Soggetto genere / forma | Electronic books. |
| ISBN | 0-85709-875-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover ; Nanolithography: The art of fabricating nanoelectronic and nanophotonic devices and systems ; Copyright ; Contents; Contributor contact details; Woodhead Publishing Series in Electronic and Optical Materials; Preface; 1: Optical projection lithography; 1.1 Introduction; 1.2 Lithography technology and trends; 1.3 Fundamentals of optical lithography; 1.4 Image evaluation; 1.5 Projection lithography systems; 1.6 Wavelengths for optical lithography; 1.7 Lithography in the deep ultraviolet (UV); 1.8 Resolution enhancement technology; 1.9 Immersion lithography
1.10 Multiple patterning optical lithography1.11 Conclusion; 1.12 References; 2: Extreme ultraviolet (EUV) lithography; 2.1 Introduction; 2.2 EUV sources; 2.3 EUV optics; 2.4 EUV masks; 2.5 EUV resists; 2.6 EUV integration and implementation challenges; 2.7 Conclusion and future trends; 2.8 Acknowledgments; 2.9 References; 3: Electron beam lithography; 3.1 Introduction; 3.2 Using pixel parallelism to address the throughput bottleneck; 3.3 The tradeoff between resolution and throughput; 3.4 Distributed systems; 3.5 Ultimate lithographic resolution 3.6 Electron-beam patterning of photomasks for optical lithography3.7 Conclusion; 3.8 Acknowledgements; 3.9 References; 4: Focused ion beams for nano-machining and imaging; 4.1 Introduction; 4.2 An adumbrated history of focused ion beams (FIBs); 4.3 Sources of ions: a quartet of types; 4.4 Charged particle optics; 4.5 Ion-matter interactions; 4.6 Milling; 4.7 Deposition; 4.8 Imaging; 4.9 Spectroscopy; 4.10 Conclusion and future trends; 4.11 References; 5: Masks for microand nanolithography; 5.1 Introduction; 5.2 Mask materials; 5.3 Mask process; 5.4 Mask metrology; 5.5 Defects and masks 5.6 Conclusion5.7 References; 6: Maskless photolithography; 6.1 Introduction; 6.2 The use of photons as opposed to charged particles; 6.3 Forms of maskless photolithography; 6.4 Zone-plate-array lithography (ZPAL); 6.5 Proximity-effect correction; 6.6 Extending the resolution of ZPAL; 6.7 Commercialization of ZPAL by LumArray, Inc.; 6.8 Conclusion; 6.9 References; 7: Chemistry and processing of resists for nanolithography; 7.1 Introduction; 7.2 Resists for optical lithography: synthesis and radiation induced chemistry of resists as a function of exposure technology 7.3 Chemically amplified resist process considerations7.4 Chemically amplified resists for 193 nm lithography; 7.5 Resists for extreme ultraviolet lithography (EUVL); 7.6 Resists for electron beam lithography; 7.7 Resists for selected forward looking lithographic technologies; 7.8 Resist resolution limitations; 7.9 Conclusion; 7.10 References; 8: Directed assembly nanolithography; 8.1 Introduction; 8.2 Block copolymers in lithography; 8.3 Directed self-assembly of block copolymers; 8.4 Programmable three-dimensional lithography; 8.5 Conclusion; 8.6 References; 9: Nanoimprint lithography 9.1 Introduction |
| Record Nr. | UNISA-996426332403316 |
| Philadelphia, PA : , : Woodhead Pub., , 2014 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
Nanolithography : the art of fabricating nanoelectronic and nanophotonic devices and systems / / edited by Martin Feldman
| Nanolithography : the art of fabricating nanoelectronic and nanophotonic devices and systems / / edited by Martin Feldman |
| Pubbl/distr/stampa | Philadelphia, PA : , : Woodhead Pub., , 2014 |
| Descrizione fisica | 1 online resource (599 p.) |
| Disciplina | 621.381531 |
| Altri autori (Persone) | FeldmanMartin |
| Collana | Woodhead Publishing series in electronic and optical materials |
| Soggetto topico |
Nanolithography
Nanophotonics Nanotechnology Nanostructured materials - Design and construction |
| Soggetto genere / forma | Electronic books. |
| ISBN | 0-85709-875-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover ; Nanolithography: The art of fabricating nanoelectronic and nanophotonic devices and systems ; Copyright ; Contents; Contributor contact details; Woodhead Publishing Series in Electronic and Optical Materials; Preface; 1: Optical projection lithography; 1.1 Introduction; 1.2 Lithography technology and trends; 1.3 Fundamentals of optical lithography; 1.4 Image evaluation; 1.5 Projection lithography systems; 1.6 Wavelengths for optical lithography; 1.7 Lithography in the deep ultraviolet (UV); 1.8 Resolution enhancement technology; 1.9 Immersion lithography
1.10 Multiple patterning optical lithography1.11 Conclusion; 1.12 References; 2: Extreme ultraviolet (EUV) lithography; 2.1 Introduction; 2.2 EUV sources; 2.3 EUV optics; 2.4 EUV masks; 2.5 EUV resists; 2.6 EUV integration and implementation challenges; 2.7 Conclusion and future trends; 2.8 Acknowledgments; 2.9 References; 3: Electron beam lithography; 3.1 Introduction; 3.2 Using pixel parallelism to address the throughput bottleneck; 3.3 The tradeoff between resolution and throughput; 3.4 Distributed systems; 3.5 Ultimate lithographic resolution 3.6 Electron-beam patterning of photomasks for optical lithography3.7 Conclusion; 3.8 Acknowledgements; 3.9 References; 4: Focused ion beams for nano-machining and imaging; 4.1 Introduction; 4.2 An adumbrated history of focused ion beams (FIBs); 4.3 Sources of ions: a quartet of types; 4.4 Charged particle optics; 4.5 Ion-matter interactions; 4.6 Milling; 4.7 Deposition; 4.8 Imaging; 4.9 Spectroscopy; 4.10 Conclusion and future trends; 4.11 References; 5: Masks for microand nanolithography; 5.1 Introduction; 5.2 Mask materials; 5.3 Mask process; 5.4 Mask metrology; 5.5 Defects and masks 5.6 Conclusion5.7 References; 6: Maskless photolithography; 6.1 Introduction; 6.2 The use of photons as opposed to charged particles; 6.3 Forms of maskless photolithography; 6.4 Zone-plate-array lithography (ZPAL); 6.5 Proximity-effect correction; 6.6 Extending the resolution of ZPAL; 6.7 Commercialization of ZPAL by LumArray, Inc.; 6.8 Conclusion; 6.9 References; 7: Chemistry and processing of resists for nanolithography; 7.1 Introduction; 7.2 Resists for optical lithography: synthesis and radiation induced chemistry of resists as a function of exposure technology 7.3 Chemically amplified resist process considerations7.4 Chemically amplified resists for 193 nm lithography; 7.5 Resists for extreme ultraviolet lithography (EUVL); 7.6 Resists for electron beam lithography; 7.7 Resists for selected forward looking lithographic technologies; 7.8 Resist resolution limitations; 7.9 Conclusion; 7.10 References; 8: Directed assembly nanolithography; 8.1 Introduction; 8.2 Block copolymers in lithography; 8.3 Directed self-assembly of block copolymers; 8.4 Programmable three-dimensional lithography; 8.5 Conclusion; 8.6 References; 9: Nanoimprint lithography 9.1 Introduction |
| Record Nr. | UNISA-996461151603316 |
| Philadelphia, PA : , : Woodhead Pub., , 2014 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
