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.. IEEE International Symposium on Nanoscale Architectures
| .. IEEE International Symposium on Nanoscale Architectures |
| Pubbl/distr/stampa | Piscataway, NJ : , : IEEE, , [2007?-] |
| Disciplina | 621.381 |
| Soggetto topico |
Nanoelectronics
Nanotechnology Metal oxide semiconductors, Complementary |
| Soggetto genere / forma | Conference papers and proceedings. |
| Formato | Materiale a stampa  |
| Livello bibliografico | Periodico |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996279530203316 |
| Piscataway, NJ : , : IEEE, , [2007?-] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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.. IEEE International Symposium on Nanoscale Architectures
| .. IEEE International Symposium on Nanoscale Architectures |
| Pubbl/distr/stampa | Piscataway, NJ : , : IEEE, , [2007?-] |
| Disciplina | 621.381 |
| Soggetto topico |
Nanoelectronics
Nanotechnology Metal oxide semiconductors, Complementary |
| Soggetto genere / forma | Conference papers and proceedings. |
| ISSN | 2327-8218 |
| Formato | Materiale a stampa |
| Livello bibliografico | Periodico |
| Lingua di pubblicazione | eng |
| Altri titoli varianti |
.. IEEE International Symposium on Nanoscale Architecture
Proceedings of the ... IEEE/ACM International Symposium on Nanoscale Architectures NANOARCH NANOSARCH IEEE/ACM International Symposium on Nanoscale Architectures Nanoscale Architecture (NANOARCH ...) Nanoscale architectures |
| Record Nr. | UNINA-9910626164603321 |
| Piscataway, NJ : , : IEEE, , [2007?-] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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2000 IEEE International Workshop on Defect Based Testing : April 30, 2000, Montreal, Canada : proceedings
| 2000 IEEE International Workshop on Defect Based Testing : April 30, 2000, Montreal, Canada : proceedings |
| Pubbl/distr/stampa | [Place of publication not identified], : IEEE Computer Society, 2000 |
| Disciplina | 621.3815 |
| Soggetto topico |
Integrated circuits - Defects
Iddq testing Metal oxide semiconductors, Complementary Electrical & Computer Engineering Electrical Engineering Engineering & Applied Sciences |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996218751103316 |
| [Place of publication not identified], : IEEE Computer Society, 2000 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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2000 Southwest Symposium on Mixed-Signal Design : SSMSD : February 27-29, 2000, San Diego, California, U.S.A
| 2000 Southwest Symposium on Mixed-Signal Design : SSMSD : February 27-29, 2000, San Diego, California, U.S.A |
| Pubbl/distr/stampa | [Place of publication not identified], : IEEE, 2000 |
| Disciplina | 621.382/2 |
| Soggetto topico |
Mixed signal circuits - Design and construction
Signal processing - Digital techniques Signal processing - Design and construction Electronic circuit design - Design and construction Integrated circuits Metal oxide semiconductors, Complementary Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996218228603316 |
| [Place of publication not identified], : IEEE, 2000 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
2001 Southwest Symposium on Mixed-Signal Design : SSMSD : February 25-27, 2001, Austin, Texas, U.S.A
| 2001 Southwest Symposium on Mixed-Signal Design : SSMSD : February 25-27, 2001, Austin, Texas, U.S.A |
| Pubbl/distr/stampa | [Place of publication not identified], : IEEE, 2001 |
| Disciplina | 621.382/2 |
| Soggetto topico |
Signal processing - Digital techniques
Signal processing - Design and construction Electronic circuit design - Design and construction Integrated circuits Metal oxide semiconductors, Complementary Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996213510703316 |
| [Place of publication not identified], : IEEE, 2001 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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2012 IEEE International Interconnect Technology Conference
| 2012 IEEE International Interconnect Technology Conference |
| Pubbl/distr/stampa | [Place of publication not identified], : IEEE, 2012 |
| Descrizione fisica | 1 online resource |
| Disciplina | 621.3815 |
| Soggetto topico |
Metal oxide semiconductors, Complementary
Interconnects (Integrated circuit technology) |
| ISBN |
1-4673-1137-5
1-4673-1136-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996215694903316 |
| [Place of publication not identified], : IEEE, 2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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2012 IEEE International Interconnect Technology Conference
| 2012 IEEE International Interconnect Technology Conference |
| Pubbl/distr/stampa | [Place of publication not identified], : IEEE, 2012 |
| Descrizione fisica | 1 online resource |
| Disciplina | 621.3815 |
| Soggetto topico |
Metal oxide semiconductors, Complementary
Interconnects (Integrated circuit technology) |
| ISBN |
1-4673-1137-5
1-4673-1136-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910130687503321 |
| [Place of publication not identified], : IEEE, 2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Analog filters in nanometer CMOS / / Heimo Uhrmann, Robert Kolm, Horst Zimmermann
| Analog filters in nanometer CMOS / / Heimo Uhrmann, Robert Kolm, Horst Zimmermann |
| Autore | Uhrmann Heimo |
| Edizione | [1st ed. 2014.] |
| Pubbl/distr/stampa | Heidelberg, Germany : , : Springer, , 2014 |
| Descrizione fisica | 1 online resource (xii, 166 pages) : illustrations |
| Disciplina | 621.381 |
| Collana | Springer Series in Advanced Microelectronics |
| Soggetto topico |
Nanoelectronics
Metal oxide semiconductors, Complementary Electric filters |
| ISBN | 3-642-38013-1 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Analog Filters -- CMOS Technology -- Operational Transconductance Amplifiers (OTAs) -- Gm-C Filters -- Current-Mode Filters -- Operational Amplifier RC Low-Pass Filter. |
| Record Nr. | UNINA-9910299715303321 |
Uhrmann Heimo
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| Heidelberg, Germany : , : Springer, , 2014 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Analog IC reliability in nanometer CMOS / / Elie Maricau, Georges Gielen
| Analog IC reliability in nanometer CMOS / / Elie Maricau, Georges Gielen |
| Autore | Maricau Elie |
| Edizione | [1st ed. 2013.] |
| Pubbl/distr/stampa | New York : , : Springer, , 2013 |
| Descrizione fisica | 1 online resource (xvi, 198 pages) : illustrations (some color) |
| Disciplina | 621.3815 |
| Collana | Analog Circuits and Signal Processing |
| Soggetto topico |
Linear integrated circuits - Reliability
Metal oxide semiconductors, Complementary |
| ISBN |
1-299-19739-6
1-4614-6163-4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Introduction -- CMOS Reliability Overview -- Transistor Aging Compact Modeling -- Background on IC Reliability Simulation -- Analog IC Reliability Simulation -- Integrated Circuit Reliability -- Conclusions. |
| Record Nr. | UNINA-9910438039203321 |
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Maricau Elie
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| New York : , : Springer, , 2013 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Beyond CMOS Nanodevices 1 / / edited by Francis Balestra
| Beyond CMOS Nanodevices 1 / / edited by Francis Balestra |
| Pubbl/distr/stampa | London, England ; ; Hoboken, New Jersey : , : iSTE : , : Wiley, , 2014 |
| Descrizione fisica | 1 online resource (517 p.) |
| Disciplina | 621.381 |
| Collana | Nanoscience and nanotechnology series |
| Soggetto topico |
Nanoelectronics
Metal oxide semiconductors, Complementary Nanostructures |
| ISBN |
1-118-98477-3
1-118-98485-4 1-118-98479-X |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover; Title Page; Copyright; Contents; Acknowledgments; General Introduction; Part 1. Silion Nanowire Biochemical Sensors; Part 1. Introduction; Chapter 1. Fabrication Of Nanowires; 1.1. Introduction; 1.2. Silicon nanowire fabrication with electron beam lithography; 1.2.1. Key requirements; 1.2.2. Why electron beam lithography?; 1.2.3. Lithographic requirements; 1.2.4. Tools, resist materials and development processes; 1.2.5. Exposure strategies and proximity effect correction; 1.2.6. Technology limitations and how to circumvent them
1.3. Silicon nanowire fabrication with sidewall transfer lithography1.4. Si nanonet fabrication; 1.4.1. Si NWs fabrication; 1.4.2. Si nanonet assembling; 1.4.3. Si nanonet morphology and properties; 1.5. Acknowledgments; 1.6. Bibliography; Chapter 2. Functionalization Of Si-Based NW FETs For DNA Detection; 2.1. Introduction; 2.2. Functionalization process; 2.3. Functionalization of Si nanonets for DNA biosensing; 2.3.1. Detection of DNA hybridization on the Si nanonet by fluorescence microscopy; 2.3.2. Preliminary electrical characterizations of NW networks 2.4. Functionalization of SiC nanowire-based sensor for electrical DNA biosensing2.4.1. SiC nanowire-based sensor functionalization process; 2.4.2. DNA electrical detection from SiC nanowire-based sensor; 2.5. Acknowledgments; 2.6. Bibliography; Chapter 3. Sensitivity Of Silicon Nanowire Biochemical Sensors; 3.1. Introduction; 3.1.1. Definitions; 3.1.2. Main parameters affecting the sensitivity; 3.2. Sensitivity and noise; 3.3. Modeling the sensitivity of Si NW biosensors; 3.3.1. Modeling the electrolyte; 3.4. Sensitivity of random arrays of 1D nanostructures 3.4.1. Electrical characterization3.4.2. Low-frequency noise characterization; 3.4.3. Simulation of electron conduction in random networks of 1D nanostructures; 3.4.4. Discussion; 3.5. Conclusions; 3.6. Acknowledgments; 3.7. Bibliography; Chapter 4. Integration Of Silicon Nanowires With CMOS; 4.1. Introduction; 4.2. Overview of CMOS process technology; 4.3. Integration of silicon nanowire after BEOL; 4.4. Integration of silicon nanowires in FEOL; 4.5. Sensor architecture design; 4.6. Conclusions; 4.7. Bibliography Chapter 5. Portable, Integrated Lock-In-Amplifier-Based System For Real-Time Impedimetric Measurements On Nanowires Biosensors5.1. Introduction; 5.2. Portable stand-alone system; 5.3. Integrated impedimetric interface; 5.4. Impedimetric measurements on nanowire sensors; 5.5. Bibliography; Part 2. New Materials, Devices And Technologies For Energy Harvesting; Part 2. Introduction; Chapter 6. Vibrational Energy Harvesting; 6.1. Introduction; 6.2. Piezoelectric energy transducer; 6.2.1. Introduction; 6.2.2. State-of-the-art devices and materials 6.2.3. MEMS piezoelectric vibration energy harvesting transducers |
| Record Nr. | UNINA-9910132194603321 |
| London, England ; ; Hoboken, New Jersey : , : iSTE : , : Wiley, , 2014 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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