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Cold plasma in food and agriculture : fundamentals and applications / / edited by N. N. Misra, Oliver Schlüter, P. J. Cullen
| Cold plasma in food and agriculture : fundamentals and applications / / edited by N. N. Misra, Oliver Schlüter, P. J. Cullen |
| Pubbl/distr/stampa | Amsterdam, [Netherlands] : , : Academic Press, , 2016 |
| Descrizione fisica | 1 online resource (382 p.) |
| Disciplina | 530.44 |
| Soggetto topico |
Low temperature plasmas
Low temperature engineering |
| ISBN |
0-12-801489-X
0-12-801365-6 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Cold Plasma in Food and Agriculture: Fundamentals and Applications; Copyright; Contents; Contributors; Foreword; Chapter 1: Plasma in Food and Agriculture; 1. Challenges and Trends in Food Production; 1.1. Food Security; 1.2. Food Safety; 1.3. Minimal Processing; 1.4. Consumer and Regulatory Acceptance; 2. The Emergence of Nonthermal Solutions; 2.1. Related Nonthermal Technologies; 2.1.1. Pulsed Electric Field Processing; 2.1.2. Pulsed Ultraviolet-Light Processing; 2.1.3. Ozone Processing; 2.1.4. General Remarks; 3. What Is Cold Plasma?; 4. History
5. Cold Plasma in Food Processing-A Paradigm Shift6. Objective of the Book; Acknowledgments; References; Chapter 2: Physics of Cold Plasma; 1. Introduction; 2. Electron Kinetics; 3. Plasma Chemistry; 4. Breakdown Processes; 5. Plasma Sources; 5.1. Glow Discharge; 5.2. Microplasmas; 5.3. Corona Discharge; 5.4. Dielectric Barrier Discharge; 5.5. Jet Sources; 6. Modeling Approaches; 7. Summary; References; Chapter 3: The Chemistry of Cold Plasma; 1. Introduction; 2. Collisional Processes in Plasma; 2.1. Primary Plasma Processes-Collisions of Electrons 2.2. Secondary Plasma Processes-Collisions of Heavy Particles3. Some Case Studies in Plasma Chemistry of Relevance to Food and Agriculture; 3.1. The Plasma Chemistry of Ozone Formation; 3.2. Nitrogen Fixation by Cold Plasma; 3.2.1. The Plasma Production of Nitrogen Oxides and Nitric Acid; 3.2.2. Ammonia Production by Nonthermal Plasma; 3.3. Cold Plasma Treatment of VOCs; 4. Concluding Remarks; References; Chapter 4: Atmospheric Pressure Nonthermal Plasma Sources; 1. Introduction; 2. Corona Discharge APNTP; 2.1. Corona Discharge; 2.2. Pulsed Corona Discharge; 2.3. Application of Corona APNTP 3. Dielectric Barrier Discharge APNTP3.1. Dielectric Barrier Discharge; 3.2. Different Patterns of DBD; 3.3. Applications of DBD APNTP; 4. Glow Discharge APNTP; 4.1. Low Pressure Glow Discharge; 4.2. Atmospheric Pressure Glow Discharge; 4.3. Microdischarges; 4.4. Hollow Cathode Discharge; 4.5. Glow Discharge With Liquid Electrodes; 5. Atmospheric Pressure Plasma Jets; 6. High Voltage Pulsed Discharge Produced APNTP; 7. Conclusion; References; Chapter 5: Plasma Diagnostics; 1. Introduction; 2. Electrical Diagnostics of Plasma; 2.1. Langmuir Probe; 2.2. Equivalent Circuit Model 2.3. Interferometry3. Optical Diagnostics of Nonthermal Plasma; 3.1. Instrumentations; 3.2. Optical Emission Spectroscopy; 3.3. Spectral Profile (Voigt); 3.4. Plasma Density (Stark Broadening); 3.5. Optical Absorption Spectroscopy; 3.6. Laser-Induced Fluorescence; 3.7. Laser Scattering; 3.8. Infrared Spectroscopy; 4. Electron Spin Resonance; 5. Mass Spectrometry of Plasma; 6. Concluding Remarks; References; Chapter 6: Principles of Nonthermal Plasma Decontamination; 1. Introduction; 1.1. Plasma as a Tool for Biodecontamination; 2. Role of Plasma Species in Microbial Inactivation 2.1. Reactive Oxygen Species (ROS) and Reactive Nitrogen Species (RNS) |
| Record Nr. | UNINA-9910583094003321 |
| Amsterdam, [Netherlands] : , : Academic Press, , 2016 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Low temperature plasma technology : methods and applications / / edited by Paul K. Chu, XinPei Lu
| Low temperature plasma technology : methods and applications / / edited by Paul K. Chu, XinPei Lu |
| Pubbl/distr/stampa | Boca Raton : , : CRC Press, , 2014 |
| Descrizione fisica | 1 online resource (488 p.) |
| Disciplina |
621.044
621.5/6 621.56 |
| Altri autori (Persone) | ChuPaul K |
| Soggetto topico |
Low temperature plasmas
Low temperature plasmas - Industrial applications Low temperature plasmas - Scientific applications |
| ISBN |
0-429-19397-1
1-4665-0991-0 |
| Classificazione | SCI013050SCI055000TEC021000 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | section 1. Fundamentals -- section 2. Processing and characterization -- section 3. Applications. |
| Record Nr. | UNINA-9910786825903321 |
| Boca Raton : , : CRC Press, , 2014 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Low temperature plasma technology : methods and applications / / edited by Paul K. Chu, XinPei Lu
| Low temperature plasma technology : methods and applications / / edited by Paul K. Chu, XinPei Lu |
| Edizione | [1st ed.] |
| Pubbl/distr/stampa | Boca Raton, : CRC Press, 2014 |
| Descrizione fisica | 1 online resource (488 p.) |
| Disciplina | 621.5/6 |
| Altri autori (Persone) | ChuPaul K |
| Soggetto topico |
Low temperature plasmas
Low temperature plasmas - Industrial applications Low temperature plasmas - Scientific applications |
| ISBN |
0-429-19397-1
1-4665-0991-0 |
| Classificazione | SCI013050SCI055000TEC021000 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | section 1. Fundamentals -- section 2. Processing and characterization -- section 3. Applications. |
| Record Nr. | UNINA-9910816230703321 |
| Boca Raton, : CRC Press, 2014 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Low temperature plasmas : fundamentals, technologies, and techniques / edited by Rainer Hippler ... [et al.]
| Low temperature plasmas : fundamentals, technologies, and techniques / edited by Rainer Hippler ... [et al.] |
| Edizione | [2nd, rev. and enl. ed.] |
| Pubbl/distr/stampa | Weinheim : Wiley-VCH |
| Descrizione fisica | 2 v. (xxxiii, 891 p.) : ill. (some col.) ; 25 cm. |
| Disciplina | 530.442 |
| Altri autori (Persone) | Hippler, R. |
| Soggetto topico |
Low temperature plasmas
Plasma (Ionized gases) |
| ISBN |
9783527406739 (hbk.)
3527406735 (hbk.) |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISALENTO-991002122189707536 |
| Weinheim : Wiley-VCH | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. del Salento | ||
| ||
Physics and technology of high-current discharges in dense gas media and flows [[electronic resource] /] / Philip Rutberg
| Physics and technology of high-current discharges in dense gas media and flows [[electronic resource] /] / Philip Rutberg |
| Autore | Rutberg Philip |
| Pubbl/distr/stampa | New York, : Nova Science Publishers, Inc., c2009 |
| Descrizione fisica | 1 online resource (226 p.) |
| Disciplina | 530.4/4 |
| Soggetto topico |
Low temperature plasmas
Gas flow Plasma generators Pulsed power systems |
| Soggetto genere / forma | Electronic books. |
| ISBN | 1-61470-585-2 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910452904203321 |
Rutberg Philip
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| New York, : Nova Science Publishers, Inc., c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Physics and technology of high-current discharges in dense gas media and flows [[electronic resource] /] / Philip Rutberg
| Physics and technology of high-current discharges in dense gas media and flows [[electronic resource] /] / Philip Rutberg |
| Autore | Rutberg Philip |
| Pubbl/distr/stampa | New York, : Nova Science Publishers, Inc., c2009 |
| Descrizione fisica | 1 online resource (226 p.) |
| Disciplina | 530.4/4 |
| Soggetto topico |
Low temperature plasmas
Gas flow Plasma generators Pulsed power systems |
| ISBN | 1-61470-585-2 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910779628003321 |
|
Rutberg Philip
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||
| New York, : Nova Science Publishers, Inc., c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Physics and technology of high-current discharges in dense gas media and flows [[electronic resource] /] / Philip Rutberg
| Physics and technology of high-current discharges in dense gas media and flows [[electronic resource] /] / Philip Rutberg |
| Autore | Rutberg Philip |
| Edizione | [1st ed.] |
| Pubbl/distr/stampa | New York, : Nova Science Publishers, Inc., c2009 |
| Descrizione fisica | 1 online resource (226 p.) |
| Disciplina | 530.4/4 |
| Soggetto topico |
Low temperature plasmas
Gas flow Plasma generators Pulsed power systems |
| ISBN | 1-61470-585-2 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Intro -- PHYSICS AND TECHNOLOGY OF HIGH-CURRENT DISCHARGES IN DENSE GAS MEDIA AND FLOWS -- PHYSICS AND TECHNOLOGY OF HIGH-CURRENT DISCHARGES IN DENSE GAS MEDIA AND FLOWS -- CONTENTS -- PREFACE -- Chapter I PROCESSES IN HIGH CURRENT DISCHARGES IN DENSE AND SUPER DENSE GAS ENVIRONMENTS -- ABSTRACT -- 1. INTRODUCTION -- 2. CONSTRUCTION OF THE DISCHARGE CHAMBERS -- 2.1 Methods of Diagnostics -- 2.2 Pressure Measuring -- 2.3 Roentgen Measuring -- 3. LARGE CURRENT DISCHARGE WITH THE CURRENT INCREASE RATE OF 109 A/SEC -- 3.1 Discharge Character -- 3.2 Discussion of the Results -- 4. LARGE CURRENT DISCHARGE UNDER THE CURRENT INCREASE RATE OF (1-3)×108 A/SEC -- 4.1 Discharge in Hydrogen -- 4.2 Discharge in Helium, Nitrogen, and Argon -- 5. LARGE CURRENT DISCHARGE UNDER THE CURRENT INCREASE RATE OF (0.6-3)×107 A/SEC -- 5.1 Electro-Machine Source -- 5.2 Inductive Storage -- 6. LARGE CURRENT DISCHARGE UNDER THE CURRENT INCREASE RATE OF (0.6-1.8)×1010A/SEC -- 7. LARGE CURRENT DISCHARGE UNDER THE CURRENT INCREASE RATE OF 6×1011A/SEC -- 8. HEAT EXCHANGE IN THE DISCHARGE CHAMBER : HEAT EXCHANGE BETWEEN THE DISCHARGE AND THE WORKING GAS -- 8.1 Electrodes -- 8.2 Peculiarities of the Electrodes' Erosion -- 9. PULSE DISCHARGE IN THE SUPER DENSE GAS -- 10. WORKING CHARACTERISTICS OF LARGE CURRENT DISCHARGES IN PULSE GENERATORS OF DENSE PLASMA -- 11. PULSE PLASMA GENERATORS -- 11.1 Pulse Electric Arc Plasma Generators -- 11.2 Pulse Electric Arc Plasma Generators with Co-Axial Electrodes -- 11.3 Pulse Plasma Generators with Two Rod Electrodes -- 11.4 Pulse Electric Arc Plasmatrons with Co-Axial Rod Electrodes -- 11.5 Pulse Plasma Generators and the Electric Discharge Light-Gas Accelerators of Bodies -- 12. CONCLUSION -- REFERENCES -- Chapter II INVESTIGATION OF HIGH-CURRENT DISCHARGES IN GAS ENVIRONMENTS -- ABSTRACT -- 1. INTRODUCTION.
2. DISCHARGES IN GAS ENVIRONMENTS -- 2.1. Character of the Discharge -- 2.2. Discharge in Nitrogen -- 2.3. Heat Exchange between the Arc and the Working Gas -- 2.4. On the Opportunity to Obtain the Detachment of the Oscillating Temperature of Nitrogen in Decaying Plasma under High Pressure -- 2.5. Heating by Radiation in Nitrogen -- 2.6. Discharge in Air and in Water Vapors -- 3. ELECTRODES -- 3.1. Measurements of Surface Temperature of Electrodes -- 3.2. Working Regimes of Electrodes -- 3.3. Investigation of the Electrodes' Material -- 3.4. Run-Out of the Electrodes -- 3.5. Work of Electrodes in the Oxidizing Environments: The Rail Electrodes -- 3.6. The Core-Type Electrodes -- 4. THE MAIN TECHNICAL CHARACTERISTICS OF PLASMA GENERATORS AND THEIR CONSTRUCTIONS -- 4.1 Classification of Plasma Generators -- 4.2. DC Plasma Generators -- 4.3. AC Plasma Generators -- 4.4 Single-Phase Plasma Generators of Alternating Current -- 4.5 A Single-Phase AC Plasma Generator with an Arc of Direct Action with Power up to 150 Kw -- 4.6 Multi-Phase Multi-Chamber Plasma Generators of Alternating Current -- 4.7. Multi-Phase Single-Chamber Plasma Generators of Alternating Current -- 4.8. Plasma Generators with Rod Electrodes -- 4.9. High-Voltage One- and Three-Phase Plasmatron -- 5. EXTERNAL CHARACTERISTICS OF PLASMA GENERATORS -- 6. PLASMA TECHNOLOGIES -- 6.1. General Description -- 6.2. Plasma Pyrolysis and Gasification -- 6.3 Plasma High-Temperature Oxidizing -- REFERENCES -- Chapter III INVESTIGATION OF PULSE ELECTRIC DISCHARGES IN LIQUIDS -- ABSTRACT -- 1. INTRODUCTION -- 2. EXPERIMENTAL UNIT AND THE PED PARAMETERS -- 3. EROSION OF ELECTRODES AND THE NANOPARTICLES -- 4. BIOLOGICAL OBJECTS AND METHODS OF INVESTIGATION -- 5. NANOPARTICLES IN DISPERSIONS -- 6. NANOPARTICLES AND BLOOD SERUM -- 7. AGGREGATION OF LYSOZYME ON NANOPARTICLES. 8. BACTERICIDAL ACTION OF WATER TREATED BY PED -- 9. MECHANISM OF PMRW -- 10. INFLUENCE OF NANOPARTICLES ON TUMOR GROWTH IN VIVO -- REFERENCES -- INDEX -- Blank Page. |
| Record Nr. | UNINA-9910811019503321 |
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Rutberg Philip
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| New York, : Nova Science Publishers, Inc., c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Plasma nanoscience : basic concepts and applications of deterministic nanofabrication / / Kostya (Ken) Ostrikov
| Plasma nanoscience : basic concepts and applications of deterministic nanofabrication / / Kostya (Ken) Ostrikov |
| Autore | Ostrikov Kostya (Ken) |
| Pubbl/distr/stampa | Weinheim, [Germany] : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 |
| Descrizione fisica | 1 online resource (566 p.) |
| Disciplina | 621.044 |
| Soggetto topico |
Nanostructured materials
Plasma engineering Low temperature plasmas |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-281-94721-0
9786611947217 3-527-62332-9 3-527-62331-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Nanoscience; Contents; Preface; Acronyms; 1 Introduction; 1.1 Main Concepts and Issues; 1.2 Self-Organized Nanoworld, Commonsense Science of the Small and Socio-Economic Push; 1.3 Nature's Plasma Nanofab and Nanotechnology Research Directions; 1.4 Deterministic Nanofabrication and Plasma Nanoscience; 1.5 Structure of the Monograph and Advice to the Reader; 2 What Makes Low-Temperature Plasmas a Versatile Nanotool?; 2.1 Basic Ideas and Major Issues; 2.2 Plasma Nanofabrication Concept; 2.3 Useful Plasma Features for Nanoscale Fabrication
2.4 Choice and Generation of Building and Working Units2.5 Effect of the Plasma Sheath; 2.6 How Plasmas Affect Elementary Surface Processes; 2.7 Concluding Remarks; 3 Specific Examples and Practical Framework; 3.1 Semiconducting Nanofilms and Nanostructures; 3.2 Carbon-Based Nanofilms and Nanostructures; 3.3 Practical Framework - Bridging Nine Orders of Magnitude; 3.4 Concluding Remarks; 4 Generation of Building and Working Units; 4.1 Species in Methane-Based Plasmas for Synthesis of Carbon Nanostructures; 4.1.1 Experimental Details; 4.1.2 Basic Assumptions of the Model 4.1.3 Particle and Power Balance in Plasma Discharge4.1.4 Densities of Neutral and Charged Species; 4.1.4.1 Effect of RF Power; 4.1.4.2 Effect of Argon and Methane Dilution; 4.1.5 Deposited Neutral and Ion Fluxes; 4.1.6 Most Important Points and Summary; 4.2 Species in Acetylene-Based Plasmas for Synthesis of Carbon Nanostructures; 4.2.1 Formulation of the Problem; 4.2.2 Number Densities of the Main Discharge Species; 4.2.3 Fluxes of Building and Working Units; 4.3 Nanocluster and Nanoparticle Building Units; 4.3.1 Nano-Sized Building Units from Reactive Plasmas 4.3.2 Nanoparticle Generation: Other Examples4.4 Concluding Remarks; 5 Transport, Manipulation and Deposition of Building and Working Units; 5.1 Microscopic Ion Fluxes During Nanoassembly Processes; 5.1.1 Formulation and Model; 5.1.2 Numerical Results; 5.1.3 Interpretation of Numerical Results; 5.2 Nanoparticle Manipulation in the Synthesis of Carbon Nanostructures; 5.2.1 Nanoparticle Manipulation: Experimental Results; 5.2.2 Nanoparticle Manipulation: Numerical Model; 5.3 Selected-Area Nanoparticle Deposition Onto Microstructured Surfaces; 5.3.1 Numerical Model and Simulation Parameters 5.3.2 Selected-Area Nanoparticle Deposition5.3.3 Practical Implementation Framework; 5.4 Electrostatic Nanoparticle Filter; 5.5 Concluding Remarks; 6 Surface Science of Plasma-Exposed Surfaces and Self-Organization Processes; 6.1 Synthesis of Self-Organizing Arrays of Quantum Dots: Objectives and Approach; 6.2 Initial Stage of Ge/Si Nanodot Formation Using Nanocluster Fluxes; 6.2.1 Physical Model and Numerical Details; 6.2.2 Physical Interpretation and Relevant Experimental Data; 6.3 Binary Si(x)C(1-x) Quantum Dot Systems: Initial Growth Stage 6.3.1 Adatom Fluxes at Initial Growth Stages of Si(x)C(1-x) Quantum Dots |
| Record Nr. | UNINA-9910144450103321 |
|
Ostrikov Kostya (Ken)
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||
| Weinheim, [Germany] : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma nanoscience : basic concepts and applications of deterministic nanofabrication / / Kostya Ostrikov
| Plasma nanoscience : basic concepts and applications of deterministic nanofabrication / / Kostya Ostrikov |
| Autore | Ostrikov K (Kostya) |
| Pubbl/distr/stampa | Weinheim : , : Wiley-VCH Verlag GmbH & Co. KGaA, , [2008] |
| Descrizione fisica | 1 online resource (566 p.) |
| Disciplina | 530.44 |
| Soggetto topico |
Low temperature plasmas
Nanostructured materials Plasma engineering |
| ISBN |
1-281-94721-0
9786611947217 3-527-62332-9 3-527-62331-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Nanoscience; Contents; Preface; Acronyms; 1 Introduction; 1.1 Main Concepts and Issues; 1.2 Self-Organized Nanoworld, Commonsense Science of the Small and Socio-Economic Push; 1.3 Nature's Plasma Nanofab and Nanotechnology Research Directions; 1.4 Deterministic Nanofabrication and Plasma Nanoscience; 1.5 Structure of the Monograph and Advice to the Reader; 2 What Makes Low-Temperature Plasmas a Versatile Nanotool?; 2.1 Basic Ideas and Major Issues; 2.2 Plasma Nanofabrication Concept; 2.3 Useful Plasma Features for Nanoscale Fabrication
2.4 Choice and Generation of Building and Working Units2.5 Effect of the Plasma Sheath; 2.6 How Plasmas Affect Elementary Surface Processes; 2.7 Concluding Remarks; 3 Specific Examples and Practical Framework; 3.1 Semiconducting Nanofilms and Nanostructures; 3.2 Carbon-Based Nanofilms and Nanostructures; 3.3 Practical Framework - Bridging Nine Orders of Magnitude; 3.4 Concluding Remarks; 4 Generation of Building and Working Units; 4.1 Species in Methane-Based Plasmas for Synthesis of Carbon Nanostructures; 4.1.1 Experimental Details; 4.1.2 Basic Assumptions of the Model 4.1.3 Particle and Power Balance in Plasma Discharge4.1.4 Densities of Neutral and Charged Species; 4.1.4.1 Effect of RF Power; 4.1.4.2 Effect of Argon and Methane Dilution; 4.1.5 Deposited Neutral and Ion Fluxes; 4.1.6 Most Important Points and Summary; 4.2 Species in Acetylene-Based Plasmas for Synthesis of Carbon Nanostructures; 4.2.1 Formulation of the Problem; 4.2.2 Number Densities of the Main Discharge Species; 4.2.3 Fluxes of Building and Working Units; 4.3 Nanocluster and Nanoparticle Building Units; 4.3.1 Nano-Sized Building Units from Reactive Plasmas 4.3.2 Nanoparticle Generation: Other Examples4.4 Concluding Remarks; 5 Transport, Manipulation and Deposition of Building and Working Units; 5.1 Microscopic Ion Fluxes During Nanoassembly Processes; 5.1.1 Formulation and Model; 5.1.2 Numerical Results; 5.1.3 Interpretation of Numerical Results; 5.2 Nanoparticle Manipulation in the Synthesis of Carbon Nanostructures; 5.2.1 Nanoparticle Manipulation: Experimental Results; 5.2.2 Nanoparticle Manipulation: Numerical Model; 5.3 Selected-Area Nanoparticle Deposition Onto Microstructured Surfaces; 5.3.1 Numerical Model and Simulation Parameters 5.3.2 Selected-Area Nanoparticle Deposition5.3.3 Practical Implementation Framework; 5.4 Electrostatic Nanoparticle Filter; 5.5 Concluding Remarks; 6 Surface Science of Plasma-Exposed Surfaces and Self-Organization Processes; 6.1 Synthesis of Self-Organizing Arrays of Quantum Dots: Objectives and Approach; 6.2 Initial Stage of Ge/Si Nanodot Formation Using Nanocluster Fluxes; 6.2.1 Physical Model and Numerical Details; 6.2.2 Physical Interpretation and Relevant Experimental Data; 6.3 Binary Si(x)C(1-x) Quantum Dot Systems: Initial Growth Stage 6.3.1 Adatom Fluxes at Initial Growth Stages of Si(x)C(1-x) Quantum Dots |
| Record Nr. | UNINA-9910830407303321 |
|
Ostrikov K (Kostya)
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| Weinheim : , : Wiley-VCH Verlag GmbH & Co. KGaA, , [2008] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma-aided nanofabrication [[electronic resource] ] : from plasma sources to nanoassembly / / Kostya (Ken) Ostrikov and Shuyan Xu
| Plasma-aided nanofabrication [[electronic resource] ] : from plasma sources to nanoassembly / / Kostya (Ken) Ostrikov and Shuyan Xu |
| Autore | Ostrikov K (Kostya) |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, c2007 |
| Descrizione fisica | 1 online resource (317 p.) |
| Disciplina |
620.5
621.044 |
| Altri autori (Persone) | XuShuyan |
| Soggetto topico |
Low temperature plasmas
Manufacturing processes Nanostructured materials Plasma engineering |
| ISBN |
1-281-08802-1
9786611088026 3-527-61155-X 3-527-61156-8 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma-Aided Nanofabrication; Contents; Preface; 1 Introduction; 1.1 What is a Plasma?; 1.2 Relevant Issues of Nanoscience and Nanotechnology; 1.3 Plasma-Assisted Synthesis of Nanomaterials; 1.4 How to Choose the Right Plasma for Applications in Nanotechnology?; 1.5 Structure of the Monograph and Advice to the Reader; 2 Generation of Highly Uniform, High-Density Inductively Coupled Plasma; 2.1 Low-Frequency ICP with a Flat External Spiral Coil: Plasma Source and Diagnostic Equipment; 2.1.1 Plasma Source; 2.1.2 Diagnostics of Inductively Coupled Plasmas
3 Plasma Sources: Meeting the Demands of Nanotechnology3.1 Inductively Coupled Plasma Source with Internal Oscillating Currents: Concept and Experimental Verification; 3.1.1 Configuration of the IOCPS; 3.1.2 RF Power Deposition; 3.1.3 Plasma Parameters; 3.2 IOCPS: Stability and Mode Transitions; 3.2.1 Optical Emission; 3.2.2 Self-Transitions of the IOCPS Discharge Modes; 3.3 ICP-Assisted DC Magnetron Sputtering Device; 3.3.1 Enhancement of DC Magnetron Sputtering by an Inductively Coupled Plasma Source; 3.3.2 Mode Transitions in ICP-Assisted Magnetron Sputtering Device 3.4 Integrated Plasma-Aided Nanofabrication Facility3.5 Concluding Remarks; 4 Carbon-Based Nanostructures; 4.1 Growth of Carbon Nanostructures on Unheated Substrates; 4.1.1 Process Details; 4.1.2 Synthesis, Characterization, and Growth Kinetics; 4.2 Temperature-Controlled Regime; 4.3 Single-Crystalline Carbon Nanotips: Experiment; 4.4 Single-Crystalline Carbon Nanotips: ab initio Simulations; 4.4.1 Theoretical Background and Numerical Code; 4.4.2 Geometrical Stability of Carbon Nanotip Structures; 4.4.3 Electronic Properties of Carbon Nanotips 4.5 Plasma-Assisted Doping and Functionalization of Carbon Nanostructures4.5.1 Doping of Carbon-Based Nanostructures: Density Functional Theory Considerations; 4.5.2 Postprocessing of Carbon-Based Nanostructures: Experiments; 4.6 Synthesis of Carbon Nanowall-Like Structures; 5 Quantum Confinement Structures; 5.1 Plasma-Assisted Fabrication of AlN Quantum Dots; 5.2 Nanofabrication of Al(x)In(1-x)N Quantum Dots: Plasma-Aided Bandgap Control; 5.3 Plasma-Aided Nanofabrication of SiC Quantum Dot Arrays; 5.3.1 SiC Properties and Applications; 5.3.2 SiC Growth Modes: With and Without AlN Interlayer 5.3.3 Quest for Crystallinity and Nanopattern Uniformity |
| Record Nr. | UNINA-9910144594603321 |
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Ostrikov K (Kostya)
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| Weinheim, : Wiley-VCH, c2007 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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