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Industrial ion sources : broadbeam gridless ion source technology / / Viacheslav V. Zhurin
| Industrial ion sources : broadbeam gridless ion source technology / / Viacheslav V. Zhurin |
| Autore | Zhurin Viacheslav V. |
| Pubbl/distr/stampa | Weinheim : , : Wiley-VCH, , [2012] |
| Descrizione fisica | 1 online resource (615 p.) |
| Disciplina | 541.372 |
| Soggetto topico | Ion sources |
| Soggetto genere / forma | Electronic books. |
| ISBN |
3-527-63573-4
3-527-63572-6 3-527-63574-2 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover; Title Page; Copyright; Related Titles; Preface; References; Chapter 1: Hall-Current Ion Sources; 1.1 Introduction; 1.2 Closed Drift Ion Sources; 1.3 End-Hall Ion Sources; 1.4 Electric Discharge and Ion Beam Volt-Ampere Characteristics; 1.5 Operating Parameters Characterizing Ion Source; Appendix 1.A: Web Addresses; References; Chapter 2: Ion Source and Vacuum Chamber. Influence of Various Effects on Ion Beam Parameters; 2.1 Introduction; 2.2 Mass Entrainment; 2.3 Charge-Exchange Influence on Ion Beam Flow; 2.4 Doubly Ionized Particles and Their Role
2.5 Influence of Vacuum Chamber Pumping Rate2.6 Dielectric Depositions on an Anode During Operation with Reactive Gases; 2.7 Estimation of Returned Sputtered Particles to Ion Source; 2.8 Influence of Ion Source Heating on its Operation; 2.9 Negative Ions and their Role; 2.10 Conclusion; References; Chapter 3: Oscillations and Instabilities in Hall-Current Ion Sources; 3.1 Introduction; 3.2 Oscillations and Instabilities; 3.3 Types of Oscillations; 3.4 Conclusions and What to Do About Oscillations; References; Chapter 4: Optimum Operation of Hall-Current Ion Sources; 4.1 Introduction 4.2 Regime of Nonself-Sustained Discharge and Optimum Operation Conditions of End-Hall Ion Source4.3 Operation of End-Hall Ion Source with Excessive Electron Emission; 4.4 Ion Beam Energy of End-Hall Ion Source; 4.5 End-Hall Ion Source Optimum Magnetic Field for Ion Beam Current; 4.6 Ion Beam Energy Distribution as a Function of Angle With Various Emission Currents; 4.7 Conclusion; References; Chapter 5: Cathode Neutralizers for Ion Sources; 5.1 Introduction; 5.2 Ion Beam and its Practical Neutralization; 5.3 Hot Filament Electron Source and Thermoelectron Emission; 5.4 Hollow Cathodes 5.5 Conclusions about Cathode Neutralizers5.6 Appendix 5.A: Web Addresses; References; Chapter 6: Industrial Gridless Broad-Beam Ion Source Producers, Problems and the Need for Their Standardization; 6.1 World Producers of Ion Sources; 6.2 Specific Designs of End-Hall Current Ion Sources for Thin Film Technology; 6.3 Nontraditional Broad Beam Ion Sources; 6.4 Linear Ion Sources; 6.5 Hall-Current Ion Sources Basic Operation Parameter Problems; 6.6 The Need for Standardization of Ion Sources; 6.7 Conclusions; 6.8 Appendix 6.A: Web Addresses; References Chapter 7: Operation of Industrial Ion Sources with Reactive Gases7.1 Introduction; 7.2 Low- and High-Temperature Oxidation; 7.3 Ion Source Operation with Dielectric and Insulating Depositions on an Anode; 7.4 End-Hall with Grooved Anode and Baffle; 7.5 End-Hall With Hidden Anode Area for Continuing Discharge Operation; 7.6 Practical Operation of Hall-Current Ion Sources with Reactive Gases; References; Chapter 8: Ion Beam and Radiation Impact on Substrate Heating; 8.1 Introduction; 8.2 Target-Substrate Heating By Radiation and Ion Beam 8.3 Experimental Measurements of Ion Beam and Radiation Impact on a Target-Substrate |
| Record Nr. | UNINA-9910141447203321 |
Zhurin Viacheslav V.
|
||
| Weinheim : , : Wiley-VCH, , [2012] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Industrial ion sources : broadbeam gridless ion source technology / / Viacheslav V. Zhurin
| Industrial ion sources : broadbeam gridless ion source technology / / Viacheslav V. Zhurin |
| Autore | Zhurin Viacheslav V. |
| Pubbl/distr/stampa | Weinheim : , : Wiley-VCH, , [2012] |
| Descrizione fisica | 1 online resource (615 p.) |
| Disciplina | 541.372 |
| Soggetto topico | Ion sources |
| ISBN |
3-527-63573-4
3-527-63572-6 3-527-63574-2 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover; Title Page; Copyright; Related Titles; Preface; References; Chapter 1: Hall-Current Ion Sources; 1.1 Introduction; 1.2 Closed Drift Ion Sources; 1.3 End-Hall Ion Sources; 1.4 Electric Discharge and Ion Beam Volt-Ampere Characteristics; 1.5 Operating Parameters Characterizing Ion Source; Appendix 1.A: Web Addresses; References; Chapter 2: Ion Source and Vacuum Chamber. Influence of Various Effects on Ion Beam Parameters; 2.1 Introduction; 2.2 Mass Entrainment; 2.3 Charge-Exchange Influence on Ion Beam Flow; 2.4 Doubly Ionized Particles and Their Role
2.5 Influence of Vacuum Chamber Pumping Rate2.6 Dielectric Depositions on an Anode During Operation with Reactive Gases; 2.7 Estimation of Returned Sputtered Particles to Ion Source; 2.8 Influence of Ion Source Heating on its Operation; 2.9 Negative Ions and their Role; 2.10 Conclusion; References; Chapter 3: Oscillations and Instabilities in Hall-Current Ion Sources; 3.1 Introduction; 3.2 Oscillations and Instabilities; 3.3 Types of Oscillations; 3.4 Conclusions and What to Do About Oscillations; References; Chapter 4: Optimum Operation of Hall-Current Ion Sources; 4.1 Introduction 4.2 Regime of Nonself-Sustained Discharge and Optimum Operation Conditions of End-Hall Ion Source4.3 Operation of End-Hall Ion Source with Excessive Electron Emission; 4.4 Ion Beam Energy of End-Hall Ion Source; 4.5 End-Hall Ion Source Optimum Magnetic Field for Ion Beam Current; 4.6 Ion Beam Energy Distribution as a Function of Angle With Various Emission Currents; 4.7 Conclusion; References; Chapter 5: Cathode Neutralizers for Ion Sources; 5.1 Introduction; 5.2 Ion Beam and its Practical Neutralization; 5.3 Hot Filament Electron Source and Thermoelectron Emission; 5.4 Hollow Cathodes 5.5 Conclusions about Cathode Neutralizers5.6 Appendix 5.A: Web Addresses; References; Chapter 6: Industrial Gridless Broad-Beam Ion Source Producers, Problems and the Need for Their Standardization; 6.1 World Producers of Ion Sources; 6.2 Specific Designs of End-Hall Current Ion Sources for Thin Film Technology; 6.3 Nontraditional Broad Beam Ion Sources; 6.4 Linear Ion Sources; 6.5 Hall-Current Ion Sources Basic Operation Parameter Problems; 6.6 The Need for Standardization of Ion Sources; 6.7 Conclusions; 6.8 Appendix 6.A: Web Addresses; References Chapter 7: Operation of Industrial Ion Sources with Reactive Gases7.1 Introduction; 7.2 Low- and High-Temperature Oxidation; 7.3 Ion Source Operation with Dielectric and Insulating Depositions on an Anode; 7.4 End-Hall with Grooved Anode and Baffle; 7.5 End-Hall With Hidden Anode Area for Continuing Discharge Operation; 7.6 Practical Operation of Hall-Current Ion Sources with Reactive Gases; References; Chapter 8: Ion Beam and Radiation Impact on Substrate Heating; 8.1 Introduction; 8.2 Target-Substrate Heating By Radiation and Ion Beam 8.3 Experimental Measurements of Ion Beam and Radiation Impact on a Target-Substrate |
| Record Nr. | UNINA-9910829975303321 |
|
Zhurin Viacheslav V.
|
||
| Weinheim : , : Wiley-VCH, , [2012] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
The physics and technology of ion sources / / edited by Ian G. Brown
| The physics and technology of ion sources / / edited by Ian G. Brown |
| Autore | Brown Ian G. |
| Edizione | [Second, revised and extended edition.] |
| Pubbl/distr/stampa | Weinheim, Germany : , : WILEY-VCH Verlag GmbH & Co., , [2004] |
| Descrizione fisica | 1 online resource (399 p.) |
| Disciplina | 539.73 |
| Soggetto topico | Ion sources |
| ISBN |
1-280-51983-5
9786610519835 3-527-60395-6 3-527-60454-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
The Physics and Technology of Ion Sources; Preface; Contents; List of Contributors; 1 Introduction; 2 Plasma Physics; 2.1 Introduction; 2.2 Basic Plasma Parameters; 2.2.1 Particle Density; 2.2.2 Fractional Ionization; 2.2.3 Particle Temperature; 2.2.4 Particle Energy and Velocity; 2.2.5 Collisions; 2.3 The Plasma Sheath; 2.3.1 Debye Length; 2.3.2 Charge Neutrality; 2.3.3 Plasma Oscillations; 2.4 Magnetic Field Effects; 2.4.1 Gyro Orbits; 2.4.2 Gyro Frequencies; 2.4.3 Magnetic Confinement; 2.4.4 Magnetic and Plasma Pressure; 2.5 Ionization; 2.5.1 Electron Impact Ionization
2.5.2 Multiple Ionization2.5.3 Photoionization; 2.5.4 Ion Impact Ionization; 2.5.5 Negative Ions; 2.5.6 Field Ionization; 3 Elementary Ion Sources; 3.1 Introduction; 3.2 Terminology; 3.3 The Quintessential Ion Source; 3.4 Ion Beam Formation; 3.5 Ion Beam Parameters; 3.6 An Example; 3.7 Conclusion; 4 Computer Simulation of Extraction; 4.1 Introduction; 4.2 Positive Ion Sources; 4.2.1 Filament Driven Cusp Sources; 4.2.2 Duoplasmatrons and Duopigatrons; 4.2.3 Vacuum Arc Ion Sources; 4.2.4 Laser Ion Sources; 4.2.5 ECR Ion Sources; 4.2.6 Penning Ion Sources; 4.3 Negative Ion and Electron Sources 4.3.1 Hot Cathode Electron Sources4.3.2 Plasma Electron Sources; 4.3.3 H(-) Sources; 4.4 Conclusion; 5 Ion Extraction; 5.1 Introduction; 5.2 Fundamentals of Ion Beam Formation in the Extraction System; 5.3 Beam Quality; 5.4 Sophisticated Treatment of Ion Beam Formation in the Extraction System; 5.5 Multi-Aperture Extraction Systems; 5.6 Starting Conditions; 6 Beam Transport; 6.1 Introduction; 6.1.1 Drift; 6.1.2 Extraction System and Acceleration Gap; 6.1.3 Low Energy Beam Line; 6.2 Current Effects; 6.3 Space-Charge Compensation; 6.3.1 Residual Gas Collisions; 6.3.2 Sputtering 6.3.3 Preserving Space Charge Compensation6.3.4 Influence of Space Charge Compensation; 6.4 A LEBT System for the Future Proton Linac at GSI; 6.4.1 Compound System; 6.4.2 Pentode or Two-Gap System; 6.4.3 Triode System and DC Post-Acceleration; 6.4.4 Discussion; 7 High Current Gaseous Ion Sources; 7.1 Introduction; 7.2 Basic Types of High Current Ion Sources; 7.2.1 Filament Driven Ion Sources; 7.2.2 High-Frequency Ion Sources; 7.2.3 Cold Cathode Ion Sources; 7.3 Conclusion; 8 Freeman and Bernas Ion Sources; 8.1 Introduction; 8.2 The Freeman Ion Source; 8.3 The Bernas Ion Source 8.4 Further Discussion of the Source Plasma8.4.1 Plasma and Sheath Potentials; 8.4.2 Effect of Sputtering on the Plasma; 8.4.3 Ion Heating of the Cathode and Anticathode in the Bernas Source; 8.4.4 Current Balance in the Freeman Source; 8.4.5 Current Balance in the Bernas Source; 8.5 Control Systems; 8.5.1 Freeman and Bernas Controls; 8.5.2 Bernas Indirectly Heated Cathode; 8.6 Lifetime and Maintenance Issues; 8.6.1 Use of BF(3); 8.6.2 Use of PH(3), AsH(3), P(4), and As(4); 8.6.3 Use of Sb, Sb(2)O(3), and SbF(3); 8.6.4 Use of SiF(4) and GeF(4) 8.6.5 General Guidelines for the Use of Other Organic and Inorganic Compounds |
| Record Nr. | UNINA-9910144717203321 |
|
Brown Ian G.
|
||
| Weinheim, Germany : , : WILEY-VCH Verlag GmbH & Co., , [2004] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
The physics and technology of ion sources / edited by Ian G. Brown
| The physics and technology of ion sources / edited by Ian G. Brown |
| Autore | Brown, Ian G. |
| Pubbl/distr/stampa | New York : John Wiley & Sons, c1989 |
| Descrizione fisica | xix, 444 p. : ill. ; 25 cm. |
| Soggetto topico | Ion sources |
| ISBN | 0471857084 |
| Classificazione |
53.0.671
53.2.84 541.3'72 QC702.3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISALENTO-991001149379707536 |
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Brown, Ian G.
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| New York : John Wiley & Sons, c1989 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. del Salento | ||
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