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Ferroelectric dielectrics integrated on silicon [[electronic resource] /] / edited by Emmanuel Defay
Ferroelectric dielectrics integrated on silicon [[electronic resource] /] / edited by Emmanuel Defay
Autore Defaÿ Emmanuel
Edizione [1st edition]
Pubbl/distr/stampa London, : ISTE Ltd.
Descrizione fisica 1 online resource (464 p.)
Disciplina 621.3815/2
621.38152
Altri autori (Persone) DefaÿEmmanuel
Collana ISTE
Soggetto topico Ferroelectric thin films
Silicon - Electric properties
Electric batteries - Corrosion
Soggetto genere / forma Electronic books.
ISBN 1-118-60275-7
1-118-60276-5
1-118-60280-3
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Cover; Title Page; Copyright Page; Table of Contents; Preface; Chapter 1. The Thermodynamic Approach; 1.1. Background; 1.2. The functions of state; 1.3. Linear equations, piezoelectricity; 1.4. Nonlinear equations, electrostriction; 1.5. Thermodynamic modeling of the ferroelectric-paraelectricphase transition; 1.5.1. Assumption on the elastic Gibbs energy; 1.5.2. Second-order transition; 1.5.3. Effect of stress; 1.5.4. First-order transition; 1.6. Conclusion; 1.7. Bibliography; Chapter 2. Stress Effect on Thin Films; 2.1. Introduction; 2.2. Modeling the system under consideration
2.3. Temperature-misfit strain phase diagrams for monodomain films2.3.1. Phase diagram construction from the Landau-Ginzburg-Devonshire theory; 2.3.2. Calculations limitations; 2.4. Domain stability map; 2.4.1. Presentation and description of the framework of study; 2.4.2. Main contributions to the total energy of a film; 2.4.3. Influence of thickness; 2.4.4. Macroscopic elastic energy for each type of tetragonal domain; 2.4.5. Indirect interaction energy; 2.4.6. Domain structures at equilibrium; 2.4.7. Domain stability map; 2.5. Temperature-misfit strain phase diagram for polydomain films
2.6. Discussion of the nature of the "misfit strain"2.6.1. Mechanical misfit strain; 2.6.2. Thermodynamic misfit strain; 2.6.3. As an illustration; 2.7. Conclusion; 2.8. Experimental validation of phase diagrams: state of the art; 2.9. Case study; 2.10. Results; 2.10.1. Evolution of the lattice parameters; 2.10.2. Associated stresses and strains; 2.11. Comparison between the experimental data and the temperature-misfit strain phase diagrams; 2.11.1. Thin film of PZT; 2.11.2. Thin layer of PbTiO3; 2.12. Conclusion; 2.13. Bibliography; Chapter 3. Deposition and Patterning Technologies
3.1. Deposition method3.1.1. Cathodic sputtering; 3.1.2. Ion beam sputtering; 3.1.3. Pulsed laser deposition; 3.1.4. The sol-gel process; 3.1.5. The MOCVD; 3.1.6. Molecular beam epitaxy; 3.2. Etching; 3.2.1. Wet etching; 3.2.2. Dry etching; 3.3. Contamination; 3.4. Monocrystalline thin-film transfer; 3.4.1. Smart CutTM technology; 3.4.2. Bonding/thinning; 3.4.3. Interest in the material in a thin layer; 3.4.4. State of the art of the domain/applications; 3.4.5. An exemplary implementation; 3.5. Design of experiments; 3.5.1. The assumptions; 3.5.2. Reproducibility
3.5.3. How can we reduce the number of experiments?3.5.4. A DOE example: PZT RF magnetron sputtering deposition; 3.6. Conclusion; 3.7. Bibliography; Chapter 4. Analysis Through X-ray Diffraction of Polycrystalline Thin Films; 4.1. Introduction; 4.2. Some reminders of X-ray diffraction and crystallography; 4.2.1. Nature of X-rays; 4.2.2. X-ray scattering and diffraction; 4.3. Application to powder or polycrystalline thin-films; 4.4. Phase analysis by X-ray diffraction; 4.4.1. Grazing incidence diffraction; 4.4.2. De-texturing; 4.4.3. Quantitative analysis
4.5. Identification of coherent domain sizes of diffraction and micro-strains
Record Nr. UNINA-9910141601203321
Defaÿ Emmanuel  
London, : ISTE Ltd.
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Ferroelectric dielectrics integrated on silicon [[electronic resource] /] / edited by Emmanuel Defay
Ferroelectric dielectrics integrated on silicon [[electronic resource] /] / edited by Emmanuel Defay
Autore Defaÿ Emmanuel
Edizione [1st edition]
Pubbl/distr/stampa London, : ISTE Ltd.
Descrizione fisica 1 online resource (464 p.)
Disciplina 621.3815/2
621.38152
Altri autori (Persone) DefaÿEmmanuel
Collana ISTE
Soggetto topico Ferroelectric thin films
Silicon - Electric properties
Electric batteries - Corrosion
ISBN 1-118-60275-7
1-118-60276-5
1-118-60280-3
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Cover; Title Page; Copyright Page; Table of Contents; Preface; Chapter 1. The Thermodynamic Approach; 1.1. Background; 1.2. The functions of state; 1.3. Linear equations, piezoelectricity; 1.4. Nonlinear equations, electrostriction; 1.5. Thermodynamic modeling of the ferroelectric-paraelectricphase transition; 1.5.1. Assumption on the elastic Gibbs energy; 1.5.2. Second-order transition; 1.5.3. Effect of stress; 1.5.4. First-order transition; 1.6. Conclusion; 1.7. Bibliography; Chapter 2. Stress Effect on Thin Films; 2.1. Introduction; 2.2. Modeling the system under consideration
2.3. Temperature-misfit strain phase diagrams for monodomain films2.3.1. Phase diagram construction from the Landau-Ginzburg-Devonshire theory; 2.3.2. Calculations limitations; 2.4. Domain stability map; 2.4.1. Presentation and description of the framework of study; 2.4.2. Main contributions to the total energy of a film; 2.4.3. Influence of thickness; 2.4.4. Macroscopic elastic energy for each type of tetragonal domain; 2.4.5. Indirect interaction energy; 2.4.6. Domain structures at equilibrium; 2.4.7. Domain stability map; 2.5. Temperature-misfit strain phase diagram for polydomain films
2.6. Discussion of the nature of the "misfit strain"2.6.1. Mechanical misfit strain; 2.6.2. Thermodynamic misfit strain; 2.6.3. As an illustration; 2.7. Conclusion; 2.8. Experimental validation of phase diagrams: state of the art; 2.9. Case study; 2.10. Results; 2.10.1. Evolution of the lattice parameters; 2.10.2. Associated stresses and strains; 2.11. Comparison between the experimental data and the temperature-misfit strain phase diagrams; 2.11.1. Thin film of PZT; 2.11.2. Thin layer of PbTiO3; 2.12. Conclusion; 2.13. Bibliography; Chapter 3. Deposition and Patterning Technologies
3.1. Deposition method3.1.1. Cathodic sputtering; 3.1.2. Ion beam sputtering; 3.1.3. Pulsed laser deposition; 3.1.4. The sol-gel process; 3.1.5. The MOCVD; 3.1.6. Molecular beam epitaxy; 3.2. Etching; 3.2.1. Wet etching; 3.2.2. Dry etching; 3.3. Contamination; 3.4. Monocrystalline thin-film transfer; 3.4.1. Smart CutTM technology; 3.4.2. Bonding/thinning; 3.4.3. Interest in the material in a thin layer; 3.4.4. State of the art of the domain/applications; 3.4.5. An exemplary implementation; 3.5. Design of experiments; 3.5.1. The assumptions; 3.5.2. Reproducibility
3.5.3. How can we reduce the number of experiments?3.5.4. A DOE example: PZT RF magnetron sputtering deposition; 3.6. Conclusion; 3.7. Bibliography; Chapter 4. Analysis Through X-ray Diffraction of Polycrystalline Thin Films; 4.1. Introduction; 4.2. Some reminders of X-ray diffraction and crystallography; 4.2.1. Nature of X-rays; 4.2.2. X-ray scattering and diffraction; 4.3. Application to powder or polycrystalline thin-films; 4.4. Phase analysis by X-ray diffraction; 4.4.1. Grazing incidence diffraction; 4.4.2. De-texturing; 4.4.3. Quantitative analysis
4.5. Identification of coherent domain sizes of diffraction and micro-strains
Record Nr. UNINA-9910830439703321
Defaÿ Emmanuel  
London, : ISTE Ltd.
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Ferroelectric dielectrics integrated on silicon / / edited by Emmanuel Defay
Ferroelectric dielectrics integrated on silicon / / edited by Emmanuel Defay
Edizione [1st edition]
Pubbl/distr/stampa London, : ISTE Ltd.
Descrizione fisica 1 online resource (464 p.)
Disciplina 621.3815/2
Altri autori (Persone) DefayEmmanuel
Collana ISTE
Soggetto topico Ferroelectric thin films
Silicon - Electric properties
Electric batteries - Corrosion
ISBN 1-118-60275-7
1-118-60276-5
1-118-60280-3
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Cover; Title Page; Copyright Page; Table of Contents; Preface; Chapter 1. The Thermodynamic Approach; 1.1. Background; 1.2. The functions of state; 1.3. Linear equations, piezoelectricity; 1.4. Nonlinear equations, electrostriction; 1.5. Thermodynamic modeling of the ferroelectric-paraelectricphase transition; 1.5.1. Assumption on the elastic Gibbs energy; 1.5.2. Second-order transition; 1.5.3. Effect of stress; 1.5.4. First-order transition; 1.6. Conclusion; 1.7. Bibliography; Chapter 2. Stress Effect on Thin Films; 2.1. Introduction; 2.2. Modeling the system under consideration
2.3. Temperature-misfit strain phase diagrams for monodomain films2.3.1. Phase diagram construction from the Landau-Ginzburg-Devonshire theory; 2.3.2. Calculations limitations; 2.4. Domain stability map; 2.4.1. Presentation and description of the framework of study; 2.4.2. Main contributions to the total energy of a film; 2.4.3. Influence of thickness; 2.4.4. Macroscopic elastic energy for each type of tetragonal domain; 2.4.5. Indirect interaction energy; 2.4.6. Domain structures at equilibrium; 2.4.7. Domain stability map; 2.5. Temperature-misfit strain phase diagram for polydomain films
2.6. Discussion of the nature of the "misfit strain"2.6.1. Mechanical misfit strain; 2.6.2. Thermodynamic misfit strain; 2.6.3. As an illustration; 2.7. Conclusion; 2.8. Experimental validation of phase diagrams: state of the art; 2.9. Case study; 2.10. Results; 2.10.1. Evolution of the lattice parameters; 2.10.2. Associated stresses and strains; 2.11. Comparison between the experimental data and the temperature-misfit strain phase diagrams; 2.11.1. Thin film of PZT; 2.11.2. Thin layer of PbTiO3; 2.12. Conclusion; 2.13. Bibliography; Chapter 3. Deposition and Patterning Technologies
3.1. Deposition method3.1.1. Cathodic sputtering; 3.1.2. Ion beam sputtering; 3.1.3. Pulsed laser deposition; 3.1.4. The sol-gel process; 3.1.5. The MOCVD; 3.1.6. Molecular beam epitaxy; 3.2. Etching; 3.2.1. Wet etching; 3.2.2. Dry etching; 3.3. Contamination; 3.4. Monocrystalline thin-film transfer; 3.4.1. Smart CutTM technology; 3.4.2. Bonding/thinning; 3.4.3. Interest in the material in a thin layer; 3.4.4. State of the art of the domain/applications; 3.4.5. An exemplary implementation; 3.5. Design of experiments; 3.5.1. The assumptions; 3.5.2. Reproducibility
3.5.3. How can we reduce the number of experiments?3.5.4. A DOE example: PZT RF magnetron sputtering deposition; 3.6. Conclusion; 3.7. Bibliography; Chapter 4. Analysis Through X-ray Diffraction of Polycrystalline Thin Films; 4.1. Introduction; 4.2. Some reminders of X-ray diffraction and crystallography; 4.2.1. Nature of X-rays; 4.2.2. X-ray scattering and diffraction; 4.3. Application to powder or polycrystalline thin-films; 4.4. Phase analysis by X-ray diffraction; 4.4.1. Grazing incidence diffraction; 4.4.2. De-texturing; 4.4.3. Quantitative analysis
4.5. Identification of coherent domain sizes of diffraction and micro-strains
Record Nr. UNINA-9910877171003321
London, : ISTE Ltd.
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Integration of ferroelectric and piezoelectric thin films [[electronic resource] ] : concepts and applications for microsystems / / edited by Emmanuel Defaÿ
Integration of ferroelectric and piezoelectric thin films [[electronic resource] ] : concepts and applications for microsystems / / edited by Emmanuel Defaÿ
Pubbl/distr/stampa London, : ISTE
Descrizione fisica 1 online resource (424 p.)
Disciplina 621.3815
621.38152
Altri autori (Persone) DefaÿEmmanuel
Collana ISTE
Soggetto topico Piezoelectric devices - Materials
Ferroelectric thin films
Miniature electronic equipment - Materials
Soggetto genere / forma Electronic books.
ISBN 1-118-61663-4
1-299-31420-1
1-118-61675-8
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Dielectric, piezoelectric, pyroelectric, and ferroelectric -- Thermodynamic study : a structuring approach -- Ferroelectric-paraelectric phase transition thermodynamic modelling -- Mechanical formalism -- Dielectric formalism -- Piezoelectric formalism -- Acoustic formalism -- Electrostrictive formalism -- Electric characterization -- Piezoelectric resonators and filters -- High overtone bulk acoustic resonator (HBAR) -- Electrostrictive resonators -- Thin film piezoelectric transducers.
Record Nr. UNINA-9910139056703321
London, : ISTE
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Integration of ferroelectric and piezoelectric thin films [[electronic resource] ] : concepts and applications for microsystems / / edited by Emmanuel Defaÿ
Integration of ferroelectric and piezoelectric thin films [[electronic resource] ] : concepts and applications for microsystems / / edited by Emmanuel Defaÿ
Pubbl/distr/stampa London, : ISTE
Descrizione fisica 1 online resource (424 p.)
Disciplina 621.3815
621.38152
Altri autori (Persone) DefaÿEmmanuel
Collana ISTE
Soggetto topico Piezoelectric devices - Materials
Ferroelectric thin films
Miniature electronic equipment - Materials
ISBN 1-118-61663-4
1-299-31420-1
1-118-61675-8
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Dielectric, piezoelectric, pyroelectric, and ferroelectric -- Thermodynamic study : a structuring approach -- Ferroelectric-paraelectric phase transition thermodynamic modelling -- Mechanical formalism -- Dielectric formalism -- Piezoelectric formalism -- Acoustic formalism -- Electrostrictive formalism -- Electric characterization -- Piezoelectric resonators and filters -- High overtone bulk acoustic resonator (HBAR) -- Electrostrictive resonators -- Thin film piezoelectric transducers.
Record Nr. UNINA-9910830083603321
London, : ISTE
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Integration of ferroelectric and piezoelectric thin films : concepts and applications for microsystems / / edited by Emmanuel Defay
Integration of ferroelectric and piezoelectric thin films : concepts and applications for microsystems / / edited by Emmanuel Defay
Pubbl/distr/stampa London, : ISTE
Descrizione fisica 1 online resource (424 p.)
Disciplina 621.3815/2
Altri autori (Persone) DefayEmmanuel
Collana ISTE
Soggetto topico Piezoelectric devices - Materials
Ferroelectric thin films
Miniature electronic equipment - Materials
ISBN 1-118-61663-4
1-299-31420-1
1-118-61675-8
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Dielectric, piezoelectric, pyroelectric, and ferroelectric -- Thermodynamic study : a structuring approach -- Ferroelectric-paraelectric phase transition thermodynamic modelling -- Mechanical formalism -- Dielectric formalism -- Piezoelectric formalism -- Acoustic formalism -- Electrostrictive formalism -- Electric characterization -- Piezoelectric resonators and filters -- High overtone bulk acoustic resonator (HBAR) -- Electrostrictive resonators -- Thin film piezoelectric transducers.
Record Nr. UNINA-9910876643403321
London, : ISTE
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Iron-based superconducting thin films / / Silvia Haindl
Iron-based superconducting thin films / / Silvia Haindl
Autore Haindl Silvia
Pubbl/distr/stampa Cham, Switzerland : , : Springer, , [2021]
Descrizione fisica 1 online resource (403 pages)
Disciplina 621.38152
Collana Springer Series in Materials Science
Soggetto topico Ferroelectric thin films
Superconductors
ISBN 3-030-75132-5
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Intro -- Preface -- Contents -- Acronyms -- 1 Introduction to Fe-Based Superconductors -- 1.1 Discoveries and the `Iron Age' in Superconductivity -- 1.2 Compounds and Crystal Structures -- 1.3 Iron (Fe) and Superconductivity -- 1.4 Electronic Bands and Fermi Surfaces -- 1.5 Nematicity, Magnetism and Superconductivity -- References -- 2 Thin Film Growth of Fe-Based Superconductors -- 2.1 Pulsed Laser Deposition -- 2.1.1 Overview -- 2.1.2 PLD of Fe-Chalcogenides -- 2.1.3 PLD of Fe-Pnictide Compounds with ThCr2Si2 Structure -- 2.1.4 PLD of Fe-Oxyarsenides with ZrCuSiAs Structure -- 2.2 Molecular Beam Epitaxy -- 2.2.1 Overview -- 2.2.2 MBE-Growth of Fe-Chalcogenide Thin Films -- 2.2.3 Fabrication of Fe-Chalcogenide Monolayers -- 2.2.4 Alkali-Metal Evaporation on Ultrathin FeSe Films -- 2.2.5 Fe-Chalcogenides/Topological Insulators (TIs) -- 2.2.6 MBE-Growth of Fe-Pnictides -- 2.3 Other Thin Film Growth Methods -- 2.3.1 Two-Stage Synthesis with Postdeposition Annealing -- 2.3.2 Selenization Methods for FeSe Film Growth -- 2.3.3 Magnetron Sputtering of Fe-Chalcogenides -- 2.3.4 Metal-Organic Chemical Vapor Deposition -- 2.3.5 Electrodeposition of FeSe and LiFeAs -- 2.3.6 Other Wet Chemical Deposition Processes for FeSe -- References -- 3 Growth, Microstructure and Surfaces -- 3.1 In-Situ Film Growth Monitoring -- 3.1.1 LEED -- 3.1.2 RHEED -- 3.1.3 HEPD -- 3.2 Thin Film Texture and Crystal Quality -- 3.2.1 Texture and In-Plane-Alignment of Grains -- 3.2.2 Out-of-Plane-Alignment and Rocking Curves -- 3.3 Growth Modes, Surface Structure and Morphology -- 3.3.1 Polar Surfaces -- 3.3.2 Growth Modes of Vapor Deposited Films -- 3.3.3 Examples of Surface Studies -- References -- 4 The Film/Substrate Interface -- 4.1 Substrates in Thin Film Growth of Fe-Based Superconductors -- 4.1.1 The Role of the Substrate -- 4.1.2 Buffer and Seed Layers.
4.1.3 Fe-Chalcogenide Film/Substrate Interfaces -- 4.1.4 Selected Fe-Pnictide Film/Substrate Interfaces -- 4.2 Interface Models -- 4.2.1 Misfit Dislocations -- 4.2.2 FeSe and FeSe1-xTex on TiO2 and TiO2-Terminated SrTiO3 -- 4.2.3 Interface Models for Fe-Chalcogenides on LaAlO3 and MgO -- 4.2.4 Heterointerfaces with Fe-Pnictides -- 4.3 TEM Interface Atlas -- 4.3.1 Fe-Chalcogenide Thin Film/Substrate Interfaces -- 4.3.2 Fe-Pnictide Thin Film/Substrate Interfaces -- References -- 5 More Interfaces: Multilayers and Heterostructures with Fe-Based Superconductors -- 5.1 FeSe1-xTex-Based Multilayers -- 5.2 New Platforms: Interfaces Between FeSe (FeTe) and TIs -- 5.3 BaFe2As2-Based Heterointerfaces -- 5.4 Secondary Phase Formation and Artificially Introduced Nanoparticles -- References -- 6 Thin Film Studies Under Focus -- 6.1 Vortex Matter in Thin Films -- 6.1.1 Vortex Motion -- 6.1.2 Berezinskii-Kosterlitz-Thouless (BKT) Transition -- 6.1.3 Critical Currents and Vortex Pinning -- 6.1.4 The Role of Grain Boundaries -- 6.2 Superconductor-to-Insulator (SIT) Transitions -- 6.2.1 Granular and Crystalline FeSe Films -- 6.2.2 Electrostatic Doping in EDLT/FeSe Films and SIT -- 6.3 Electronic Phase Diagrams -- 6.3.1 FeSe1-xTex and FeSe1-xSx -- 6.3.2 FeSe and K-Coated FeSe Surface -- 6.3.3 Ba(Fe1-xCox)2As2 -- 6.3.4 BaFe2As2/SrTiO3 Superlattices -- 6.4 Metastable Compounds -- 6.5 The Tc Boost in FeSe Monolayers -- 6.5.1 Fermi Surface, Topology and Energy Gap -- 6.5.2 Charge Transfer -- 6.5.3 Interfacial Electron-Phonon Coupling -- 6.5.4 Vortices and Andreev Bound States -- 6.6 High Magnetic Field Studies -- 6.6.1 Fe-Chalcogenide Thin Films in High Magnetic Fields -- 6.6.2 Fe-Pnictide Thin Films in High Magnetic Fields -- 6.7 Electromagnetic Properties, Superconducting Gaps and Fermi Surfaces ... -- 6.7.1 DC Transport and Response to Low Frequency Fields.
6.7.2 Radio Frequency and Microwave Techniques -- 6.7.3 Optical (IR/THz) Spectroscopy -- 6.7.4 Photoelectron Spectroscopies -- 6.7.5 Point-Contact Spectroscopy -- 6.8 Irradiation and Implantation -- 6.8.1 Laser Light Irradiation of and Ion Implantation in FeTe Films -- 6.8.2 Irradiation and Implantation Effects in FeSe1-xTex Films -- 6.8.3 Irradiation of Fe-Pnictide Thin Films -- References -- Appendix A Chronological Survey of Selected Publications -- Appendix B Space Groups and Brillouin Zones -- References -- Index.
Record Nr. UNINA-9910488700003321
Haindl Silvia  
Cham, Switzerland : , : Springer, , [2021]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Optimization of PbTiO₃ seed layers for PZT MEMS actuators [[electronic resource] /] / Luz Sanchez and Ronald G. Polcawich
Optimization of PbTiO₃ seed layers for PZT MEMS actuators [[electronic resource] /] / Luz Sanchez and Ronald G. Polcawich
Autore Sanchez Luz
Pubbl/distr/stampa Adelphi, MD : , : Army Research Laboratory, , [2008]
Descrizione fisica vi, 22 pages : digital, PDF file
Altri autori (Persone) PolcawichRonald G
Collana ARL-TR
Soggetto topico Ferroelectric crystals
Ferroelectric thin films
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910698037403321
Sanchez Luz  
Adelphi, MD : , : Army Research Laboratory, , [2008]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Physics of ferroelectrics : a modern perspective / / Karin M. Rabe, Charles H. Ahn, Jean-Marc Triscone, eds
Physics of ferroelectrics : a modern perspective / / Karin M. Rabe, Charles H. Ahn, Jean-Marc Triscone, eds
Edizione [1st ed. 2007.]
Pubbl/distr/stampa Berlin ; ; New York, : Springer, c2007
Descrizione fisica 1 online resource (396 p.)
Disciplina 537/.2448
Altri autori (Persone) RabeKarin M (Karin Maria)
AhnCharles H
TrisconeJean-Marc
Collana Topics in applied physics
Soggetto topico Ferroelectricity
Ferroelectric devices - Materials
Ferroelectric thin films
ISBN 1-281-25078-3
9786611250782
3-540-34591-4
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Appendix B – Material–Substrate Combinations Tables -- Modern Physics of Ferroelectrics: Essential Background -- Theory of Polarization: A Modern Approach -- A Landau Primer for Ferroelectrics -- First-Principles Studies of Ferroelectric Oxides -- Analogies and Differences between Ferroelectrics and Ferromagnets -- Growth and Novel Applications of Epitaxial Oxide Thin Films -- Ferroelectric Size Effects -- Nanoscale Studies of Domain Walls in Epitaxial Ferroelectric Thin Films -- APPENDIX A – Landau Free-Energy Coefficients.
Record Nr. UNINA-9910634034503321
Berlin ; ; New York, : Springer, c2007
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Reducing film thickness in lead zirconate titanate thin film capacitors [[electronic resource] /] / Vikram Rao and Ronald G. Polcawich
Reducing film thickness in lead zirconate titanate thin film capacitors [[electronic resource] /] / Vikram Rao and Ronald G. Polcawich
Autore Rao Vikram
Pubbl/distr/stampa Adelphi, MD : , : Army Research Laboratory, , [2007]
Descrizione fisica vi, 16 pages : digital, PDF file
Altri autori (Persone) PolcawichRonald G
Collana ARL-TR
Soggetto topico Ferroelectric thin films
Ferroelectric devices
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910698199803321
Rao Vikram  
Adelphi, MD : , : Army Research Laboratory, , [2007]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui