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2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) / / Institute of Electrical and Electronics Engineers (IEEE)
| 2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) / / Institute of Electrical and Electronics Engineers (IEEE) |
| Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers (IEEE), , 2016 |
| Descrizione fisica | 1 online resource (various pagings) : illustrations |
| Disciplina | 621.381 |
| Soggetto topico |
Atomic layer deposition
Electronics |
| ISBN | 1-5090-3416-1 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Altri titoli varianti | 2016 14th International Baltic Conference on Atomic Layer Deposition |
| Record Nr. | UNISA-996279838603316 |
| Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers (IEEE), , 2016 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) / / Institute of Electrical and Electronics Engineers (IEEE)
| 2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) / / Institute of Electrical and Electronics Engineers (IEEE) |
| Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers (IEEE), , 2016 |
| Descrizione fisica | 1 online resource (various pagings) : illustrations |
| Disciplina | 621.381 |
| Soggetto topico |
Atomic layer deposition
Electronics |
| ISBN | 1-5090-3416-1 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Altri titoli varianti | 2016 14th International Baltic Conference on Atomic Layer Deposition |
| Record Nr. | UNINA-9910172653203321 |
| Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers (IEEE), , 2016 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Atomic layer deposition (ALD) to extend catalyst lifetime for production / / presented by Derek Vardon
| Atomic layer deposition (ALD) to extend catalyst lifetime for production / / presented by Derek Vardon |
| Autore | Vardon Derek |
| Pubbl/distr/stampa | Golden, CO : , : National Renewable Energy Laboratory, , 2020 |
| Descrizione fisica | 1 online resource (27 pages) : color illustrations |
| Collana | NREL/PR |
| Soggetto topico |
Atomic layer deposition
Adipic acid |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Altri titoli varianti | Atomic layer deposition |
| Record Nr. | UNINA-9910713949903321 |
Vardon Derek
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| Golden, CO : , : National Renewable Energy Laboratory, , 2020 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Atomic layer deposition in energy conversion applications / / Julien Bachmann
| Atomic layer deposition in energy conversion applications / / Julien Bachmann |
| Autore | Bachmann Julien |
| Pubbl/distr/stampa | Weinheim, Germany : , : Wiley-VCH, , 2017 |
| Descrizione fisica | 1 online resource (311 pages) : illustrations, graphs |
| Disciplina | 621.042 |
| Soggetto topico |
Energy conversion
Atomic layer deposition |
| Soggetto genere / forma | Electronic books. |
| ISBN |
3-527-69483-8
3-527-69481-1 3-527-69482-X |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910270911703321 |
|
Bachmann Julien
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| Weinheim, Germany : , : Wiley-VCH, , 2017 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Atomic layer deposition in energy conversion applications / / Julien Bachmann
| Atomic layer deposition in energy conversion applications / / Julien Bachmann |
| Autore | Bachmann Julien |
| Pubbl/distr/stampa | Weinheim, Germany : , : Wiley-VCH, , 2017 |
| Descrizione fisica | 1 online resource (311 pages) : illustrations, graphs |
| Disciplina | 621.042 |
| Soggetto topico |
Energy conversion
Atomic layer deposition |
| ISBN |
3-527-69483-8
3-527-69481-1 3-527-69482-X |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910830993803321 |
|
Bachmann Julien
|
||
| Weinheim, Germany : , : Wiley-VCH, , 2017 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Atomic layer deposition of nanostructured materials / / edited by Nicola Pinna and Mato Knez
| Atomic layer deposition of nanostructured materials / / edited by Nicola Pinna and Mato Knez |
| Pubbl/distr/stampa | Weinheim : , : Wiley-VCH, , [2012] |
| Descrizione fisica | 1 online resource (979 p.) |
| Disciplina |
621.31
621.31/2429 621.38152 |
| Soggetto topico | Atomic layer deposition |
| Soggetto genere / forma | Electronic books. |
| ISBN |
3-527-63993-4
3-527-63992-6 3-527-63991-8 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover; Related Titles; Title Page; Copyright; Foreword; Preface; Introduction; 1 Introduction; 2 Basic Features of ALD; 3 Short History of the ALD Technology; 4 The ALD Community in the Academia and Industry; 5 Conclusions; References; List of Contributors; Part One: Introduction to ALD; Chapter 1: Theoretical Modeling of ALD Processes; 1.1 Introduction; 1.2 Overview of Atomistic Simulations; 1.3 Calculation of Properties Using Quantum Simulations; 1.4 Prediction of ALD Chemical Mechanisms; 1.5 Example of a Calculated ALD Mechanism: ALD of Al2O3 Using TMA and Water; References
Chapter 2: Step Coverage in ALD2.1 Introduction; 2.2 Growth Techniques; 2.3 Step Coverage Models in ALD; 2.4 Experimental Verifications of Step Coverage Models; 2.5 Summary; References; Chapter 3: Precursors for ALD Processes; 3.1 Introduction; 3.2 General Requirements for ALD Precursors; 3.3 Metallic Precursors for ALD; 3.4 Nonmetal Precursors for ALD; 3.5 Conclusions; References; Chapter 4: Sol-Gel Chemistry and Atomic Layer Deposition; 4.1 Aqueous and Nonaqueous Sol-Gel in Solution; 4.2 Sol-Gel and ALD: An Overview; 4.3 Mechanistic and In Situ Studies; References Chapter 5: Molecular Layer Deposition of Hybrid Organic-Inorganic Films5.1 Introduction; 5.2 General Issues for MLD of Hybrid Organic-Inorganic Films; 5.3 MLD Using Trimethylaluminum and Ethylene Glycol in an AB Process; 5.4 Expansion to an ABC Process Using Heterobifunctional and Ring-Opening Precursors; 5.5 Use of a Homotrifunctional Precursor to Promote Cross-Linking in an AB Process; 5.6 Use of a Heterobifunctional Precursor in an ABC Process; 5.7 MLD of Hybrid Alumina-Siloxane Films Using an ABCD Process; 5.8 Future Prospects for MLD of Hybrid Organic-Inorganic Films; Acknowledgments ReferencesChapter 6: Low-Temperature Atomic Layer Deposition; 6.1 Introduction; 6.2 Challenges of LT-ALD; 6.3 Materials and Processes; 6.4 Toward Novel LT-ALD Processes; 6.5 Thin Film Gas Diffusion Barriers; 6.6 Encapsulation of Organic Electronics; 6.7 Conclusions; Acknowledgments; References; Chapter 7: Plasma Atomic Layer Deposition; 7.1 Introduction; 7.2 Plasma Basics; 7.3 Plasma ALD Configurations; 7.4 Merits of Plasma ALD; 7.5 Challenges for Plasma ALD; 7.6 Concluding Remarks and Outlook; Acknowledgments; References; Part Two: Nanostructures by ALD Chapter 8: Atomic Layer Deposition for Microelectronic Applications8.1 Introduction; 8.2 ALD Layers for Memory Devices; 8.3 ALD for Logic Devices; 8.4 Concluding Remarks; Acknowledgments; References; Chapter 9: Nanopatterning by Area-Selective Atomic Layer Deposition; 9.1 Concept of Area-Selective Atomic Layer Deposition; 9.2 Change of Surface Properties; 9.3 Patterning; 9.4 Applications of AS-ALD; 9.5 Current Challenges; Acknowledgment; References; Chapter 10: Coatings on High Aspect Ratio Structures; 10.1 Introduction; 10.2 Models and Analysis 10.3 Characterization Methods for ALD Coatings in High Aspect Ratio Structures |
| Record Nr. | UNINA-9910130957403321 |
| Weinheim : , : Wiley-VCH, , [2012] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Atomic layer deposition of nanostructured materials / / edited by Nicola Pinna and Mato Knez
| Atomic layer deposition of nanostructured materials / / edited by Nicola Pinna and Mato Knez |
| Pubbl/distr/stampa | Weinheim : , : Wiley-VCH, , [2012] |
| Descrizione fisica | 1 online resource (979 p.) |
| Disciplina |
621.31
621.31/2429 621.38152 |
| Soggetto topico | Atomic layer deposition |
| ISBN |
3-527-63993-4
3-527-63992-6 3-527-63991-8 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover; Related Titles; Title Page; Copyright; Foreword; Preface; Introduction; 1 Introduction; 2 Basic Features of ALD; 3 Short History of the ALD Technology; 4 The ALD Community in the Academia and Industry; 5 Conclusions; References; List of Contributors; Part One: Introduction to ALD; Chapter 1: Theoretical Modeling of ALD Processes; 1.1 Introduction; 1.2 Overview of Atomistic Simulations; 1.3 Calculation of Properties Using Quantum Simulations; 1.4 Prediction of ALD Chemical Mechanisms; 1.5 Example of a Calculated ALD Mechanism: ALD of Al2O3 Using TMA and Water; References
Chapter 2: Step Coverage in ALD2.1 Introduction; 2.2 Growth Techniques; 2.3 Step Coverage Models in ALD; 2.4 Experimental Verifications of Step Coverage Models; 2.5 Summary; References; Chapter 3: Precursors for ALD Processes; 3.1 Introduction; 3.2 General Requirements for ALD Precursors; 3.3 Metallic Precursors for ALD; 3.4 Nonmetal Precursors for ALD; 3.5 Conclusions; References; Chapter 4: Sol-Gel Chemistry and Atomic Layer Deposition; 4.1 Aqueous and Nonaqueous Sol-Gel in Solution; 4.2 Sol-Gel and ALD: An Overview; 4.3 Mechanistic and In Situ Studies; References Chapter 5: Molecular Layer Deposition of Hybrid Organic-Inorganic Films5.1 Introduction; 5.2 General Issues for MLD of Hybrid Organic-Inorganic Films; 5.3 MLD Using Trimethylaluminum and Ethylene Glycol in an AB Process; 5.4 Expansion to an ABC Process Using Heterobifunctional and Ring-Opening Precursors; 5.5 Use of a Homotrifunctional Precursor to Promote Cross-Linking in an AB Process; 5.6 Use of a Heterobifunctional Precursor in an ABC Process; 5.7 MLD of Hybrid Alumina-Siloxane Films Using an ABCD Process; 5.8 Future Prospects for MLD of Hybrid Organic-Inorganic Films; Acknowledgments ReferencesChapter 6: Low-Temperature Atomic Layer Deposition; 6.1 Introduction; 6.2 Challenges of LT-ALD; 6.3 Materials and Processes; 6.4 Toward Novel LT-ALD Processes; 6.5 Thin Film Gas Diffusion Barriers; 6.6 Encapsulation of Organic Electronics; 6.7 Conclusions; Acknowledgments; References; Chapter 7: Plasma Atomic Layer Deposition; 7.1 Introduction; 7.2 Plasma Basics; 7.3 Plasma ALD Configurations; 7.4 Merits of Plasma ALD; 7.5 Challenges for Plasma ALD; 7.6 Concluding Remarks and Outlook; Acknowledgments; References; Part Two: Nanostructures by ALD Chapter 8: Atomic Layer Deposition for Microelectronic Applications8.1 Introduction; 8.2 ALD Layers for Memory Devices; 8.3 ALD for Logic Devices; 8.4 Concluding Remarks; Acknowledgments; References; Chapter 9: Nanopatterning by Area-Selective Atomic Layer Deposition; 9.1 Concept of Area-Selective Atomic Layer Deposition; 9.2 Change of Surface Properties; 9.3 Patterning; 9.4 Applications of AS-ALD; 9.5 Current Challenges; Acknowledgment; References; Chapter 10: Coatings on High Aspect Ratio Structures; 10.1 Introduction; 10.2 Models and Analysis 10.3 Characterization Methods for ALD Coatings in High Aspect Ratio Structures |
| Record Nr. | UNINA-9910831087603321 |
| Weinheim : , : Wiley-VCH, , [2012] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Atomlagenabscheidung von hafniumoxid / / Thomas Zilbauer
| Atomlagenabscheidung von hafniumoxid / / Thomas Zilbauer |
| Autore | Zilbauer Thomas |
| Edizione | [1. Auflage.] |
| Pubbl/distr/stampa | Göttingen, [Germany] : , : Cuvillier Verlag, , 2010 |
| Descrizione fisica | 1 online resource (152 pages) : illustrations (some color) |
| Disciplina | 660.04 |
| Soggetto topico |
Chemical vapor deposition
Atomic layer deposition Hafnium oxide |
| ISBN | 3-7369-3270-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | ger |
| Record Nr. | UNINA-9910794942103321 |
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Zilbauer Thomas
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| Göttingen, [Germany] : , : Cuvillier Verlag, , 2010 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Atomlagenabscheidung von hafniumoxid / / Thomas Zilbauer
| Atomlagenabscheidung von hafniumoxid / / Thomas Zilbauer |
| Autore | Zilbauer Thomas |
| Edizione | [1. Auflage.] |
| Pubbl/distr/stampa | Göttingen, [Germany] : , : Cuvillier Verlag, , 2010 |
| Descrizione fisica | 1 online resource (152 pages) : illustrations (some color) |
| Disciplina | 660.04 |
| Soggetto topico |
Chemical vapor deposition
Atomic layer deposition Hafnium oxide |
| ISBN | 3-7369-3270-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | ger |
| Record Nr. | UNINA-9910822746903321 |
|
Zilbauer Thomas
|
||
| Göttingen, [Germany] : , : Cuvillier Verlag, , 2010 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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