Pubbl/distr/stampa	Norwich, N.Y., : William Andrew Pub.
Descrizione fisica	1 online resource (613 p.)
Disciplina	548/.5
Altri autori (Persone)	ByrappaK OhachiT
Collana	Springer series in materials processing
Soggetto topico	Crystal growth
ISBN	0-08-094685-2 9786612755231 1-282-75523-4 1-282-01377-7 9786612013775 0-8155-1680-0
Formato	Materiale a stampa
Livello bibliografico	Monografia
Lingua di pubblicazione	eng
Nota di contenuto	Front Cover; Crystal Growth Technology; Copyright Page; Contents; Chapter 1 Growth Histories of Mineral Crystals as Seen from Their Morphological Features; 1.1 Introduction; 1.2 Morphology of Crystals; 1.3 Diamond; 1.4 Beryl; 1.5 Trapiche Ruby; 1.6 Summary; References; Chapter 2 Theory of Crystal Growth from Vapor and Solution; 2.1 Various Crystal Growth Processes; 2.2 Vapor Growth; 2.3 Growth of a Crystal in a Solution; References; Chapter 3 Epitaxial Growth of III-V Compounds; 3.1 Introduction; 3.2 MBE of III-V Compounds; 3.3 MOCVD of III-V Compounds; 3.4 Summary; References Chapter 4 CVD Diamond Growth4.1 Introduction; 4.2 Preparation and Application of CVD Film; 4.3 Nucleation and Growth of Diarno; 4.4 Phase Diagram and Gas-Phase Species in CVD Diamond Growth Processes; 4.5 In Situ Diagnostic Techniques for Diamond Growth; 4.6 Summary; References; Chapter 5 Laser-Assisted Growth and Characterization of Multicomponent Lead-Zirconate-Titanate Films; 5.1 Introduction; 5.2 Film Deposition Process; 5.3 Case Study: Nd-Modified PZT Films; 5.4 Results from XRD and EDS Measurements; 5.5 Compositional and Structural Changes in the Target 5.6 Raman Spectroscopy Studies of PZT Films5.7 Electrical Properties of PNZT Films; 5.8 Summary; References; Chapter 6 Silicon Carbide Crystals -Part I: Growth and Characterization; 6.1 Introduction; 6.2 Vapor Growth; 6.3 High Temperature Solution Growth; 6.4 Bulk Growth by Seeded Sublimation: The Industrial Process; 6.5 Doping in Bulk and Epitaxial Growth; 6.6 Growth Defects; 6.7 Defect Analysis; 6.8 Summary; References; Chapter 7 Silicon Carbide Crystals - Part II: Process Physics and Modeling; 7.1 Introduction; 7.2 Modeling of Heat and Mass Transfer and Growth Rate; 7.3 Growth Simulation 7.4 Summary References; Chapter 8 Thermodynamics of Multicomponent Perovskite Synthesis in Hydrothermal Solution; 8.1 Introduction; 8.2 Thermodynamic Model; 8.3 Validation and Applications of Thermodynamic Modeling; 8.4 Summary; References; Chapter 9 Growth of Multicomponent Perovskite Oxide Crystals: Synthesis Conditions for the Hydrothermal Growth of Ferroelectric Powders; 9.1 Introduction; 9.2 General Overview; 9.3 Synthesis Conditions for Controlled Chemical and Phase Purity; 9.4 Kinetics and Rate Controlling Mechanisms; 9.5 Synthesis Conditions for Controlled Morphology 9.6 Syntesis Conditions for Controlled Particle Size9.7 Summary; References; Chapter 10 Crystal Growth, Size, and Morphology Control of Nd:RVO4 Under Hydrothermal Conditions; 10.1 Introduction; 10.2 Technologically Important Vanadates; 10.3 Phase Equilibria; 10.4 Structure of Nd:RVO4; 10.5 Synthesis and Growth of Rare Earth Vanadates; 10.6 Solubility Study; 10.7 Crystal Growth; 10.8 Morphology; 10.9 Characterization; 10.10 Summary; References; Chapter 11 Hydrothermal Growth of Quartz Under Specific Conditions and the Raman Spectra of Ion Species in a Hydrothermal Growth Solution 11.1 Introduction
Record Nr.	UNINA-9911006841703321

Autore	Giles, Harold F.
Pubbl/distr/stampa	Norwich, NY : William Andrew Pub., c2005
Descrizione fisica	xviii, 542 p. : ill. ; 29 cm
Disciplina	668.413
Altri autori (Persone)	Wagner, John R. Mount, Eldridge M.
Collana	PDL handbook series
Soggetto topico	Plastics - Extrusion
ISBN	0815514735
Formato	Materiale a stampa
Livello bibliografico	Monografia
Lingua di pubblicazione	eng
Record Nr.	UNISALENTO-991001651809707536

Pubbl/distr/stampa	Norwich, NY, : William Andrew Pub.
Descrizione fisica	1 online resource (887 p.)
Disciplina	620.1/1295
Altri autori (Persone)	TompkinsHarland G IreneEugene A
Soggetto topico	Ellipsometry
ISBN	0-8155-1747-5 1-282-00263-5 9786612002632 9786612002625 1-59124-849-3
Formato	Materiale a stampa
Livello bibliografico	Monografia
Lingua di pubblicazione	eng
Nota di contenuto	Front Cover; Handbook of Ellipsometry; Copyright Page; Contents; Part 1: Theory of Ellipsometry; Chapter 1. Polarized Light and Ellipsometry; 1.1 A Quick Guide to Ellipsometry; 1.2 Maxwell and Wave Equations; 1.3 Representations of Polarization; 1.4 Propagation of Polarized Light; 1.5 Reflection and Transmission of Polarized Light at Planar Interfaces; 1.6 References; Chapter 2. Optical Physics of Materials; 2.1 Introduction; 2.2 Propagation of Light in Solids; 2.3 Classical Theories of the Optical Properties of Solids; 2.4 Quantum Mechanical Theories of the Optical Properties of Solids 2.5 Modeling the Optical Properties of Solids2.6 Overview and Concluding Remarks; 2.7 References and Bibliography; Chapter 3. Data Analysis for Spectroscopic Ellipsometry; 3.1 Introduction; 3.2 Ellipsometry Parameters; 3.3 Calculation of Complex Reflection Coefficients; 3.4 Models for Dielectric Functions; 3.5 Fitting Models to Data; 3.6 Determination of Optical Functions from Spectroscopic Ellipsometry Data; 3.7 Depolarization; 3.8 Further Reading and References; Part 2: Instrumentation; Chapter 4. Optical Components and the Simple PCSA (Polarizer, Compensator, Sample, Analyzer) Ellipsometer 4.1 General4.2 The Components; 4.3 Ellipsometer Component Configurations; 4.4 References; Chapter 5. Rotating Polarizer and Analyzer Ellipsometry; 5.1 Introduction; 5.2 Comparison of Ellipsometers; 5.3 Instrumentation Issues; 5.4 Data Reduction for the Rotating Polarizer and Analyzer Ellipsometers; 5.5 Precision Considerations; 5.6 Calibration Procedures; 5.7 Summary: Recent and Future Directions; 5.8 References; Chapter 6. Polarization Modulation Ellipsometry; 6.1 Introduction; 6.2 The Photoelastic Modulator (PEM); 6.3 Experimental Configurations of Polarization Modulation Ellipsometers 6.4 Light Intensity Through a Polarization Modulation Ellipsometer6.5 Waveform Analysis; 6.6 Calibration Procedures; 6.7 Errors; 6.8 Further Reading and References; Chapter 7. Multichannel Ellipsometry; 7.1 Introduction; 7.2 Overview of Instrumentation; 7.3 Rotating-Element Designs; 7.4 Concluding Remarks; 7.5 References; Part 3: Critical Reviews of Some Applications; Chapter 8. SiO2 Films; 8.1 Introduction; 8.2 Historical Perspective - Prior to 1970; 8.3 Modern Studies - Since 1970; 8.4 Conclusions; 8.5 References; Chapter 9. Theory and Application of Generalized Ellipsometry 9.1 Introduction9.2 The Generalized Ellipsometry Concept; 9.3 Theory of Generalized Ellipsometry; 9.4 Special Generalized Ellipsometry Solutions; 9.5 Strategies in Generalized Ellipsometry; 9.6 Generalized Ellipsometry Applications; 9.7 Conclusions; 9.8 Further Reading and References; Part 4: Emerging Areas in Ellipsometry; Chapter 10. VUV Ellipsometry; 10.1 Introduction; 10.2 Historical Review of Short Wavelength Ellipsometry; 10.3 VUV Ellipsometry Today; 10.4 Importance of VUV Ellipsometry; 10.5 Survey of Applications; 10.6 Future of VUV Ellipsometry; 10.7 Acknowledgments; 10.8 References Chapter 11. Spectroscopic Infrared Ellipsometry
Record Nr.	UNINA-9911004801103321

Autore	Fink, Johannes Karl
Pubbl/distr/stampa	Norwich, NY : William Andrew Pub., c2005
Descrizione fisica	xxiv, 770 p. : ill. ; 24 cm.
Disciplina	668.374
Collana	PDL handbook series
Soggetto topico	Gums and resins, Synthetic Gums and resins - Industrial applications
ISBN	0815515154
Formato	Materiale a stampa
Livello bibliografico	Monografia
Lingua di pubblicazione	eng
Record Nr.	UNISALENTO-991002816779707536

Autore	Wasa Kiyotaka
Pubbl/distr/stampa	Norwich, NY, : William Andrew Pub.
Descrizione fisica	1 online resource (533 p.)
Disciplina	621.3815/2
Altri autori (Persone)	KitabatakeMakoto AdachiHideaki
Soggetto topico	Cathode sputtering (Plating process) Thin films
ISBN	1-282-02766-2 9786612027666 0-08-094698-4 0-8155-1931-1
Formato	Materiale a stampa
Livello bibliografico	Monografia
Lingua di pubblicazione	eng
Nota di contenuto	Front Cover; Thin Film Materials Technology: Sputtering of Compound Materials; Copyright Page; Table of Contents; Chapter 1. Thin Film Materials and Devices; 1.1 THIN FILM MATERIALS; 1.2 THIN FILM DEVICES; REFERENCES; Chapter 2. Thin Film Processes; 2.1 THIN FILM GROWTH PROCESS; 2.2 THIN FILM DEPOSITION PROCESS; 2.3 CHARACTERIZATION; REFERENCES; Chapter 3. Sputtering Phenomena; 3.1 SPUTTER YIELD; 3.2 SPUTTERED ATOMS; 3.3 MECHANISMS OF SPUTTERING; REFERENCES; Chapter 4. Sputtering Systems; 4.1 DISCHARGE IN A GAS; 4.2 SPUTTERING SYSTEMS; 4.3 PRACTICAL ASPECTS OF SPUTTERING SYSTEMS; REFERENCES Chapter 5. Deposition of Compound Thin Films5.1 OXIDES; 5.2 NITRIDES; 5.3 CARBIDES AND SILICIDES; 5.4 DIAMOND; 5.5 SELENIDES; 5.6 AMORPHOUS THIN FILMS; 5.7 SUPERLATTICE STRUCTURES; 5.8 ORGANIC THIN FILMS; 5.9 MAGNETRON SPUTTERING UNDER A STRONG MAGNETIC FIELD; REFERENCES; Chapter 6. Structural Control of Compound Thin Films: Perovskite and Nanometer Oxide Thin Films; 6.1 FERROELECTRIC MATERIALS AND STRUCTURES; 6.2 CONTROL OF STRUCTURE; 6.3 NANOMETER STRUCTURE; 6.4 INTERFACIAL CONTROL; REFERENCES; Chapter 7. Microfabrication by Sputtering; 7.1 CLASSIFICATION OF SPUTTER ETCHING 7.2 ION-BEAM SPUTTER ETCHING7.3 DIODE SPUTTER ETCHING; 7.4 DEPOSITION INTO DEEP-TRENCH STRUCTURES; REFERENCES; Appendix; Table A.1 Electric Units, Their Symbols and Conversion Factors; Table A.2 Fundamental Physical Constants; List of Acronyms; Index
Record Nr.	UNINA-9911006982203321