Advanced optics using aspherical elements / / Bernhard Braunecker, Rudiger Hentschel, Hans J. Tiziani, editors
| Advanced optics using aspherical elements / / Bernhard Braunecker, Rudiger Hentschel, Hans J. Tiziani, editors |
| Pubbl/distr/stampa | Bellingham, Wash., : SPIE Press, c2008 |
| Descrizione fisica | 1 online resource (xix, 414 pages) : illustrations |
| Disciplina | 681/.423 |
| Altri autori (Persone) |
BrauneckerBernhard
HentschelRudiger <1949-> TizianiHans J |
| Collana | SPIE Press monograph |
| Soggetto topico |
Aspherical lenses
Optical instruments - Design and construction |
| ISBN |
1-61583-699-3
0-8194-7840-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
1. Introduction -- Part I. 1.1. Motivation -- 1.2. Guideline -- 2. Basic considerations. 2.1. Preliminary remarks -- 2.2. Definition of aspherical optical elements -- 2.3. Drawing indications -- 2.4. Information exchange over aspherical elements -- 2.5. Study about surface errors -- 2.6. References -- 3. Applications. 3.1. Physical considerations -- 3.2. Image quality -- 3.3. Case study -- 3.4. Design drivers -- 3.5. Classifications -- 3.6. Technical challenges -- 3.7. Application spectrum -- 4. Materials of aspheres. 4.1. Glasses -- 4.2. Polymers -- 4.3. Glass ceramics -- 4.4. Single crystals and polycrystalline ceramics -- 5. Processing technologies. 5.1. Processing of aspheres: the historical approach -- 5.2. Overview processing -- 5.3. Process chain for processing aspheres -- 5.4. Hybrid technology -- 5.5. Molding -- 5.6. References -- 6. Metrology. 6.1. Measurement of optical system performance -- 6.2. Measurement of individual surfaces -- 6.3. Surface metrology -- 6.4. Measurement of surface roughness and waviness -- 6.5. Surface form measurement -- 6.6. Interferometric testing -- 6.7. Surface form measurement with a Shack-Hartmann wavefront sensor -- 6.8. Comparison of methods -- 6.9. References.
7. Coating technologies. 7.1. Introduction -- 7.2. Market and business -- 7.3. Deposition technologies, coating design, and monitoring -- 7.4. Multifunctional coatings on plastic optics -- 7.5. Actual topics -- 7.6. Nanocoatings -- 7.7. Summary -- 7.8. References -- 7.9. Further reading -- 8. Assembly technologies. 8.1. Relation between design and assembly -- 8.2. Review of different assembly strategies -- 8.3. Errors and tolerances -- 8.4. Compensators -- 8.5. Alignment of the optical axis of the aspherical components -- 8.6. Monolithic optics -- 8.7. Technical details -- 8.8. Reference -- 9. Future trends. 9.1. Introduction -- 9.2. Preliminary remarks -- 9.3. Applications -- 9.4. Materials -- 9.5. Processing technologies and metrology -- 9.6. Coating technologies -- 9.7. Assembly -- 9.8. Reference -- 10. Mathematical formulation. 10.1. Surfaces of second-order (quadrics) -- 10.2. Basic equation by ISO. Part II. Experts' contributions. 11. Applications. 11.1. Illuminations -- 11.2. Micro-optic cylindrical aspherical fast axis collimator for high power diode laser -- 11.3. Photo-optics -- 11.4. Aspheres for large format lenses -- 11.5. Aspherical projection lenses for UV- and eUV-lithography -- 11.6. Large-format lenses for aerial surveying -- 11.7. Mirror telescope for space communication -- 11.8. Free-form correction plate for telescopes -- 12. Materials. 12.1. Low-tg glass (nd <6, vd> ) -- 12.2. Low-tg glass (1.6. < nd <9, < vd < ) -- 12.3. Low-tg glass (1.8. < nd, > vd) -- 12.4. Uv-transmitting glasses -- 12.5. Fused silica -- 12.6. Optical polymers -- 12.7. Crystals for uv optics -- 12.8. Crystals for ir optics -- 12.9. Glass ceramics -- 12.10. Opto-ceramics -- 12.11. Glasses for ir optics -- 13. Processing technologies. 13.1. Zonal grinding process -- 13.2. Zonal polishing process -- 13.3. Magnetorheological finishing -- 13.4. Robotic polishing -- 13.5. Subaperture robotic polishing -- 13.6. Robot-assisted fluid jet polishing (FJP) -- 13.7. Ion beam polishing -- 13.8. Precision glass molding -- 13.9. Tools for precision glass molding -- 13.10. Injection molding of high-precision polymer optics -- 13.11. Aspherical microlenses manufactured by wafer-based technology. 14. Metrology. 14.1. Tactile profile measurement -- 14.2. Interferometry -- 14.3. Wavefront sensor (Shack-Hartmann) -- 14.4. Surface/microstructure inspection -- 15. Coating technologies. 15.1. Coating design -- 15.2. Electron-beam evaporation -- 15.3. Ion-assisted deposition (IAD) -- 15.4. Ion plating (IP) deposition -- 15.5. Advanced plasma source (APS) -- 15.5.6. Link -- 15.6. Magnetron sputtering -- 15.7. Ion beam sputtering -- 15.8. Plasma impulse chemical vapor deposition -- 16. Assembly. 16.1. Assembly of spherical lenses (consumer optics) -- 16.2. Assembly of spherical lenses (HQ optics) -- 16.3. Assembly of aspherical lenses -- 16.4. Micro-assembly trimo -- 16.5. CNC-machined monolithic optics -- 17. Editor and author biographies. 17.1. Volume editors -- 17.2. Contributing experts -- Acknowledgements -- Index. |
| Record Nr. | UNINA-9911004810903321 |
| Bellingham, Wash., : SPIE Press, c2008 | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
The art of radiometry / / James M. Palmer, Barbara G. Grant
| The art of radiometry / / James M. Palmer, Barbara G. Grant |
| Autore | Palmer James M |
| Pubbl/distr/stampa | Bellingham, Wash., : SPIE Press, c2010 |
| Descrizione fisica | 1 online resource (384 p.) |
| Disciplina | 539.7/7 |
| Altri autori (Persone) | GrantBarbara G <1957-> (Barbara Geri) |
| Collana | Press monograph |
| Soggetto topico | Radiation - Measurement |
| ISBN |
1-61583-722-1
0-8194-7916-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
1. Introduction to Radiometry -- Definitions -- Why Measure Light? -- Historical Background -- Radiometric Measurement Process -- Radiometry Applications.
2. Propagation of Optical Radiation -- Basic Definitions -- Fundamental Radiometric Quantities -- Radiometric Approximations -- Equation of Radiative Transfer -- Configuration Factors -- Effect of Lenses on Power Transfer -- Common Radiative Transfer Configurations -- Integrating Sphere -- Radiometric Calculation Examples -- Generalized Expressions for Image-Plane Irradiance -- Summary of Some Key Concepts. 3. Radiometric Properties of Materials -- Introduction and Terminology -- Transmission -- Reflection -- Absorption -- Relationship Between Reflectance, Transmittance, and Absorptance -- Directional Characteristics -- Emission -- Spectral Characteristics -- Optical Materials Checklist. 4. Generation of Optical Radiation -- Introduction -- Radiation Laws -- Emitter Types and Properties -- Practical Sources of Radiant Energy -- Radiation Source Selection Criteria -- Source Safety Considerations -- Summary of Some Key Concepts. 5. Detectors of Optical Radiation -- Introduction -- Definitions -- Figures of Merit -- #N 6. Radiometric Instrumentation -- Introduction -- Instrumentation Requirements -- Radiometer Optics -- Spectral Instruments. 7. Radiometric Measurement and Calibration -- Introduction -- Measurement Types -- Errors in Measurements, Effects of Noise, and Signal-to-Noise Ratio in Measurements -- Measurement and Range Equations -- Introduction to the Philosophy of Calibration -- Radiometric Calibration Configurations -- Example Calculations: Satellite Electro-optical System -- Final Thoughts. Table of Appendices -- Système Internationale (SI) Units for Radiometry and Photometry -- Physical Constants, Conversion Factors, and Other Useful Quantities -- Antiquarian's Garden of Sane and Outrageous Terminology -- Solid-Angle Relationships -- Glossary -- Effective Noise Bandwidth of Analog RC Filters and the Selection of Filter Parameters to Optimize Signal-to-Noise Ratio -- Bandwidth Normalization by Moments -- Jones Near-Small-Source Calibration Configuration -- Is Sunglint Observable in the Thermal Infrared? -- Documentary Standards for Radiometry and Photometry -- Radiometry and Photometry Bibliography -- Reference List for Noise and Postdetection Signal. |
| Record Nr. | UNINA-9911004813303321 |
Palmer James M
|
||
| Bellingham, Wash., : SPIE Press, c2010 | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Computational Fourier optics : a MATLAB tutorial / David Voelz
| Computational Fourier optics : a MATLAB tutorial / David Voelz |
| Autore | Voelz, David |
| Pubbl/distr/stampa | Bellingham, Washington, : SPIE Press, 2011 |
| Descrizione fisica | XV, 232 p. : ill. ; 26 cm |
| Collana | Tutorial texts series |
| ISBN | 978-0-8194-8204-4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910432560303321 |
Voelz, David
|
||
| Bellingham, Washington, : SPIE Press, 2011 | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
The design of plastic optical systems / / Michael P. Schaub
| The design of plastic optical systems / / Michael P. Schaub |
| Autore | Schaub Michael P |
| Pubbl/distr/stampa | Bellingham, Wash., : SPIE Press, c2009 |
| Descrizione fisica | 1 online resource (226 p.) |
| Disciplina | 681/.4 |
| Collana | Tutorial texts series |
| Soggetto topico |
Plastic lenses
Optical instruments - Design and construction Plastics - Optical properties Optical materials |
| ISBN |
1-61583-711-6
0-8194-7890-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Preface -- Acknowledgments -- Chapter 1. Introduction -- 1.1. Background -- 1.2. When are plastic optics appropriate? -- Chapter 2. Optical plastics -- 2.1. Plastic versus glass maps -- 2.2. Material properties -- 2.3. Material selection -- 2.4. Material specification -- Chapter 3. Manufacturing methods -- 3.1. Casting -- 3.2. Embossing and compression molding -- 3.3. Machining -- 3.4. Injection molding -- Chapter 4. Design guidelines -- 4.1. Design basics -- 4.2. Tolerances -- 4.3. Plastic versus glass -- 4.4. Shape and thickness -- 4.5. Aspheric surfaces -- 4.6. Diffractive surfaces -- 4.7. Athermalization -- 4.8. Coatings -- 4.9. Optomechanical design -- 4.10. Stray light -- 4.11. Special considerations for small and large parts -- 4.12. Drawings -- 4.13. Vendors and vendor interaction
Chapter 5. Design examples -- 5.1. Singlet lens -- 5.2. Webcams -- 5.3. Cell phone camera -- 5.4. Infrared multiorder or harmonic diffractive lens -- Chapter 6. Testing -- 6.1. Parameters, equipment, and techniques -- 6.2. Making testing easier -- Chapter 7. Prototyping -- 7.1. Optics -- 7.2. Mechanical parts -- 7.3. Assembly and test -- Chapter 8. Production -- 8.1. Transition to production -- 8.2. Steady-state production -- References -- Index. |
| Record Nr. | UNINA-9911004809803321 |
Schaub Michael P
|
||
| Bellingham, Wash., : SPIE Press, c2009 | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Diffractive optics : design, fabrication, and test / / Donald C. O'Shea ... [et al.]
| Diffractive optics : design, fabrication, and test / / Donald C. O'Shea ... [et al.] |
| Pubbl/distr/stampa | Bellingham, Wash., : SPIE Press, c2004 |
| Descrizione fisica | 1 online resource (258 p.) |
| Disciplina | 621.36 |
| Altri autori (Persone) | O'SheaDonald C |
| Collana | Tutorial texts in optical engineering |
| Soggetto topico |
Optical instruments - Design and construction
Lenses - Design and construction Diffraction |
| ISBN |
1-61583-705-1
0-8194-7887-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Preface -- Chapter 1. Introduction -- 1.1 Where Do Diffractive Elements Fit in Optics? -- 1.2 A Quick Survey of Diffractive Optics -- 1.3 A Classic Optical Element: The Fresnel Lens -- 1.4 Light Treated as a PropagatingWave -- 1.5 A Physical Optics Element: The Blazed Grating -- 1.6 Fanout Gratings -- 1.7 Constructing the Profile: Optical Lithography -- 1.8 A Theme.
Chapter 2. Scalar Diffraction Theory -- 2.1 Rayleigh-Sommerfeld Propagation -- 2.2 Fourier Analysis -- 2.3 Using Fourier Analysis -- 2.4 Diffraction Efficiency of Binary Optics -- 2.5 Extended Scalar Theory -- 2.6 Conclusion -- References. Chapter 3. Electromagnetic Analysis of Diffractive Optical Elements -- 3.1 Scalar Limitations -- 3.2 Plane-wave Spectrum Method -- 3.3 Electromagnetic Diffraction Models -- Effective Media Theory -- References. Chapter 4. Diffractive Lens Design -- 4.1 Basics of Lens Design -- 4.2 Diffractive Optics Lens Design -- 4.3 Efficiency of Multilevel Diffractive Lenses -- 4.4 Hybrid Lenses -- References. Chapter 5. Design of Diffraction Gratings -- 5.1 Introduction -- 5.2 Design Approaches -- 5.3 Design Variables -- 5.4 Direct Inversion -- 5.5 Iterative Design -- 5.6 Conclusion -- References. Chapter 6. Making a DOE -- 6.1 The Profile -- 6.2 Photolithography: A Method for DOE Fabrication -- 6.3 From Equation to Component -- 6.4 Interplay between Fabrication and Optical Design -- 6.5 Facilities and Substrates -- 6.6 Fabrication of DOEs -- References. Chapter 7. Photolithographic Fabrication of Diffractive Optical Elements -- 7.1 Photolithographic Processing -- 7.2 Binary Optics -- 7.3 Conclusion -- Reference. Chapter 8. Survey of Fabrication Techniques for Diffractive Optical Elements -- 8.1 Lithographic Techniques -- 8.2 Direct Machining -- 8.3 Replication -- 8.4 Comparison of Fabrication Methods for DOEs -- References. Chapter 9. Testing Diffractive Optical Elements -- 9.1 Metrology -- 9.2 Testing Optical Performance -- 9.3 Effects of Fabrication Errors on DOE Performance -- References. Chapter 10. Application of Diffractive Optics to Lens Design -- 10.1 Introduction -- 10.2 Diffractive Lenses -- 10.3 Hybrid Lenses -- 10.4 Thermal Compensation with Diffractive Optics -- References. Chapter 11. Additional Applications of Diffractive Optical Elements -- 11.1 Introduction -- 11.2 Multiple Lens Applications -- 11.3 Beam-Shaping Applications -- 11.4 Grating Applications -- 11.4.1 Beam deflectors, splitters, and samplers -- 11.5 Subwavelength Gratings -- 11.6 Integration and Modules -- 11.7 Example Application Area: Optical Communications -- 11.8 Conclusion -- References -- Index. |
| Record Nr. | UNINA-9911004824903321 |
| Bellingham, Wash., : SPIE Press, c2004 | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Electroactive polymer (EAP) actuators as artificial muscles : reality, potential, and challenges / Yoseph Bar-Cohen, editor
| Electroactive polymer (EAP) actuators as artificial muscles : reality, potential, and challenges / Yoseph Bar-Cohen, editor |
| Autore | Bar-Cohen, Yoseph |
| Pubbl/distr/stampa | Bellingham, Wash. : SPIE Press, 2001 |
| Descrizione fisica | XIV, 671 p. : ill. ; 26 cm |
| Disciplina | 610 |
| Soggetto non controllato | Polimeri - Medicina |
| ISBN | 081944054X |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-990009979840403321 |
| Bar-Cohen, Yoseph | ||
| Bellingham, Wash. : SPIE Press, 2001 | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Electroactive polymer (EAP) actuators as artificial muscles : reality, potential, and challenges / / Yoseph Bar-Cohen, editor
| Electroactive polymer (EAP) actuators as artificial muscles : reality, potential, and challenges / / Yoseph Bar-Cohen, editor |
| Edizione | [2nd ed.] |
| Pubbl/distr/stampa | Bellingham, Wash., : SPIE Press, c2004 |
| Descrizione fisica | 1 online resource (816 p.) |
| Disciplina | 610/.28 |
| Altri autori (Persone) | Bar-CohenYoseph |
| Collana | SPIE Press monograph |
| Soggetto topico |
Polymers in medicine
Conducting polymers Muscles |
| ISBN |
1-61583-723-X
0-8194-8112-2 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Topic 1. Introduction -- Chapter 1. EAP history, current status, and infrastructure / Yoseph Bar-Cohen -- 1.1. Introduction -- 1.2. Biological muscles -- 1.3. Historical review and currently available active polymers -- 1.4. Polymers with controllable properties or shape -- 1.5. Electroactive polymers (EAP) -- 1.6. The EAP roadmap, need for an established EAP technology -- Infrastructure -- 1.7. Potential -- 1.8. Acknowledgments -- 1.9. References --
Topic 2. Natural muscles -- Chapter 2. Natural muscle as a biological system / Gerald H. Pollack, Felix A. Blyakhman, Frederick B. Reitz, Olga V. Yakovenko, and Dwayne L. Dunaway -- 2.1. Conceptual background -- 2.2. Structural considerations -- 2.3. Does contraction involve a phase transition? -- 2.4. Molecular basis of the phase transition -- 2.5. Lessons from the natural muscle system that may be useful for the design of polymer actuators -- 2.6. References -- Chapter 3. Metrics of natural muscle function / Robert J. Full and Kenneth Meijer -- 3.1. Caution about copying and comparisons -- 3.2. Common characterizations, partial picture -- 3.3. Work-loop method reveals diverse roles of muscle function during rhythmic activity -- 3.4. Direct comparisons of muscle with human-made actuators -- 3.5. Future reciprocal Interdisciplinary collaborations -- 3.6. Acknowledgments -- 3.7. References -- Topic 3. EAP materials -- Topic 3.1. Electric EAP -- Chapter 4. Electric EAP / Qiming Zhang, Cheng Huang, Feng Xia, and Ji Su -- 4.1. Introduction -- 4.2. General terminology of electromechanical effects in electric EAP -- 4.3. PVDF-based ferroelectric polymers -- 4.4. Ferroelectric odd-numbered polyamides (nylons) -- 4.5. Electrostriction -- 4.6. Field-induced strain due to Maxwell stress effect -- 4.7. High dielectric constant polymeric materials as actuator materials -- 4.8. Electrets -- 4.9. Liquid-crystal polymers -- 4.10. Acknowledgments -- 4.11. References -- Topic 3.2. Ionic EAP -- Chapter 5. Electroactive polymer gels / Paul Calvert -- 5.1. Introduction, the gel state -- 5.2. Physical gels -- 5.3. Chemical gels -- 5.4. Thermodynamic properties of gels -- 5.5. Transport properties of gels -- 5.6. Polyelectrolyte gels -- 5.7. Mechanical properties of gels -- 5.8. Chemical actuation of gels -- 5.9. Electrically actuated gels -- 5.10. Recent progress -- 5.11. Future directions -- 5.12. References -- Chapter 6. Ionomeric polymer-metal composites / Sia Nemat-Nasser and Chris W. Thomas -- 6.1. Introduction -- 6.2. Brief history of IPMC materials -- 6.3. Materials and manufacture -- 6.4. Properties and characterization -- 6.5. Actuation mechanism -- 6.6. Development of IPMC applications -- 6.7. Discussion: advantages/disadvantages -- 6.8. Acknowledgments -- 6.9. References -- Chapter 7. Conductive polymers / José-María Sansiñena and Virginia Olazábal -- 7.1. Brief history of conductive polymers -- 7.2. Applications of conductive polymers -- 7.3. Basic mechanism of CP actuators -- 7.4. Development of CP actuators -- 7.5. Advantages and disadvantages of CP actuators -- 7.6. Acknowledgments -- 7.7. References -- Chapter 8. Carbon nanotube actuators: synthesis, properties, and performance / Geoffrey M. Spinks, Gordon G. Wallace, Ray H. Baughman, and Liming Dai -- 8.1. Introduction -- 8.2. Nanotube synthesis -- 8.3. Characterization of carbon nanotubes -- 8.4. Macroscopic nanotube assemblies: mats and fibers -- 8.5. Mechanical properties of carbon nanotubes -- 8.6. Mechanism of nanotube actuation -- 8.7. Experimental studies of carbon nanotube actuators -- 8.8. Conclusions and future developments -- 8.9. References -- Topic 3.3. Molecular EAP -- Chapter 9. Molecular scale electroactive polymers / Michael J. Marsella -- 9.1. Introduction -- 9.2. Intrinsic properties and macroscale translation -- 9.3. Stimulus-induced conformational changes within the single molecule -- 9.4. Final comments -- 9.5. References -- Topic 4. Modeling electroactive polymers -- Chapter 10. Computational chemistry / Kristopher E. Wise -- 10.1. Introduction -- 10.2. Overview of computational methods -- 10.3. Quantum mechanical methods -- 10.4. Classical force field simulations -- 10.5. Mesoscale simulations -- 10.6. References -- Chapter 11. Modeling and analysis of chemistry and electromechanics / Thomas Wallmersperger, Bernd Kröplin, and Rainer W. Gülch -- 11.1. Introduction --11.2. Chemical stimulation -- 11.3. Electrical stimulation -- 11.4. Conclusion -- 11.5. References -- Chapter 12. Electromechanical models for optimal design and effective behavior of electroactive polymers / Kaushik Bhattacharya, Jiangyu Li, and Yu Xiao -- 12.1. Introduction -- 12.2. Introduction to finite elasticity -- 12.3. Optimal design of electrostatic actuators -- 12.4. Models of ionomer actuators -- 12.5. Reduced models -- 12.6. Conclusion -- 12.7. Acknowledgment -- 12.8. References -- Chapter 13. Modeling IPMC for design of actuation mechanisms / Satoshi Tadokoro, Masashi Konyo, and Keisuke Oguro -- 13.1. Models and CAE tools for design of IPMC mechanisms -- 13.2. A physicochemical model considering six phenomena -- 13.3. Gray-box macroscopic model for mechanical and control design -- 13.4. Simulation demonstration by models -- 13.5. Applications of the model -- 13.6. References -- Topic 5. Processing and fabrication of EAPs -- Chapter 14. Processing and fabrication techniques / Yoseph Bar-Cohen, Virginia Olazábal, José-María Sansiñena, and Jeffrey Hinkley -- 14.1. Introduction -- 14.2. Synthesis and material processing -- 14.3. Fabrication and shaping techniques -- 14.4. Electroding techniques -- 14.5. System integration methods -- 14.6. EAP actuators -- 14.7. Concluding remarks -- 14.8. References -- Topic 6. Testing and characterization -- Chapter 15. Methods of testing and characterization / Stewart Sherrit, Xiaoqi Bao, and Yoseph Bar-Cohen -- 15.1. Introduction -- 15.2. Characterization of EAP with polarization-dependent strains -- 15.3. Characterization of ionic EAP with diffusion-dependent strain -- 15.4. Summary of test methods -- 15.5. Conclusion -- 15.6. Acknowledgments -- 15.7. References -- Topic 7. EAP actuators, devices, and mechanisms -- Chapter 16. Application of dielectric elastomer EAP actuators / Roy Kornbluh, Ron Pelrine, Qibing Pei, Marcus Rosenthal, Scott Stanford, Neville Bonwit, Richard Heydt, Harsha Prahlad, and Subramanian V. Shastri -- 16.1. Introduction -- 16.2. Dielectric elastomer EAP, background and basics -- 16.3. Actuator design issues -- 16.4. Operational considerations -- 16.5. Examples of dielectric elastomer EAP actuators and applications -- 16.6. Artificial muscles and applications to biologically inspired devices -- 16.7. General purpose linear actuators -- 16.8. Planar and other actuator configurations -- 16.9. Motors -- 16.10. Generators -- 16.11. Sensors -- 16.12. Summary and future developments -- 16.13. Acknowledgments -- 16.14. References -- Chapter 17. Biologically inspired robots / Brett Kennedy, Chris Melhuish, and Andrew Adamatzky -- 17.1. Introduction -- 17.2. Biologically inspired mechanisms and robots -- 17.3. Aspects of robotic design -- 17.4. Active polymer actuators in a traditional robotic system -- 17.5. Using rapid prototyping methods for integrated design -- 17.6. Evolutionary design algorithms (genetic algorithm design) -- 17.7. EAP actuators in highly integrated microrobot design -- 17.8. Solving the power problem toward energetic autonomy -- 17.9. The future of active polymer actuators and robots -- 17.10. References -- Chapter 18. Applications of EAP to the entertainment industry / David Hanson -- 18.1. Introduction -- 18.2. Entertainment and its shifting significance -- 18.3. Technical background to entertainment application of EAP -- 18.4. The craft of aesthetic biomimesis in entertainment -- 18.5. A recipe for using EAP in entertainment -- 18.6. Facial expression robot-practical test bed for EAP -- 18.7. Conclusion -- 18.8. Acknowledgment -- 18.9. References -- Chapter 19. Haptic interfaces using electrorheological fluids / Constantinos Mavroidis, Yoseph Bar-Cohen, and Mourad Bouzit -- 19.1. Introduction -- 19.2. Electrorheological fluids -- 19.3. Haptic interfaces and electrorheological fluids -- 19.4. MEMICA haptic glove -- 19.5. ECS element model derivation -- 19.6. Parametric analysis of the design of ECS elements -- 19.7. Experimental ECS system and results -- 19.8. Conclusions -- 19.9. Acknowledgments -- 19.10. References -- Chapter 20. Shape control of precision gossamer apertures / Christopher H. M. Jenkins -- 20.1. Introduction -- 20.2. Shape control of PGAs -- 20.3. Shape control methodologies involving electroactive polymers -- 20.4. Conclusions -- 20.5. Nomenclature -- 20.6. Acknowledgments -- 20.7. References -- Topic 8. Lessons learned, applications, and outlook -- Chapter 21. EAP applications, potential, and challenges / Yoseph Bar-Cohen -- 21.1. Introduction -- 21.2. Lesson learned using IPMC and dielectric EAP -- 21.3. Summary of existing EAP materials -- 21.4. Scalability issues and needs -- 21.5. Expected and evolving applications -- 21.6. EAP characterization -- 21.7. Platforms for demonstration of EAP -- 21.8. Future expectations -- 21.9. Acknowledgments -- 21.10. References -- Index. |
| Record Nr. | UNINA-9911004835603321 |
| Bellingham, Wash., : SPIE Press, c2004 | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Electromagnetic wave propagation in turbulence : evaluation and application of Mellin transforms / / Richard J. Sasiela
| Electromagnetic wave propagation in turbulence : evaluation and application of Mellin transforms / / Richard J. Sasiela |
| Autore | Sasiela Richard J. <1940-> |
| Edizione | [2nd ed.] |
| Pubbl/distr/stampa | Bellingham, Wash., : SPIE Press, 2007 |
| Descrizione fisica | 1 online resource (386 p.) |
| Disciplina | 539.2 |
| Collana | SPIE Press monograph |
| Soggetto topico |
Electromagnetic waves - Transmission
Atmospheric turbulence Mellin transform Numerical calculations |
| ISBN |
9781615837250
1615837256 9780819478399 0819478393 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
1. Introduction. 1.1. Book plan -- 1.2. Introduction to Mellin transforms -- 1.3. Higher transcendental functions -- 2. Basic equations for wave propagation in turbulence. 2.1. Turbulence spectra -- 2.2. Rytov approximation. -- 2.3. Phase and log-amplitude variances -- 2.4. Power spectral density -- 2.5. Beam shape and Strehl ratio -- 3. Filter functions. 3.1. Circular aperture modes -- 3.2. Piston and tilt on an annulus -- 3.3. Finite apertures and focal anisoplanatism -- 3.4. Adaptive-optics systems -- 3.5. Structure function for a distributed beacon -- 3.6. Developing new variance filter functions -- 4. Zero-parameter problems. 4.1. Turbulence models and moments -- 4.2. Tilt and piston for collimated and focused beams -- 4.3. Gradient tilt -- 4.4. Difference between gradient and Zernike tilt -- 4.5. Zernike mode variance. -- 4.6. Piston and tilt of a gaussian beam -- 4.7. Beam movement at a target -- 4.8. Angle-of-arrival jitter -- 4.9. Scintillation for collimated and focused beams -- 4.10. Phase variance with finite servo bandwidth -- 4.11. Variances for beams corrected by adaptive optics.
5. Integral evaluation with Mellin transforms. 5.1. Integral evaluation with one parameter. -- 5.2. Asymptotic solutions -- 5.3. Multiple poles -- 6. Examples with a single positive parameter. 6.1. Zernike modes and tilt for the von Karman spectrum -- 6.2. Tilt for the Greenwood spectrum -- 6.3. Tilt with finite inner scale -- 6.4. Piston- and tilt-removed phase variance on an annulus -- 6.5. Effect of diffraction on tilt -- 6.6. Tilt anisoplanatism -- 6.7. Power spectral density of tilt -- 6.8. Scintillation with finite apertures and sources -- 6.9. Scintillation with finite inner scale -- 6.10. Scintillation anisoplanatism -- 6.11. Focus anisoplanatism. -- 6.12. Zernike anisoplanatism -- 6.13. Focal anisoplanatism for point sources -- 6.14 Focal anisoplanatism for distributed sources -- 6.15 Focal anisoplanatism for offset sources -- 7. Strehl ratio. -- 7.1. Strehl ratio for propagation through turbulence -- 7.2. Strehl ratio with beam jitter -- 7.3. Strehl ratio with anisoplanatism -- 7.4. Strehl ratio for various anisoplanatic effects -- 7.5. Strehl ratio using numerical integration. -- 8. Mellin transforms with a complex parameter -- 8.1. Mellin-Barnes integrals with complex parameters -- 8.2. Asymptotic results with a complex parameter -- 8.3. The Mellin transform of an exponential times a Bessel function. 9. finite beam characteristics as examples with a single cmplex parameter -- 9.1. Phase and log-amplitude variances of beam waves -- 9.2. Power spectral density of beam waves -- 9.3. Scintillation on beam waves -- 9.4. Heuristic scintillation formulas -- 10. Mellin transforms in n complex planes -- 10.1. Convergence of multi-parameter series -- 10.2. Path closure at infinity -- 10.3. Integration in multiple complex planes -- 10.4. Asymptotic solution in two or more complex planes -- 11. integral evaluation with n parameters -- 11.1. An integral with two Bessel functions and a sinusoid -- 11.2. An integral with three Bessel functions -- 11.3. Example in three and n complex planes -- 11.4. Effect of outer scale on tilt anisoplanatism -- 11.5. Tilt with inner and outer scale -- 11.6. Power spectrum of tilt with outer scale -- 11.7. Structure and correlation functions with inner and outer scales -- 12. Beam shape -- 12.1. General formula for beam shape. -- 12.2. Beam shape for uncorrected turbulence -- 12.3. Beam shape with tilt jitter -- 12.4. Beam shape with anisoplanatism -- Appendix A: Additional Mellin transforms -- Appendix B: Transcendental functions -- Index. |
| Record Nr. | UNINA-9911004806603321 |
Sasiela Richard J. <1940->
|
||
| Bellingham, Wash., : SPIE Press, 2007 | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Enhanced optical filter design / / David Cushing
| Enhanced optical filter design / / David Cushing |
| Autore | Cushing David <d. 2009.> |
| Pubbl/distr/stampa | Bellingham, Wash., : SPIE Press, c2011 |
| Descrizione fisica | 1 online resource (168 p.) |
| Disciplina | 621.36/9 |
| Collana | SPIE |
| Soggetto topico |
Optical coatings
Light filters Optical films |
| ISBN |
9781523132041
1523132043 9781680150971 1680150979 9780819483591 0819483591 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Basics -- Methods of deposition and materials -- Antireflection coatings -- Multilayer films -- Dichroics -- Metal films and filters -- All-dielectric bandpass filters -- Optical monitoring -- Fully blocked visible filters -- Fully blocked ultraviolet filters -- Nonpolarizing reflection filters -- Nonpolarizing transmissive filters. |
| Record Nr. | UNINA-9911004737303321 |
Cushing David <d. 2009.>
|
||
| Bellingham, Wash., : SPIE Press, c2011 | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
EUV lithography [[electronic resource] /] / Vivek Bakshi, editor
| EUV lithography [[electronic resource] /] / Vivek Bakshi, editor |
| Pubbl/distr/stampa | Bellingham, Wash., : SPIE Press, : John Wiley & Sons, c2009 |
| Descrizione fisica | 1 online resource (702 p.) |
| Disciplina | 621.3815 |
| Altri autori (Persone) | BakshiVivek |
| Collana | SPIE Press monograph |
| Soggetto topico |
Ultraviolet radiation - Industrial applications
Photolithography Optical coatings |
| ISBN |
1-61583-717-5
0-8194-8070-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
1. EUV Lithography: A Historical Perspective / Hiroo Kinoshita and Obert Wood -- Introduction -- The Early Stage of Development: 1981 to 1992 -- The Second Stage of Development: 1993 to 1996 -- Other Developments in Japan and Europe -- The Development of Individual Technologies -- EUVL Conferences -- Summary.
2. EUV LLC: An Historical Perspective / Chuck Gwyn and Stefan Wurm -- Introduction -- Formation of the LLC -- Program Structure -- Program Results -- Retrospective Observations -- Status of EUV Development at the End of LLC -- Summary. 3. EUV Source Technology / Vivek Bakshi-- Introduction -- EUV Source Requirements -- DPP and LPP Source Technologies -- EUV Source Performance -- Summary and Future Outlook. 4A. Optics and Multilayer Coatings for EUVL Systems / Regina Soufli, Saša Bajt, Russell M. Hudyma and John S. Taylor -- Introduction -- Properties of EUVL Systems. 4B. Projection Systems for Extreme Ultraviolet Lithography / Russell M. Hudyma and Regina Soufli -- General EUVL Optical Design Considerations -- EUV Microsteppers -- Engineering Test Stand (ETS) -- Six-Mirror EUVL Projection Systems. 4C. Specification, Fabrication, Testing, and Mounting of EUVL Optical Substrates / John S. Taylor and Regina Soufli -- Introduction -- Specification -- Projection Optics -- Effect of Substrate Errors on Imaging Performance -- Low-Frequency (Figure) Errors -- Mid-Spatial-Frequency Errors -- High-Spatial-Frequency Errors -- Influence of Coatings on Roughness Specification -- Calculation of Surface Errors -- Uniformity -- Substrate Materials -- Fabrication -- Metrology -- Mounting and Assembly -- Alignment -- Condenser Optics. 4D. Multilayer Coatings for EUVL / Regina Soufli and Saša Bajt -- Overview and History of EUV Multilayer Coatings -- Choice of ML Materials and Wavelength Considerations -- Multilayer Deposition Technologies -- Theoretical design -- High Reflectivity, Low Stress, and Thermal Stability Considerations -- Optical Constants -- Multilayer Thickness Specifications for Imaging and Condenser EUVL Mirrors. 5. EUV Optical Testing / Kenneth A. Goldberg -- Introduction -- Target Accuracy -- Techniques for Angstrom-scale EUV Wavefront Measurement Accuracy -- Intercomparison -- Future Directions. 6A. Optics Contamination / Saša Bajt -- Introduction -- Fundamentals of Optics Contamination -- Optics Contamination Control -- Summary and Future Outlook. 6B. Grazing Angle Collector Contamination / Valentino Rigato -- Introduction -- Collector Lifetime Status and Challenges -- Summary. 6C. Normal Incidence (Multilayer) Collector Contamination / David N. Ruzic and Shailendra N. Srivastava -- Introduction -- Overview of Normal-Incidence Collector Mirrors -- Collector Performance -- Summary. 7. EUV Mask and Mask Metrology / Han-Ku Cho and Jinho Ahn -- Introduction -- EUV Mask Structure and Process Flow -- Mask Substrate -- Mask Blank Fabrication -- Absorber Stack and Backside Conductive Coating -- Mask Patterning -- Mask Cleaning -- Advanced Mask Structure -- Summary and Future Outlook. 8. Photoresists for Extreme Ultraviolet Lithography / Robert L. Brainard -- Introduction -- Earliest EUV Resist Imaging -- Absorption Coefficients of EUV Photoresists -- Multilayer Resists and Pattern Transfer -- Resist Types -- PAGs and Acids -- Line Edge Roughness -- Summary and Future Outlook. 9. High-Resolution EUV Imaging Tools for Resist Exposure and Aerial Image Monitoring / Malcolm Gower -- Introduction -- EUV Tool Design Considerations -- EUV Microstepper -- Reticle Imaging Microscope -- Summary and Future Outlook. 10. Fundamentals of the EUVL Scanner / Kazuya Ota -- Introduction -- Illumination Optics -- Projection Optics -- Stages -- Sensors -- Handling Systems -- Vacuum and Environment System -- Budgets -- Summary. 11. EUVL System Patterning Performance / Patrick Naulleau, John E. Bjorkholm, and Manish Chandhok -- Introduction: The Benefits of EUV Imaging -- Imaging with the 0.1-NA ETS Optic -- Imaging with the 0.3-NA MET Optic -- System Contributors to Line Edge Roughness -- Flare in EUVL Systems -- Summary. 12. Lithography Cost of Ownership / Phil Seidel -- Cost of Ownership Overview -- Lithography: Historical Cost and Price Trends -- Major Lithography CoO Parameter and Productivity Drivers -- General Observations on Lithography Cell and CoO Improvements (Past Decade) -- CoO Considerations for Future Lithography Technologies -- Summary -- Appendix: Example Case Studies of Lithography CoO Calculations. |
| Altri titoli varianti | Extreme ultraviolet lithography |
| Record Nr. | UNINA-9911004833203321 |
| Bellingham, Wash., : SPIE Press, : John Wiley & Sons, c2009 | ||
| Lo trovi qui: Univ. Federico II | ||
| ||