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1996 1st International Symposium on Plasma Process-Induced Damage : 13-14 May 1996, Santa Clara, California, USA
| 1996 1st International Symposium on Plasma Process-Induced Damage : 13-14 May 1996, Santa Clara, California, USA |
| Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1996 |
| Disciplina | 621.3815/2 |
| Soggetto topico |
Semiconductor wafers - Congresses
Semiconductors - Congresses - Effect of radiation on Plasma radiation - Congresses Electrical & Computer Engineering Electrical Engineering Engineering & Applied Sciences |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996206561303316 |
| [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1996 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
1996 1st International Symposium on Plasma Process-Induced Damage : 13-14 May 1996, Santa Clara, California, USA
| 1996 1st International Symposium on Plasma Process-Induced Damage : 13-14 May 1996, Santa Clara, California, USA |
| Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1996 |
| Disciplina | 621.3815/2 |
| Soggetto topico |
Semiconductor wafers
Semiconductors - Effect of radiation on Plasma radiation - Congresses Electrical & Computer Engineering Electrical Engineering Engineering & Applied Sciences |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910872918203321 |
| [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1996 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA
| 1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA |
| Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1997 |
| Disciplina | 621.3815/2 |
| Soggetto topico |
Semiconductor wafers - Defects
Semiconductors - Effect of radiation on Plasma etching - Congresses Electrical & Computer Engineering Electrical Engineering Engineering & Applied Sciences |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996206561003316 |
| [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1997 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA
| 1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA |
| Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1997 |
| Disciplina | 621.3815/2 |
| Soggetto topico |
Semiconductor wafers - Defects
Semiconductors - Effect of radiation on Plasma etching Electrical & Computer Engineering Electrical Engineering Engineering & Applied Sciences |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910872954903321 |
| [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1997 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA
| 1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA |
| Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998 |
| Disciplina | 621.3815/2 |
| Soggetto topico |
Semiconductor wafers - Defects
Semiconductors - Effect of radiation on Plasma etching Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996206560303316 |
| [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA
| 1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA |
| Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998 |
| Disciplina | 621.3815/2 |
| Soggetto topico |
Semiconductor wafers - Defects
Semiconductors - Effect of radiation on Plasma etching Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910872956003321 |
| [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
1999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA
| 1999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA |
| Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999 |
| Disciplina | 621.3815/2 |
| Soggetto topico |
Semiconductor wafers - Effect of radiation on
Semiconductors Plasma radiation Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996206560003316 |
| [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
1999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA
| 1999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA |
| Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999 |
| Disciplina | 621.3815/2 |
| Soggetto topico |
Semiconductor wafers - Effect of radiation on
Semiconductors Plasma radiation Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910872956903321 |
| [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
2000 5th International Symposium on Plasma Process-Induced Damage : May 22-24, 2000, Santa Clara, California, USA
| 2000 5th International Symposium on Plasma Process-Induced Damage : May 22-24, 2000, Santa Clara, California, USA |
| Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 2000 |
| Disciplina | 621.3815/2 |
| Soggetto topico |
Semiconductor wafers - Effect of radiation on
Semiconductors Plasma radiation Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996206559703316 |
| [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 2000 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
2000 5th International Symposium on Plasma Process-Induced Damage : May 22-24, 2000, Santa Clara, California, USA
| 2000 5th International Symposium on Plasma Process-Induced Damage : May 22-24, 2000, Santa Clara, California, USA |
| Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 2000 |
| Disciplina | 621.3815/2 |
| Soggetto topico |
Semiconductor wafers - Effect of radiation on
Semiconductors Plasma radiation Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910872957903321 |
| [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 2000 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
