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Growth kinetics of chemical compound layers [[electronic resource] /] / V.I. Dybkov
Growth kinetics of chemical compound layers [[electronic resource] /] / V.I. Dybkov
Autore Dybkov V. I (Vasiliĭ Ivanovich)
Pubbl/distr/stampa Cambridge, : Cambridge International Science, 2004
Descrizione fisica 1 online resource (201 p.)
Disciplina 541.394
Soggetto topico Chemical kinetics
Chemical engineering
Soggetto genere / forma Electronic books.
ISBN 1-280-50065-4
9786610500659
1-904602-84-3
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910450226003321
Dybkov V. I (Vasiliĭ Ivanovich)  
Cambridge, : Cambridge International Science, 2004
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Growth kinetics of chemical compound layers [[electronic resource] /] / V.I. Dybkov
Growth kinetics of chemical compound layers [[electronic resource] /] / V.I. Dybkov
Autore Dybkov V. I (Vasiliĭ Ivanovich)
Pubbl/distr/stampa Cambridge, : Cambridge International Science, 2004
Descrizione fisica 1 online resource (201 p.)
Disciplina 541.394
Soggetto topico Chemical kinetics
Chemical engineering
ISBN 1-280-50065-4
9786610500659
1-904602-84-3
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910783485803321
Dybkov V. I (Vasiliĭ Ivanovich)  
Cambridge, : Cambridge International Science, 2004
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Growth kinetics of chemical compound layers / / V.I. Dybkov
Growth kinetics of chemical compound layers / / V.I. Dybkov
Autore Dybkov V. I (Vasilii Ivanovich)
Pubbl/distr/stampa Cambridge, : Cambridge International Science, 2004
Descrizione fisica 1 online resource (201 p.)
Disciplina 541.394
Soggetto topico Chemical kinetics
Chemical engineering
ISBN 1-280-50065-4
9786610500659
1-904602-84-3
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Intro -- INTRODUCTORY REMARKS -- 1. SOLID-STATE GROWTH OF A CHEMICAL COMPOUND LAYER AT THE INTERFACE OF TWO ELEMENTARY SUBSTANCES -- 1.1 Special features of description of the kinetics of solid-state heterogeneous reactions -- 1.2 Reaction diffusion -- 1.3 Growth of the ApBq layer at the expense of diffusion of only component B -- 1.3.1 Critical thickness of the ApBq layer with regard to component B -- 1.3.2 Growth regime of the ApBq layer with regard to component B: Theoretical definition -- 1.3.3. Stationary state or stationary point? -- 1.4. Growth of the ApBq layer at the expense of diffusion of components A and B -- 1.4.1 Critical thickness and the growth regime of the ApBq layer with regard to component A -- 1.4.2 General kinetic equation: a single compound layer -- 1.4.3. Separate determination of the reaction diffusion constants -- 1.5. Linear growth of the Cu6Sn5 layer in the copper-tin reaction couple -- 1.6. Parabolic growth of the AlSb layer in the aluminium-antimony diffusion couple -- 1.7 Linear-parabolic growth of the chemical compound layer -- 1.8. The ratio of diffusion coefficients of a component in growing and nongrowing chemical compound layers -- 1.9 Growth of the layer of a single compound: Brief conclusions -- 2. GROWTH OF THE LAYERS OF TWO CHEMICAL COMPOUNDS BETWEEN ELEMENTARY SUBSTANCES -- 2.1. Chemical reactions at phase interfaces -- 2.2. A system of differential equations describing the formation rate of the layers of two chemical compounds -- 2.3. Initial linear growth of the ApBq and ArBs layers -- 2.4. Minimal thickness of the ArBs layer necessary for the ApBq layer to grow -- 2.5 Non-linear growth of the ApBq and ArBs layers -- 2.6 Effect of the critical thickness of the ApBq layer with regard to component A on the process of growth of the ArBs layer -- 2.7 'Paralinear' stage of growth of two compound layers.
2.8 Diffusional stage of growth of the ApBq and ArBs layers -- 2.9 Growth of the layers of two compounds: brief conclusions -- 3. GROWTH OF COMPOUND LAYERS IN A MULTIPHASE BINARY SYSTEM -- 3.1 Chemical reactions at the phase interfaces of a multiphase binary system -- 3.2 A system of differential equations describing the growth process of layers of three chemical compounds between elementary substances A and B -- 3.3 Initial linear growth of the layers -- 3.4 Transition from linear to non-linear kinetics -- 3.5 Critical values of the thickness of the layers and their effect on growth kinetics -- 3.6 Diffusional stage of formation of the layers -- 3.7 Sequence of formation of the layers of chemical compounds in the A-B reaction couple of a multiphase binary system -- 3.8 Multiphase growth of compound layers: brief conclusions -- 4. THE EFFECT OF COMPOSITIONS OF INITIAL PHASES ON THE GROWTH RATE OF A CHEMICAL COMPOUND LAYER -- 4.1 Growth of the ArBs layer at the A-B interface -- 4.2 Growth of the ArBs layer at the ApBq-B interface -- 4.2.1 Growth of the ArBs layer between ApBq and B at the expense of diffusion of only component A -- 4.2.2 Growth of the ArBs layer between ApBq and B at the expense of diffusion of both components -- 4.3 Growth of the ArBs layer at the ApBq - AlBn interface -- 4.4 Comparison of the growth rates of the ArBs layer in different reaction couples of the A - B multiphase system -- 4.5 Duplex structure of the ArBs layer -- 4.6 The effect of compositions of initial phases on the growth rate of a chemical compound layer: brief conclusions -- 5. THE EFFECT OF DISSOLUTION (EVAPORATION) ON THE GROWTH RATE OF A CHEMICAL COMPOUND LAYER -- 5.1 Main relationships governing dissolution of a solid in a liquid -- 5.2 Experimental investigation of the process of dissolution of a solid in a liquid.
5.2.1 Determination of saturation concentration -- 5.2.2 Determination of the dissolution rate constant -- 5.2.3 Determination of diffusion coefficients -- 5.3 Growth kinetics of the layer of a chemical compound under the conditions of its simultaneous dissolution in the liquid phase -- 5.4 Growth kinetics of intermetallic layers at the transition metal- liquid aluminium interface -- 5.5 Special features of kinetic dependences in the solid-gas system -- 5.5.1 Influence of evaporation on the growth of a chemical compound layer -- 5.5.2 Oxidation of chemical compounds -- 5.6 The effect of dissolution (evaporation) on the growth rate of a chemical compound layer: brief conclusions -- FINAL REMARKS -- REFERENCES -- Index.
Record Nr. UNINA-9910825283403321
Dybkov V. I (Vasilii Ivanovich)  
Cambridge, : Cambridge International Science, 2004
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Plasma torches [[electronic resource] ] : basic studies and design / / edited by O.P. Solonenko
Plasma torches [[electronic resource] ] : basic studies and design / / edited by O.P. Solonenko
Pubbl/distr/stampa Cambridge, : Cambridge International Science, 2000
Descrizione fisica 1 online resource (396 p.)
Disciplina 621.044
Altri autori (Persone) SolonenkoO. P
Collana Thermal plasma torches and technologies
Soggetto topico High temperature plasmas
Plasma engineering
Plasma jets
Soggetto genere / forma Electronic books.
ISBN 1-280-50066-2
9786610500666
1-4237-2422-4
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910450183803321
Cambridge, : Cambridge International Science, 2000
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Plasma torches [[electronic resource] ] : basic studies and design / / edited by O.P. Solonenko
Plasma torches [[electronic resource] ] : basic studies and design / / edited by O.P. Solonenko
Pubbl/distr/stampa Cambridge, : Cambridge International Science, 2000
Descrizione fisica 1 online resource (396 p.)
Disciplina 621.044
Altri autori (Persone) SolonenkoO. P
Collana Thermal plasma torches and technologies
Soggetto topico High temperature plasmas
Plasma engineering
Plasma jets
ISBN 1-280-50066-2
9786610500666
1-4237-2422-4
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910783478303321
Cambridge, : Cambridge International Science, 2000
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Plasma torches : basic studies and design / / edited by O.P. Solonenko
Plasma torches : basic studies and design / / edited by O.P. Solonenko
Pubbl/distr/stampa Cambridge, : Cambridge International Science, 2000
Descrizione fisica 1 online resource (396 p.)
Disciplina 621.044
Altri autori (Persone) SolonenkoO. P
Collana Thermal plasma torches and technologies
Soggetto topico High temperature plasmas
Plasma engineering
Plasma jets
ISBN 1-280-50066-2
9786610500666
1-4237-2422-4
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Intro -- Contents -- PREFACE -- Electric arc generators of thermal plasma: review -- Trends of thermal plasma technology -- Integrated analysis of induction plasma systems -- Plasma metallurgy: Current state, problems and prospects -- Atmosphere plasma spraying: Theory, modelling, diagnostics, computer-aided design and some applications -- Metallic and ceramic materials: Present and future -- Extreme technologies in building material production -- Achievements of plasma topography -- New vortex method of plasma insulation and the Ranque effect -- Physical phenomena in a hollow cathode and interaction of powder with the vacuum arc -- Experimental investigation of electric, energetic and optical characteristics of the induction transformer-type discharge -- Mathematical modelling of transformer discharge -- Integrated method of research of processes in thermal plasma generators -- Modelling of electric arc plasma -- On the problem of turbulent arc modelling -- Energy characteristics of electric arc heaters for tetrafluoromethane -- Numerical investigation of the characteristics of a steady curved arc in external fields -- Properties of water-stabilized plasma torches -- Modeling of a DC arc plasma torch with a hydrogen-argon mixture as the working gas -- The modified balance method of calculating characteristics of near-anode processes -- Application of heat diffusion theory in cold electrode erosion for nonstationary arc spots -- Emission current density and electronic work function of metal to plasma -- Erosion of multi-arc cathodes -- Influence of three-phase electric arcs, burning on oxide melts, on quality of electric power -- Modelling of flow stabilization by the swirl of a peripheral flow as applied to plasma reactors -- Low-density plasma jets: Production and investigation.
Effect of arc current modulation on thermal plasma flow in plasma torches.
Record Nr. UNINA-9910825280303321
Cambridge, : Cambridge International Science, 2000
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui