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Oxide ultrathin films [[electronic resource] ] : science and technology / / edited by Gianfranco Pacchioni and Sergio Valeri
| Oxide ultrathin films [[electronic resource] ] : science and technology / / edited by Gianfranco Pacchioni and Sergio Valeri |
| Pubbl/distr/stampa | Weinheim, Germany, : Wiley-VCH, c2012 |
| Descrizione fisica | 1 online resource (723 p.) |
| Disciplina | 621.38152 |
| Altri autori (Persone) |
PacchioniG <1954-> (Gianfranco)
ValeriSergio |
| Soggetto topico |
Thin films
Oxides |
| Soggetto genere / forma | Electronic books. |
| ISBN |
3-527-64018-5
3-527-64019-3 3-527-64017-7 |
| Classificazione |
530
540 UP 7560 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover; Contents; Title; Copyright; Preface; List of Contributors; Chapter 1: Synthesis and Preparation of Oxide Ultrathin Films; 1.1 Introduction; 1.2 Basic Aspects of Fabrication; 1.3 Physical Methods; 1.4 Chemical Methods; 1.5 Oxide Nanosheets and Buried Layers; 1.6 Conclusions and Perspectives; Chapter 2: Characterization Tools of Ultrathin Oxide Films; 2.1 Introduction; 2.2 Structure Determination Techniques; 2.3 Spectroscopic Techniques; 2.4 Summary; Chapter 3: Ordered Oxide Nanostructures on Metal Surfaces; 3.1 Introduction; 3.2 Fabrication of Oxide Nanostructures
3.3 Novel Structure Concepts3.4 Dimensionality Aspects: from Two- to One- to Zero-Dimensional Structures; 3.5 Transition from Two- to Three-Dimensional Structures: Growth of Bulk Structures out of Interfacial Layers; 3.6 Synopsis; Acknowledgment; Chapter 4: Unusual Properties of Oxides and Other Insulators in the Ultrathin Limit; 4.1 Introduction; 4.2 Evolution of Band Gap with Film Thickness; 4.3 Electronic Transport through Oxide Ultrathin Films; 4.4 Work Function Changes Induced by Oxide Films; 4.5 Nanoporosity: Oxide Films as Molecular and Atomic Sieves 4.6 Flexibility of Oxide Thin Films and Polaronic Distortion4.7 Conclusions; Acknowledgments; Chapter 5: Silica and High-k Dielectric Thin Films in Microelectronics; 5.1 Introduction; 5.2 Electrical Characterization of High-k Dielectrics on Silicon; 5.3 Theoretical Modeling of Gate Dielectric Films; 5.4 Models of the Structure and Properties of HfO2 Gate Dielectric Films; 5.5 Polycrystalline Gate Oxide Films; 5.6 Conclusions and Outlook; Acknowledgments; Chapter 6: Oxide Passive Films and Corrosion Protection; 6.1 Introduction; 6.2 Electrochemical Fundamentals of Passivation of Metals 6.3 Chemical Composition, Chemical States, and Thickness of Passive Films on Metals and Alloys6.4 Two-Dimensional Oxide Passive Films on Metals; 6.5 Growth and Nanostructure of Three-Dimensional Ultrathin Oxide Films; 6.6 Corrosion Modeling by DFT; 6.7 Conclusion; Chapter 7: Oxide Films as Catalytic Materials and Models of Real Catalysts; 7.1 Introduction; 7.2 Oxide Thin Films Grown as Supports; 7.3 Systems to Model Real Catalysts; 7.4 Ultrathin-Film Catalysts; 7.5 Synopsis; Acknowledgments; Chapter 8: Oxide Films in Spintronics; 8.1 Introduction; 8.2 Historical Notes 8.3 Half-Metallic Manganites: the Case of LSMO8.4 Electric Control of Magnetization in Oxide Heterostructures; 8.5 Conclusions and Perspectives; Acknowledgments; Chapter 9: Oxide Ultrathin Films for Solid Oxide Fuel Cells; 9.1 Overview of Solid Oxide Fuel Cell Technology; 9.2 Preparation of Oxide Ion Conductor Thin Films; 9.3 Nano Size Effects on Oxide Ion Conductor Films; 9.4 Power Generating Property of SOFCs using LaGaO3 Thin Films; 9.5 Development of μ-SOFCs; 9.6 Concluding Remarks; Chapter 10: Transparent Conducting and Chromogenic Oxide Films as Solar Energy Materials; 10.1 Introduction 10.2 Transparent Infrared Reflectors and Transparent Electrical Conductors |
| Record Nr. | UNINA-9910133837103321 |
| Weinheim, Germany, : Wiley-VCH, c2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Oxide ultrathin films [[electronic resource] ] : science and technology / / edited by Gianfranco Pacchioni and Sergio Valeri
| Oxide ultrathin films [[electronic resource] ] : science and technology / / edited by Gianfranco Pacchioni and Sergio Valeri |
| Pubbl/distr/stampa | Weinheim, Germany, : Wiley-VCH, c2012 |
| Descrizione fisica | 1 online resource (723 p.) |
| Disciplina | 621.38152 |
| Altri autori (Persone) |
PacchioniG <1954-> (Gianfranco)
ValeriSergio |
| Soggetto topico |
Thin films
Oxides |
| ISBN |
3-527-64018-5
3-527-64019-3 3-527-64017-7 |
| Classificazione |
530
540 UP 7560 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover; Contents; Title; Copyright; Preface; List of Contributors; Chapter 1: Synthesis and Preparation of Oxide Ultrathin Films; 1.1 Introduction; 1.2 Basic Aspects of Fabrication; 1.3 Physical Methods; 1.4 Chemical Methods; 1.5 Oxide Nanosheets and Buried Layers; 1.6 Conclusions and Perspectives; Chapter 2: Characterization Tools of Ultrathin Oxide Films; 2.1 Introduction; 2.2 Structure Determination Techniques; 2.3 Spectroscopic Techniques; 2.4 Summary; Chapter 3: Ordered Oxide Nanostructures on Metal Surfaces; 3.1 Introduction; 3.2 Fabrication of Oxide Nanostructures
3.3 Novel Structure Concepts3.4 Dimensionality Aspects: from Two- to One- to Zero-Dimensional Structures; 3.5 Transition from Two- to Three-Dimensional Structures: Growth of Bulk Structures out of Interfacial Layers; 3.6 Synopsis; Acknowledgment; Chapter 4: Unusual Properties of Oxides and Other Insulators in the Ultrathin Limit; 4.1 Introduction; 4.2 Evolution of Band Gap with Film Thickness; 4.3 Electronic Transport through Oxide Ultrathin Films; 4.4 Work Function Changes Induced by Oxide Films; 4.5 Nanoporosity: Oxide Films as Molecular and Atomic Sieves 4.6 Flexibility of Oxide Thin Films and Polaronic Distortion4.7 Conclusions; Acknowledgments; Chapter 5: Silica and High-k Dielectric Thin Films in Microelectronics; 5.1 Introduction; 5.2 Electrical Characterization of High-k Dielectrics on Silicon; 5.3 Theoretical Modeling of Gate Dielectric Films; 5.4 Models of the Structure and Properties of HfO2 Gate Dielectric Films; 5.5 Polycrystalline Gate Oxide Films; 5.6 Conclusions and Outlook; Acknowledgments; Chapter 6: Oxide Passive Films and Corrosion Protection; 6.1 Introduction; 6.2 Electrochemical Fundamentals of Passivation of Metals 6.3 Chemical Composition, Chemical States, and Thickness of Passive Films on Metals and Alloys6.4 Two-Dimensional Oxide Passive Films on Metals; 6.5 Growth and Nanostructure of Three-Dimensional Ultrathin Oxide Films; 6.6 Corrosion Modeling by DFT; 6.7 Conclusion; Chapter 7: Oxide Films as Catalytic Materials and Models of Real Catalysts; 7.1 Introduction; 7.2 Oxide Thin Films Grown as Supports; 7.3 Systems to Model Real Catalysts; 7.4 Ultrathin-Film Catalysts; 7.5 Synopsis; Acknowledgments; Chapter 8: Oxide Films in Spintronics; 8.1 Introduction; 8.2 Historical Notes 8.3 Half-Metallic Manganites: the Case of LSMO8.4 Electric Control of Magnetization in Oxide Heterostructures; 8.5 Conclusions and Perspectives; Acknowledgments; Chapter 9: Oxide Ultrathin Films for Solid Oxide Fuel Cells; 9.1 Overview of Solid Oxide Fuel Cell Technology; 9.2 Preparation of Oxide Ion Conductor Thin Films; 9.3 Nano Size Effects on Oxide Ion Conductor Films; 9.4 Power Generating Property of SOFCs using LaGaO3 Thin Films; 9.5 Development of μ-SOFCs; 9.6 Concluding Remarks; Chapter 10: Transparent Conducting and Chromogenic Oxide Films as Solar Energy Materials; 10.1 Introduction 10.2 Transparent Infrared Reflectors and Transparent Electrical Conductors |
| Record Nr. | UNINA-9910830891603321 |
| Weinheim, Germany, : Wiley-VCH, c2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Oxide ultrathin films : science and technology / / edited by Gianfranco Pacchioni and Sergio Valeri
| Oxide ultrathin films : science and technology / / edited by Gianfranco Pacchioni and Sergio Valeri |
| Pubbl/distr/stampa | Weinheim, Germany, : Wiley-VCH, c2012 |
| Descrizione fisica | 1 online resource (723 p.) |
| Disciplina | 621.38152 |
| Altri autori (Persone) |
PacchioniG <1954-> (Gianfranco)
ValeriSergio |
| Soggetto topico |
Thin films
Oxides |
| ISBN |
9783527640188
3527640185 9783527640195 3527640193 9783527640171 3527640177 |
| Classificazione |
530
540 UP 7560 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover; Contents; Title; Copyright; Preface; List of Contributors; Chapter 1: Synthesis and Preparation of Oxide Ultrathin Films; 1.1 Introduction; 1.2 Basic Aspects of Fabrication; 1.3 Physical Methods; 1.4 Chemical Methods; 1.5 Oxide Nanosheets and Buried Layers; 1.6 Conclusions and Perspectives; Chapter 2: Characterization Tools of Ultrathin Oxide Films; 2.1 Introduction; 2.2 Structure Determination Techniques; 2.3 Spectroscopic Techniques; 2.4 Summary; Chapter 3: Ordered Oxide Nanostructures on Metal Surfaces; 3.1 Introduction; 3.2 Fabrication of Oxide Nanostructures
3.3 Novel Structure Concepts3.4 Dimensionality Aspects: from Two- to One- to Zero-Dimensional Structures; 3.5 Transition from Two- to Three-Dimensional Structures: Growth of Bulk Structures out of Interfacial Layers; 3.6 Synopsis; Acknowledgment; Chapter 4: Unusual Properties of Oxides and Other Insulators in the Ultrathin Limit; 4.1 Introduction; 4.2 Evolution of Band Gap with Film Thickness; 4.3 Electronic Transport through Oxide Ultrathin Films; 4.4 Work Function Changes Induced by Oxide Films; 4.5 Nanoporosity: Oxide Films as Molecular and Atomic Sieves 4.6 Flexibility of Oxide Thin Films and Polaronic Distortion4.7 Conclusions; Acknowledgments; Chapter 5: Silica and High-k Dielectric Thin Films in Microelectronics; 5.1 Introduction; 5.2 Electrical Characterization of High-k Dielectrics on Silicon; 5.3 Theoretical Modeling of Gate Dielectric Films; 5.4 Models of the Structure and Properties of HfO2 Gate Dielectric Films; 5.5 Polycrystalline Gate Oxide Films; 5.6 Conclusions and Outlook; Acknowledgments; Chapter 6: Oxide Passive Films and Corrosion Protection; 6.1 Introduction; 6.2 Electrochemical Fundamentals of Passivation of Metals 6.3 Chemical Composition, Chemical States, and Thickness of Passive Films on Metals and Alloys6.4 Two-Dimensional Oxide Passive Films on Metals; 6.5 Growth and Nanostructure of Three-Dimensional Ultrathin Oxide Films; 6.6 Corrosion Modeling by DFT; 6.7 Conclusion; Chapter 7: Oxide Films as Catalytic Materials and Models of Real Catalysts; 7.1 Introduction; 7.2 Oxide Thin Films Grown as Supports; 7.3 Systems to Model Real Catalysts; 7.4 Ultrathin-Film Catalysts; 7.5 Synopsis; Acknowledgments; Chapter 8: Oxide Films in Spintronics; 8.1 Introduction; 8.2 Historical Notes 8.3 Half-Metallic Manganites: the Case of LSMO8.4 Electric Control of Magnetization in Oxide Heterostructures; 8.5 Conclusions and Perspectives; Acknowledgments; Chapter 9: Oxide Ultrathin Films for Solid Oxide Fuel Cells; 9.1 Overview of Solid Oxide Fuel Cell Technology; 9.2 Preparation of Oxide Ion Conductor Thin Films; 9.3 Nano Size Effects on Oxide Ion Conductor Films; 9.4 Power Generating Property of SOFCs using LaGaO3 Thin Films; 9.5 Development of μ-SOFCs; 9.6 Concluding Remarks; Chapter 10: Transparent Conducting and Chromogenic Oxide Films as Solar Energy Materials; 10.1 Introduction 10.2 Transparent Infrared Reflectors and Transparent Electrical Conductors |
| Record Nr. | UNINA-9911019813103321 |
| Weinheim, Germany, : Wiley-VCH, c2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||