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CVD of nonmetals / / edited by William S. Rees, Jr
| CVD of nonmetals / / edited by William S. Rees, Jr |
| Pubbl/distr/stampa | Weinheim, [Germany] : , : VCH, , 1996 |
| Descrizione fisica | 1 online resource (449 p.) |
| Disciplina |
620.44
671.735 |
| Soggetto topico |
Chemical vapor deposition
Nonmetals |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-281-84263-X
9786611842635 3-527-61481-8 3-527-61480-X |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
CVD of Nonmetals; Contents; 1 . Introduction; 1.1 Organization of the Book; 1.1.1 Scope of the Book; 1.1.2 Potential Audience; 1.1.3 Selection of Chapter Topics; 1.1.4 Chapter Organization; 1.1.4.1 Cross-References Between Chapters; 1.1.4.2 Where to Find a Topic; 1.2 Uses of Materials; 1.2.1 Electronic Applications; 1.2.1.1 Band Gap Classifications; 1.2.2 Optical Applications; 1.2.3 Structural Applications; 1.3 Comparison of Deposition Techniques; 1.3.1 Comparison of Chemical Vapor Deposition Sub-Techniques; 1.3.1.1 Organometallic Vapor Phase Epitaxy (OMVPE); 1.3.1.2 PlasmaCVD
1.3.1.3 PhotoCVD1.3.1.4 Pressure Modifications in CVD; 1.3.1.5 Spray Pyrolysis Modifications; 1.3.2 Comparison of Non-Chemical Vapor Deposition Technologies; 1.3.2.1 Molecular Beam Epitaxy (MBE); 1.3.2.2 Other Physical Vapor Deposition Techniques; 1.4 General Comments on CVD; 1.4.1 Reactor Types; 1.4.2 Important Reaction Locations in CVD Reactors; 1.5 Experimental Design; 1.5.1 System Configuration; 1.5.1.1 System Reactant Input; 1.5.1.2 Reaction Zones; 1.5.1.3 Reaction Co-Product Removal System; 1.5.2 Handling of Precursors; 1.5.3 Methods of Energy Input; 1.5.3.1 Thermal CVD 1.5.3.2 Alternate Modes1.5.4 Vapor Analysis in CVD; 1.6 Reaction Kinetics in CVD; 1.6.1 General Comments; 1.6.2 Vapor Phase Reactions; 1.6.3 Vapor-Solid Phase Reactions; 1.6.4 Solid Phase Reactions; 1.6.5 Control of Reaction Location; 1.6.6 Rate-Determining Steps in CVD; 1.6.7 Temperature and Growth Rate Effects; 1.7 Thermodynamics in CVD; 1.8 General Comments on Precursors; 1.8.1 Design Considerations; 1.8.2 Structural Motifs; 1.8.3 Mechanistic Insights; 1.9 References; 2 . Superconducting Materials; 2.1 Introduction; 2.2 Overview of Superconductivity 2.2.1 Physical Properties of Superconductors2.2.2 Low Temperature Superconducting Materials; 2.2.2.1 Crystal Structures of LTS Materials; 2.2.3 High Temperature Superconducting Materials; 2.2.3.1 Crystal Structure of HTS Materials; 2.2.4 Applications of Superconductors; 2.2.4.1 Large-Scale Applications of Superconducting Magnets; 2.2.4.2 Low-Field Applications of Superconductors; 2.2.4.3 Superconducting Electronics Applications; 2.3 CVD of LTS Materials; 2.3.1 Nb3Sn CVD Film Growth; 2.3.1.1 Nb3Sn CVD Precursors and Reaction Schemes; 2.3.1.2 Nb3Sn CVD Reactor Design 2.3.1.3 Substrates for Nb3Sn CVD2.3.1.4 Physical Properties of CVD-Derived Nb3Sn Films; 2.3.2 Nb3Ge CVD Film Growth; 2.3.2.1 Nb3Ge CVD Precursors and Reaction Schemes; 2.3.2.2 Nb3Ge CVD Reactor Design; 2.3.2.3 Physical Properties of CVD-Derived Nb3Ge Films; 2.3.2.4 Films Effects of Chemical Doping Upon Physical Properties of CVD-Derived Nb3Ge; 2.3.3 NbC1-y Ny CVD Film Growth; 2.3.3.1 NbC1-yNy CVD Precursors and Reaction Schemes; 2.3.3.2 Reactor Design for CVD of NbC1-y Ny on Carbon Fiber; 2.3.3.3 Physical Properties of CVD-Derived NbCI, Ny Films; 2.3.4 NbN CVD Film Growth 2.3.4.1 NbN CVD Precursors and Reaction Schemes |
| Record Nr. | UNINA-9910144714203321 |
| Weinheim, [Germany] : , : VCH, , 1996 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
CVD of nonmetals / / edited by William S. Rees, Jr
| CVD of nonmetals / / edited by William S. Rees, Jr |
| Pubbl/distr/stampa | Weinheim, [Germany] : , : VCH, , 1996 |
| Descrizione fisica | 1 online resource (449 p.) |
| Disciplina |
620.44
671.735 |
| Soggetto topico |
Chemical vapor deposition
Nonmetals |
| ISBN |
1-281-84263-X
9786611842635 3-527-61481-8 3-527-61480-X |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
CVD of Nonmetals; Contents; 1 . Introduction; 1.1 Organization of the Book; 1.1.1 Scope of the Book; 1.1.2 Potential Audience; 1.1.3 Selection of Chapter Topics; 1.1.4 Chapter Organization; 1.1.4.1 Cross-References Between Chapters; 1.1.4.2 Where to Find a Topic; 1.2 Uses of Materials; 1.2.1 Electronic Applications; 1.2.1.1 Band Gap Classifications; 1.2.2 Optical Applications; 1.2.3 Structural Applications; 1.3 Comparison of Deposition Techniques; 1.3.1 Comparison of Chemical Vapor Deposition Sub-Techniques; 1.3.1.1 Organometallic Vapor Phase Epitaxy (OMVPE); 1.3.1.2 PlasmaCVD
1.3.1.3 PhotoCVD1.3.1.4 Pressure Modifications in CVD; 1.3.1.5 Spray Pyrolysis Modifications; 1.3.2 Comparison of Non-Chemical Vapor Deposition Technologies; 1.3.2.1 Molecular Beam Epitaxy (MBE); 1.3.2.2 Other Physical Vapor Deposition Techniques; 1.4 General Comments on CVD; 1.4.1 Reactor Types; 1.4.2 Important Reaction Locations in CVD Reactors; 1.5 Experimental Design; 1.5.1 System Configuration; 1.5.1.1 System Reactant Input; 1.5.1.2 Reaction Zones; 1.5.1.3 Reaction Co-Product Removal System; 1.5.2 Handling of Precursors; 1.5.3 Methods of Energy Input; 1.5.3.1 Thermal CVD 1.5.3.2 Alternate Modes1.5.4 Vapor Analysis in CVD; 1.6 Reaction Kinetics in CVD; 1.6.1 General Comments; 1.6.2 Vapor Phase Reactions; 1.6.3 Vapor-Solid Phase Reactions; 1.6.4 Solid Phase Reactions; 1.6.5 Control of Reaction Location; 1.6.6 Rate-Determining Steps in CVD; 1.6.7 Temperature and Growth Rate Effects; 1.7 Thermodynamics in CVD; 1.8 General Comments on Precursors; 1.8.1 Design Considerations; 1.8.2 Structural Motifs; 1.8.3 Mechanistic Insights; 1.9 References; 2 . Superconducting Materials; 2.1 Introduction; 2.2 Overview of Superconductivity 2.2.1 Physical Properties of Superconductors2.2.2 Low Temperature Superconducting Materials; 2.2.2.1 Crystal Structures of LTS Materials; 2.2.3 High Temperature Superconducting Materials; 2.2.3.1 Crystal Structure of HTS Materials; 2.2.4 Applications of Superconductors; 2.2.4.1 Large-Scale Applications of Superconducting Magnets; 2.2.4.2 Low-Field Applications of Superconductors; 2.2.4.3 Superconducting Electronics Applications; 2.3 CVD of LTS Materials; 2.3.1 Nb3Sn CVD Film Growth; 2.3.1.1 Nb3Sn CVD Precursors and Reaction Schemes; 2.3.1.2 Nb3Sn CVD Reactor Design 2.3.1.3 Substrates for Nb3Sn CVD2.3.1.4 Physical Properties of CVD-Derived Nb3Sn Films; 2.3.2 Nb3Ge CVD Film Growth; 2.3.2.1 Nb3Ge CVD Precursors and Reaction Schemes; 2.3.2.2 Nb3Ge CVD Reactor Design; 2.3.2.3 Physical Properties of CVD-Derived Nb3Ge Films; 2.3.2.4 Films Effects of Chemical Doping Upon Physical Properties of CVD-Derived Nb3Ge; 2.3.3 NbC1-y Ny CVD Film Growth; 2.3.3.1 NbC1-yNy CVD Precursors and Reaction Schemes; 2.3.3.2 Reactor Design for CVD of NbC1-y Ny on Carbon Fiber; 2.3.3.3 Physical Properties of CVD-Derived NbCI, Ny Films; 2.3.4 NbN CVD Film Growth 2.3.4.1 NbN CVD Precursors and Reaction Schemes |
| Record Nr. | UNISA-996199391303316 |
| Weinheim, [Germany] : , : VCH, , 1996 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
CVD of nonmetals / / edited by William S. Rees, Jr
| CVD of nonmetals / / edited by William S. Rees, Jr |
| Pubbl/distr/stampa | Weinheim, [Germany] : , : VCH, , 1996 |
| Descrizione fisica | 1 online resource (449 p.) |
| Disciplina |
620.44
671.735 |
| Soggetto topico |
Chemical vapor deposition
Nonmetals |
| ISBN |
1-281-84263-X
9786611842635 3-527-61481-8 3-527-61480-X |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
CVD of Nonmetals; Contents; 1 . Introduction; 1.1 Organization of the Book; 1.1.1 Scope of the Book; 1.1.2 Potential Audience; 1.1.3 Selection of Chapter Topics; 1.1.4 Chapter Organization; 1.1.4.1 Cross-References Between Chapters; 1.1.4.2 Where to Find a Topic; 1.2 Uses of Materials; 1.2.1 Electronic Applications; 1.2.1.1 Band Gap Classifications; 1.2.2 Optical Applications; 1.2.3 Structural Applications; 1.3 Comparison of Deposition Techniques; 1.3.1 Comparison of Chemical Vapor Deposition Sub-Techniques; 1.3.1.1 Organometallic Vapor Phase Epitaxy (OMVPE); 1.3.1.2 PlasmaCVD
1.3.1.3 PhotoCVD1.3.1.4 Pressure Modifications in CVD; 1.3.1.5 Spray Pyrolysis Modifications; 1.3.2 Comparison of Non-Chemical Vapor Deposition Technologies; 1.3.2.1 Molecular Beam Epitaxy (MBE); 1.3.2.2 Other Physical Vapor Deposition Techniques; 1.4 General Comments on CVD; 1.4.1 Reactor Types; 1.4.2 Important Reaction Locations in CVD Reactors; 1.5 Experimental Design; 1.5.1 System Configuration; 1.5.1.1 System Reactant Input; 1.5.1.2 Reaction Zones; 1.5.1.3 Reaction Co-Product Removal System; 1.5.2 Handling of Precursors; 1.5.3 Methods of Energy Input; 1.5.3.1 Thermal CVD 1.5.3.2 Alternate Modes1.5.4 Vapor Analysis in CVD; 1.6 Reaction Kinetics in CVD; 1.6.1 General Comments; 1.6.2 Vapor Phase Reactions; 1.6.3 Vapor-Solid Phase Reactions; 1.6.4 Solid Phase Reactions; 1.6.5 Control of Reaction Location; 1.6.6 Rate-Determining Steps in CVD; 1.6.7 Temperature and Growth Rate Effects; 1.7 Thermodynamics in CVD; 1.8 General Comments on Precursors; 1.8.1 Design Considerations; 1.8.2 Structural Motifs; 1.8.3 Mechanistic Insights; 1.9 References; 2 . Superconducting Materials; 2.1 Introduction; 2.2 Overview of Superconductivity 2.2.1 Physical Properties of Superconductors2.2.2 Low Temperature Superconducting Materials; 2.2.2.1 Crystal Structures of LTS Materials; 2.2.3 High Temperature Superconducting Materials; 2.2.3.1 Crystal Structure of HTS Materials; 2.2.4 Applications of Superconductors; 2.2.4.1 Large-Scale Applications of Superconducting Magnets; 2.2.4.2 Low-Field Applications of Superconductors; 2.2.4.3 Superconducting Electronics Applications; 2.3 CVD of LTS Materials; 2.3.1 Nb3Sn CVD Film Growth; 2.3.1.1 Nb3Sn CVD Precursors and Reaction Schemes; 2.3.1.2 Nb3Sn CVD Reactor Design 2.3.1.3 Substrates for Nb3Sn CVD2.3.1.4 Physical Properties of CVD-Derived Nb3Sn Films; 2.3.2 Nb3Ge CVD Film Growth; 2.3.2.1 Nb3Ge CVD Precursors and Reaction Schemes; 2.3.2.2 Nb3Ge CVD Reactor Design; 2.3.2.3 Physical Properties of CVD-Derived Nb3Ge Films; 2.3.2.4 Films Effects of Chemical Doping Upon Physical Properties of CVD-Derived Nb3Ge; 2.3.3 NbC1-y Ny CVD Film Growth; 2.3.3.1 NbC1-yNy CVD Precursors and Reaction Schemes; 2.3.3.2 Reactor Design for CVD of NbC1-y Ny on Carbon Fiber; 2.3.3.3 Physical Properties of CVD-Derived NbCI, Ny Films; 2.3.4 NbN CVD Film Growth 2.3.4.1 NbN CVD Precursors and Reaction Schemes |
| Record Nr. | UNINA-9910829984003321 |
| Weinheim, [Germany] : , : VCH, , 1996 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Handbook of physical vapor deposition (PVD) processing [[electronic resource] /] / Donald M. Mattox
| Handbook of physical vapor deposition (PVD) processing [[electronic resource] /] / Donald M. Mattox |
| Autore | Mattox D. M |
| Edizione | [2nd ed.] |
| Pubbl/distr/stampa | Amsterdam, : Elsevier, 2010 |
| Descrizione fisica | 1 online resource (793 p.) |
| Disciplina | 671.735 |
| Soggetto topico | Physical vapor deposition |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-282-73769-4
9786612737695 0-8155-2038-7 0-08-094658-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Handbook of Physical Vapor Deposition (PVD) Processing; Copyright Page; Contents; Preface to First Edition; Preface to Second Edition; Acknowledgements; Acronyms; Biography; Chapter 1: Introduction; 1.1 Surface Engineering; 1.1.1 Physical Vapor Deposition (PVD) Processes; 1.1.2 Non-PVD Thin Film Atomistic Deposition Processes; 1.1.3 Applications of Vacuum-deposited Materials; 1.2 Thin Film Processing; 1.2.1 Stages of Fabrication; 1.2.2 Factors that Affect Film Properties; 1.2.3 Scale-Up and Manufacturability; 1.3 Process Documentation; 1.3.1 Process Specifications
1.3.2 Manufacturing Process Instructions (MPIs)1.3.3 Travelers; 1.3.4 Equipment and Calibration Logs; 1.3.5 Commercial/Military Standards and Specifications (Mil Specs); 1.4 Safety and Environmental Concerns; 1.5 Units; 1.5.1 Temperature Scales; 1.5.2 Energy Units; 1.5.3 Prefixes; 1.5.4 The Greek Alphabet; 1.6 Summary; Chapter 2: Substrate (""Real"") Surfaces and Surface Modification; 2.1 Introduction; 2.2 Materials and Fabrication; 2.2.1 Metals; 2.2.2 Ceramics and Glasses; 2.2.3 Polymers; 2.3 Atomic Structure and Atom-particle Interactions; 2.3.1 Atomic Structure and Nomenclature 2.3.2 Excitation and Atomic Transitions2.3.3 Chemical Bonding; 2.3.4 Probing and Detected Species; 2.4 Characterization of Surfaces and Near-surface Regions; 2.4.1 Elemental (Chemical) Compositional Analysis; 2.4.2 Phase Composition and Microstructure; 2.4.3 Molecular Composition and Chemical Bonding; 2.4.4 Surface Morphology; 2.4.5 Adsorption - Gases and Liquids; 2.4.6 Mechanical and Thermal Properties of Surfaces; 2.4.7 Surface Energy and Surface Tension; 2.4.8 Acidic and Basic Properties of Surfaces; 2.5 Bulk Properties; 2.5.1 Outgassing; 2.5.2 Outdiffusion 2.6 Modification of Substrate Surfaces2.6.1 Surface Morphology; 2.6.2 Surface Hardness; 2.6.3 Strengthening of Surfaces; 2.6.4 Surface Composition; 2.6.5 Surface ""Activation"" (""Functionalization""); 2.6.6 Surface ""Sensitization""; 2.7 Summary; Chapter 3: The ""Good"" Vacuum (Low Pressure) Processing Environment; 3.1 Introduction; 3.2 Gases and Vapors; 3.2.1 Gas Pressure and Partial Pressure; 3.2.2 Molecular Motion; 3.2.3 Gas Flow; 3.2.4 Ideal Gas Law; 3.2.5 Vapor Pressure and Condensation; 3.3 Gas-surface Interactions; 3.3.1 Residence Time; 3.3.2 Chemical Interactions 3.4 Vacuum Environment3.4.1 Origin of Gases and Vapors; 3.5 Vacuum Processing Systems; 3.5.1 System Design Considerations and ""Trade-Offs""; 3.5.2 Processing Chamber Configurations; 3.5.3 Equilibrium Conductance; 3.5.4 Pumping Speed and Mass Throughput; 3.5.5 Fixturing and Tooling; 3.5.6 Feedthroughs and Accessories; 3.5.7 Liners and Shields; 3.5.8 Fail-Safe Designs; 3.6 Vacuum pumping; 3.6.1 Mechanical Pumps; 3.6.2 Momentum Transfer Pumps; 3.6.3 Capture Pumps; 3.6.4 Hybrid Pumps; 3.7 Vacuum- and Plasma-Compatible Materials; 3.7.1 Metals; 3.7.2 Ceramic and Glass Materials; 3.7.3 Polymers 3.8 Assembly |
| Record Nr. | UNINA-9910456393403321 |
Mattox D. M
|
||
| Amsterdam, : Elsevier, 2010 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Handbook of physical vapor deposition (PVD) processing [[electronic resource] /] / Donald M. Mattox
| Handbook of physical vapor deposition (PVD) processing [[electronic resource] /] / Donald M. Mattox |
| Autore | Mattox D. M |
| Edizione | [2nd ed.] |
| Pubbl/distr/stampa | Amsterdam, : Elsevier, 2010 |
| Descrizione fisica | 1 online resource (793 p.) |
| Disciplina | 671.735 |
| Soggetto topico | Physical vapor deposition |
| ISBN |
1-282-73769-4
9786612737695 0-8155-2038-7 0-08-094658-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Handbook of Physical Vapor Deposition (PVD) Processing; Copyright Page; Contents; Preface to First Edition; Preface to Second Edition; Acknowledgements; Acronyms; Biography; Chapter 1: Introduction; 1.1 Surface Engineering; 1.1.1 Physical Vapor Deposition (PVD) Processes; 1.1.2 Non-PVD Thin Film Atomistic Deposition Processes; 1.1.3 Applications of Vacuum-deposited Materials; 1.2 Thin Film Processing; 1.2.1 Stages of Fabrication; 1.2.2 Factors that Affect Film Properties; 1.2.3 Scale-Up and Manufacturability; 1.3 Process Documentation; 1.3.1 Process Specifications
1.3.2 Manufacturing Process Instructions (MPIs)1.3.3 Travelers; 1.3.4 Equipment and Calibration Logs; 1.3.5 Commercial/Military Standards and Specifications (Mil Specs); 1.4 Safety and Environmental Concerns; 1.5 Units; 1.5.1 Temperature Scales; 1.5.2 Energy Units; 1.5.3 Prefixes; 1.5.4 The Greek Alphabet; 1.6 Summary; Chapter 2: Substrate (""Real"") Surfaces and Surface Modification; 2.1 Introduction; 2.2 Materials and Fabrication; 2.2.1 Metals; 2.2.2 Ceramics and Glasses; 2.2.3 Polymers; 2.3 Atomic Structure and Atom-particle Interactions; 2.3.1 Atomic Structure and Nomenclature 2.3.2 Excitation and Atomic Transitions2.3.3 Chemical Bonding; 2.3.4 Probing and Detected Species; 2.4 Characterization of Surfaces and Near-surface Regions; 2.4.1 Elemental (Chemical) Compositional Analysis; 2.4.2 Phase Composition and Microstructure; 2.4.3 Molecular Composition and Chemical Bonding; 2.4.4 Surface Morphology; 2.4.5 Adsorption - Gases and Liquids; 2.4.6 Mechanical and Thermal Properties of Surfaces; 2.4.7 Surface Energy and Surface Tension; 2.4.8 Acidic and Basic Properties of Surfaces; 2.5 Bulk Properties; 2.5.1 Outgassing; 2.5.2 Outdiffusion 2.6 Modification of Substrate Surfaces2.6.1 Surface Morphology; 2.6.2 Surface Hardness; 2.6.3 Strengthening of Surfaces; 2.6.4 Surface Composition; 2.6.5 Surface ""Activation"" (""Functionalization""); 2.6.6 Surface ""Sensitization""; 2.7 Summary; Chapter 3: The ""Good"" Vacuum (Low Pressure) Processing Environment; 3.1 Introduction; 3.2 Gases and Vapors; 3.2.1 Gas Pressure and Partial Pressure; 3.2.2 Molecular Motion; 3.2.3 Gas Flow; 3.2.4 Ideal Gas Law; 3.2.5 Vapor Pressure and Condensation; 3.3 Gas-surface Interactions; 3.3.1 Residence Time; 3.3.2 Chemical Interactions 3.4 Vacuum Environment3.4.1 Origin of Gases and Vapors; 3.5 Vacuum Processing Systems; 3.5.1 System Design Considerations and ""Trade-Offs""; 3.5.2 Processing Chamber Configurations; 3.5.3 Equilibrium Conductance; 3.5.4 Pumping Speed and Mass Throughput; 3.5.5 Fixturing and Tooling; 3.5.6 Feedthroughs and Accessories; 3.5.7 Liners and Shields; 3.5.8 Fail-Safe Designs; 3.6 Vacuum pumping; 3.6.1 Mechanical Pumps; 3.6.2 Momentum Transfer Pumps; 3.6.3 Capture Pumps; 3.6.4 Hybrid Pumps; 3.7 Vacuum- and Plasma-Compatible Materials; 3.7.1 Metals; 3.7.2 Ceramic and Glass Materials; 3.7.3 Polymers 3.8 Assembly |
| Record Nr. | UNINA-9910781160803321 |
|
Mattox D. M
|
||
| Amsterdam, : Elsevier, 2010 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Handbook of physical vapor deposition (PVD) processing [[electronic resource] /] / Donald M. Mattox
| Handbook of physical vapor deposition (PVD) processing [[electronic resource] /] / Donald M. Mattox |
| Autore | Mattox D. M |
| Edizione | [2nd ed.] |
| Pubbl/distr/stampa | Amsterdam, : Elsevier, 2010 |
| Descrizione fisica | 1 online resource (793 p.) |
| Disciplina | 671.735 |
| Soggetto topico | Physical vapor deposition |
| ISBN |
1-282-73769-4
9786612737695 0-8155-2038-7 0-08-094658-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Handbook of Physical Vapor Deposition (PVD) Processing; Copyright Page; Contents; Preface to First Edition; Preface to Second Edition; Acknowledgements; Acronyms; Biography; Chapter 1: Introduction; 1.1 Surface Engineering; 1.1.1 Physical Vapor Deposition (PVD) Processes; 1.1.2 Non-PVD Thin Film Atomistic Deposition Processes; 1.1.3 Applications of Vacuum-deposited Materials; 1.2 Thin Film Processing; 1.2.1 Stages of Fabrication; 1.2.2 Factors that Affect Film Properties; 1.2.3 Scale-Up and Manufacturability; 1.3 Process Documentation; 1.3.1 Process Specifications
1.3.2 Manufacturing Process Instructions (MPIs)1.3.3 Travelers; 1.3.4 Equipment and Calibration Logs; 1.3.5 Commercial/Military Standards and Specifications (Mil Specs); 1.4 Safety and Environmental Concerns; 1.5 Units; 1.5.1 Temperature Scales; 1.5.2 Energy Units; 1.5.3 Prefixes; 1.5.4 The Greek Alphabet; 1.6 Summary; Chapter 2: Substrate (""Real"") Surfaces and Surface Modification; 2.1 Introduction; 2.2 Materials and Fabrication; 2.2.1 Metals; 2.2.2 Ceramics and Glasses; 2.2.3 Polymers; 2.3 Atomic Structure and Atom-particle Interactions; 2.3.1 Atomic Structure and Nomenclature 2.3.2 Excitation and Atomic Transitions2.3.3 Chemical Bonding; 2.3.4 Probing and Detected Species; 2.4 Characterization of Surfaces and Near-surface Regions; 2.4.1 Elemental (Chemical) Compositional Analysis; 2.4.2 Phase Composition and Microstructure; 2.4.3 Molecular Composition and Chemical Bonding; 2.4.4 Surface Morphology; 2.4.5 Adsorption - Gases and Liquids; 2.4.6 Mechanical and Thermal Properties of Surfaces; 2.4.7 Surface Energy and Surface Tension; 2.4.8 Acidic and Basic Properties of Surfaces; 2.5 Bulk Properties; 2.5.1 Outgassing; 2.5.2 Outdiffusion 2.6 Modification of Substrate Surfaces2.6.1 Surface Morphology; 2.6.2 Surface Hardness; 2.6.3 Strengthening of Surfaces; 2.6.4 Surface Composition; 2.6.5 Surface ""Activation"" (""Functionalization""); 2.6.6 Surface ""Sensitization""; 2.7 Summary; Chapter 3: The ""Good"" Vacuum (Low Pressure) Processing Environment; 3.1 Introduction; 3.2 Gases and Vapors; 3.2.1 Gas Pressure and Partial Pressure; 3.2.2 Molecular Motion; 3.2.3 Gas Flow; 3.2.4 Ideal Gas Law; 3.2.5 Vapor Pressure and Condensation; 3.3 Gas-surface Interactions; 3.3.1 Residence Time; 3.3.2 Chemical Interactions 3.4 Vacuum Environment3.4.1 Origin of Gases and Vapors; 3.5 Vacuum Processing Systems; 3.5.1 System Design Considerations and ""Trade-Offs""; 3.5.2 Processing Chamber Configurations; 3.5.3 Equilibrium Conductance; 3.5.4 Pumping Speed and Mass Throughput; 3.5.5 Fixturing and Tooling; 3.5.6 Feedthroughs and Accessories; 3.5.7 Liners and Shields; 3.5.8 Fail-Safe Designs; 3.6 Vacuum pumping; 3.6.1 Mechanical Pumps; 3.6.2 Momentum Transfer Pumps; 3.6.3 Capture Pumps; 3.6.4 Hybrid Pumps; 3.7 Vacuum- and Plasma-Compatible Materials; 3.7.1 Metals; 3.7.2 Ceramic and Glass Materials; 3.7.3 Polymers 3.8 Assembly |
| Record Nr. | UNINA-9910820543403321 |
|
Mattox D. M
|
||
| Amsterdam, : Elsevier, 2010 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||