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Dusty plasmas : physics, chemistry, and technological impacts in plasma processing / edited by André Bouchoule
Dusty plasmas : physics, chemistry, and technological impacts in plasma processing / edited by André Bouchoule
Autore Bouchoule, André
Pubbl/distr/stampa Chichester, England ; New York : John Wiley & Sons, c1999
Descrizione fisica viii, 408 p. : ill. ; 24 cm.
Disciplina 53.6.5
660.044
TA2020
Soggetto topico Dusty plasmas
Plasma chemistry
Plasma engineering
Plasma enhanced chemical vapor deposition
Plasma (Ionized gases)-Industrial applications
ISBN 0471973866
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNISALENTO-991003071579707536
Bouchoule, André  
Chichester, England ; New York : John Wiley & Sons, c1999
Materiale a stampa
Lo trovi qui: Univ. del Salento
Opac: Controlla la disponibilità qui
Industrial Plasma Technology: Applications from Environmental to Energy Technologies
Industrial Plasma Technology: Applications from Environmental to Energy Technologies
Autore Kawai Yoshinobu
Pubbl/distr/stampa [Place of publication not identified], : Wiley VCH Imprint, 2010
Disciplina 660.044
Soggetto topico Engineering & Applied Sciences
Applied Physics
ISBN 3-527-62974-2
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Introduction to Plasmas -- Environmental Application of Nonthermal Plasma -- Atmospheric Plasma Air Pollution Control, Solid Waste, and Water Treatment Technologies: Fundamental and Overview -- Optical Diagnostics for High-Pressure Nonthermal Plasma Analysis -- Laser Investigations of Flow Patterns in Electrostatic Precipitators and Nonthermal Plasma Reactors -- Water Plasmas for Environmental Application -- Chemistry of Organic Pollutants in Atmospheric Plasmas -- Generation and Application of Wide Area Plasma -- Nonthermal Plasma-Based System for Exhaust Treatment Under Reduced Atmosphere of Pyrolysis Gases -- Pharmaceutical and Biomedical Engineering By Plasma Techniques -- Targeting Dendritic Cells With Carbon Magnetic Nanoparticles Made By Dense-Medium Plasma Technology -- Applications of Pulsed Power and Plasmas To Biosystems and Living Organisms -- Applications of Plasma Polymerization in Biomaterials -- Plasma Sterilization At Normal Atmospheric Pressure -- Elimination of Pathogenic Biological Residuals By Means of Low-Pressure Inductively Coupled Plasma Discharge -- Sterilization and Protein Treatment Using Oxygen Radicals Produced By Rf Discharge -- Hydrophilicity and Bioactivity of A Polyethylene Terephthalate Surface Modified By Plasma-Initiated Graft Polymerization -- Strategies and Issues on the Plasma Processing of Thin-Film Silicon Solar Cells -- Characteristics of Vhf Plasma With Large Area -- Deposition of A-Si : H Films With High Stability Against Light Exposure By Reducing Deposition of Nanoparticles Formed in Sih4 Discharges -- Diagnostics and Modeling of Sih4 /H2 Plasmas for the Deposition of Microcrystalline Silicon: the Case of Dual-Frequency Sources -- Introduction To Diamond-Like Carbons -- Diamond-Like Carbon for Applications -- Applications of Dlcs To Bioprocessing -- Plasma Processing of Nanocrystalline Semiconductive Cubic Boron Nitride Thin Films -- Fundamentals on Tribology of Plasma-Deposited Diamond-Like Carbon Films -- Diamond-Like Carbon Thin Films Grown in Pulsed-Dc Plasmas -- Plasma Deposition of N-Tio2 Thin Films -- Investigation of Dlc and Multilayer Coatings Hydrophobic Character for Biomedical Applications -- Creation of Novel Electromagnetic and Reactive Media From Microplasmas -- Nanoblock Assembly Using Pulse Rf Discharges With Amplitude Modulation -- Thomson Scattering Diagnostics of Discharge Plasmas -- Crystallized Nanodust Particles Growth in Low-Pressure Cold Plasmas -- Collection and Removal of Fine Particles in Plasma Chambers.
Record Nr. UNINA-9910830792503321
Kawai Yoshinobu  
[Place of publication not identified], : Wiley VCH Imprint, 2010
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Industrial Plasma Technology: Applications from Environmental to Energy Technologies
Industrial Plasma Technology: Applications from Environmental to Energy Technologies
Autore Kawai Yoshinobu
Pubbl/distr/stampa [Place of publication not identified], : Wiley VCH Imprint, 2010
Disciplina 660.044
Soggetto topico Engineering & Applied Sciences
Applied Physics
ISBN 3-527-62974-2
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Introduction to Plasmas -- Environmental Application of Nonthermal Plasma -- Atmospheric Plasma Air Pollution Control, Solid Waste, and Water Treatment Technologies: Fundamental and Overview -- Optical Diagnostics for High-Pressure Nonthermal Plasma Analysis -- Laser Investigations of Flow Patterns in Electrostatic Precipitators and Nonthermal Plasma Reactors -- Water Plasmas for Environmental Application -- Chemistry of Organic Pollutants in Atmospheric Plasmas -- Generation and Application of Wide Area Plasma -- Nonthermal Plasma-Based System for Exhaust Treatment Under Reduced Atmosphere of Pyrolysis Gases -- Pharmaceutical and Biomedical Engineering By Plasma Techniques -- Targeting Dendritic Cells With Carbon Magnetic Nanoparticles Made By Dense-Medium Plasma Technology -- Applications of Pulsed Power and Plasmas To Biosystems and Living Organisms -- Applications of Plasma Polymerization in Biomaterials -- Plasma Sterilization At Normal Atmospheric Pressure -- Elimination of Pathogenic Biological Residuals By Means of Low-Pressure Inductively Coupled Plasma Discharge -- Sterilization and Protein Treatment Using Oxygen Radicals Produced By Rf Discharge -- Hydrophilicity and Bioactivity of A Polyethylene Terephthalate Surface Modified By Plasma-Initiated Graft Polymerization -- Strategies and Issues on the Plasma Processing of Thin-Film Silicon Solar Cells -- Characteristics of Vhf Plasma With Large Area -- Deposition of A-Si : H Films With High Stability Against Light Exposure By Reducing Deposition of Nanoparticles Formed in Sih4 Discharges -- Diagnostics and Modeling of Sih4 /H2 Plasmas for the Deposition of Microcrystalline Silicon: the Case of Dual-Frequency Sources -- Introduction To Diamond-Like Carbons -- Diamond-Like Carbon for Applications -- Applications of Dlcs To Bioprocessing -- Plasma Processing of Nanocrystalline Semiconductive Cubic Boron Nitride Thin Films -- Fundamentals on Tribology of Plasma-Deposited Diamond-Like Carbon Films -- Diamond-Like Carbon Thin Films Grown in Pulsed-Dc Plasmas -- Plasma Deposition of N-Tio2 Thin Films -- Investigation of Dlc and Multilayer Coatings Hydrophobic Character for Biomedical Applications -- Creation of Novel Electromagnetic and Reactive Media From Microplasmas -- Nanoblock Assembly Using Pulse Rf Discharges With Amplitude Modulation -- Thomson Scattering Diagnostics of Discharge Plasmas -- Crystallized Nanodust Particles Growth in Low-Pressure Cold Plasmas -- Collection and Removal of Fine Particles in Plasma Chambers.
Record Nr. UNINA-9911019967003321
Kawai Yoshinobu  
[Place of publication not identified], : Wiley VCH Imprint, 2010
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Introduction to plasma technology [[electronic resource] ] : science, engineering and applications / / John Harry
Introduction to plasma technology [[electronic resource] ] : science, engineering and applications / / John Harry
Autore Harry John
Pubbl/distr/stampa Weinheim, Germany, : Wiley-VCH, 2010
Descrizione fisica 1 online resource (234 p.)
Disciplina 530.44
660.044
Soggetto topico Plasma engineering
Plasma chemistry
Soggetto genere / forma Electronic books.
ISBN 3-527-64370-2
1-283-30238-1
9786613302380
3-527-63217-4
3-527-63216-6
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Introduction to Plasma Technology: Science, Engineering and Applications; Contents; Preface; Symbols, Constants and Electronic Symbols; 1 Plasma, an Overview; 1.1 Introduction; 1.2 Plasma; 1.2.1 Space Plasmas; 1.2.2 Kinetic Plasmas; 1.2.3 Technological Plasmas; 1.3 Classical Models; 1.3.1 Simple Ballistic and Statistical Models; 1.3.2 Statistical Behaviour; 1.3.3 Collisions Between Particles; 1.3.4 Coulomb Forces; 1.3.5 Boundaries and Sheaths; 1.3.6 Degree of Ionization; 1.4 Plasma Resonance; 1.5 The Defining Characteristics of a Plasma; References; Further Reading
2 Elastic and Inelastic Collision Processes in Weakly Ionized Gases2.1 Introduction; 2.2 The Drift Velocity; 2.2.1 Electrical Conductivity; 2.2.2 Mobility; 2.2.3 Thermal Velocity; 2.2.4 Collision Frequency; 2.2.5 Collision Cross-section; 2.3 Inelastic Collision Processes; 2.3.1 Excitation; 2.3.1.1 Metastable Processes; 2.3.2 Ionization and Recombination Processes; 2.3.2.1 Charge Transfer; 2.3.2.2 Dissociation; 2.3.2.3 Negative Ionization; 2.3.2.4 Recombination; 2.3.2.5 Metastable Ionization; References; 3 The Interaction of Electromagnetic Fields with Plasmas; 3.1 Introduction
3.2 The Behaviour of Plasmas at DC and Low Frequencies in the Near Field3.2.1 Charged Particles in Electromagnetic Fields; 3.2.1.1 Behaviour of a Charged Particle in an Oscillating Electric Field; 3.2.1.2 Plasma Frequency; 3.2.1.3 The Debye Radius; 3.3 Behaviour of Charged Particles in Magnetic Fields (Magnetized Plasmas); 3.4 Initiation of an Electrical Discharge or Plasma; 3.5 Similarity Conditions; References; Further Reading; 4 Coupling Processes; 4.1 Introduction; 4.2 Direct Coupling; 4.2.1 The Cathode; 4.2.1.1 Emission Processes; 4.2.2 The Cathode Fall Region; 4.2.3 The Anode
4.2.4 The Discharge Column4.2.5 Interaction of Magnetic Fields with a Discharge or Plasma; 4.3 Indirect Coupling; 4.3.1 Induction Coupling; 4.3.2 Capacitive Coupling; 4.3.3 Propagation of an Electromagnetic Wave; 4.3.4 The Helical Resonator; 4.3.5 Microwave Waveguides; 4.3.6 Electron Cyclotron Resonance; 4.3.7 The Helicon Plasma Source; References; Further Reading; 5 Applications of Nonequilibrium Cold Low-pressure Discharges and Plasmas; 5.1 Introduction; 5.2 Plasma Processes Used in Electronics Fabrication; 5.2.1 The Glow Discharge Diode; 5.2.2 The Magnetron
5.2.3 Inductively Coupled Plasmas5.2.4 Electron Cyclotron Resonance Reactor; 5.2.5 The Helical Reactor; 5.2.6 The Helicon Reactor; 5.3 Low-pressure Electric Discharge and Plasma Lamps; 5.3.1 The Low-pressure Mercury Vapour Lamp; 5.3.2 Cold Cathode Low-pressure Lamps; 5.3.3 Electrodeless Low-pressure Discharge Lamps; 5.4 Gas Lasers; 5.5 Free Electron and Ion Beams; 5.5.1 Electron and Ion Beam Evaporation; 5.5.2 Ion Beam Processes; 5.5.3 High-power Electron Beams; 5.6 Glow Discharge Surface Treatment; 5.7 Propulsion in Space; References; Further Reading
6 Nonequilibrium Atmospheric Pressure Discharges and Plasmas
Record Nr. UNINA-9910139422103321
Harry John  
Weinheim, Germany, : Wiley-VCH, 2010
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Introduction to plasma technology : science, engineering and applications / / John Harry
Introduction to plasma technology : science, engineering and applications / / John Harry
Autore Harry John
Pubbl/distr/stampa Weinheim, Germany, : Wiley-VCH, 2010
Descrizione fisica 1 online resource (234 p.)
Disciplina 530.44
660.044
Soggetto topico Plasma engineering
Plasma chemistry
ISBN 9786613302380
9783527643707
3527643702
9781283302388
1283302381
9783527632176
3527632174
9783527632169
3527632166
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Introduction to Plasma Technology: Science, Engineering and Applications; Contents; Preface; Symbols, Constants and Electronic Symbols; 1 Plasma, an Overview; 1.1 Introduction; 1.2 Plasma; 1.2.1 Space Plasmas; 1.2.2 Kinetic Plasmas; 1.2.3 Technological Plasmas; 1.3 Classical Models; 1.3.1 Simple Ballistic and Statistical Models; 1.3.2 Statistical Behaviour; 1.3.3 Collisions Between Particles; 1.3.4 Coulomb Forces; 1.3.5 Boundaries and Sheaths; 1.3.6 Degree of Ionization; 1.4 Plasma Resonance; 1.5 The Defining Characteristics of a Plasma; References; Further Reading
2 Elastic and Inelastic Collision Processes in Weakly Ionized Gases2.1 Introduction; 2.2 The Drift Velocity; 2.2.1 Electrical Conductivity; 2.2.2 Mobility; 2.2.3 Thermal Velocity; 2.2.4 Collision Frequency; 2.2.5 Collision Cross-section; 2.3 Inelastic Collision Processes; 2.3.1 Excitation; 2.3.1.1 Metastable Processes; 2.3.2 Ionization and Recombination Processes; 2.3.2.1 Charge Transfer; 2.3.2.2 Dissociation; 2.3.2.3 Negative Ionization; 2.3.2.4 Recombination; 2.3.2.5 Metastable Ionization; References; 3 The Interaction of Electromagnetic Fields with Plasmas; 3.1 Introduction
3.2 The Behaviour of Plasmas at DC and Low Frequencies in the Near Field3.2.1 Charged Particles in Electromagnetic Fields; 3.2.1.1 Behaviour of a Charged Particle in an Oscillating Electric Field; 3.2.1.2 Plasma Frequency; 3.2.1.3 The Debye Radius; 3.3 Behaviour of Charged Particles in Magnetic Fields (Magnetized Plasmas); 3.4 Initiation of an Electrical Discharge or Plasma; 3.5 Similarity Conditions; References; Further Reading; 4 Coupling Processes; 4.1 Introduction; 4.2 Direct Coupling; 4.2.1 The Cathode; 4.2.1.1 Emission Processes; 4.2.2 The Cathode Fall Region; 4.2.3 The Anode
4.2.4 The Discharge Column4.2.5 Interaction of Magnetic Fields with a Discharge or Plasma; 4.3 Indirect Coupling; 4.3.1 Induction Coupling; 4.3.2 Capacitive Coupling; 4.3.3 Propagation of an Electromagnetic Wave; 4.3.4 The Helical Resonator; 4.3.5 Microwave Waveguides; 4.3.6 Electron Cyclotron Resonance; 4.3.7 The Helicon Plasma Source; References; Further Reading; 5 Applications of Nonequilibrium Cold Low-pressure Discharges and Plasmas; 5.1 Introduction; 5.2 Plasma Processes Used in Electronics Fabrication; 5.2.1 The Glow Discharge Diode; 5.2.2 The Magnetron
5.2.3 Inductively Coupled Plasmas5.2.4 Electron Cyclotron Resonance Reactor; 5.2.5 The Helical Reactor; 5.2.6 The Helicon Reactor; 5.3 Low-pressure Electric Discharge and Plasma Lamps; 5.3.1 The Low-pressure Mercury Vapour Lamp; 5.3.2 Cold Cathode Low-pressure Lamps; 5.3.3 Electrodeless Low-pressure Discharge Lamps; 5.4 Gas Lasers; 5.5 Free Electron and Ion Beams; 5.5.1 Electron and Ion Beam Evaporation; 5.5.2 Ion Beam Processes; 5.5.3 High-power Electron Beams; 5.6 Glow Discharge Surface Treatment; 5.7 Propulsion in Space; References; Further Reading
6 Nonequilibrium Atmospheric Pressure Discharges and Plasmas
Record Nr. UNINA-9911019234003321
Harry John  
Weinheim, Germany, : Wiley-VCH, 2010
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Microwave plasma sources and methods in processing technology / / Ladislav Bardos, Hana Barankova, Uppsala University, Uppsala, Sweden
Microwave plasma sources and methods in processing technology / / Ladislav Bardos, Hana Barankova, Uppsala University, Uppsala, Sweden
Autore Bardos Ladislav <1947->
Pubbl/distr/stampa Hoboken, New Jersey : , : John Wiley & Sons, , [2022]
Descrizione fisica 1 online resource (262 pages)
Disciplina 660.044
Soggetto topico Electromagnetism
ISBN 1-119-82688-8
1-119-82690-X
1-119-82689-6
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910554862703321
Bardos Ladislav <1947->  
Hoboken, New Jersey : , : John Wiley & Sons, , [2022]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Microwave plasma sources and methods in processing technology / / Ladislav Bardos, Hana Barankova, Uppsala University, Uppsala, Sweden
Microwave plasma sources and methods in processing technology / / Ladislav Bardos, Hana Barankova, Uppsala University, Uppsala, Sweden
Autore Bardos Ladislav <1947->
Pubbl/distr/stampa Hoboken, New Jersey : , : John Wiley & Sons, , [2022]
Descrizione fisica 1 online resource (262 pages)
Disciplina 660.044
Soggetto topico Electromagnetism
ISBN 1-119-82688-8
1-119-82690-X
1-119-82689-6
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910830188903321
Bardos Ladislav <1947->  
Hoboken, New Jersey : , : John Wiley & Sons, , [2022]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
A novel green treatment for textiles : plasma treatment as a sustainable technology / / Chi-wai Kan
A novel green treatment for textiles : plasma treatment as a sustainable technology / / Chi-wai Kan
Autore Kan Chi-wai
Pubbl/distr/stampa Boca Raton : , : CRC Press, , [2015]
Descrizione fisica 1 online resource (298 p.)
Disciplina 660.044
660/.044
Collana Sustainability : Contributions through Science and Technology
Soggetto topico Plasma chemistry - Industrial applications
Textile fibers - Etching
Bleaching
Dyes and dyeing
Textile chemistry
Green chemistry
ISBN 0-429-06376-8
1-4398-3944-1
Classificazione SCI013000SCI013010TEC010000
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Front Cover; Contents; List of Figures; List of Tables; Series Preface; Foreword; Preface; Acknowledgements; About the Author; Chapter 1: Introduction; Chapter 2: Textile Materials; Chapter 3: Processes for Treating Textile Fibres; Chapter 4: What Is Plasma?; Chapter 5: Application of Plasma in the Pretreatment of Textiles; Chapter 6: Application of Plasma Treatment in the Dyeing of Textiles; Chapter 7: Application of Plasma Treatment in the Printing of Textiles; Chapter 8: Application of Plasma Treatment in Finishing of Textiles
Chapter 9: Sustainability and Development of Plasma Treatment in Textile Wet ProcessingBack Cover
Record Nr. UNINA-9910787845103321
Kan Chi-wai  
Boca Raton : , : CRC Press, , [2015]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
A novel green treatment for textiles : plasma treatment as a sustainable technology / / Chi-wai Kan
A novel green treatment for textiles : plasma treatment as a sustainable technology / / Chi-wai Kan
Autore Kan Chi-wai
Pubbl/distr/stampa Boca Raton : , : CRC Press, , [2015]
Descrizione fisica 1 online resource (298 p.)
Disciplina 660.044
660/.044
Collana Sustainability : Contributions through Science and Technology
Soggetto topico Plasma chemistry - Industrial applications
Textile fibers - Etching
Bleaching
Dyes and dyeing
Textile chemistry
Green chemistry
ISBN 0-429-06376-8
1-4398-3944-1
Classificazione SCI013000SCI013010TEC010000
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Front Cover; Contents; List of Figures; List of Tables; Series Preface; Foreword; Preface; Acknowledgements; About the Author; Chapter 1: Introduction; Chapter 2: Textile Materials; Chapter 3: Processes for Treating Textile Fibres; Chapter 4: What Is Plasma?; Chapter 5: Application of Plasma in the Pretreatment of Textiles; Chapter 6: Application of Plasma Treatment in the Dyeing of Textiles; Chapter 7: Application of Plasma Treatment in the Printing of Textiles; Chapter 8: Application of Plasma Treatment in Finishing of Textiles
Chapter 9: Sustainability and Development of Plasma Treatment in Textile Wet ProcessingBack Cover
Record Nr. UNINA-9910800183203321
Kan Chi-wai  
Boca Raton : , : CRC Press, , [2015]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Plasma Electrolytic Oxidation – Fundamentals, Advances and Applications : Edition Details / / edited by Viswanathan S. Saji, Mikhail Zheludkevich
Plasma Electrolytic Oxidation – Fundamentals, Advances and Applications : Edition Details / / edited by Viswanathan S. Saji, Mikhail Zheludkevich
Autore Saji Viswanathan S
Edizione [1st ed. 2025.]
Pubbl/distr/stampa Cham : , : Springer Nature Switzerland : , : Imprint : Springer, , 2025
Descrizione fisica 1 online resource (750 pages)
Disciplina 660.044
Collana Chemistry and Materials Science Series
Soggetto topico Surfaces (Technology)
Thin films
Metals
Coatings
Photocatalysis
Materials
Surfaces, Interfaces and Thin Film
Metals and Alloys
ISBN 9783031924293
9783031924286
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Plasma electrolytic oxidation: Fundamentals -- PEO by AC, DC and pulsed DC – Advantages, challenges and effects of electrolyte/electrode parameters -- Mechanistic aspects of PEO from the perspective of sparking discharge regimes and the role of ‘soft’ sparking. -- Unconventional PEO approaches (two-step PEO, laser-assisted PEO, ionic liquid / molten salt-assisted PEO, Cathodic PEO etc.) -- Effect of PEO on the mechanical properties of various metallic substrates (including fracture behaviours of PEO coatings) -- Growth mechanism of PEO on valve metals (Al, Ti and Mg) -- Growth mechanism of PEO on non-valve metals -- Growth mechanism of PEO on metal-matrix composites -- The colouring mechanism of PEO films -- Computational modelling studies on PEO -- PEO composite coatings with enhanced corrosion and wear resistance via particles incorporation -- Functionalization of PEO coatings via particles addition -- PEO coatings containing nanocarbons -- Biomedical PEO composite coatings (calcium phosphate, bioceramics etc.) -- Advances in anti-corrosion PEO coatings for light-weight materials (Al and Mg alloys) -- Advances in anti-wear PEO coatings for light-weight materials (Al and Mg alloys) -- Advances in anti-corrosion and anti-wear PEO coatings for Ti and its alloys -- Advances in anti-corrosion and anti-wear PEO coatings for steel and other alloys -- High-temperature oxidation/hot corrosion of PEO coatings -- Active corrosion protection coatings based on PEO (including multi-layer and self-healing coatings) -- PEO in photocatalysis and photoelectrochemical catalysis -- PEO in chemical and electrochemical catalysis -- PEO in battery applications (Li-ion battery, Li metal batteries etc.) -- Post-treatment sealing strategies for PEO coatings (organic and inorganic sealing-treatment, hydrothermally treated PEO composite coating).
Record Nr. UNINA-9911039325303321
Saji Viswanathan S  
Cham : , : Springer Nature Switzerland : , : Imprint : Springer, , 2025
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui