Dusty plasmas : physics, chemistry, and technological impacts in plasma processing / edited by André Bouchoule
| Dusty plasmas : physics, chemistry, and technological impacts in plasma processing / edited by André Bouchoule |
| Autore | Bouchoule, André |
| Pubbl/distr/stampa | Chichester, England ; New York : John Wiley & Sons, c1999 |
| Descrizione fisica | viii, 408 p. : ill. ; 24 cm. |
| Disciplina |
53.6.5
660.044 TA2020 |
| Soggetto topico |
Dusty plasmas
Plasma chemistry Plasma engineering Plasma enhanced chemical vapor deposition Plasma (Ionized gases)-Industrial applications |
| ISBN | 0471973866 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISALENTO-991003071579707536 |
Bouchoule, André
|
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| Chichester, England ; New York : John Wiley & Sons, c1999 | ||
| Lo trovi qui: Univ. del Salento | ||
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Industrial Plasma Technology: Applications from Environmental to Energy Technologies
| Industrial Plasma Technology: Applications from Environmental to Energy Technologies |
| Autore | Kawai Yoshinobu |
| Pubbl/distr/stampa | [Place of publication not identified], : Wiley VCH Imprint, 2010 |
| Disciplina | 660.044 |
| Soggetto topico |
Engineering & Applied Sciences
Applied Physics |
| ISBN | 3-527-62974-2 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Introduction to Plasmas -- Environmental Application of Nonthermal Plasma -- Atmospheric Plasma Air Pollution Control, Solid Waste, and Water Treatment Technologies: Fundamental and Overview -- Optical Diagnostics for High-Pressure Nonthermal Plasma Analysis -- Laser Investigations of Flow Patterns in Electrostatic Precipitators and Nonthermal Plasma Reactors -- Water Plasmas for Environmental Application -- Chemistry of Organic Pollutants in Atmospheric Plasmas -- Generation and Application of Wide Area Plasma -- Nonthermal Plasma-Based System for Exhaust Treatment Under Reduced Atmosphere of Pyrolysis Gases -- Pharmaceutical and Biomedical Engineering By Plasma Techniques -- Targeting Dendritic Cells With Carbon Magnetic Nanoparticles Made By Dense-Medium Plasma Technology -- Applications of Pulsed Power and Plasmas To Biosystems and Living Organisms -- Applications of Plasma Polymerization in Biomaterials -- Plasma Sterilization At Normal Atmospheric Pressure -- Elimination of Pathogenic Biological Residuals By Means of Low-Pressure Inductively Coupled Plasma Discharge -- Sterilization and Protein Treatment Using Oxygen Radicals Produced By Rf Discharge -- Hydrophilicity and Bioactivity of A Polyethylene Terephthalate Surface Modified By Plasma-Initiated Graft Polymerization -- Strategies and Issues on the Plasma Processing of Thin-Film Silicon Solar Cells -- Characteristics of Vhf Plasma With Large Area -- Deposition of A-Si : H Films With High Stability Against Light Exposure By Reducing Deposition of Nanoparticles Formed in Sih4 Discharges -- Diagnostics and Modeling of Sih4 /H2 Plasmas for the Deposition of Microcrystalline Silicon: the Case of Dual-Frequency Sources -- Introduction To Diamond-Like Carbons -- Diamond-Like Carbon for Applications -- Applications of Dlcs To Bioprocessing -- Plasma Processing of Nanocrystalline Semiconductive Cubic Boron Nitride Thin Films -- Fundamentals on Tribology of Plasma-Deposited Diamond-Like Carbon Films -- Diamond-Like Carbon Thin Films Grown in Pulsed-Dc Plasmas -- Plasma Deposition of N-Tio2 Thin Films -- Investigation of Dlc and Multilayer Coatings Hydrophobic Character for Biomedical Applications -- Creation of Novel Electromagnetic and Reactive Media From Microplasmas -- Nanoblock Assembly Using Pulse Rf Discharges With Amplitude Modulation -- Thomson Scattering Diagnostics of Discharge Plasmas -- Crystallized Nanodust Particles Growth in Low-Pressure Cold Plasmas -- Collection and Removal of Fine Particles in Plasma Chambers. |
| Record Nr. | UNINA-9910830792503321 |
Kawai Yoshinobu
|
||
| [Place of publication not identified], : Wiley VCH Imprint, 2010 | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Industrial Plasma Technology: Applications from Environmental to Energy Technologies
| Industrial Plasma Technology: Applications from Environmental to Energy Technologies |
| Autore | Kawai Yoshinobu |
| Pubbl/distr/stampa | [Place of publication not identified], : Wiley VCH Imprint, 2010 |
| Disciplina | 660.044 |
| Soggetto topico |
Engineering & Applied Sciences
Applied Physics |
| ISBN | 3-527-62974-2 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Introduction to Plasmas -- Environmental Application of Nonthermal Plasma -- Atmospheric Plasma Air Pollution Control, Solid Waste, and Water Treatment Technologies: Fundamental and Overview -- Optical Diagnostics for High-Pressure Nonthermal Plasma Analysis -- Laser Investigations of Flow Patterns in Electrostatic Precipitators and Nonthermal Plasma Reactors -- Water Plasmas for Environmental Application -- Chemistry of Organic Pollutants in Atmospheric Plasmas -- Generation and Application of Wide Area Plasma -- Nonthermal Plasma-Based System for Exhaust Treatment Under Reduced Atmosphere of Pyrolysis Gases -- Pharmaceutical and Biomedical Engineering By Plasma Techniques -- Targeting Dendritic Cells With Carbon Magnetic Nanoparticles Made By Dense-Medium Plasma Technology -- Applications of Pulsed Power and Plasmas To Biosystems and Living Organisms -- Applications of Plasma Polymerization in Biomaterials -- Plasma Sterilization At Normal Atmospheric Pressure -- Elimination of Pathogenic Biological Residuals By Means of Low-Pressure Inductively Coupled Plasma Discharge -- Sterilization and Protein Treatment Using Oxygen Radicals Produced By Rf Discharge -- Hydrophilicity and Bioactivity of A Polyethylene Terephthalate Surface Modified By Plasma-Initiated Graft Polymerization -- Strategies and Issues on the Plasma Processing of Thin-Film Silicon Solar Cells -- Characteristics of Vhf Plasma With Large Area -- Deposition of A-Si : H Films With High Stability Against Light Exposure By Reducing Deposition of Nanoparticles Formed in Sih4 Discharges -- Diagnostics and Modeling of Sih4 /H2 Plasmas for the Deposition of Microcrystalline Silicon: the Case of Dual-Frequency Sources -- Introduction To Diamond-Like Carbons -- Diamond-Like Carbon for Applications -- Applications of Dlcs To Bioprocessing -- Plasma Processing of Nanocrystalline Semiconductive Cubic Boron Nitride Thin Films -- Fundamentals on Tribology of Plasma-Deposited Diamond-Like Carbon Films -- Diamond-Like Carbon Thin Films Grown in Pulsed-Dc Plasmas -- Plasma Deposition of N-Tio2 Thin Films -- Investigation of Dlc and Multilayer Coatings Hydrophobic Character for Biomedical Applications -- Creation of Novel Electromagnetic and Reactive Media From Microplasmas -- Nanoblock Assembly Using Pulse Rf Discharges With Amplitude Modulation -- Thomson Scattering Diagnostics of Discharge Plasmas -- Crystallized Nanodust Particles Growth in Low-Pressure Cold Plasmas -- Collection and Removal of Fine Particles in Plasma Chambers. |
| Record Nr. | UNINA-9911019967003321 |
Kawai Yoshinobu
|
||
| [Place of publication not identified], : Wiley VCH Imprint, 2010 | ||
| Lo trovi qui: Univ. Federico II | ||
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Introduction to plasma technology [[electronic resource] ] : science, engineering and applications / / John Harry
| Introduction to plasma technology [[electronic resource] ] : science, engineering and applications / / John Harry |
| Autore | Harry John |
| Pubbl/distr/stampa | Weinheim, Germany, : Wiley-VCH, 2010 |
| Descrizione fisica | 1 online resource (234 p.) |
| Disciplina |
530.44
660.044 |
| Soggetto topico |
Plasma engineering
Plasma chemistry |
| Soggetto genere / forma | Electronic books. |
| ISBN |
3-527-64370-2
1-283-30238-1 9786613302380 3-527-63217-4 3-527-63216-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Introduction to Plasma Technology: Science, Engineering and Applications; Contents; Preface; Symbols, Constants and Electronic Symbols; 1 Plasma, an Overview; 1.1 Introduction; 1.2 Plasma; 1.2.1 Space Plasmas; 1.2.2 Kinetic Plasmas; 1.2.3 Technological Plasmas; 1.3 Classical Models; 1.3.1 Simple Ballistic and Statistical Models; 1.3.2 Statistical Behaviour; 1.3.3 Collisions Between Particles; 1.3.4 Coulomb Forces; 1.3.5 Boundaries and Sheaths; 1.3.6 Degree of Ionization; 1.4 Plasma Resonance; 1.5 The Defining Characteristics of a Plasma; References; Further Reading
2 Elastic and Inelastic Collision Processes in Weakly Ionized Gases2.1 Introduction; 2.2 The Drift Velocity; 2.2.1 Electrical Conductivity; 2.2.2 Mobility; 2.2.3 Thermal Velocity; 2.2.4 Collision Frequency; 2.2.5 Collision Cross-section; 2.3 Inelastic Collision Processes; 2.3.1 Excitation; 2.3.1.1 Metastable Processes; 2.3.2 Ionization and Recombination Processes; 2.3.2.1 Charge Transfer; 2.3.2.2 Dissociation; 2.3.2.3 Negative Ionization; 2.3.2.4 Recombination; 2.3.2.5 Metastable Ionization; References; 3 The Interaction of Electromagnetic Fields with Plasmas; 3.1 Introduction 3.2 The Behaviour of Plasmas at DC and Low Frequencies in the Near Field3.2.1 Charged Particles in Electromagnetic Fields; 3.2.1.1 Behaviour of a Charged Particle in an Oscillating Electric Field; 3.2.1.2 Plasma Frequency; 3.2.1.3 The Debye Radius; 3.3 Behaviour of Charged Particles in Magnetic Fields (Magnetized Plasmas); 3.4 Initiation of an Electrical Discharge or Plasma; 3.5 Similarity Conditions; References; Further Reading; 4 Coupling Processes; 4.1 Introduction; 4.2 Direct Coupling; 4.2.1 The Cathode; 4.2.1.1 Emission Processes; 4.2.2 The Cathode Fall Region; 4.2.3 The Anode 4.2.4 The Discharge Column4.2.5 Interaction of Magnetic Fields with a Discharge or Plasma; 4.3 Indirect Coupling; 4.3.1 Induction Coupling; 4.3.2 Capacitive Coupling; 4.3.3 Propagation of an Electromagnetic Wave; 4.3.4 The Helical Resonator; 4.3.5 Microwave Waveguides; 4.3.6 Electron Cyclotron Resonance; 4.3.7 The Helicon Plasma Source; References; Further Reading; 5 Applications of Nonequilibrium Cold Low-pressure Discharges and Plasmas; 5.1 Introduction; 5.2 Plasma Processes Used in Electronics Fabrication; 5.2.1 The Glow Discharge Diode; 5.2.2 The Magnetron 5.2.3 Inductively Coupled Plasmas5.2.4 Electron Cyclotron Resonance Reactor; 5.2.5 The Helical Reactor; 5.2.6 The Helicon Reactor; 5.3 Low-pressure Electric Discharge and Plasma Lamps; 5.3.1 The Low-pressure Mercury Vapour Lamp; 5.3.2 Cold Cathode Low-pressure Lamps; 5.3.3 Electrodeless Low-pressure Discharge Lamps; 5.4 Gas Lasers; 5.5 Free Electron and Ion Beams; 5.5.1 Electron and Ion Beam Evaporation; 5.5.2 Ion Beam Processes; 5.5.3 High-power Electron Beams; 5.6 Glow Discharge Surface Treatment; 5.7 Propulsion in Space; References; Further Reading 6 Nonequilibrium Atmospheric Pressure Discharges and Plasmas |
| Record Nr. | UNINA-9910139422103321 |
Harry John
|
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| Weinheim, Germany, : Wiley-VCH, 2010 | ||
| Lo trovi qui: Univ. Federico II | ||
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Introduction to plasma technology : science, engineering and applications / / John Harry
| Introduction to plasma technology : science, engineering and applications / / John Harry |
| Autore | Harry John |
| Pubbl/distr/stampa | Weinheim, Germany, : Wiley-VCH, 2010 |
| Descrizione fisica | 1 online resource (234 p.) |
| Disciplina |
530.44
660.044 |
| Soggetto topico |
Plasma engineering
Plasma chemistry |
| ISBN |
9786613302380
9783527643707 3527643702 9781283302388 1283302381 9783527632176 3527632174 9783527632169 3527632166 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Introduction to Plasma Technology: Science, Engineering and Applications; Contents; Preface; Symbols, Constants and Electronic Symbols; 1 Plasma, an Overview; 1.1 Introduction; 1.2 Plasma; 1.2.1 Space Plasmas; 1.2.2 Kinetic Plasmas; 1.2.3 Technological Plasmas; 1.3 Classical Models; 1.3.1 Simple Ballistic and Statistical Models; 1.3.2 Statistical Behaviour; 1.3.3 Collisions Between Particles; 1.3.4 Coulomb Forces; 1.3.5 Boundaries and Sheaths; 1.3.6 Degree of Ionization; 1.4 Plasma Resonance; 1.5 The Defining Characteristics of a Plasma; References; Further Reading
2 Elastic and Inelastic Collision Processes in Weakly Ionized Gases2.1 Introduction; 2.2 The Drift Velocity; 2.2.1 Electrical Conductivity; 2.2.2 Mobility; 2.2.3 Thermal Velocity; 2.2.4 Collision Frequency; 2.2.5 Collision Cross-section; 2.3 Inelastic Collision Processes; 2.3.1 Excitation; 2.3.1.1 Metastable Processes; 2.3.2 Ionization and Recombination Processes; 2.3.2.1 Charge Transfer; 2.3.2.2 Dissociation; 2.3.2.3 Negative Ionization; 2.3.2.4 Recombination; 2.3.2.5 Metastable Ionization; References; 3 The Interaction of Electromagnetic Fields with Plasmas; 3.1 Introduction 3.2 The Behaviour of Plasmas at DC and Low Frequencies in the Near Field3.2.1 Charged Particles in Electromagnetic Fields; 3.2.1.1 Behaviour of a Charged Particle in an Oscillating Electric Field; 3.2.1.2 Plasma Frequency; 3.2.1.3 The Debye Radius; 3.3 Behaviour of Charged Particles in Magnetic Fields (Magnetized Plasmas); 3.4 Initiation of an Electrical Discharge or Plasma; 3.5 Similarity Conditions; References; Further Reading; 4 Coupling Processes; 4.1 Introduction; 4.2 Direct Coupling; 4.2.1 The Cathode; 4.2.1.1 Emission Processes; 4.2.2 The Cathode Fall Region; 4.2.3 The Anode 4.2.4 The Discharge Column4.2.5 Interaction of Magnetic Fields with a Discharge or Plasma; 4.3 Indirect Coupling; 4.3.1 Induction Coupling; 4.3.2 Capacitive Coupling; 4.3.3 Propagation of an Electromagnetic Wave; 4.3.4 The Helical Resonator; 4.3.5 Microwave Waveguides; 4.3.6 Electron Cyclotron Resonance; 4.3.7 The Helicon Plasma Source; References; Further Reading; 5 Applications of Nonequilibrium Cold Low-pressure Discharges and Plasmas; 5.1 Introduction; 5.2 Plasma Processes Used in Electronics Fabrication; 5.2.1 The Glow Discharge Diode; 5.2.2 The Magnetron 5.2.3 Inductively Coupled Plasmas5.2.4 Electron Cyclotron Resonance Reactor; 5.2.5 The Helical Reactor; 5.2.6 The Helicon Reactor; 5.3 Low-pressure Electric Discharge and Plasma Lamps; 5.3.1 The Low-pressure Mercury Vapour Lamp; 5.3.2 Cold Cathode Low-pressure Lamps; 5.3.3 Electrodeless Low-pressure Discharge Lamps; 5.4 Gas Lasers; 5.5 Free Electron and Ion Beams; 5.5.1 Electron and Ion Beam Evaporation; 5.5.2 Ion Beam Processes; 5.5.3 High-power Electron Beams; 5.6 Glow Discharge Surface Treatment; 5.7 Propulsion in Space; References; Further Reading 6 Nonequilibrium Atmospheric Pressure Discharges and Plasmas |
| Record Nr. | UNINA-9911019234003321 |
Harry John
|
||
| Weinheim, Germany, : Wiley-VCH, 2010 | ||
| Lo trovi qui: Univ. Federico II | ||
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Microwave plasma sources and methods in processing technology / / Ladislav Bardos, Hana Barankova, Uppsala University, Uppsala, Sweden
| Microwave plasma sources and methods in processing technology / / Ladislav Bardos, Hana Barankova, Uppsala University, Uppsala, Sweden |
| Autore | Bardos Ladislav <1947-> |
| Pubbl/distr/stampa | Hoboken, New Jersey : , : John Wiley & Sons, , [2022] |
| Descrizione fisica | 1 online resource (262 pages) |
| Disciplina | 660.044 |
| Soggetto topico | Electromagnetism |
| ISBN |
1-119-82688-8
1-119-82690-X 1-119-82689-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910554862703321 |
Bardos Ladislav <1947->
|
||
| Hoboken, New Jersey : , : John Wiley & Sons, , [2022] | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Microwave plasma sources and methods in processing technology / / Ladislav Bardos, Hana Barankova, Uppsala University, Uppsala, Sweden
| Microwave plasma sources and methods in processing technology / / Ladislav Bardos, Hana Barankova, Uppsala University, Uppsala, Sweden |
| Autore | Bardos Ladislav <1947-> |
| Pubbl/distr/stampa | Hoboken, New Jersey : , : John Wiley & Sons, , [2022] |
| Descrizione fisica | 1 online resource (262 pages) |
| Disciplina | 660.044 |
| Soggetto topico | Electromagnetism |
| ISBN |
1-119-82688-8
1-119-82690-X 1-119-82689-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910830188903321 |
Bardos Ladislav <1947->
|
||
| Hoboken, New Jersey : , : John Wiley & Sons, , [2022] | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
A novel green treatment for textiles : plasma treatment as a sustainable technology / / Chi-wai Kan
| A novel green treatment for textiles : plasma treatment as a sustainable technology / / Chi-wai Kan |
| Autore | Kan Chi-wai |
| Pubbl/distr/stampa | Boca Raton : , : CRC Press, , [2015] |
| Descrizione fisica | 1 online resource (298 p.) |
| Disciplina |
660.044
660/.044 |
| Collana | Sustainability : Contributions through Science and Technology |
| Soggetto topico |
Plasma chemistry - Industrial applications
Textile fibers - Etching Bleaching Dyes and dyeing Textile chemistry Green chemistry |
| ISBN |
0-429-06376-8
1-4398-3944-1 |
| Classificazione | SCI013000SCI013010TEC010000 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Contents; List of Figures; List of Tables; Series Preface; Foreword; Preface; Acknowledgements; About the Author; Chapter 1: Introduction; Chapter 2: Textile Materials; Chapter 3: Processes for Treating Textile Fibres; Chapter 4: What Is Plasma?; Chapter 5: Application of Plasma in the Pretreatment of Textiles; Chapter 6: Application of Plasma Treatment in the Dyeing of Textiles; Chapter 7: Application of Plasma Treatment in the Printing of Textiles; Chapter 8: Application of Plasma Treatment in Finishing of Textiles
Chapter 9: Sustainability and Development of Plasma Treatment in Textile Wet ProcessingBack Cover |
| Record Nr. | UNINA-9910787845103321 |
Kan Chi-wai
|
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| Boca Raton : , : CRC Press, , [2015] | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
A novel green treatment for textiles : plasma treatment as a sustainable technology / / Chi-wai Kan
| A novel green treatment for textiles : plasma treatment as a sustainable technology / / Chi-wai Kan |
| Autore | Kan Chi-wai |
| Pubbl/distr/stampa | Boca Raton : , : CRC Press, , [2015] |
| Descrizione fisica | 1 online resource (298 p.) |
| Disciplina |
660.044
660/.044 |
| Collana | Sustainability : Contributions through Science and Technology |
| Soggetto topico |
Plasma chemistry - Industrial applications
Textile fibers - Etching Bleaching Dyes and dyeing Textile chemistry Green chemistry |
| ISBN |
0-429-06376-8
1-4398-3944-1 |
| Classificazione | SCI013000SCI013010TEC010000 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Contents; List of Figures; List of Tables; Series Preface; Foreword; Preface; Acknowledgements; About the Author; Chapter 1: Introduction; Chapter 2: Textile Materials; Chapter 3: Processes for Treating Textile Fibres; Chapter 4: What Is Plasma?; Chapter 5: Application of Plasma in the Pretreatment of Textiles; Chapter 6: Application of Plasma Treatment in the Dyeing of Textiles; Chapter 7: Application of Plasma Treatment in the Printing of Textiles; Chapter 8: Application of Plasma Treatment in Finishing of Textiles
Chapter 9: Sustainability and Development of Plasma Treatment in Textile Wet ProcessingBack Cover |
| Record Nr. | UNINA-9910800183203321 |
Kan Chi-wai
|
||
| Boca Raton : , : CRC Press, , [2015] | ||
| Lo trovi qui: Univ. Federico II | ||
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Plasma Electrolytic Oxidation – Fundamentals, Advances and Applications : Edition Details / / edited by Viswanathan S. Saji, Mikhail Zheludkevich
| Plasma Electrolytic Oxidation – Fundamentals, Advances and Applications : Edition Details / / edited by Viswanathan S. Saji, Mikhail Zheludkevich |
| Autore | Saji Viswanathan S |
| Edizione | [1st ed. 2025.] |
| Pubbl/distr/stampa | Cham : , : Springer Nature Switzerland : , : Imprint : Springer, , 2025 |
| Descrizione fisica | 1 online resource (750 pages) |
| Disciplina | 660.044 |
| Collana | Chemistry and Materials Science Series |
| Soggetto topico |
Surfaces (Technology)
Thin films Metals Coatings Photocatalysis Materials Surfaces, Interfaces and Thin Film Metals and Alloys |
| ISBN |
9783031924293
9783031924286 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Plasma electrolytic oxidation: Fundamentals -- PEO by AC, DC and pulsed DC – Advantages, challenges and effects of electrolyte/electrode parameters -- Mechanistic aspects of PEO from the perspective of sparking discharge regimes and the role of ‘soft’ sparking. -- Unconventional PEO approaches (two-step PEO, laser-assisted PEO, ionic liquid / molten salt-assisted PEO, Cathodic PEO etc.) -- Effect of PEO on the mechanical properties of various metallic substrates (including fracture behaviours of PEO coatings) -- Growth mechanism of PEO on valve metals (Al, Ti and Mg) -- Growth mechanism of PEO on non-valve metals -- Growth mechanism of PEO on metal-matrix composites -- The colouring mechanism of PEO films -- Computational modelling studies on PEO -- PEO composite coatings with enhanced corrosion and wear resistance via particles incorporation -- Functionalization of PEO coatings via particles addition -- PEO coatings containing nanocarbons -- Biomedical PEO composite coatings (calcium phosphate, bioceramics etc.) -- Advances in anti-corrosion PEO coatings for light-weight materials (Al and Mg alloys) -- Advances in anti-wear PEO coatings for light-weight materials (Al and Mg alloys) -- Advances in anti-corrosion and anti-wear PEO coatings for Ti and its alloys -- Advances in anti-corrosion and anti-wear PEO coatings for steel and other alloys -- High-temperature oxidation/hot corrosion of PEO coatings -- Active corrosion protection coatings based on PEO (including multi-layer and self-healing coatings) -- PEO in photocatalysis and photoelectrochemical catalysis -- PEO in chemical and electrochemical catalysis -- PEO in battery applications (Li-ion battery, Li metal batteries etc.) -- Post-treatment sealing strategies for PEO coatings (organic and inorganic sealing-treatment, hydrothermally treated PEO composite coating). |
| Record Nr. | UNINA-9911039325303321 |
Saji Viswanathan S
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| Cham : , : Springer Nature Switzerland : , : Imprint : Springer, , 2025 | ||
| Lo trovi qui: Univ. Federico II | ||
| ||