Active-matrix organic light-emitting display technologies / / by Shuming Chen [and four others] |
Pubbl/distr/stampa | Sharjah, United Arab Emirates : , : Bentham Science Publishers Ltd., , [2014] |
Descrizione fisica | 1 online resource (211 p.) |
Disciplina | 621.381522 |
Collana | Frontiers in Electrical Engineering |
Soggetto topico | Light emitting diodes |
Soggetto genere / forma | Electronic books. |
ISBN | 1-68108-120-2 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
CONTENTS; PREFACE ; LIST OF CONTRIBUTORS ; Introduction to Organic Light-Emitting Display Technologies ; INTRODUCTION; DEVELOPEMNT HISTORY OF OLEDS; BASIC PHYSICS OF OLEDS; Charge Carriers Injection; Charge Carriers Transportation ; Exciton Formation and Recombination ; Light Extraction from Devices ; FABRICATION AND CHARACTERIZATION OF OLEDS; APPLICATION OF OLEDS; Flat Panel Display; Solid-state Lighting; CONFLICT OF INTEREST; ACKNOWLEDGMENTS; REFERENCES; White Organic Light-Emitting Diodes for Display and Lighting Application ; WOLEDS FOR FULL COLOR DISPLAYS; WOLEDS FOR SOLID-STATE LIGHTING
APPROACHES TO WHITE LIGHT EMISSIONMulti-emissive Layers; Single-emissive Layer; WOLEDs with Fluorescent-phosphorescent Hybrid Emitters ; Tandem WOLEDs; Side by Side WOLEDs; Color Converted WOLEDs; Excimer/Exciplex WOLEDs; CONFLICT OF INTEREST; ACKNOWLEDGMENTS; REFERENCES; Light Outcoupling Technologies ; INTRODUCTION; LIGHT DISTRIBUTION IN OLED; EXTERNAL EXTRACTION STRUCTURES; Truncated Square-pyramid Luminaire; Scattering Film; Sand-blasting Substrate; Microlens Array; INTERNAL EXTRACTION STRUCTURES; Internal Scattering Layer; Photonic Crystal Structure; Metal Nanoparticles; CONCLUSION CONFLICT OF INTERESTACKNOWLEDGEMENTS; REFERENCES; Encapsulation Technologies ; INTRODUCTION; DARK SPOTS FORMATION MECHANISM; REQUIREMENT AND MEASUREMENT OF THE PERMEATION RATES; TRADITIONAL ENCAPSULATION TECHNOLOGY; THIN FILM ENCAPSUTION TECHNOLOGY; Si3N4/SiO2 Multilayer; Organic/Inorganic Multilayer; Atomic Layer Deposited (ALD) Film; CONCLUSION; CONFLICT OF INTEREST; ACKNOWLEDGEMENTS; REFERENCES; Thin Film Transistor Technology ; INTRODUCTION; HISTORY OF THIN FILM TRANSISTORS; HYDROGENATED AMORPHOUS SILICON TFT TECHNOLOGY; LOW TEMPERATURE POLYCRYSTALLLINE SILICON TFT TECHNOLOGY SPC TechnologyMIC Technology; ELA Technology; Bridge Grain Technology; METAL OXIDE SEMICONDUCTOR TFTS; Zinc Oxide TFTs; Amorphous Oxide Semiconductors and TFTs; Zinc Tin Oxide; Indium Gallium Oxide; Indium Gallium Zinc Oxide; GaN TFTs; MoS2 TFTs; SUMMARY ; CONFLICT OF INTEREST; ACKNOWLEDGEMENTS; REFERENCES; Driving Schemes and Design Considerations for AMOLED ; CIRCUIT FUNDAMENTALS ; Resistor-Capacitor Circuit; Charging and Discharging RC Circuit; Capacitive Parasitics; TFT CIRCUIT CONSIDERATIONS; Operational Region; Transistor as a Switch; Transistor as a Current Source or Current Drain On ResistanceApproximation of TFT with an equivalent resistance; DESIGN CONSIDERATIONS FOR ACTIVE-MATRIX BACKPLANE; Brightness; Display Timing; Pixel Storage Capacitance; Design Expression; TFT CIRCUIT DESIGN TECHNIQUES; Bootstrap Circuit; CIRCUIT COMPENSATION AND LAYOUT DESIGN; CHALLENGE IN AMOLED DISPLAYS; Aging of OLED and TFT ; Threshold Voltage Shift; 2T1C Pixel Configuration; THRESHOLD VOLTAGE COMPENSATED AMOLED PIXEL; 3T1C Pixel Configuration; 4T1C Pixel Configuration; 5T2C Pixel Configuration; 6T1C Pixel Configuration; 6T1C Pixel Configuration with biased discharge method CONFLICT OF INTEREST |
Record Nr. | UNINA-9910460876403321 |
Sharjah, United Arab Emirates : , : Bentham Science Publishers Ltd., , [2014] | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
Active-matrix organic light-emitting display technologies / / by Shuming Chen [and four others] |
Pubbl/distr/stampa | Sharjah, United Arab Emirates : , : Bentham Science Publishers Ltd., , [2014] |
Descrizione fisica | 1 online resource (211 p.) |
Disciplina | 621.381522 |
Collana | Frontiers in Electrical Engineering |
Soggetto topico | Light emitting diodes |
ISBN | 1-68108-120-2 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
CONTENTS; PREFACE ; LIST OF CONTRIBUTORS ; Introduction to Organic Light-Emitting Display Technologies ; INTRODUCTION; DEVELOPEMNT HISTORY OF OLEDS; BASIC PHYSICS OF OLEDS; Charge Carriers Injection; Charge Carriers Transportation ; Exciton Formation and Recombination ; Light Extraction from Devices ; FABRICATION AND CHARACTERIZATION OF OLEDS; APPLICATION OF OLEDS; Flat Panel Display; Solid-state Lighting; CONFLICT OF INTEREST; ACKNOWLEDGMENTS; REFERENCES; White Organic Light-Emitting Diodes for Display and Lighting Application ; WOLEDS FOR FULL COLOR DISPLAYS; WOLEDS FOR SOLID-STATE LIGHTING
APPROACHES TO WHITE LIGHT EMISSIONMulti-emissive Layers; Single-emissive Layer; WOLEDs with Fluorescent-phosphorescent Hybrid Emitters ; Tandem WOLEDs; Side by Side WOLEDs; Color Converted WOLEDs; Excimer/Exciplex WOLEDs; CONFLICT OF INTEREST; ACKNOWLEDGMENTS; REFERENCES; Light Outcoupling Technologies ; INTRODUCTION; LIGHT DISTRIBUTION IN OLED; EXTERNAL EXTRACTION STRUCTURES; Truncated Square-pyramid Luminaire; Scattering Film; Sand-blasting Substrate; Microlens Array; INTERNAL EXTRACTION STRUCTURES; Internal Scattering Layer; Photonic Crystal Structure; Metal Nanoparticles; CONCLUSION CONFLICT OF INTERESTACKNOWLEDGEMENTS; REFERENCES; Encapsulation Technologies ; INTRODUCTION; DARK SPOTS FORMATION MECHANISM; REQUIREMENT AND MEASUREMENT OF THE PERMEATION RATES; TRADITIONAL ENCAPSULATION TECHNOLOGY; THIN FILM ENCAPSUTION TECHNOLOGY; Si3N4/SiO2 Multilayer; Organic/Inorganic Multilayer; Atomic Layer Deposited (ALD) Film; CONCLUSION; CONFLICT OF INTEREST; ACKNOWLEDGEMENTS; REFERENCES; Thin Film Transistor Technology ; INTRODUCTION; HISTORY OF THIN FILM TRANSISTORS; HYDROGENATED AMORPHOUS SILICON TFT TECHNOLOGY; LOW TEMPERATURE POLYCRYSTALLLINE SILICON TFT TECHNOLOGY SPC TechnologyMIC Technology; ELA Technology; Bridge Grain Technology; METAL OXIDE SEMICONDUCTOR TFTS; Zinc Oxide TFTs; Amorphous Oxide Semiconductors and TFTs; Zinc Tin Oxide; Indium Gallium Oxide; Indium Gallium Zinc Oxide; GaN TFTs; MoS2 TFTs; SUMMARY ; CONFLICT OF INTEREST; ACKNOWLEDGEMENTS; REFERENCES; Driving Schemes and Design Considerations for AMOLED ; CIRCUIT FUNDAMENTALS ; Resistor-Capacitor Circuit; Charging and Discharging RC Circuit; Capacitive Parasitics; TFT CIRCUIT CONSIDERATIONS; Operational Region; Transistor as a Switch; Transistor as a Current Source or Current Drain On ResistanceApproximation of TFT with an equivalent resistance; DESIGN CONSIDERATIONS FOR ACTIVE-MATRIX BACKPLANE; Brightness; Display Timing; Pixel Storage Capacitance; Design Expression; TFT CIRCUIT DESIGN TECHNIQUES; Bootstrap Circuit; CIRCUIT COMPENSATION AND LAYOUT DESIGN; CHALLENGE IN AMOLED DISPLAYS; Aging of OLED and TFT ; Threshold Voltage Shift; 2T1C Pixel Configuration; THRESHOLD VOLTAGE COMPENSATED AMOLED PIXEL; 3T1C Pixel Configuration; 4T1C Pixel Configuration; 5T2C Pixel Configuration; 6T1C Pixel Configuration; 6T1C Pixel Configuration with biased discharge method CONFLICT OF INTEREST |
Record Nr. | UNINA-9910797786803321 |
Sharjah, United Arab Emirates : , : Bentham Science Publishers Ltd., , [2014] | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
Active-matrix organic light-emitting display technologies / / by Shuming Chen [and four others] |
Pubbl/distr/stampa | Sharjah, United Arab Emirates : , : Bentham Science Publishers Ltd., , [2014] |
Descrizione fisica | 1 online resource (211 p.) |
Disciplina | 621.381522 |
Collana | Frontiers in Electrical Engineering |
Soggetto topico | Light emitting diodes |
ISBN | 1-68108-120-2 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
CONTENTS; PREFACE ; LIST OF CONTRIBUTORS ; Introduction to Organic Light-Emitting Display Technologies ; INTRODUCTION; DEVELOPEMNT HISTORY OF OLEDS; BASIC PHYSICS OF OLEDS; Charge Carriers Injection; Charge Carriers Transportation ; Exciton Formation and Recombination ; Light Extraction from Devices ; FABRICATION AND CHARACTERIZATION OF OLEDS; APPLICATION OF OLEDS; Flat Panel Display; Solid-state Lighting; CONFLICT OF INTEREST; ACKNOWLEDGMENTS; REFERENCES; White Organic Light-Emitting Diodes for Display and Lighting Application ; WOLEDS FOR FULL COLOR DISPLAYS; WOLEDS FOR SOLID-STATE LIGHTING
APPROACHES TO WHITE LIGHT EMISSIONMulti-emissive Layers; Single-emissive Layer; WOLEDs with Fluorescent-phosphorescent Hybrid Emitters ; Tandem WOLEDs; Side by Side WOLEDs; Color Converted WOLEDs; Excimer/Exciplex WOLEDs; CONFLICT OF INTEREST; ACKNOWLEDGMENTS; REFERENCES; Light Outcoupling Technologies ; INTRODUCTION; LIGHT DISTRIBUTION IN OLED; EXTERNAL EXTRACTION STRUCTURES; Truncated Square-pyramid Luminaire; Scattering Film; Sand-blasting Substrate; Microlens Array; INTERNAL EXTRACTION STRUCTURES; Internal Scattering Layer; Photonic Crystal Structure; Metal Nanoparticles; CONCLUSION CONFLICT OF INTERESTACKNOWLEDGEMENTS; REFERENCES; Encapsulation Technologies ; INTRODUCTION; DARK SPOTS FORMATION MECHANISM; REQUIREMENT AND MEASUREMENT OF THE PERMEATION RATES; TRADITIONAL ENCAPSULATION TECHNOLOGY; THIN FILM ENCAPSUTION TECHNOLOGY; Si3N4/SiO2 Multilayer; Organic/Inorganic Multilayer; Atomic Layer Deposited (ALD) Film; CONCLUSION; CONFLICT OF INTEREST; ACKNOWLEDGEMENTS; REFERENCES; Thin Film Transistor Technology ; INTRODUCTION; HISTORY OF THIN FILM TRANSISTORS; HYDROGENATED AMORPHOUS SILICON TFT TECHNOLOGY; LOW TEMPERATURE POLYCRYSTALLLINE SILICON TFT TECHNOLOGY SPC TechnologyMIC Technology; ELA Technology; Bridge Grain Technology; METAL OXIDE SEMICONDUCTOR TFTS; Zinc Oxide TFTs; Amorphous Oxide Semiconductors and TFTs; Zinc Tin Oxide; Indium Gallium Oxide; Indium Gallium Zinc Oxide; GaN TFTs; MoS2 TFTs; SUMMARY ; CONFLICT OF INTEREST; ACKNOWLEDGEMENTS; REFERENCES; Driving Schemes and Design Considerations for AMOLED ; CIRCUIT FUNDAMENTALS ; Resistor-Capacitor Circuit; Charging and Discharging RC Circuit; Capacitive Parasitics; TFT CIRCUIT CONSIDERATIONS; Operational Region; Transistor as a Switch; Transistor as a Current Source or Current Drain On ResistanceApproximation of TFT with an equivalent resistance; DESIGN CONSIDERATIONS FOR ACTIVE-MATRIX BACKPLANE; Brightness; Display Timing; Pixel Storage Capacitance; Design Expression; TFT CIRCUIT DESIGN TECHNIQUES; Bootstrap Circuit; CIRCUIT COMPENSATION AND LAYOUT DESIGN; CHALLENGE IN AMOLED DISPLAYS; Aging of OLED and TFT ; Threshold Voltage Shift; 2T1C Pixel Configuration; THRESHOLD VOLTAGE COMPENSATED AMOLED PIXEL; 3T1C Pixel Configuration; 4T1C Pixel Configuration; 5T2C Pixel Configuration; 6T1C Pixel Configuration; 6T1C Pixel Configuration with biased discharge method CONFLICT OF INTEREST |
Record Nr. | UNINA-9910808185903321 |
Sharjah, United Arab Emirates : , : Bentham Science Publishers Ltd., , [2014] | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
Advances in photodiodes / / edited by Gian-Franco Dalla Betta |
Autore | Betta G. F (Gian-Franco Dalla) |
Pubbl/distr/stampa | IntechOpen, 2011 |
Descrizione fisica | 1 online resource (480 pages) : illustrations |
Disciplina | 621.381522 |
Soggetto topico | Photodiodes |
Soggetto non controllato |
Engineering
Physical Sciences Engineering and Technology Electrical and Electronic Engineering Optical Engineering |
ISBN | 953-51-4512-6 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910138266003321 |
Betta G. F (Gian-Franco Dalla) | ||
IntechOpen, 2011 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
Air-Stable Inverted Organic Light-Emitting Diodes [[electronic resource] /] / by Katsuyuki Morii, Hirohiko Fukagawa |
Autore | Morii Katsuyuki |
Edizione | [1st ed. 2020.] |
Pubbl/distr/stampa | Cham : , : Springer International Publishing : , : Imprint : Springer, , 2020 |
Descrizione fisica | 1 online resource (55 pages) |
Disciplina | 621.381522 |
Collana | Display Science and Technology |
Soggetto topico |
Lasers
Photonics Microwaves Optical engineering Optical materials Electronic materials Semiconductors Optics, Lasers, Photonics, Optical Devices Microwaves, RF and Optical Engineering Optical and Electronic Materials |
ISBN | 3-030-18514-1 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto | 1: Air stability for organic light-emitting diodes (Katsuyuki Morii) -- 2: Hybrid organic-inorganic light-emitting diode (Katsuyuki Morii) -- 3: Interfacial engineering by introducing an interlayer (Hirohiko Fukagawa) -- 4: Carrier Injection Mechanism (Hirohiko Fukagawa). |
Record Nr. | UNISA-996418175103316 |
Morii Katsuyuki | ||
Cham : , : Springer International Publishing : , : Imprint : Springer, , 2020 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. di Salerno | ||
|
Air-Stable Inverted Organic Light-Emitting Diodes / / by Katsuyuki Morii, Hirohiko Fukagawa |
Autore | Morii Katsuyuki |
Edizione | [1st ed. 2020.] |
Pubbl/distr/stampa | Cham : , : Springer International Publishing : , : Imprint : Springer, , 2020 |
Descrizione fisica | 1 online resource (55 pages) |
Disciplina | 621.381522 |
Collana | Display Science and Technology |
Soggetto topico |
Lasers
Photonics Microwaves Optical engineering Optical materials Electronic materials Semiconductors Optics, Lasers, Photonics, Optical Devices Microwaves, RF and Optical Engineering Optical and Electronic Materials |
ISBN | 3-030-18514-1 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto | 1: Air stability for organic light-emitting diodes (Katsuyuki Morii) -- 2: Hybrid organic-inorganic light-emitting diode (Katsuyuki Morii) -- 3: Interfacial engineering by introducing an interlayer (Hirohiko Fukagawa) -- 4: Carrier Injection Mechanism (Hirohiko Fukagawa). |
Record Nr. | UNINA-9910409998803321 |
Morii Katsuyuki | ||
Cham : , : Springer International Publishing : , : Imprint : Springer, , 2020 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
ANSI N42.28-2002 : American National Standard for Calibration of Germanium Detectors for In-Situ Gamma-Ray Measurements / / Institute of Electrical and Electronics Engineers (IEEE) |
Pubbl/distr/stampa | New York : , : Institute of Electrical and Electronics Engineers (IEEE), , 2004 |
Descrizione fisica | 1 online resource (vi, 37 pages) : illustrations |
Disciplina | 621.381522 |
Soggetto topico |
Gamma rays - Measurement - Standards
Germanium diodes - Standards |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Altri titoli varianti | ANSI N42.28-2002: American National Standard for Calibration of Germanium Detectors for In-Situ Gamma-Ray Measurements |
Record Nr. | UNISA-996279884503316 |
New York : , : Institute of Electrical and Electronics Engineers (IEEE), , 2004 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. di Salerno | ||
|
ANSI N42.28-2002 : American National Standard for Calibration of Germanium Detectors for In-Situ Gamma-Ray Measurements / / Institute of Electrical and Electronics Engineers (IEEE) |
Pubbl/distr/stampa | New York : , : Institute of Electrical and Electronics Engineers (IEEE), , 2004 |
Descrizione fisica | 1 online resource (vi, 37 pages) : illustrations |
Disciplina | 621.381522 |
Soggetto topico |
Gamma rays - Measurement - Standards
Germanium diodes - Standards |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Altri titoli varianti | ANSI N42.28-2002: American National Standard for Calibration of Germanium Detectors for In-Situ Gamma-Ray Measurements |
Record Nr. | UNINA-9910147245403321 |
New York : , : Institute of Electrical and Electronics Engineers (IEEE), , 2004 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
ANSI Std N42.12-1980 : American National Standard Calibration and Usage of Sodium Iodide Detector Systems / / Institute of Electrical and Electronics Engineers |
Pubbl/distr/stampa | New York, New York : , : IEEE, , 1980 |
Descrizione fisica | 1 online resource (11 pages) |
Disciplina | 621.381522 |
Soggetto topico |
Germanium diodes - Standards
Gamma rays - Measurement - Standards |
ISBN | 0-7381-4163-1 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Altri titoli varianti | ANSI Std N42.12-1980: American National Standard Calibration and Usage of Sodium Iodide Detector Systems |
Record Nr. | UNINA-9910135781503321 |
New York, New York : , : IEEE, , 1980 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
ANSI Std N42.12-1980 : American National Standard Calibration and Usage of Sodium Iodide Detector Systems / / Institute of Electrical and Electronics Engineers |
Pubbl/distr/stampa | New York, New York : , : IEEE, , 1980 |
Descrizione fisica | 1 online resource (11 pages) |
Disciplina | 621.381522 |
Soggetto topico |
Germanium diodes - Standards
Gamma rays - Measurement - Standards |
ISBN | 0-7381-4163-1 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Altri titoli varianti | ANSI Std N42.12-1980: American National Standard Calibration and Usage of Sodium Iodide Detector Systems |
Record Nr. | UNISA-996279879703316 |
New York, New York : , : IEEE, , 1980 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. di Salerno | ||
|